Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2010
03/30/2010US7687226 Method for fabricating printing plate with fine pattern using electric field
03/30/2010US7687224 decreased fish eye defects; improved workability
03/30/2010US7687223 Underlayer coating forming composition for lithography containing cyclodextrin compound
03/30/2010US7687222 Polymerizable ester compounds, polymers, resist compositions and patterning process
03/30/2010US7687221 high resolution pattern with reduced line edge roughness; increased alkali solubility under action of acid generator
03/30/2010US7687220 Oxime derivatives and use thereof as latent acids
03/30/2010US7687219 acid generators; irradiation polymerization; lithography
03/30/2010US7687208 Positive photosensitive resin composition
03/30/2010US7687007 devised for forming a structured nanoscale pattern on an object and having a layer which is anti-adhesive with regard to the object; stamp blank is provided with a structured pattern on a surface
03/25/2010WO2010033720A1 Dual tone development processes
03/25/2010WO2010033182A1 On-press developable imageable elements
03/25/2010WO2010032884A1 Movable body apparatus and movable body drive method
03/25/2010WO2010032878A2 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
03/25/2010WO2010032877A1 Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
03/25/2010WO2010032855A1 Fine particles of a water-insoluble compound, dispersion of same and process for production thereof
03/25/2010WO2010032839A1 Resist pattern coating agent and resist pattern formation method
03/25/2010WO2010032796A1 Composition for forming side wall
03/25/2010WO2010032753A1 Aperture stop, optical system, exposure apparatus and electronic device manufacturing method
03/25/2010WO2010032710A1 Substrate processing liquid and method for processing resist substrate using same
03/25/2010WO2010032585A1 Illumination optical system, photolithography apparatus and method for manufacturing device
03/25/2010WO2010032224A2 Lithographic apparatus, programmable patterning device and lithographic method
03/25/2010WO2010031754A1 Vibration damping in projection exposure apparatuses for semiconductor lithography
03/25/2010WO2010031566A1 Method and apparatus for measuring structures on photolithography masks
03/25/2010WO2010031510A1 Inspection method for lithography
03/25/2010WO2010031483A1 Reflective optical element and methods for producing it
03/25/2010WO2010002129A3 Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same
03/25/2010US20100075263 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
03/25/2010US20100075262 Post arrays and methods of making the same
03/25/2010US20100075261 Methods for Manufacturing a Contact Grid on a Photovoltaic Cell
03/25/2010US20100075260 Plate making method of lithographic printing plate precursor
03/25/2010US20100075259 Illuminating waveguide fabrication method
03/25/2010US20100075258 On-press developable imageable elements
03/25/2010US20100075257 Resin and Chemically Amplified Resist Composition Comprising the Same
03/25/2010US20100075256 Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
03/25/2010US20100075255 Lithographic printing plate precursor and process for producing lithographic printing plate
03/25/2010US20100075254 Oxime ester compound and photopolymerization initiator containing the same
03/25/2010US20100075253 Resist underlayer film forming composition containing low molecular weight dissolution accelerator
03/25/2010US20100075252 Lithographic printing plate precursor and plate making method thereof
03/25/2010US20100075251 Method of preparing lithographic printing plate and lithographic printing plate precursor
03/25/2010US20100075250 Waterless planographic printing plate precursor
03/25/2010US20100075249 Positive resist composition and method of forming resist pattern
03/25/2010US20100075248 Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
03/25/2010US20100075238 Variable Resist Protecting Groups
03/25/2010US20100075237 Process for producing substrate having partition walls and pixels formed thereon
03/25/2010US20100075235 Writing pattern producing method, photomask manufacturing method, and semiconductor device manufacturing method
03/25/2010US20100075118 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same
03/25/2010US20100075117 Relief printing plate precursor for laser engraving, method of producing the same, relief printing plate obtainable therefrom, and method of producing relief printing plate
03/25/2010US20100073766 Microscope slide testing and identification assembly
03/25/2010US20100073688 Periodic patterns and technique to control misalignment between two layers
03/25/2010US20100073658 Laser light source device, exposure device, and mask inspection device using this laser light source device
03/25/2010US20100073646 Method for the production of a multi-colour volume hologram, a document with such a hologram, and a volume hologram master
