Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2010
03/24/2010CN101681103A Photosensitive composition, method, cured product, and liquid crystal display device
03/24/2010CN101681102A Color composition, method for producing color filter, and color filter
03/24/2010CN101681101A Photosensitive adhesive resin composition, adhesive film and light-receiving device
03/24/2010CN101681100A Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the cured film
03/24/2010CN101681099A Positive photosensitive resin composition and polyhydroxyamide resin
03/24/2010CN101681098A Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby
03/24/2010CN101681097A Photosensitive composition, partition wall, and black matrix
03/24/2010CN101681096A Hardmask composition having antireflective properties and method of patterning material on substrate using the same
03/24/2010CN101681095A Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method
03/24/2010CN101681094A Imprint lithography with improved substrate/mold separation
03/24/2010CN101681093A Methods for performing model-based lithography guided layout design
03/24/2010CN101681091A Mask film to form relief images and method of use
03/24/2010CN101681009A Optical element holding device, lens barrel, exposure device, and device manufacturing method
03/24/2010CN101680984A Curable composition for color filter, method for producing curable composition for color filter, colored curable resin composition, method for forming colored pattern, colored pattern, method for prod
03/24/2010CN101680983A Method for producing substrate with partition wall and pixel formed thereon
03/24/2010CN101680783A Moving body system, pattern forming device, exposure apparatus, measuring instrument, and device manufacturing method
03/24/2010CN101680780A Total internal reflection displacement scale
03/24/2010CN101680747A Moving body driving system, pattern forming apparatus, exposure apparatus, exposure method and device manufacturing method
03/24/2010CN101680746A Moving body device, exposure device, pattern formation device, and device manufacturing method
03/24/2010CN101679800A An antireflective coating composition comprising fused aromatic rings
03/24/2010CN101679758A Resin composition, resin spacer film, and semiconductor device
03/24/2010CN101679555A Reactive urethane compound having ether bond, curable composition and cured product
03/24/2010CN101676806A Stripper combination of heat-harden-able resin for thin-film transistor liquid crystal display
03/24/2010CN101676805A Lithographic apparatus and device manufacturing method
03/24/2010CN101676804A Lithographic apparatus and method of operating the same
03/24/2010CN101676803A Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution
03/24/2010CN101676802A Light sensitive liquid coating apparatus
03/24/2010CN101676801A Lithography method
03/24/2010CN101676800A Phototonus resin combination, solder resist combination for printed wiring board and printed wiring board
03/24/2010CN101676799A Method for etching base material
03/24/2010CN101676798A Method of producing microlens arrays
03/24/2010CN101676797A Method of producing surface acoustic wave devices by exposing X-rays in a direct writing way
03/24/2010CN101676752A Manufacturing method of color filter
03/24/2010CN101676750A Full-ring photon sieve and method of producing same
03/24/2010CN101676339A Microparticles of water-insoluble compound and disperser thereof, their preparation method, and color filter
03/24/2010CN101676338A Pigment disperse combination, coloring photosensitive combination, color filter, liquid crystal display element and solid camera shooting element
03/24/2010CN100596254C Printed circuit boards
03/24/2010CN100595681C Full phase shifting mask in damascene process
03/24/2010CN100595680C Diluent composition for removing photosensitive resin
03/24/2010CN100595679C Automatic developing apparatus and process for forming image using the same
03/24/2010CN100595678C Immerging liquid recovering damping control device used for mask aligner
03/24/2010CN100595677C Lithographic method
03/24/2010CN100595676C Adjusting method for long mask exposure focusing plane correction
03/24/2010CN100595675C Positive quadrupole illuminating exposure method and device therefor
03/24/2010CN100595674C Lithographic apparatus and device manufacturing method
03/24/2010CN100595673C Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
03/24/2010CN100595672C Photosensitive resin composition and process for production of printed wiring boards with the same
03/24/2010CN100595670C Mask pattern and its forming method, method for manufacturing coating composition, and method for manufacturing semiconductor device
03/23/2010US7685560 Method and apparatus for monitoring exposure process
03/23/2010US7685556 Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method
03/23/2010US7684125 Diaphragm changing device
