| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/02/2010 | US7672044 Lens made of a crystalline material |
| 03/02/2010 | US7672043 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth |
| 03/02/2010 | US7672000 Position detecting method and apparatus |
| 03/02/2010 | US7671979 Apparatus and process for determination of dynamic lens field curvature |
| 03/02/2010 | US7671966 Computer architecture for and method of high-resolution imaging using a low-resolution image transducer |
| 03/02/2010 | US7671965 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 03/02/2010 | US7671963 Lithographic apparatus and device manufacturing method |
| 03/02/2010 | US7671002 A mixture of solvents with no corrosion of copper properties and a corrosion inhibitor; during the photolithographic process, removing photoresist remaining after forming copper line |
| 03/02/2010 | US7671001 alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants; compositions contain one or more bases and one or more metal corrosion inhibiting metal halides |
| 03/02/2010 | US7670945 In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 03/02/2010 | US7670922 Method of measuring alignment of measurement pattern |
| 03/02/2010 | US7670893 Membrane IC fabrication |
| 03/02/2010 | US7670761 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key |
| 03/02/2010 | US7670759 Micro pattern forming method and semiconductor device manufacturing method |
| 03/02/2010 | US7670757 provides a positive type photosensitive resin composition containing an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light |
| 03/02/2010 | US7670756 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 03/02/2010 | US7670755 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 03/02/2010 | US7670754 Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers |
| 03/02/2010 | US7670753 Subbing layer between support and photosensitive layer contains a maleamic acid (co)polymer, in which at least one hydrogen atom on a nitrogen atom is substituted with an onium group; exposure based on digital signals, which generates no stains in the non-image area; development latitude |
| 03/02/2010 | US7670752 comprising compound having carbon-carbon unsaturated double bond and carboxyl group, obtained by allowing bisphenol type epoxy compound and unsaturated monocarboxylic acid to react, and then allowing polybasic acid anhydride to undergo addition reaction with secondary hydroxyl groups of product |
| 03/02/2010 | US7670751 Photoacid generator, resist composition, and patterning process |
| 03/02/2010 | US7670750 Polymer, resist protective coating material, and patterning process |
| 03/02/2010 | US7670749 Resist material and method for forming a patterned resist layer on a substrate |
| 03/02/2010 | US7670748 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same |
| 03/02/2010 | US7670747 Pattern transfer method |
| 03/02/2010 | US7670745 photoresists comprising polyvinylketone phenol and derivatives or copolymers with addition monomers having oxiranyl, oxetanyl, N-substituted maleimide and tricyclo[5.2.1.02,6]decanyl groups, capable of forming patterned films having solvent, water, acid, alkali and heat resistance; bonding strength |
| 03/02/2010 | US7670731 Method for exposing a substrate and lithographic projection apparatus |
| 03/02/2010 | US7670729 Measurement method and apparatus, exposure apparatus, and device fabrication method |
| 03/02/2010 | US7670727 Illumination compensator for curved surface lithography |
| 03/02/2010 | US7670725 Optical masks and methods for measuring aberration of a beam |
| 03/02/2010 | US7670514 Method of producing optical disk-use original and method of producing optical disk |
| 03/02/2010 | US7669608 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
| 02/25/2010 | WO2010021704A1 Processing of positive-working lithographic printing plate precursor |
| 02/25/2010 | WO2010021442A1 Resist copolymers containing photoacid generators for lithographic applications and its method of preparation |
| 02/25/2010 | WO2010021364A1 Process for producing lithographic printing plate |
| 02/25/2010 | WO2010021359A1 Method for improving resist sensitivity |
| 02/25/2010 | WO2010021347A1 Material for forming resist-sensitizing film and method for manufacturing semiconductor device |
| 02/25/2010 | WO2010021290A1 Composition for forming silicon-containing resist underlayer film with onium group |
| 02/25/2010 | WO2010021030A1 Material for resist sensitization film formation, process for producing semiconductor device, semiconductor device, and magnetic head |
| 02/25/2010 | WO2010020515A1 Process for fabricating multi-level metal parts by the uv-liga technique |
| 02/25/2010 | WO2010020506A1 Inspection method and apparatus, and lithographic apparatus |
| 02/25/2010 | WO2010020481A1 Projection system, lithographic apparatus, method of projecting a beam of radiation onto a target and device manufacturing method |
| 02/25/2010 | WO2010020331A1 A method of measuring overlay error and a device manufacturing method |
| 02/25/2010 | WO2009155067A3 Method for forming fine pitch structures |
| 02/25/2010 | WO2009145520A3 Film type photodegradable transfer material |
| 02/25/2010 | WO2009140270A3 System and method for light source employing laser-produced plasma |
