| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/24/2010 | EP1438774B1 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 02/24/2010 | CN101657761A Photoresist developing solution |
| 02/24/2010 | CN101657760A Radiation source and method for generating electromagnetic radiation |
| 02/24/2010 | CN101657759A Alkali-developable photosensitive resin composition and ss-diketone |
| 02/24/2010 | CN101657758A Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| 02/24/2010 | CN101657757A Methods of forming a stamp, methods of patterning a substrate, and a stamp and a patterning system for same |
| 02/24/2010 | CN101655672A Liquor circulation pipeline |
| 02/24/2010 | CN101655671A Lithographic apparatus and device manufacturing method |
| 02/24/2010 | CN101655670A On-line detection device with function of calibrating systematic error for wave aberration of projection objective of photoetching machine |
| 02/24/2010 | CN101655669A Multiple exposure method for thick photoresist |
| 02/24/2010 | CN101655668A Micro-image device and chip-balancing method for micro-image device |
| 02/24/2010 | CN101655667A Lithographic equipment with fiber module |
| 02/24/2010 | CN101655666A Photoetching method and system |
| 02/24/2010 | CN101655665A Film as well as manufacturing and use method thereof |
| 02/24/2010 | CN101655664A Photosensitive resin composition and method for preparing color filter |
| 02/24/2010 | CN100592214C Device and method for focusing and leveling based on microlens array |
| 02/24/2010 | CN100592213C System and method for using a two part cover for protecting a reticle |
| 02/24/2010 | CN100592212C Grating ion beam etching optical on-line detection device and detection method |
| 02/24/2010 | CN100592211C Equipment for manufacturing liquid crystal display |
| 02/24/2010 | CN100592210C Projection objective for a microlithographic projection exposure apparatus |
| 02/24/2010 | CN100592209C Method for manufacturing photoelectric circuit board |
| 02/24/2010 | CN100592208C Photoresist coater carrying disc for preventing static assembly |
| 02/24/2010 | CN100592207C Binder diffusion transfer patterning of a thick film paste layer |
| 02/24/2010 | CN100592206C Resist for forming pattern and method for forming pattern using the same |
| 02/24/2010 | CN100592205C Tinted photosensitive resin composition |
| 02/24/2010 | CN100592204C Components pattern, wiring structural body and manufacturing method for image display device |
| 02/24/2010 | CN100592203C Asymmetric high-pressure MOS component grid oxidizing layer protection method and uses thereof |
| 02/23/2010 | US7669174 Pattern generation method and charged particle beam writing apparatus |
| 02/23/2010 | US7666722 Manufacturing method of semiconductor device, and IC card, IC tag, RFID, transponder, bill, securities, passport, electronic apparatus, bag, and garment |
| 02/23/2010 | US7666695 Array substrates of liquid crystal display and fabrication method thereof |
| 02/23/2010 | US7666580 System and method for contrast enhanced zone plate array lithography |
| 02/23/2010 | US7666578 Efficient pitch multiplication process |
| 02/23/2010 | US7666577 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 02/23/2010 | US7666576 lithography; semiconductors |
| 02/23/2010 | US7666575 Antireflective coating compositions |
| 02/23/2010 | US7666574 Mixture of resin that is decomposable with an acid, adjust solubility of alkali developer with an acid; irradiating with actinic radiation |
| 02/23/2010 | US7666573 Positive photosensitive resin composition and method for forming pattern |
| 02/23/2010 | US7666572 Resist top coat composition and patterning process |
| 02/23/2010 | US7666571 High sensitivity and resolution, decreased pattern collapse during development, and minimized mask error factor, for micropatterning material for integrated circuit manufacture; heat treatment |
| 02/23/2010 | US7666570 lamination; magnetism |
| 02/23/2010 | US7666569 Positive resist composition and method for forming resist pattern |
| 02/23/2010 | US7666558 Inkless reimageable printing paper and method |
| 02/23/2010 | US7666554 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 02/23/2010 | US7666553 positional accuracy assurance, dimensional accuracy assurance; halftone type phase shift mask; forming a fine pattern in a semiconductor device, a magnetic device |
| 02/23/2010 | US7665983 Microcontact printing |
| 02/23/2010 | US7665916 Coater/developer and coating/developing method |
| 02/18/2010 | WO2010018825A1 Light exposure device, maintenance method, and device manufacturing method |
| 02/18/2010 | WO2010018806A1 Method for manufacturing color filter, color filter substrate and color filter |
| 02/18/2010 | WO2010018753A1 Deformable mirror, mirror apparatus, and exposure apparatus |
| 02/18/2010 | WO2010018430A1 A hardmask process for forming a reverse tone image |
| 02/18/2010 | WO2010018046A1 Mirror, lithographic apparatus and device manufacturing method |
