Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2010
03/04/2010WO2010025032A2 Method for optical proximity correction, design and manufacturing of a reticle using variable shaped beam lithography
03/04/2010WO2010025031A2 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography
03/04/2010WO2010024988A2 Methods of forming a photoresist-comprising pattern on a substrate
03/04/2010WO2010024841A1 New propanoates and processes for preparing the same
03/04/2010WO2010024106A1 Illumination optical system, aligner, and process for fabricating device
03/04/2010WO2010024087A1 Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition
03/04/2010WO2010024075A1 Computer generated hologram, exposure apparatus and device fabrication method
03/04/2010WO2010024037A1 Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored
03/04/2010WO2010023841A1 Laser apparatus, phototherapeutic apparatus, exposure apparatus, device manufacturing method and apparatus for inspecting subject to be inspected
03/04/2010WO2010023790A1 Manufacturing method for pattern-forming body and electromagnetic beam processing apparatus
03/04/2010WO2010023789A1 Pattern-forming member and method of manufacturing the same
03/04/2010WO2010023227A1 Improved nanoimprint method
03/04/2010WO2010023156A1 Method for resist coating a recess in the surface of a substrate, in particular a wafer
03/04/2010WO2010022840A1 Spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method
03/04/2010WO2010022815A1 Detection of contaminating substances in an euv lithography apparatus
03/04/2010WO2010003671A3 Spectral purity filter, radiation source, lithographic apparatus, and device manufacturing method
03/04/2010US20100056411 Treating liquid for photoresist removal and method for treating substrate
03/04/2010US20100056410 Compositions and methods for the removal of photoresist for a wafer rework application
03/04/2010US20100055851 Photoresist compostion, method for forming thin film patterns, and method for manufacturing a thin film transistor using the same
03/04/2010US20100055807 Plasma ashing apparatus and endpoint detection process
03/04/2010US20100055626 Method for pattern formation
03/04/2010US20100055625 Method of process optimization for dual tone development
03/04/2010US20100055624 Method of patterning a substrate using dual tone development
03/04/2010US20100055623 Exposure apparatus and device manufacturing method
03/04/2010US20100055622 Method for making light blocking plate
03/04/2010US20100055621 Patterning process
03/04/2010US20100055620 Nanostructure fabrication
03/04/2010US20100055618 Method of manufacturing array substrate of transreflective liquid crystal display
03/04/2010US20100055617 Method of forming pattern in semiconductor device
03/04/2010US20100055616 Method for fabricating saddle type fin transistor
03/04/2010US20100055615 Method of preparing lithographic printing plate
03/04/2010US20100055614 Lithographic printing plate having specific polymeric binders
03/04/2010US20100055613 Negative-working lithographic printing plate precursor and method of lithographic printing using same
03/04/2010US20100055612 Nagative-working photosensitive resin composition and photosensitive resin plate using the same
03/04/2010US20100055611 Resist composition and method for forming a pattern using the same
03/04/2010US20100055610 Heat sensitive positive-working lithographic printing plate precursor
03/04/2010US20100055609 Compound, method for preparing the compound and resist composition containing the compound
03/04/2010US20100055608 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
03/04/2010US20100055607 Lithographic printing plate precursor and plate making method thereof
03/04/2010US20100055606 Positive resist composition and method of forming resist pattern
03/04/2010US20100055605 Printed circuit board and method of manufacturing the same
03/04/2010US20100055587 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
03/04/2010US20100055586 Method and system for forming circular patterns on a surface
03/04/2010US20100055585 Method for Optical Proximity Correction of a Reticle to be Manufactured Using Variable Shaped Beam Lithography
03/04/2010US20100055584 Exposure device and exposure method
03/04/2010US20100055583 Method for fabicating color filter substrate
03/04/2010US20100055580 Method for fracturing circular patterns and for manufacturing a semiconductor device
03/04/2010US20100055578 plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface; shots within plurality of shots are allowed to overlap each other; dosages of the shots may also be allowed to vary; method may be used in manufacturing an integrated circuit using direct write
03/04/2010US20100055414 Negative-working imageable element and method of use
03/04/2010US20100055413 article, and a method for creating the article, with a chemically patterned surface
03/04/2010US20100055401 Manufacturing method of film having micro-pattern thereon and film manufactured thereby
03/04/2010US20100053589 System for isolating an exposure apparatus
