Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2010
04/08/2010DE102008042439A1 Hochreflektierender dielektrischer Spiegel und Verfahren zu dessen Herstellung, sowie eine Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel Highly reflective dielectric mirror and method for its production, as well as a projection exposure system for microlithography with such a mirror
04/08/2010DE102008042438A1 Mikrolithographie-Projektionsbelichtungsanlage mit mindestens zwei Arbeitszuständen Microlithography projection exposure apparatus having at least two working conditions
04/08/2010DE102008042356A1 Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit Projection exposure system with optimized adjustment feature
04/08/2010DE102008033340B3 Abbildende Optik The imaging optics
04/08/2010CA2738835A1 Prepolymer-based polyurethane formulations for producing holographic media
04/07/2010EP2172966A1 Optical characteristic measuring method, optical characteristic adjusting method, exposing device, exposing method, and exposing device manufacturing method
04/07/2010EP2172965A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method
04/07/2010EP2172962A1 Exposure device
04/07/2010EP2172809A1 Cleanup method for optics in immersion lithography
04/07/2010EP2172808A1 Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process
04/07/2010EP2172807A1 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
04/07/2010EP2172806A2 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board
04/07/2010EP2172766A1 Lithographic apparatus and humidity measurement system
04/07/2010EP2172752A1 Multiple area indicator
04/07/2010EP2172505A1 Photopolymer compounds for optical elements and visual representations
04/07/2010EP2172504A1 Photopolymer formulations with low interlacing density
04/07/2010EP2172503A1 Special polyether-based polyurethane formulations for producing holographic media
04/07/2010EP2172502A1 Polyether-based polyurethane formulations for producing holographic media
04/07/2010EP2172455A1 Oxime ester photoinitiators
04/07/2010EP2172320A1 Mold, method for production of the mold, and method for production of substrate having replicated fine pattern
04/07/2010EP2171809A2 Engraving with amplifier having multiple exit ports
04/07/2010EP2171542A1 Method and device for producing structured optical materials
04/07/2010EP2171541A1 Method for examining a wafer with regard to a contamination limit and euv projection exposure system
04/07/2010EP2171540A2 Hydrocarbon getter for lithographic exposure tools
04/07/2010EP2171539A2 Method and apparatus for duv transmission mapping
04/07/2010EP2171538A1 A method of making a secondary imprint on an imprinted polymer
04/07/2010EP2171537A1 Alignment system and method for a substrate in a nano-imprint process
04/07/2010EP2170764A2 Methods of making hierarchical articles
04/07/2010CN201436605U Lens collision-proof device
04/07/2010CN201436604U Gravity compensator
04/07/2010CN201436603U Printing device making plate by using computer directly
04/07/2010CN1885164B Photoresist coating method and photoresist coating apparatus
04/07/2010CN1867865B Cleanup method for optics in immersion lithography
04/07/2010CN1842749B Method for reclaiming alkyl esters
04/07/2010CN1800988B 光阻清洗剂 Resist cleaning agents
04/07/2010CN1794089B Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method
04/07/2010CN1542549B Photo resist transfer printing device and method
04/07/2010CN1514306B Manufacturing method of photoetching equipment and device, and device obtained therefrom
04/07/2010CN101692439A Manufacturing method for a plurality of groups of substrates of thin-film transistor
04/07/2010CN101692155A Composition for removing photoresist and method of manufacturing an array substrate using the same
04/07/2010CN101692154A Deflector
04/07/2010CN101692153A Color filter ink, color filter ink set, color filter, image display device, and electronic device
04/07/2010CN101692152A Polymer laser ablation based three-dimensional photoetching method
04/07/2010CN101692151A Method for manufacturing silicon nano-wire based on soft template nano-imprinting technique
04/07/2010CN101349814B Plane reflection type compound eye cold light source exposure system
04/07/2010CN101215369B Optical cured resin, photosensitive resin composition and preparation method thereof
04/07/2010CN101176042B Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device
04/07/2010CN101149505B 液晶显示装置及其制造方法 The liquid crystal display device and manufacturing method
04/07/2010CN101033587B Method of printing on towel by four primary colors
04/06/2010US7693597 Instructions for executing the development of a photoresist by by supplying ozone and a controlled rate of water vapor into the chamber such that dewformation is prevented; improving the peeling rate of, for example, the resist film without plasma ashing