| 02/25/2010 | WO2009007977A3 Method and apparatus for duv transmission mapping |
| 02/25/2010 | US20100050149 Design and Layout of Phase Shifting Photolithographic Masks |
| 02/25/2010 | US20100048443 Liquid composition for removing photoresist residue and polymer residue |
| 02/25/2010 | US20100048023 Methods for Manufacturing a Structure on a Substrate and Intermediate Product |
| 02/25/2010 | US20100047725 Developing method and developing unit |
| 02/25/2010 | US20100047724 Base component which exhibits increased solubility in an alkali developing solution under the action of acid, an acid generator, and organic solvent having a boiling point of at least 150 degrees C.; hole-like resist pattern can be formed with a high level of resolution and minute dimensions |
| 02/25/2010 | US20100047723 Processing of positive-working lithographic printing plate precursor |
| 02/25/2010 | US20100047722 Three-dimensional nano material structures |
| 02/25/2010 | US20100047721 Method of forming openings in selected material |
| 02/25/2010 | US20100047720 Method of manufacturing semiconductor device |
| 02/25/2010 | US20100047719 Image recording method |
| 02/25/2010 | US20100047718 Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus |
| 02/25/2010 | US20100047717 Method for manufacturing original master |
| 02/25/2010 | US20100047716 Method for forming a pattern |
| 02/25/2010 | US20100047715 Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern |
| 02/25/2010 | US20100047714 New propanoates and processes for preparing the same |
| 02/25/2010 | US20100047713 Curable composition containing hydroxythiol compound, and cured products thereof |
| 02/25/2010 | US20100047712 Top antireflective coating composition containing hydrophobic and acidic groups |
| 02/25/2010 | US20100047711 Resist composition, method for forming resist pattern, and method for producing electronic device |
| 02/25/2010 | US20100047710 Copolymer for immersion lithography and compositions |
| 02/25/2010 | US20100047709 Radiation-sensitive composition |
| 02/25/2010 | US20100047702 Resist pattern forming method |
| 02/25/2010 | US20100047701 Enhanced imaging of features |
| 02/25/2010 | US20100047698 Hybrid multi-layer mask |
| 02/25/2010 | US20100047626 Substrate for suspension, process for producing the same, suspension for magnetic head, and hard disk drive |
| 02/25/2010 | US20100047581 Actin filament associated nanodevices |
| 02/25/2010 | US20100047539 Positive photosensitive resin composition, method of forming pattern and semiconductor device |
| 02/25/2010 | US20100047537 Method of producing lithographic printing plate |
| 02/25/2010 | US20100046079 Polymer pattern and metal film pattern, metal pattern, plastic mold using thereof, and method of the forming the same |
| 02/25/2010 | US20100045961 Dual stage positioning and switching system |
| 02/25/2010 | US20100045958 Lithography system |
| 02/25/2010 | US20100045952 Microlithographic projection exposure apparatus |
| 02/25/2010 | US20100045905 Curable composition, color filter, and manufacturing method of the same |
| 02/25/2010 | US20100045169 Nano electronic devices |
| 02/25/2010 | US20100045024 Security element for a security document and process for the production thereof |
| 02/25/2010 | US20100044943 Split axes stage design for semiconductor applications |
| 02/25/2010 | US20100044913 Method for producing surface convexes and concaves |
| 02/25/2010 | US20100044888 Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element |
| 02/25/2010 | US20100044837 Replication and transfer of microstructures and nanostructures |
| 02/25/2010 | US20100044817 Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
| 02/25/2010 | US20100044593 Lithographic apparatus and device manufacturing method |
| 02/25/2010 | DE102008038993A1 Optisches Element und Verfahren zu seiner Herstellung Optical element and process for its preparation |
| 02/24/2010 | EP2157481A2 Radiation source, lithographic apparatus, and device manufacturing method |
| 02/24/2010 | EP2157480A1 Exposure method and apparatus, and device manufacturing method |
| 02/24/2010 | EP2157479A1 Resist composition for negative development and method of forming pattern therewith |
| 02/24/2010 | EP2157478A2 Method of producing lithographic printing plate |
| 02/24/2010 | EP2157477A1 Resist composition for negative working-type development, and method for pattern formation using the resist composition |
| 02/24/2010 | EP2157476A1 Method of manufacturing multi-level metal parts using the LIGA-UV technique |
| 02/24/2010 | EP2157130A1 Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
| 02/24/2010 | EP2157107A1 Organic insulating material, varnish for resin film using the same, resin film and semiconductor device |
| 02/24/2010 | EP2156247A1 Process for preparing a polymeric relief structure |
| 02/24/2010 | EP2156246A1 Compact nanofabrication apparatus |
| 02/24/2010 | EP2155932A2 Method for the production of an optical element by means of a molding process, optical element produced according to said method, collector, and lighting system |
| 02/24/2010 | EP1573403B1 Resistor structures to electrically measure unidirectional misalignment of stitched masks |