03/25/2010US20100072672 Uv nanoimprint lithography process and apparatus
03/25/2010US20100072454 Exposure method, and semiconductor device
03/25/2010US20100072171 Method Of Fabricating A Printhead IC
03/25/2010US20100071848 Non-leaching adhesive system and its use in a liquid immersion objective
03/25/2010DE102009033818A1 Temperiervorrichtung für eine optische Baugruppe Tempering device for an optical assembly
03/25/2010DE102008047562A1 Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie A device for damping vibrations in projection exposure apparatuses for semiconductor lithography
03/25/2010DE102008035814A1 Verfahren und System zum Reduzieren der Überlagerungsfehler in der Halbleitermassenproduktion unter Anwendung eines Mischanlagenszenarios A method and system for reducing the overlay error in the semiconductor mass production using a mixing scenarios
03/24/2010EP2166564A2 Method for removing a hardened photoresist from a semiconductor substrate
03/24/2010EP2166413A1 Cleanup method for optics in immersion lithography
03/24/2010EP2166412A1 Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties
03/24/2010EP2166411A2 Lithographic printing plate precursor, process for producing lithographic printing plate, and lithographic printing plate
03/24/2010EP2166410A2 Method of preparing lithographic printing plate and lithographic printing plate precursor
03/24/2010EP2166409A2 Alkaline developable super-hydrophobic photosensitive materials
03/24/2010EP2165241A1 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method
03/24/2010EP2165162A2 Total internal reflection displacement scale
03/24/2010EP2164826A2 Dendritic photoactive compound comprising oxime ester and method for preparing the same
03/24/2010EP1332649B1 Method and apparatus for generating x-ray or euv radiation
03/24/2010EP1287550B1 Post chemical-mechanical planarization (cmp) cleaning composition
03/24/2010CN201429770Y Developing solution dumping equipment
03/24/2010CN101681810A Moving body driving method and apparatus, exposure method and apparatus, pattern forming method and apparatus, and device manufacturing method
03/24/2010CN101681809A Exposure apparatus, moving body driving system, pattern forming apparatus, exposure method and device manufacturing method
03/24/2010CN101681131A Agent for stripping resist film on electroconductive polymer, method for stripping resist film, and substrate with patterned electroconductive polymer
03/24/2010CN101681130A Methods for stripping material for wafer reclamation
03/24/2010CN101681129A Photoresist remover composition
03/24/2010CN101681128A Use of highly alkaline developer regenerator composition
03/24/2010CN101681127A A gum solution for developing and gumming a photopolymer printing plate.
03/24/2010CN101681126A Method and apparatus for detecting non-uniform fracturing of a photomask shape
03/24/2010CN101681125A Illumination optical system, exposure apparatus, and device manufacturing method
03/24/2010CN101681124A Clamping device and object loading method
03/24/2010CN101681123A Illumination optical system, exposure apparatus, and device manufacturing method
03/24/2010CN101681122A Lithographic apparatus and method
03/24/2010CN101681121A Exposure apparatus, exposure method, and device manufacturing method
03/24/2010CN101681120A Optical unit, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method
03/24/2010CN101681119A Optical modulator with beam-pointing correction
03/24/2010CN101681118A Exposure method and electronic device manufacturing method
03/24/2010CN101681117A Illumination optical apparatus, exposure apparatus, and device manufacturing method
03/24/2010CN101681116A Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
03/24/2010CN101681115A Illumination system for illuminating a patterning device and method for manufacturing an illumination system
03/24/2010CN101681114A Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity
03/24/2010CN101681113A Composition for antireflection film formation and method for resist pattern formation using the composition
03/24/2010CN101681112A Composition for antireflection film formation and method for resist pattern formation using the composition
03/24/2010CN101681111A A method for making a lithographic printing plate precursor
03/24/2010CN101681110A Positive photosensitive resin composition and method of forming cured film therefrom
03/24/2010CN101681109A patterned photoacid etching and articles therefrom
03/24/2010CN101681108A A lithographic printing plate precursor
03/24/2010CN101681107A Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
03/24/2010CN101681106A a lithographic printing plate precursor
03/24/2010CN101681105A 一种平版印版前体 A planographic printing plate precursor
03/24/2010CN101681104A Photosensitive adhesive composition, film-like adhesive, adhesive sheet, method for forming adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and method for manufacturing
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