Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2014
10/02/2014WO2014157171A1 Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device and organic el display device
10/02/2014WO2014157064A1 Method for manufacturing flexographic printing plate
10/02/2014WO2014157026A1 Light exposure device and light exposure method
10/02/2014WO2014156910A1 Composition, method for producing substrate having pattern formed thereon, film and method for producing same, and compound
10/02/2014WO2014156873A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device
10/02/2014WO2014156677A1 Conductive paste and method for producing conductive paste
10/02/2014WO2014156524A1 Compound, actinic-ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
10/02/2014WO2014156520A1 Photosensitive resin composition, protection film or insulation film, touch panel and method for manufacturing same
10/02/2014WO2014156463A1 Active light-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device using pattern forming method, and electronic device
10/02/2014WO2014156449A1 Lithographic printing original plate and plate making method of same
10/02/2014WO2014156374A1 Inorganic film forming composition for multilayer resist processes, and pattern forming method
10/02/2014WO2014156171A1 Circuit substrate reliably operating when controlling plurality of electron beams
10/02/2014WO2014156170A1 Electron beam irradiation device
10/02/2014WO2014155005A1 Calibration pattern for camera
10/02/2014WO2014154452A1 Lithographic apparatus
10/02/2014WO2014154433A1 Radiation collector, radiation source and lithographic apparatus
10/02/2014WO2014154428A2 Object holder, lithographic apparatus, device manufacturing method, and method of manufacturing an object holder
10/02/2014WO2014154363A1 Production of 3d free-form waveguide structures
10/02/2014WO2014154229A1 Microlithographic apparatus and method of varying a light irradiance distribution
10/02/2014WO2014153819A1 Alkali-soluble resin, preparation method and use thereof
10/02/2014US20140295355 Holder, lithography apparatus, and method of manufacturing article
10/02/2014US20140295354 Manufacturing method of microstructure
10/02/2014US20140295352 Method of Improving Print Performance in Flexographic Printing Plates
10/02/2014US20140295351 Photosensitive resin composition and photosensitive paste including the same
10/02/2014US20140295350 Resist pattern-forming method, and radiation-sensitive resin composition
10/02/2014US20140295349 Bottom antireflective materials and compositions
10/02/2014US20140295348 Compositions and processes for photolithography
10/02/2014US20140295347 Acid generators and photoresists comprising same
10/02/2014US20140295332 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
10/02/2014US20140295331 Nanoporous film patterned by direct photolithography and method for preparing the same
10/02/2014US20140295148 Photosensitive resin composition
10/02/2014US20140293469 Color filter layer and method of fabricating the same
10/02/2014US20140293400 Photosensitive resin composition and uses thereof
10/02/2014US20140293261 Lithographic Method to Apply a Pattern to a Substrate and Lithographic Apparatus
10/02/2014US20140293259 Method of making nozzle chip
10/02/2014US20140293257 Substrate holding apparatus and method
10/02/2014US20140293256 Microlithography projection objective
10/02/2014US20140293255 Mirror arrangement, in particular for use in a microlithographic projection exposure apparatus
10/02/2014US20140293254 Illumination optical device, optical unit, illumination method, and exposure method and device
10/02/2014US20140293253 Lens comprising a plurality of optical element disposed in a housing
10/02/2014US20140293252 Exposure apparatus, and device manufacturing method
10/02/2014US20140293250 Focus control apparatus for photolithography
10/02/2014US20140293249 Exposure apparatus and method for producing device
10/02/2014US20140293248 Lithographic apparatus and device manufacturing method
10/02/2014DE102014208984A1 Baugruppe Module
10/02/2014DE102014207894A1 Beleuchtungsoptik Illumination optics
10/02/2014DE102013218748A1 Optisches Bauelement Optical component
10/02/2014DE102013217655A1 Spiegelmonitoring unter Verwendung einer Graustufenblende Mirror monitoring using a grayscale aperture
10/02/2014DE102013204443A1 Optische Baugruppe zur Lichtleitwerterhöhung Optical assembly for Lichtleitwerterhöhung
10/02/2014DE102013204442A1 Optischer Wellenleiter zur Führung von Beleuchtungslicht An optical waveguide for guiding illumination light