03/04/2010US20100053580 Computer readable medium and exposure method
03/04/2010US20100053578 Apparatus for imprint lithography using an electric field
03/04/2010US20100053114 Touch panel apparatus and method for manufacturing the same
03/04/2010US20100051943 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
03/04/2010US20100051582 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
03/04/2010US20100051446 Fabrication of suspended carbon micro and nanoscale structures
03/04/2010US20100051324 Dielectric substrate with holes and method of manufacture
03/04/2010US20100051091 Electrode formation based on photo-induced reduction of metal ions in the presence of metal nanomaterials
03/04/2010US20100050895 Processless lithographic printing plate
03/04/2010DE102009025655A1 Optische Komponente zum Einsatz in einem Beleuchtungssystem für eine Projektionsbelichtungsanlage der EUV-Mikrolithographie Optical component for use in an illumination system for a projection exposure system for EUV microlithography
03/04/2010DE102008045076A1 Bead removing method for use during processing of substrate i.e. wafer, involves arranging wafer and fluid stream-nozzle relative to each other, and applying fluid stream from nozzle to bead of wafer, where stream has high pressure
03/04/2010DE102008045068A1 Verfahren zur Resist-Beschichtung einer Vertiefung in der Oberfläche eines Substrats, insbesondere eines Wafers A process for the resist coating a recess in the surface of a substrate, in particular a wafer
03/04/2010DE102008045059A1 Predefined image pattern forming method for photosensitive layer attached on e.g. offset printing plate, involves allowing part of radiation to lie outside incompletely hardenable pixel and within completely hardenable pixel
03/04/2010DE102008041801A1 Extreme UV-projection illumination system for microlithographic imaging, has spectral filter detachably arranged in spectral aperture and/or aperture diaphragm and transparent for extreme UV-radiation
03/04/2010DE102008041592A1 Detektion von kontaminierenden Stoffen in einer EUV-Lithographieanlage Detection of contaminants in an EUV lithography tool
03/04/2010CA2734952A1 Improved nanoimprint method
03/04/2010CA2676890A1 Machine readable code comprising ultra-violet curable gellant inks
03/04/2010CA2676889A1 Ultra-violet curable gellant inks for braille, raised print, and regular print applications
03/04/2010CA2676844A1 Ultra-violet curable gellant inks for creating tactile text and images for packaging applications
03/03/2010EP2159830A1 Process for producing semiconductor device
03/03/2010EP2159641A1 Surface treatment agent for forming pattern and pattern forming method using the treatment agent
03/03/2010EP2159640A1 Method of preparing lithographic printing plate
03/03/2010EP2159639A1 Fluid handling structure, lithographic apparatus and device manufacturing method
03/03/2010EP2159638A1 Radiation source and lithographic apparatus
03/03/2010EP2159637A1 Positive photosensitive resin composition and polyhydroxyamide resin
03/03/2010EP2159303A2 Aperture masks for circuit fabrication
03/03/2010EP2159249A1 Silicon-containing polymer and method for manufacturing the same, heat-resistant resin composition, and heat-resistant film
03/03/2010EP2159236A1 Photocurable composition and process for producing molded object having fine pattern in surface
03/03/2010EP2158520A1 Kinematic chucks for reticles and other planar bodies
03/03/2010EP2158519A1 Optical device and method of in situ treating an euv optical component to enhance a reduced reflectivity
03/03/2010EP2158277A2 A composition for coating over a photoresist pattern comprising a lactem
03/03/2010EP1706793B1 Exposure apparatus and measuring device for a projection lens
03/03/2010EP1323684B9 Low thermal expansion ceramic and member for exposure system
03/03/2010CN201417363Y Circulation and reclamation device of photoresist liquid
03/03/2010CN101663619A Exposure method and exposure apparatus
03/03/2010CN101663618A Positive photosensitive resin composition and cured film forming method using the same
03/03/2010CN101663617A Photosensitive resin composition, dry film, and processed work made with the same
03/03/2010CN101661229A Spray head positioning device and spray head positioning method
03/03/2010CN101661228A Substrate processing method
03/03/2010CN101661227A Large size conductive substrate thick circuit write-through device and write-through technology thereof
03/03/2010CN101661226A Carrying box of photomask boxes and fixing pieces thereof
03/03/2010CN101661225A Phase-type zone plate photon sieve
03/03/2010CN101661224A Method for improving photoetching alignment precision
03/03/2010CN101661223A Photomask blank and photomask
03/03/2010CN101661222A Substrate conveying device
03/03/2010CN100593244C Pattern formation method, thin film transistor, display device and manufacturing method thereof
03/03/2010CN100593133C Lithographic apparatus and device manufacturing method
03/03/2010CN100593132C Lithographic apparatus and device manufacturing method
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