Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2010
03/18/2010US20100068651 Developing solution for flexographic printing plates
03/18/2010US20100068650 Positive-working radiation-sensitive composition and method for resist pattern formation using the composition
03/18/2010US20100068649 Photosensitive resin composition, and pattern formation method using the same
03/18/2010US20100068648 Photosensitive resin composition, and resist pattern formation method using the same
03/18/2010US20100068647 Radiation-sensitive resin composition
03/18/2010US20100068634 Measurement apparatus, exposure apparatus, and device manufacturing method
03/18/2010US20100068631 Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask
03/18/2010US20100068480 Negative-working photosensitive resin composition and photosensitive resin plate using the same
03/18/2010US20100068470 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same
03/18/2010US20100068453 Method for producing processed glass substrate
03/18/2010US20100067849 Manufacturing method of optical waveguide device and optical waveguide device obtained thereby
03/18/2010US20100067146 Magnetic head slider
03/18/2010US20100067073 Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material
03/18/2010US20100066929 Optical vortex retarder micro-array
03/18/2010US20100066388 Epitaxial soot sensor
03/18/2010US20100065314 Multi-layer chip carrier and process for making
03/18/2010DE102008041827A1 Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung Protection Module for EUV lithography apparatus and EUV lithography apparatus
03/18/2010DE102008041179A1 Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage Illumination optics for microlithography projection exposure system
03/18/2010DE102004058967B4 Verfahren zur Belichtung eines Substrats mit einem Strahl A method for exposing a substrate with a beam
03/17/2010EP2163949A1 Developer for lithographic printing plate precursor and process for producing lithographic printing plate
03/17/2010EP2163653A2 Nucleic acid detection method having increased sensitivity
03/17/2010EP2162796A1 Lamination device method for flexographic plate manufacturing
03/17/2010EP1346261B1 Projection lithography using a phase-shifting aperture
03/17/2010CN201425942Y Thin-film transistor structure
03/17/2010CN101675500A Exposure apparatus, exposure method and device manufacturing method
03/17/2010CN101675390A Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same
03/17/2010CN101675389A Determining a process model that models the impact of car/peb on the resist profile
03/17/2010CN101675388A Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
03/17/2010CN101675387A Photosensitive resin composition, dry film, and processed product using the dry film
03/17/2010CN101675386A Alkali developable photosensitive resin composition and dry film manufactured by the same
03/17/2010CN101675385A Improving process model accuracy by modeling mask corner rounding effects
03/17/2010CN101675117A Compound for photoresist, photoresist solution, and etching method using the photoresist solution
03/17/2010CN101675113A Resin composition, dry film, and fabrications of the same
03/17/2010CN101673683A Substrate processing method
03/17/2010CN101673062A Device and method for removing photoresist by whole wet method
03/17/2010CN101673061A Transmission system of multipurpose negative processor
03/17/2010CN101673060A Method for injecting ions after photoetching
03/17/2010CN101673059A Lithographic apparatus and device manufacturing method
03/17/2010CN101673058A Lithographic apparatus and device manufacturing method
03/17/2010CN101673057A Submicron periodic structure preparation system based on digital microscope device
03/17/2010CN101673056A Maskless lithographic apparatus and methods of compensation for rotational alignment error using the same
03/17/2010CN101673055A Photoresist supply apparatus and photoresist supply method
03/17/2010CN101673054A Composite hydrophillic printing substrate and manufacturing and regenerating methods thereof
03/17/2010CN101673053A Photosensitive composition and manufacture method of a cardinal plate
03/17/2010CN101673052A Coloring radioactive composition, colorant dispersion liquid, a color filter and a colorful LCD device
03/17/2010CN101673051A Pattern forming material and method of pattern formation
03/17/2010CN101673050A Method for compensating critical dimension
03/17/2010CN101673048A Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
03/17/2010CN101673047A Mask plate and manufacturing method thereof and manufacturing method of TFT base plate
03/17/2010CN101673046A Photomask storage device and method for keeping photomask clean and dry