10/02/2014DE102013102670A1 Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements The optical element and optical system for EUV lithography, and methods for treatment of such an optical element
10/01/2014EP2784587A1 Thermally reactive resist material, method for producing mold, mold, developing method, and pattern-forming material
10/01/2014EP2784586A1 Multidimensionally photopatterned substrates on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof
10/01/2014EP2784585A1 Method for forming pattern, structural body, method for producing comb-shaped electrode, and secondary cell
10/01/2014EP2784584A1 Compositions comprising sulfonamide material and processes for photolithography
10/01/2014EP2783389A1 Assist layers for euv lithography
09/2014
09/30/2014US8849008 Determining calibration parameters for a lithographic process
09/30/2014US8848195 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
09/30/2014US8848186 Angle-resolved antisymmetric scatterometry
09/30/2014US8848169 Lithographic apparatus, composite material and manufacturing method
09/30/2014US8848168 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
09/30/2014US8848167 Optical element for UV or EUV lithography with coatings having optimized stress and thickness
09/30/2014US8848166 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
09/30/2014US8848165 Lithographic apparatus and device manufacturing method
09/30/2014US8848164 Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method
09/30/2014US8848162 Lithographic apparatus and device manufacturing method
09/30/2014US8847416 Multi-layer chip overlay target and measurement
09/30/2014US8847223 Method of forming a photosensitive pattern, method of manufacturing a display substrate, and display substrate
09/30/2014US8847183 System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
09/30/2014US8847180 Charged particle beam apparatus, drawing apparatus, and method of manufacturing article
09/30/2014US8847178 Charged particle beam writing apparatus and charged particle beam writing method
09/30/2014US8846846 Naphthalene derivative, resist bottom layer material, and patterning process
09/30/2014US8846840 Adamantyl (meth)acrylic monomer and (meth)acrylic polymer containing the same as repeating unit
09/30/2014US8846838 Fluorine-containing block copolymeric compound
09/30/2014US8846439 Method and apparatus for forming pattern
09/30/2014US8846418 Method of manufacturing quantum dot layer and quantum dot optoelectronic device including the quantum dot layer
09/30/2014US8846305 Photolithography method including dual development process
09/30/2014US8846304 Method of forming a pattern in a semiconductor device and method of forming a gate using the same
09/30/2014US8846303 Resist top coat composition and patterning process
09/30/2014US8846302 Semiconductor structure and method and tool for forming the semiconductor structure
09/30/2014US8846301 Orthogonal processing of organic materials used in electronic and electrical devices
09/30/2014US8846300 Developer for processing lithographic printing plate precursor, method for manufacturing lithographic printing plate by using the developer, and printing method
09/30/2014US8846299 Methods for preparing lithograhic printing plates
09/30/2014US8846297 Positive photoresist composition, coating film thereof, and novolac phenol resin
09/30/2014US8846296 Photoresist compositions
09/30/2014US8846295 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
09/30/2014US8846294 Photoresist composition
09/30/2014US8846293 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition
09/30/2014US8846292 Radiation-sensitive composition
09/30/2014US8846291 Resist composition, method of forming resist pattern, and new compound
09/30/2014US8846290 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
09/30/2014US8846278 Electron beam lithography system and method for improving throughput
09/30/2014US8846277 Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor
09/30/2014US8846195 Ultra-thin polymeric adhesion layer
09/30/2014US8846160 Three-dimensional articles using nonlinear thermal polymerization
09/30/2014US8846145 Liquid processing method
09/30/2014US8845908 Reticles, and methods of mitigating asymmetric lens heating in photolithography
09/30/2014US8845843 Methods and means for constituting graphical data, and for protecting use of such data, and modes of reading and storing such data
09/30/2014US8845320 Imprint lithography apparatus
09/30/2014US8845318 Imprint apparatus, imprint method, and mold for imprint
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