03/23/2010US7684008 Lithographic apparatus and device manufacturing method
03/23/2010US7683351 Lithographic apparatus and device manufacturing method
03/23/2010US7682778 Methods of forming contact plugs in semiconductor devices
03/23/2010US7682777 Method for producing a polymer structure on a substrate surface
03/23/2010US7682776 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability
03/23/2010US7682775 Process for preparing a flexographic printing plate
03/23/2010US7682774 organic polymer resin ( e.g copolymer of acryilc acid, methacrylic acid, maleic acid, itaconic acid etc), a polyfunctional monomer having an ethylenically unsaturated bond (di(meth)acrylates), photoinitiator, a silver organic complex as catalyst precursor, organic solvent; uniformity; adhesion
03/23/2010US7682772 sulfonium compound containing sulfonate anions as an acid generator ( tri(4-methylphenyl)sulfonium trifluoromethanesulfonate; exhibits changed solubility in an alkali developing solution under action of acid ; a methacrylate resin containing an acid dissociable, dissolution inhibiting group
03/23/2010US7682771 fluorochemical acrylic copolymers bearing pendant groups comprising benzophenone, substituted benzophenone, acetophenone, or substituted acetophenone moieties which can generate free radicals upon irradiation with ultraviolet light sources
03/23/2010US7682770 Resist composition and method for forming resist pattern
03/23/2010US7682760 Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask
03/23/2010US7682755 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
03/23/2010US7682552 Capacitive measurement method and system for nanoimprint process monitoring
03/23/2010US7682541 Manufacturing method of a microchemical chip made of a resin
03/23/2010US7682515 Nano-imprint lithography method involving substrate pressing
03/23/2010US7682463 Resist stripping method and resist stripping apparatus
03/18/2010WO2010030438A1 Stencil, stencil design system and method for cell projection particle beam lithography
03/18/2010WO2010030018A2 Pattern forming method and device production method
03/18/2010WO2010030013A1 Method for manufacturing resin plate for letterpress, resin plate for letterpress and apparatus for manufacturing resin plate for letterpress
03/18/2010WO2010029982A1 Radiation-sensitive resin composition, and resist pattern formation method
03/18/2010WO2010029965A1 Radiation-sensitive resin composition
03/18/2010WO2010029948A1 Photoacid generator material, photolithography material, and pattern film manufacturing method using same
03/18/2010WO2010029907A1 Resist processing method and use of positive resist composition
03/18/2010WO2010029836A1 Method for smoothing optical member for euvl and optical member for euvl having smoothed optical surface
03/18/2010WO2010029342A1 Improvements in or relating to printing
03/18/2010WO2010029341A2 Improvements in or relating to printing
03/18/2010WO2010029332A1 Multi-coloured codes
03/18/2010WO2010029329A1 Energy activated compositions
03/18/2010WO2010029195A1 Method and device for changing the direction and controlling the angle of incidence of a laser beam in interference lithography
03/18/2010WO2010029138A2 Method of etching using a multilayer masking structure
03/18/2010WO2010028899A1 Radiation source and lithographic apparatus
03/18/2010WO2010028748A1 Imaging optical system
03/18/2010WO2010028704A1 Radiation system and lithographic apparatus
03/18/2010WO2009154890A3 Method for defining regions of differing porosity of a nitrocellulose film on a substrate
03/18/2010WO2009148547A3 Illumination system for sizing focused spots of a patterning system for maskless lithography
03/18/2010US20100069521 Additive composition for increasing the storage stability of ethylenically unsaturated resins
03/18/2010US20100068664 Developing roller, electrophotographic process cartridge and electrophotographic image-forming apparatus
03/18/2010US20100068663 Method for Contaminant Removal
03/18/2010US20100068662 Method of forming fine patterns
03/18/2010US20100068661 Pattern forming method
03/18/2010US20100068660 Pattern forming method and device production method
03/18/2010US20100068659 Exposure apparatus and device manufacturing method
03/18/2010US20100068658 Photolithographic patterning of arrays of pillars having widths and lengths below the exposure wavelengths
03/18/2010US20100068657 Method of patterning target layer on substrate
03/18/2010US20100068656 High etch resistant material for double patterning
03/18/2010US20100068655 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method
03/18/2010US20100068654 Method for creating gray-scale features for dual tone development processes
03/18/2010US20100068653 Manufacturing method of optical waveguide device
03/18/2010US20100068652 Semiconductor device manufacturing method
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