Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2010
04/14/2010CN1637530B Trans-reflective type liquid crystal display device and method for fabricating the same
04/14/2010CN101694839A Array substrate and manufacture method thereof
04/14/2010CN101694564A Lithographic apparatus and device manufacturing method
04/14/2010CN101694563A Multi-mask photoetching machine silicon wafer stage system in array arrangement
04/14/2010CN101694562A Multi-mask photoetching machine silicon wafer stage system
04/14/2010CN101694561A Multi-mask photoetching machine silicon wafer stage system
04/14/2010CN101694560A Silicon wafer stage double-stage exchange system by adopting air-floatation planar motor
04/14/2010CN101693758A Synthesis of carboxylic phenol resin active ester and etherate
04/14/2010CN101324759B Optical head and optical etching apparatus
04/14/2010CN101287603B Method for making lithographic printing plate precursor and lithographic printing plate
04/14/2010CN101241859B Plasma etching method, plasma etching apparatus, control program and computer storage medium
04/14/2010CN101165597B Aligning system and lightscribing device using the system
04/14/2010CN101131539B LCD panel, LCD light reflection structure and their manufacturing method
04/14/2010CN101031597B Copolymer and upper film-forming composition
04/14/2010CN101008783B Photosensitive monomer and liquid crystal panel, and manufacture method therefor
04/13/2010USRE41220 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
04/13/2010US7697382 Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head
04/13/2010US7697222 Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
04/13/2010US7697198 Catadioptric projection objective
04/13/2010US7697117 Providing a pattern of polarization
04/13/2010US7697116 Lithographic apparatus and device manufacturing method
04/13/2010US7697111 Optical element and exposure apparatus
04/13/2010US7697110 Exposure apparatus and device manufacturing method
04/13/2010US7696493 Radiation system and lithographic apparatus
04/13/2010US7696292 Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution
04/13/2010US7696100 Method for manufacturing semiconductor device
04/13/2010US7695897 Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer
04/13/2010US7695896 Method for forming photoresist pattern
04/13/2010US7695895 photopolymerizable unsaturated binder obtained by adding unsaturated monobasic acid polyfunctional epoxy resin to form epoxy adduct and allowing epoxy adduct and polybasic acid anhydride to react; color filters, liquid crystal displays, image sensors
04/13/2010US7695894 negative tone photoinitiators; polynorbornenes, polycarbonates
04/13/2010US7695893 Photo-sensitive compound and photoresist composition including the same
04/13/2010US7695892 High resolution; sensitivity; dissolving contrast using ultraviolet radiation; reduced edge roughness
04/13/2010US7695891 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
04/13/2010US7695890 Negative photoresist for silicon KOH etch without silicon nitride
04/13/2010US7695889 photoresists; acid generators
04/13/2010US7695888 sensitizing dye, hexaarylbisimidazole compound, addition polymerizable compound, binder polymer, and mercapto compound; photopolymerization; for high definition screen printing; photostability
04/13/2010US7695887 Method for producing pattern-forming body
04/13/2010US7695875 Photo-sensitive composition
04/13/2010CA2384959C Device and method for wavelength-dependent light outcoupling
04/08/2010WO2010039229A1 Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
04/08/2010WO2010039226A2 Particle mitigation for imprint lithography
04/08/2010WO2010039196A1 In-situ cleaning of an imprint lithography tool
04/08/2010WO2010038978A2 Photopolymer resin composition
04/08/2010WO2010038837A1 Photosensitive resin composition, article using same, and method for forming negative pattern
04/08/2010WO2010038836A1 Dispersed composition, polymerizable composition, light shielding color filter, solid-state imaging element, liquid crystal display device, wafer-level lens, and imaging unit
04/08/2010WO2010038780A1 Exposure apparatus, supporting apparatus, and device manufacturing method
04/08/2010WO2010038742A1 Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition
04/08/2010WO2010038675A1 Negative-type dye-containing curable composition, color filter and method for production thereof both utilizing the composition, and solid imaging element
04/08/2010WO2010038625A1 Colored curable composition, color filter and method for production thereof, and solid imaging element
04/08/2010WO2010038543A1 Photosensitive siloxane polyimide resin composition
04/08/2010WO2010038340A1 Resist material and pattern forming method using the same
04/08/2010WO2010037778A1 Support elements for an optical element