| 02/18/2010 | WO2010018039A1 Radiation source, lithographic apparatus and device manufacturing method |
| 02/18/2010 | WO2010017952A2 Low-contamination optical arrangement |
| 02/18/2010 | WO2010017892A1 Radiation source, lithographic apparatus and device manufacturing method |
| 02/18/2010 | WO2010017890A1 Radiation source, lithographic apparatus, and device manufacturing method |
| 02/18/2010 | WO2009142869A3 Methods of forming structures supported by semiconductor substrates |
| 02/18/2010 | WO2009135102A3 Low ph mixtures for the removal of high density implanted resist |
| 02/18/2010 | WO2009129443A3 Diaphragm flexure with large range and high load capacity |
| 02/18/2010 | WO2009103485A3 Gas gauge compatible with vacuum environments |
| 02/18/2010 | US20100040988 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
| 02/18/2010 | US20100040987 Method for Exposing an Area on a Substrate to a Beam and Photolithographic System |
| 02/18/2010 | US20100040986 Process for manufacturing light guide |
| 02/18/2010 | US20100040985 Fine mold and method for regenerating fine mold |
| 02/18/2010 | US20100040984 Method of fabricating micro electro-mechanical component |
| 02/18/2010 | US20100040983 Compensation of Process-Induced Displacement |
| 02/18/2010 | US20100040982 Method for forming an opening |
| 02/18/2010 | US20100040981 Tuning Optical Cavities |
| 02/18/2010 | US20100040980 Method and apparatus for reforming film and controlling slimming amount thereof |
| 02/18/2010 | US20100040979 Systems and method for fabricating substrate surfaces for sers and apparatuses utilizing same |
| 02/18/2010 | US20100040978 Photosensitive lithographic printing plate material |
| 02/18/2010 | US20100040977 Radiation-sensitive resin composition |
| 02/18/2010 | US20100040976 Heat-sensitive imaging element |
| 02/18/2010 | US20100040975 Positive resist composition and pattern forming method using the positive resist composition |
| 02/18/2010 | US20100040974 Upper layer film forming composition and method of forming photoresist pattern |
| 02/18/2010 | US20100040973 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 02/18/2010 | US20100040972 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method |
| 02/18/2010 | US20100040971 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method |
| 02/18/2010 | US20100040970 Positive resist composition and method of forming resist pattern |
| 02/18/2010 | US20100040965 Exposure control for phase shifting photolithographic masks |
| 02/18/2010 | US20100040964 Exposure apparatus, exposure method and method of manufacturing display panel substrate |
| 02/18/2010 | US20100040963 Color filter and production method thereof, and solid-state image sensor using the same |
| 02/18/2010 | US20100040957 Method of measuring dimension of pattern and method of forming pattern |
| 02/18/2010 | US20100040848 Nano material cluster structure |
| 02/18/2010 | US20100040847 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 02/18/2010 | US20100040830 Droplet Deposition Component |
| 02/18/2010 | US20100040340 Electro-Optic Crystal-Based Structures and Method of Their Fabrication |
| 02/18/2010 | US20100040324 Optical element and method for its manufacture |
| 02/18/2010 | US20100039685 Volume hologram optical recording medium, composition for forming volume hologram recording layer, volume hologram recording material, and volume hologram optical recording method |
| 02/18/2010 | US20100039684 Sensitizer dyes for photoacid generating systems using short visible wavelengths |
| 02/18/2010 | US20100039633 Source optimization for image fidelity and throughput |
| 02/18/2010 | US20100039632 Radiation source, lithographic apparatus and device manufacturing method |
| 02/18/2010 | US20100038798 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device |
| 02/18/2010 | US20100037954 Flat light concentration device with reduced thickness |
| 02/18/2010 | US20100037791 Method of making a lithographic printing plate |
| 02/18/2010 | DE202009013625U1 Fixierungs- und Justierungseinrichtung für eine Lithographie-Direkt-Belichtungseinrichtung Fixing and adjustment device for a lithographic direct exposure device |
| 02/18/2010 | DE19781041B4 Optische Vorrichtung An optical device |
| 02/18/2010 | DE102009035505A1 Verfahren zum Belichten eines Bereichs auf einem Substrat mit einem Strahl und Photolithographisches System A method of exposing an area on a substrate with a beam and photolithography system |
| 02/18/2010 | DE102009034166A1 Kontaminationsarme optische Anordnung Low-contamination optical arrangement |
| 02/18/2010 | DE102008041222A1 Microlithographic projection exposure system has lightening system with multi-mirror array for adjusting intensity distribution in pupil level |
| 02/18/2010 | DE102008038910A1 Verfahren und Vorrichtung zur Herstellung eines strukturierten Gegenstands sowie strukturierter Gegenstand Method and apparatus for producing a patterned article, and structured object |