Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2010
03/11/2010WO2010027931A1 Radiation curable compositions useful in image projection systems
03/11/2010WO2010027415A1 Negative-working imageable element and method of use
03/11/2010WO2010027100A1 System for isolating an exposure apparatus
03/11/2010WO2010027061A1 Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, conductive pattern, printed wiring board, lead frame, base, and method for manufacturing semiconductor package
03/11/2010WO2010026988A1 Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component
03/11/2010WO2010026973A1 Photosensitive composition, pattern-forming method using the composition and resin used in the composition
03/11/2010WO2010026968A1 Resist processing method
03/11/2010WO2010026927A1 Photosensitive resin composition for protective film of printed wiring board for semiconductor package
03/11/2010WO2010026795A1 Lithographic printing plate material and process for producing lithographic printing plate material
03/11/2010WO2010025983A1 Low outgassing photoresist compositions
03/11/2010WO2010025950A1 A substrate, an inspection apparatus, and a lithographic apparatus
03/11/2010WO2010025798A1 Protection module for euv lithography apparatus, and euv lithography apparatus
03/11/2010WO2010025793A1 A substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
03/11/2010WO2010025624A1 Rinse solution for removal of plasm etching residues
03/11/2010WO2010006935A3 Alignment system, lithographic system and method
03/11/2010WO2009151499A3 Imageable elements useful for waterless printing
03/11/2010US20100062380 Double patterning process
03/11/2010US20100062379 Method of forming resist pattern
03/11/2010US20100062378 Optical waveguides and methods thereof
03/11/2010US20100062377 Method for manufacturing color filter and color filter manufactured by using the same
03/11/2010US20100062376 Method and apparatus for thermal development with a conformable support
03/11/2010US20100062375 Method of preparing lithographic printing plate
03/11/2010US20100062374 Positive resist composition and patterning process
03/11/2010US20100062373 Positive resist composition and patterning process
03/11/2010US20100062372 Positive resist composition and patterning process
03/11/2010US20100062371 Copolymer and composition for semiconductor lithography and process for producing the copolymer
03/11/2010US20100062370 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
03/11/2010US20100062369 Positive resist composition, method of forming resist pattern, and polymeric compound
03/11/2010US20100062368 Low outgassing photoresist compositions
03/11/2010US20100062367 Photosensitive lithographic printing plate precursor for infrared laser
03/11/2010US20100062366 Positive resist composition and patterning process
03/11/2010US20100062365 Chemically amplified positive resist composition
03/11/2010US20100062364 Positive resist composition, method of forming resist pattern, and polymeric compound
03/11/2010US20100062363 Composition for upper surface antireflection film, and method for pattern formation using the same
03/11/2010US20100062351 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
03/11/2010US20100062230 Method and apparatus for thermal development with supporting surface for a development medium
03/11/2010US20100062228 Negative tone double patterning method
03/11/2010US20100060898 Methods and systems for interferometric analysis of surfaces and related applications
03/11/2010US20100060877 Stage unit, exposure apparatus, and exposure method
03/11/2010US20100060876 Light generating apparatus and method of controlling the same
03/11/2010US20100060695 Inkjet printhead and method of manufacturing the same
03/11/2010US20100060109 Nanotubes, nanorods and nanowires having piezoelectric and/or pyroelectric properties and devices manufactured therefrom
03/11/2010US20100059846 Image sensor and method of manufacturing the same
03/11/2010US20100059366 Textured chamber surface
03/11/2010US20100059087 Apparatus and method for removing coating film
03/11/2010DE112007003294T5 Abstützung einer Komponente einer optischen Einrichtung Supporting a component of an optical device
03/11/2010DE102009012091A1 Reinigung optischer Oberflächen mittels atomarem Wasserstoff Cleaning optical surfaces by atomic hydrogen
03/11/2010DE102008046699A1 Abbildende Optik The imaging optics
03/10/2010EP2161736A1 Variable slit device, illumination device, exposure apparatus, exposure method, and device manufacturing method
03/10/2010EP2161725A2 Radiation source, lithographic apparatus and device manufacturing method
