| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/21/2010 | CN101697064A Process for producing photoresist composition, filter and coating device |
| 04/21/2010 | CN101696351A Antistatic agent, antistatic film, and article coated with antistatic film |
| 04/21/2010 | CN101696266A Active etherate of pyrogallol and divinyl benzene polycondensate resin and synthesizing method thereof |
| 04/21/2010 | CN101696257A Active etherate of pyrogallol acetonide resin and synthesizing method thereof |
| 04/21/2010 | CN101465287B Method for etching plasma |
| 04/21/2010 | CN101364016B Thin-film transistor LCD pixel structure and its making method |
| 04/21/2010 | CN101211750B High polymer layer cleaning method |
| 04/21/2010 | CN101196691B Method for improving metal connection defect of through hole |
| 04/21/2010 | CN101191857B Film pattern layer and its making method thereof |
| 04/20/2010 | USRE41232 Wafer positioner with planar motor and mag-lev fine stage |
| 04/20/2010 | US7703066 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 04/20/2010 | US7701742 Semiconductor device |
| 04/20/2010 | US7701640 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 04/20/2010 | US7701112 Remote center compliant flexure device |
| 04/20/2010 | US7700269 Method of forming stack layer and method of manufacturing electronic device having the same |
| 04/20/2010 | US7700268 Exposure system and pattern formation method using the same |
| 04/20/2010 | US7700267 Immersion fluid for immersion lithography, and method of performing immersion lithography |
| 04/20/2010 | US7700266 exposing imaged negative working photopolymerizable coating to high pressure stream of tap water, whereby water completely removes only less cohesive and adhesive (e.g., partially polymerized) regions of substrate, producing printing plate having image pattern of highly cohesive oleophilic regions |
| 04/20/2010 | US7700265 Image forming method, planographic printing plate precursor, and planographic printing method |
| 04/20/2010 | US7700264 Photosensitive resin composition, image forming material and image forming method using thereof |
| 04/20/2010 | US7700262 Top coat material and use thereof in lithography processes |
| 04/20/2010 | US7700261 Positive photosensitive composition and a pattern-forming method using the same |
| 04/20/2010 | US7700260 Pattern forming method |
| 04/20/2010 | US7700259 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern |
| 04/20/2010 | US7700257 Photoresist composition and resist pattern formation method by the use thereof |
| 04/20/2010 | US7700256 Phenolic/alicyclic copolymers and photoresists |
| 04/20/2010 | US7700247 Differential critical dimension and overlay metrology apparatus and measurement method |
| 04/20/2010 | US7700246 patterned conductive photolithographic film over dielectric layer, which is not removed during development |
| 04/20/2010 | US7700244 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 04/20/2010 | US7700199 Seamless master and method of making same |
| 04/20/2010 | US7699598 Conforming template for patterning liquids disposed on substrates |
| 04/20/2010 | US7699573 Reticle manipulating device |
| 04/20/2010 | US7699480 High positioning reproducible low torque mirror-actuator interface |
| 04/20/2010 | US7698999 Printing apparatus and device manufacturing method |
| 04/15/2010 | WO2010042457A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition |
| 04/15/2010 | WO2010042289A1 Methods of forming patterns utilizing lithography and spacers |
| 04/15/2010 | WO2010042230A1 Complementary alignment marks for imprint lithography |
| 04/15/2010 | WO2010042141A2 Energy sources for curing in an imprint lithography system |
| 04/15/2010 | WO2010042140A2 Template having alignment marks formed of contrast material |
| 04/15/2010 | WO2010042076A1 A method for forming metal capped substrate imprints |
| 04/15/2010 | WO2010041795A1 Positive photosensitive resin composition |
| 04/15/2010 | WO2010041626A1 Composition for forming resist underlayer film for lithography, which contains fluorene-containing resin |
| 04/15/2010 | WO2010041522A1 Illumination optical system, aligner, and process for fabricating device |
| 04/15/2010 | WO2010040696A1 Lithographic focus and dose measurement using a 2-d target |
| 04/15/2010 | WO2010040185A1 A positioning system and method |
| 04/15/2010 | WO2010018430A8 A hardmask process for forming a reverse tone image |
| 04/15/2010 | WO2010004006A3 Device and method for impressing structures in a substrate, in particular in optical data storage media, semiconductor structures and microstructures |
| 04/15/2010 | WO2008143327A8 Kinematic chucks for reticles and other planar bodies |
| 04/15/2010 | US20100093119 Resin composition for printing plate |
| 04/15/2010 | US20100092895 Silicon-based antireflective coating compositions |
