Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2010
04/01/2010US20100081088 Resist composition, method of forming resist pattern, compound and acid generator including the same
04/01/2010US20100081087 Composition for formation of antireflection film and pattern formation method using the same
04/01/2010US20100081086 Positive resist composition, method of forming resist pattern, and polymeric compound
04/01/2010US20100081085 Polymer and Resist Composition Comprising the Same
04/01/2010US20100081084 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof
04/01/2010US20100081083 printing original plate capable of being laser-engraved
04/01/2010US20100081082 Composition for resist under layer film formation and method for pattern formation
04/01/2010US20100081081 Resist underlayer film forming composition for electron beam lithography
04/01/2010US20100081080 Polymer compound, resist composition and method of forming resist pattern
04/01/2010US20100081079 Polymer for resist and resist composition manufactured using the same
04/01/2010US20100081072 Lithographic apparatus and method
04/01/2010US20100081070 Colored curable composition, color filter and production method thereof, and solid-state imaging device
04/01/2010US20100081069 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface; avoiding defective portion; semiconductors
04/01/2010US20100081067 Mask blank substrate set and mask blank set
04/01/2010US20100080963 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device
04/01/2010US20100080954 Process for formation of highly uniform arrays of nano-holes and nano-pillars
04/01/2010US20100080647 Manufacturing method of semiconductor device and manufacturing method of mask
04/01/2010US20100079863 Optical element, method for production thereof, and usage thereof
04/01/2010US20100079548 Inkjet printhead and method of manufacturing the same
04/01/2010DE102009041260A1 System und Prozess zum Herstellen von Halbleiter-Packages System and process for manufacturing semiconductor packages
04/01/2010DE102009019121A1 Positionierhilfe für verstellbares optisches Element Positioning for adjustable optical element
04/01/2010DE102008049556A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus
04/01/2010DE102005009554B4 Verfahren zur Fokuskorrektur eines Belichtungsgeräts bei der lithographischen Projektion und Verfahren zur Auswertung von Messergebnissen eines Messgeräts für die Fokuskorrektur eines Belichtungsgeräts in einer Halbleiterfertigungsanlage Method of focus correction of an exposure apparatus for the lithographic projection and methods for evaluation of measurement results of a measuring instrument for the focus correction of an exposure apparatus in a semiconductor fabrication facility
04/01/2010DE10023662B4 Verfahren zur Einstellung von Belichtungsparametern eines Laserbelichters Method for setting exposure parameters of a laser imager
03/2010
03/31/2010EP2170020A1 Extreme ultraviolet light source device and method for generating extreme ultraviolet radiation
03/31/2010EP2169466A1 Inspection apparatus and method for sphero-chromatic aberration correction
03/31/2010EP2169465A1 A six-mirror EUV projection system
03/31/2010EP2169464A1 Illumination system of a microlithographic projection exposure apparatus
03/31/2010EP2169463A2 Colored curable composition, color filter and method for producing the same
03/31/2010EP2168989A1 Colored curable composition, color filter and production method thereof, and solid-state imaging device
03/31/2010EP2168767A1 Method of preparing lithographic printing plate
03/31/2010EP2168766A1 Process for making lithographic printing plate
03/31/2010EP2168155A2 Integrated circuits on a wafer and methods for manufacturing integrated circuits
03/31/2010EP2168011A2 Method using highly alkaline developer regenerator composition
03/31/2010EP2168010A2 Debris prevention system and lithographic apparatus
03/31/2010EP2168009A1 Imageable elements with low ph developer solubility
03/31/2010EP2168008A1 Spacer lithography
03/31/2010EP2047333B1 Negative-working radiation-sensitive compositions and imageable materials
03/31/2010EP1551890B1 Curable compositions and rapid prototyping process using the same
03/31/2010EP1505090B1 Reactive diluent composition and curable resin composition
03/31/2010EP1379918B1 Imageable element comprising graft polymer
03/31/2010CN201434967Y Vacuum suction device of exposure platform
03/31/2010CN201434966Y Hundred-stage working platform assembly
03/31/2010CN101689540A methods for manufacturing integrated circuits
03/31/2010CN101689480A System for continuously using resist stripper liquid based on nanofiltration
03/31/2010CN101689030A Debris prevention system, radiation system, and lithographic apparatus