03/10/2010EP2161621A1 Cleanup method for optics in immersion lithography
03/10/2010EP2161620A1 Cleanup method for optics in immersion lithography
03/10/2010EP2161619A1 Cleanup method for optics in immersion lithography
03/10/2010EP2161618A1 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
03/10/2010EP2161317A1 Marking Substrates
03/10/2010EP2160652A2 Contact exposure device for a printing screen
03/10/2010EP2160651A1 Patterned photoacid etching and articles therefrom
03/10/2010EP2160650A1 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
03/10/2010EP2160649A1 Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
03/10/2010EP1546221B1 Fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
03/10/2010EP1344110B1 Mitigation of radiation induced surface contamination
03/10/2010CN201421545Y Light blockage liquid blending tank with constant temperature control
03/10/2010CN201421544Y Offset plate packed by utilizing heat-shrinkable film technology
03/10/2010CN201421543Y Offset plate packed by utilizing vacuumizing technology
03/10/2010CN201421542Y Lateral manufacturing device of binary optical component
03/10/2010CN101669072A Resist stripping composition
03/10/2010CN101669071A Illumination system for illuminating a mask in a microlithographic exposure apparatus
03/10/2010CN101669070A Photosensitive composition, partition wall, black matrix, and method for producing color filter
03/10/2010CN101669069A Photosensitive resin and process for producing microlens
03/10/2010CN101666984A Plasma etching residue cleaning solution
03/10/2010CN101666983A Fluid handling structure, lithographic apparatus and device manufacturing method
03/10/2010CN101666982A Bearing box for photomask box and buffering and positioning device thereof
03/10/2010CN101666981A Automatic displacement method and automatic displacement device of photoetching lamp of photoetching machine
03/10/2010CN101666980A Cleaning and drying-preventing method, and cleaning and drying-preventing apparatus
03/10/2010CN101666979A Method for solving problem of abnormal photoresist coating under condition of high-step substrate
03/10/2010CN101666978A High-precision photoresist distributor pump
03/10/2010CN101666977A Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same
03/10/2010CN101666976A Chemically-amplified positive resist composition and patterning process thereof
03/10/2010CN101666975A Coloring radiation sensitive composition, color filter and color liquid crystal display elements
03/10/2010CN101666974A Mold, imprint apparatus, and process for producing structure
03/10/2010CN101666973A Wafer-level stamping method
03/10/2010CN100593841C Liquor processing apparatus circuit substrate and method for manufacturing circuit substrate
03/10/2010CN100593756C Photosensitive resin composition and method for the formation of a resin pattern using the composition
03/09/2010US7676078 Inspection method, processor and method for manufacturing a semiconductor device
03/09/2010US7675663 Apparatus for producing a hologram mask
03/09/2010US7675000 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology
03/09/2010US7674847 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
03/09/2010US7674756 Solvent compositions containing chlorofluoroolefins or fluoroolefins
03/09/2010US7674737 Optical medium, an optical lens and a prism
03/09/2010US7674572 Exposure mask pattern for LCD and exposure method using the same
03/09/2010US7674571 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink
03/09/2010US7674570 Irradiating the sample of the pattern in an electrically conductive state with an electron beam to detect a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample; acquiring an image of the sample surface and inspecting the mask pattern image
03/09/2010US7674567 Positive resist composition and pattern forming method using the same
03/09/2010US7674566 A photo-acid generator, a terpene compound in combination with of a hydroxypolyamide which undergoes cyclization upoon curing to become a polybenzoxazole; semiconductors; excellant positive lithography performance such as sensitivity and resolution
03/09/2010US7674563 Pattern forming method and phase shift mask manufacturing method
03/09/2010US7674561 Mask blanks and method of producing the same
03/09/2010US7674503 Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
03/09/2010US7674104 Mold and molding apparatus using the same
03/04/2010WO2010025061A2 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
03/04/2010WO2010025060A2 Method for design and manufacture of a reticle using variable shaped beam lithography
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