| 04/15/2010 | US20100092894 Bottom Antireflective Coating Compositions |
| 04/15/2010 | US20100092893 Method of manufacturing optical waveguide device |
| 04/15/2010 | US20100092892 Photopolymerized resin laminate and method for manufacturing board having black matrix pattern |
| 04/15/2010 | US20100092891 Pitch reduced patterns relative to photolithography features |
| 04/15/2010 | US20100092890 Method to align mask patterns |
| 04/15/2010 | US20100092889 Mandrel |
| 04/15/2010 | US20100092888 Process for Structuring Silicon |
| 04/15/2010 | US20100092887 FLUORINE-CONTAINING QUINACRIDONES IN COLOUR FILTERS FOR LCDs |
| 04/15/2010 | US20100092882 Exposure apparatus and device fabrication method |
| 04/15/2010 | US20100092881 Process, Apparatus and Device |
| 04/15/2010 | US20100092880 Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography |
| 04/15/2010 | US20100092879 Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part |
| 04/15/2010 | US20100092878 Phase shift mask with two-phase clear feature |
| 04/15/2010 | US20100092875 Exposure Mask for Forming Photodiode and Method of Manufacturing Image Sensor Using the Same |
| 04/15/2010 | US20100092874 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank |
| 04/15/2010 | US20100092873 Methods Of Utilizing Block Copolymer To Form Patterns |
| 04/15/2010 | US20100091284 Apparatus and methods for detecting overlay errors using scatterometry |
| 04/15/2010 | US20100091257 Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location |
| 04/15/2010 | US20100091255 Lithographic apparatus and device manufacturing method |
| 04/15/2010 | US20100090316 Wafer with design printed therein |
| 04/15/2010 | US20100089633 Arrangement for Hermetically Sealing Components, and Method for the production thereof |
| 04/15/2010 | US20100089426 Dynamic multipurpose composition for the removal of photoresists and method for its use |
| 04/15/2010 | US20100089268 Non-chemical development of printing plates |
| 04/15/2010 | US20100088907 Electronic sight and manufacturing method thereof |
| 04/15/2010 | DE112008000290T5 Kontaktlithographievorrichtung und Verfahren, das eine Substratverformung einsetzt Contact lithography apparatus and method employing a substrate deformation |
| 04/15/2010 | DE102009032751A1 Reflektives optisches Element für die EUV-Lithographie The reflective optical element for EUV lithography |
| 04/15/2010 | DE102009025656A1 Projektionsoptik zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage mit einer Blende Projection optics for use in a microlithography projection exposure apparatus having an aperture |
| 04/15/2010 | DE102008051204A1 Verfahren zur Herstellung von Mikrostrukturen in einem Speichermedium A process for the fabrication of microstructures in a storage medium |
| 04/15/2010 | DE102008050446A1 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln Methods and devices for the control of micromirrors |
| 04/15/2010 | CA2776784A1 A positioning system and method |
| 04/15/2010 | CA2740027A1 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition |
| 04/14/2010 | EP2175548A2 Lithographic apparatus and Lorentz actuator |
| 04/14/2010 | EP2175320A1 Alkali-developable photosensitive resin composition and -diketone compound |
| 04/14/2010 | EP2175319A1 Positive photosensitive resin composition for spray coating, method for forming cured film using the same, cured film and semiconductor device |
| 04/14/2010 | EP2175021A2 Method for producing polymers |
| 04/14/2010 | EP2174785A2 Method and device for reducing moirés when illustrating substrates |
| 04/14/2010 | EP2174189A2 Non-covalently crosslinkable materials for photolithography processes |
| 04/14/2010 | EP1756672B1 Vacuum system for immersion photolithography |
| 04/14/2010 | EP1673480B1 Use of photopolymerization for amplification and detection of a molecular recognition event |
| 04/14/2010 | EP1472562B1 Multi-faceted mirror |
| 04/14/2010 | EP1354325B1 Collector with an unused area for lighting systems having a wavelength inferior or equal of 193 nm |
| 04/14/2010 | EP1112530B1 Method for producing micro-openings |
| 04/14/2010 | CN201438260U Developing tank applied to coating developing device |
| 04/14/2010 | CN201438259U 曝光机 Exposure Machine |
| 04/14/2010 | CN201438258U Exposure para-position lighting platform for para-position of base plate of printed circuit board and photo-plotting plate |
| 04/14/2010 | CN1949041B Method of fabricating liquid crystal display device |
| 04/14/2010 | CN1900747B Method and device for producing color filter sheet |
| 04/14/2010 | CN1892424B Photoresist composition and laminator |
| 04/14/2010 | CN1774668B Environmental system including a transport region for an immersion lithography apparatus |
| 04/14/2010 | CN1689811B Ejection apparatus and method of manufacturing photoelectricity unit |