04/08/2010WO2010037732A2 Projection exposure apparatus for microlithography for the production of semiconductor components
04/08/2010WO2010037575A1 Projection system and lithographic apparatus
04/08/2010WO2010037515A1 Media for volume-holographic recording based on self-developing polymer
04/08/2010WO2010037496A1 Prepolymer-based polyurethane formulations for producing holographic media
04/08/2010WO2010037476A2 Microlithographic projection exposure apparatus
04/08/2010WO2010037472A2 Method and system for determining a lithographic process parameter
04/08/2010WO2010037453A1 Field facet mirror for use in an illumination optics of a projection exposure apparatus for euv microlithography
04/08/2010WO2010037437A1 Illumination system for euv microlithography
04/08/2010WO2010037434A1 Field facet mirror for use in an illumination optic of a projection illumination system for euv microlithography
04/08/2010WO2010037267A1 Rinse solution for removing thick film resist
04/08/2010WO2010037266A1 Rinse solution for removal of etching residues
04/08/2010WO2010037263A1 Rinse solution for removing resist
04/08/2010US20100087563 Sulphonium salt photoinitiators
04/08/2010US20100087352 Process For Creating Shape-Designed Particles In A Fluid
04/08/2010US20100086882 Positive resist processing liquid composition and liquid developer
04/08/2010US20100086881 Oxime ester photoinitiators
04/08/2010US20100086880 Developing solution and method for production of finely patterned material
04/08/2010US20100086879 Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film
04/08/2010US20100086878 Patterning process
04/08/2010US20100086877 Pattern forming method and pattern form
04/08/2010US20100086876 Techniques for reducing degradation and/or modifying feature size of photomasks
04/08/2010US20100086875 Method of making sub-resolution pillar structures using undercutting technique
04/08/2010US20100086874 Photosensitive polymides
04/08/2010US20100086873 Positive resist composition and method of forming resist pattern
04/08/2010US20100086872 Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process
04/08/2010US20100086871 Photosensitive polyimides
04/08/2010US20100086870 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process
04/08/2010US20100086865 Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method
04/08/2010US20100086863 Lithographic processing method, and device manufactured thereby
04/08/2010US20100086860 Photopolymer compositions for optical elements and visual displays
04/08/2010US20100086859 Hologram recording material and hologram recording medium
04/08/2010US20100086751 Imaging element for use as a recording element and process of using the imaging element
04/08/2010US20100086694 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
04/08/2010US20100085518 Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix
04/08/2010US20100084785 Method for manufacturing master and method for manufacturing optical disc
04/08/2010US20100084636 Composition for photosensitive organic dielectric material and application thereof
04/08/2010US20100084634 Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
04/08/2010US20100084263 Method for producing tight pitched coil with reduced processing steps
04/08/2010US20100083762 Fabrication and use of submicron wide suspended structures
04/08/2010DE112008000778T5 Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial Wasserentwickelbares photosensitive lithographic printing plate material
04/08/2010DE10361257B4 Verfahren zur Herstellung von feinen Mustern A process for producing fine patterns
04/08/2010DE10359667B4 Transportvorrichtung für Druckplatten Transport device for printing plates
04/08/2010DE102009044957A1 Stützelemente für ein optisches Element Support elements for an optical element
04/08/2010DE102008050868A1 Fluid i.e. ultra-pure water, temperature stabilizing device for use during manufacturing of chips from silicon wafers, has reservoir lying in flow path of fluid and containing volume of fluid, where supplied fluid passes through reservoir
04/08/2010DE102008049616A1 Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen Projection exposure apparatus for microlithography for the production of semiconductor devices
04/08/2010DE102008049586A1 Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie Field facet mirror for use in an illumination optics of a projection exposure apparatus for EUV microlithography
04/08/2010DE102008049585A1 Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie Field facet mirror for use in an illumination optics of a projection exposure apparatus for EUV microlithography
04/08/2010DE102008042462A1 Beleuchtungssystem für die EUV-Mikrolithographie Illumination system for EUV microlithography
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