04/06/2010US7692881 Structure for use in a projection exposure system for manufacturing semiconductors
04/06/2010US7692868 Lithography projection objective, and a method for correcting image defects of the same
04/06/2010US7692799 Measurement apparatus, exposure apparatus, and device fabrication method
04/06/2010US7692767 Projection optical system and exposure apparatus with the same
04/06/2010US7691915 Alkali-soluble copolymer with an aziridine group; good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity; excellent pattern-forming properties; insulating film has excellent resistance to solvents and chemicals
04/06/2010US7691561 Positive resist compositions and patterning process
04/06/2010US7691560 Resist composition and pattern forming method using the same
04/06/2010US7691559 spin drying, baking, developing; semiconductor wafers; photoresists
04/06/2010US7691558 Novel Acid generator having a carbamoyl structure that generates a sulfonic acid; sensitivity and resolution and improved in the exposure latitude, pattern profile and pitch dependency; use in semiconductor production
04/06/2010US7691557 Polymerizable composition exhibiting permanent color change as cure indicator
04/06/2010US7691556 chromophores; polyglycoluril based; semiconductors; photolithography
04/06/2010US7691555 high refractive index, reduced discoloration and improved transparency; for optical adhesives, optical coating materials, potting agents for light emitting diodes, photofunctional films, photofunctional substrates, resist materials, prisms, optical fibers, filters and plastic lenses
04/06/2010US7691554 Forming full color diffraction grating image using black ink without gradation expression or high print resolution
04/06/2010US7691542 Projects images of grating pattern and test pattern; photoresists
04/06/2010US7691541 Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height
04/06/2010US7691540 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method
04/06/2010US7691313 Method for expelling gas positioned between a substrate and a mold
04/06/2010CA2442584C Forming a mark on a gemstone or industrial diamond
04/06/2010CA2321070C Method and apparatus for synthesis of arrays of dna probes
04/01/2010WO2010036524A1 An optical imaging writer system
04/01/2010WO2010036080A2 Photosensitive resin composition for black matrix
04/01/2010WO2010035925A1 Positive photosensitive resin composition
04/01/2010WO2010035909A1 Positive photosensitive composition and pattern forming method using the same
04/01/2010WO2010035908A1 Pattern forming method
04/01/2010WO2010035905A1 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition
04/01/2010WO2010035901A1 Exposure apparatus, exposure method, and method for producing device
04/01/2010WO2010035894A1 Positive resist composition for immersion exposure and pattern forming method
04/01/2010WO2010035737A1 Laser machining device
04/01/2010WO2010035736A1 Laser machining device
04/01/2010WO2010035697A1 Process for producing lithographic printing plate
04/01/2010WO2010034674A1 Projection exposure apparatus with optimized adjustment possibility
04/01/2010WO2010034472A1 Illumination system of a microlithographic projection exposure apparatus
04/01/2010WO2010034427A2 Lithographic system, lithographic method and device manufacturing method
04/01/2010WO2010034385A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
04/01/2010WO2010034382A1 Microlithography projection exposure apparatus having at least two operating states
04/01/2010WO2010034367A1 Dielectric mirror and method for the production thereof, and a projection illumination system for microlithography having such a mirror
04/01/2010WO2010015508A3 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element
04/01/2010WO2010013052A3 Exposure apparatus and methods
04/01/2010WO2009143357A3 Orthogonal processing of organic materials used in electronic and electrical devices
04/01/2010WO2009140172A3 Selective inductive double patterning
04/01/2010US20100081295 Process model evaluation method, process model generation method and process model evaluation program
04/01/2010US20100081097 Substrate processing apparatus
04/01/2010US20100081096 Exposure apparatus and device manufacturing method
04/01/2010US20100081095 Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
04/01/2010US20100081094 Mask pattern forming method, fine pattern forming method, and film deposition apparatus
04/01/2010US20100081093 Exposure apparatus inspection method and method for manufacturing semiconductor device
04/01/2010US20100081092 Method for fabricating metal interconnection of semiconductor device
04/01/2010US20100081091 Method for manufacturing semiconductor device
04/01/2010US20100081090 Process for making lithographic printing plate
04/01/2010US20100081089 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
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