03/17/2010CN101673011A Colordisc cardinal plate and LCD display device
03/17/2010CN101673010A Color film base plate of liquid crystal display and manufacture method thereof
03/17/2010CN101672937A Method for manufacturing artificial bionic compound eyes
03/17/2010CN101671287A Adamantane derivative and photosensitive material for photoresist
03/17/2010CN101671117A Glass frit composition, photosensitive barrier rib paste, PDP and method for preparing PDP
03/17/2010CN101670720A Process for printing QS quality safety sign on gold card paper
03/17/2010CN100594585C Method of manufacturing semiconductor device
03/17/2010CN100594450C Hologram recording apparatus, hologram recording medium and hologram recording method
03/17/2010CN100594434C Method for manufacturing nano-sized metal structure with large area covered by metal film
03/17/2010CN100594433C Lithographic apparatus and method
03/17/2010CN100594432C Pattern writing apparatus and pattern writing method
03/17/2010CN100594431C Immersion micro-image syatem and preparing process thereof
03/17/2010CN100594430C System for measuring the image quality of an optical imaging system
03/17/2010CN100594429C Production of X-ray mask by primary exposure with electron beam current mixed
03/17/2010CN100594428C Radiation source, photoetching device and manufacturing method of device
03/17/2010CN100594427C Apparatus and method of forming an applied film
03/17/2010CN100594426C Photoresist composition used for micro image pattern and method for forming a integrated circuit pattern
03/17/2010CN100594425C Black matrix composition, black matrix, method for forming black matrix module and and method for forming color color screen matrix
03/17/2010CN100594424C Picture dimension correcting unit and method, photomask and test used photomask
03/17/2010CN100594127C Method and equipment for providing registration image on printing plate
03/16/2010US7679842 High performance catadioptric imaging system
03/16/2010US7679720 Apparatus configured to position a workpiece
03/16/2010US7679718 Immersion exposure technique
03/16/2010US7679715 Lithographic processing cell, lithographic apparatus, track and device manufacturing method
03/16/2010US7679190 Raised solder-mask-defined (SMD) solder ball pads for a laminate electronic circuit board
03/16/2010US7679071 Electron beam drawing apparatus
03/16/2010US7679028 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
03/16/2010US7678945 High yield acid catalyzed displacement etherification of 4-hydroxyphenylmethylcarbinol with methanol using ion exchange resin; synthesis of raw material for condensation polymerization production of uniquely linear, low molecular weight polymer
03/16/2010US7678693 Exposure method for upper layer of hole of semiconductor device
03/16/2010US7678692 Fabrication method for a damascene bit line contact plug
03/16/2010US7678537 Graded topcoat materials for immersion lithography
03/16/2010US7678534 Mask for forming landing plug contact hole and plug forming method using the same
03/16/2010US7678533 Coating containing polymer on hydrophilic support; chemical resistance
03/16/2010US7678532 photoresists; photomasks; etching
03/16/2010US7678531 Positive-working imageable elements
03/16/2010US7678530 photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography
03/16/2010US7678529 photomasks; etch selectivity; photolithography
03/16/2010US7678528 Iodonium or sulfonium perfluoroalkylsulfonate acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity; liquid crystal displays
03/16/2010US7678527 Methods and compositions for providing photoresist with improved properties for contacting liquids
03/16/2010US7678516 phase shifting; lithography
03/16/2010US7678515 Thermally gated photochromic medium
03/16/2010US7678514 Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films
03/16/2010US7678513 phase shift masks; lithography
03/16/2010US7678510 photomasks; phase shifting
03/16/2010US7678509 Method of producing phase shift masks
03/16/2010US7678506 inorganic glass and photopolymers; for recording interference fringes by projecting object beam and reference beam
03/16/2010US7678462 Spin-on-glass anti-reflective coatings for photolithography
03/16/2010US7678460 cap layer and a photoresist layer are each formed over the photopatternable layer; cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning photoresist layer; photopatternable material is convertible to a SiO2 based material
03/16/2010US7678426 Composition and process using fluorinated diols with amide and phosphonate groups with reduced contamination for articles with adhesion do substrates
03/16/2010US7678319 Mold and molding apparatus using the same
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