03/31/2010CN101689029A Lamination device method for flexographic plate manufacturing
03/31/2010CN101689028A Method for processing pattern data and method for manufacturing electronic device
03/31/2010CN101689027A Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component
03/31/2010CN101689026A Movable body apparatus
03/31/2010CN101689025A Movable body apparatus
03/31/2010CN101689024A Movable body apparatus
03/31/2010CN101689023A Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
03/31/2010CN101689022A Negative photosensitive resin composition, spacer and liquid crystal display
03/31/2010CN101689021A Imageable elements with low ph developer solubility
03/31/2010CN101689020A Photosensitive resin composition for color filter and color filter of using same
03/31/2010CN101689019A Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
03/31/2010CN101688935A Resin black matrix, light blocking photosensitive resin composition, tft element substrate and liquid crystal display device
03/31/2010CN101687846A oxime ester photoinitiators
03/31/2010CN101687794A oxime ester photoinitiators
03/31/2010CN101687781A Compound for photoacid generator, resist composition using the same, and pattern-forming method
03/31/2010CN101687407A Imageable elements and methods of use in negative working lithographic printing plates
03/31/2010CN101687214A Coat film forming method and coat film forming apparatus
03/31/2010CN101685275A Alignment mark, making method and detection device thereof
03/31/2010CN101685274A Cleaning agent for thick-film photoresist
03/31/2010CN101685273A Cleanout fluid for removing photoresist layer residue
03/31/2010CN101685272A Photoresist cleaning agent
03/31/2010CN101685271A Method for detecting wafer edge cleaning width of wafer
03/31/2010CN101685270A Decompression drying device and method
03/31/2010CN101685269A Exposure apparatus and device producing method
03/31/2010CN101685268A Lithographic apparatus and method
03/31/2010CN101685267A Lighting optical device, exposure system and exposure method
03/31/2010CN101685266A Lighting optical device, exposure system and exposure method
03/31/2010CN101685265A Lighting optical device, exposure system and exposure method
03/31/2010CN101685264A Lighting optical device, exposure system and exposure method
03/31/2010CN101685263A Stage drive method and stage drive apparatus, exposure apparatus, and device producing method
03/31/2010CN101685262A Method of producing micro-lens-carrying display panel and display unit and exposure system
03/31/2010CN101685261A Off-axis light source, light shading panel and method for defining different patterns by single exposure
03/31/2010CN101685260A Instantaneous exposure optical system
03/31/2010CN101685259A Method for online monitoring of lithography circumstance
03/31/2010CN101685258A Programmable light source based on laser generator array, use method and uses
03/31/2010CN101685257A Coating method and coating apparatus
03/31/2010CN101685256A Photosensitive film manufacturing method, photosensitive film, photosensitive laminating body, permanent pattern forming method and printing circuit board
03/31/2010CN101685255A Coloring photosensitive composition, color filter and liquid crystal display
03/31/2010CN101685229A Method for manufacturing array substrate of liquid crystal display device
03/31/2010CN101685204A Polarizing modulation optical element, optical illumination device, exposure device and exposure method
03/31/2010CN101685178A Diffraction light guide film and preparation method thereof
03/31/2010CN101684181A Photosensitive polyimide and flexible printed circuit board thereof
03/31/2010CN101684166A Resin and chemically amplified resist composition comprising the same
03/31/2010CN101684086A Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
03/31/2010CN101683579A Filtering device configured in photomask picking and placing device of microlithography system
03/30/2010US7688517 Projection optical system and method for photolithography and exposure apparatus and method using same
03/30/2010US7688456 Assessment and optimization for metrology instrument
03/30/2010US7688426 Method and apparatus for measurement of exit pupil transmittance
03/30/2010US7688423 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
03/30/2010US7688410 Substrate for a display apparatus
03/30/2010US7687406 Methods of eliminating pattern collapse on photoresist patterns
03/30/2010US7687279 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
03/30/2010US7687228 Antireflection film composition and patterning process using the same
03/30/2010US7687227 latent imaging
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