| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/27/2010 | US7704678 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same |
| 04/27/2010 | US7704676 block terpolymer for use in photocurable compositions, flexographic printing plates or hot melt adhesives; improved radiation sensitivity, as well as melt viscosity |
| 04/27/2010 | US7704675 Photosensitive recording layer of sensityzing dye, polymerization initiator, polymerizable compound, binder polymer, protective oxygen barrier layer; backcoat layer of epoxy resin; infrared absorber; scratches prevented without interleaving slip sheets |
| 04/27/2010 | US7704674 forming photoresist layer above substrate, forming hydrophobic and contrast-enhancing barrier layer above photoresist layer, exposing, through hydrophobic and contrast-enhancing barrier layer, photoresist to light source, removing hydrophobic and contrast-enhancing barrier layer, developing photoresist |
| 04/27/2010 | US7704672 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device |
| 04/27/2010 | US7704671 comprising hydrophilic support, undercoat layer and laser-sensitive photopolymerizable layer, wherein undercoat layer contains copolymer containing a repeating unit having at least one ethylenically unsaturated bond and repeating unit having functional group capable of interacting with surface of support |
| 04/27/2010 | US7704670 High silicon-content thin film thermosets |
| 04/27/2010 | US7704669 radiation-sensitive resin composition comprising the acrylic polymer and a photoacid generator suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation |
| 04/27/2010 | US7704668 Photoresist compositions and methods and articles of manufacture comprising same |
| 04/27/2010 | US7704667 Dyes and use thereof in imaging members and methods |
| 04/27/2010 | US7704645 Method of generating writing pattern data of mask and method of writing mask |
| 04/27/2010 | US7704590 Printing form having a plurality of planar functional zones |
| 04/27/2010 | US7704432 Imprint lithographic method for making a polymeric structure |
| 04/27/2010 | CA2370911C Method of producing phase mask for processing optical fiber and optical fiber with bragg diffraction grating fabricated by using the optical fiber-processing phase mask |
| 04/22/2010 | WO2010045140A1 Composition, process of preparation and method of application and exposure for light imaging paper |
| 04/22/2010 | WO2010045137A1 Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light |
| 04/22/2010 | WO2010044948A1 Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography |
| 04/22/2010 | WO2010044946A1 Method and apparatus for determining a photolithography process model which models the influence of topography variations |
| 04/22/2010 | WO2010044858A1 Fluid dispense system coating |
| 04/22/2010 | WO2010044756A2 Mold imprinting |
| 04/22/2010 | WO2010044400A1 Thermally reactive resist material, laminated body for thermal lithography using the material, and mold manufacturing method using the material and the laminated body |
| 04/22/2010 | WO2010044381A1 Phenolic hydroxyl group-containing polyimide resin and photosensitive resin composition using same |
| 04/22/2010 | WO2010044372A1 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same |
| 04/22/2010 | WO2010044307A1 Illumination optical system, aligner, and process for fabricating device |
| 04/22/2010 | WO2010044275A1 Positive-type photosensitive resin composition, cured film, protective film, insulating film and semiconductor device or display device utilizing the cured film, the protective film or the insulating film, and method for forming resist film |
| 04/22/2010 | WO2010044268A1 Exposure apparatus and method for the assembly of the same, and device manufacturing method |
| 04/22/2010 | WO2010044267A1 Moving body apparatus, exposure apparatus, device manufacturing method, assembling method and maintaining method for moving body apparatus, and adjusting method, maintaining method, and assembling method for exposure apparatus |
| 04/22/2010 | WO2010044244A1 Curable resin composition and reflective sheet |
| 04/22/2010 | WO2010043946A2 Bottom antireflective coating compositions |
| 04/22/2010 | WO2010043559A1 Improvements for rapid prototyping apparatus |
| 04/22/2010 | WO2010043463A1 System and resin for rapid prototyping |
| 04/22/2010 | WO2010043398A1 Euv lithography device and method for processing an optical element |
| 04/22/2010 | WO2010043288A1 Collector assembly, radiation source, lithographic appparatus and device manufacturing method |
| 04/22/2010 | WO2010025031A3 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 04/22/2010 | WO2010017952A3 Low-contamination optical arrangement |
| 04/22/2010 | WO2010009807A8 Actuator and projection exposure system |
| 04/22/2010 | WO2010002194A3 Stripping agent and method for manufacturing a display panel using the stripping agent |
| 04/22/2010 | US20100099836 Process for producing photoresist polymeric compounds |
| 04/22/2010 | US20100099580 Photochemical methods and photoactive compounds for modifying surfaces |
| 04/22/2010 | US20100099051 Multi-focus method of enhanced three-dimensional exposure of resist |
| 04/22/2010 | US20100099050 Liquid recovery apparatus, exposure apparatus, and device manufacturing method |
| 04/22/2010 | US20100099049 Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device |
| 04/22/2010 | US20100099048 Stop Flow Interference Lithography System |
| 04/22/2010 | US20100099047 Manufacture of drop dispense apparatus |
| 04/22/2010 | US20100099046 Method for manufacturing semiconductor device |
| 04/22/2010 | US20100099045 Methods for performing photolithography using barcs having graded optical properties |
| 04/22/2010 | US20100099044 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film |
| 04/22/2010 | US20100099042 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process |
| 04/22/2010 | US20100099041 Positive-type photosensitive resin composition |
| 04/22/2010 | US20100099036 Pattern forming method and method of manufacturing semiconductor device |
| 04/22/2010 | US20100099035 Method of iterative compensation for non-linear effects in three-dimensional exposure of resist |
| 04/22/2010 | US20100099034 Method of compensation for bleaching of resist during three-dimensional exposure of resist |
| 04/22/2010 | US20100099033 Method and system for measuring in patterned structures |
| 04/22/2010 | US20100098966 Process for preparing nanogap electrode and nanogap device using the same |
| 04/22/2010 | US20100098857 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 04/22/2010 | US20100096663 Photosensitive resin and process for producing microlens |
| 04/22/2010 | DE102009033823A1 Semiconductor component i.e. computer chip, producing method, involves providing substrate in distance from optical element, where distance between substrate and element corresponds to wavelength of optical radiation during exposure process |
| 04/22/2010 | DE102008042463B3 Optische Messvorrichtung für eine Projektionsbelichtungsanlage Optical measuring device for a projection exposure apparatus |
| 04/22/2010 | DE102008021833B4 Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld Method for setting an illumination angle distribution and at the same intensity distribution over an imaged object field in an image field |
| 04/22/2010 | DE102007009265B4 Verfahren und Vorrichtung zur photolithographischen Strukturierung in der Halbleitertechnologie Method and apparatus for photolithographic structuring in the semiconductor technology |
| 04/22/2010 | DE102005036256B4 Belichtungsvorrichtung mit der Fähigkeit zum räumlichen Vorgeben der Lichtpolarisation und Verfahren zum Herstellen einer Halbleitervorrichtung mit der Belichtungsvorrichtung An exposure apparatus having the capability of specifying the spatial light polarization and method of manufacturing a semiconductor device comprising the exposure apparatus |
| 04/22/2010 | DE102005024348B4 Verfahren zur photolithographischen Strukturierung einer Vielzahl von Belichtungsfeldern Method for photolithographic patterning of a plurality of exposure fields |
| 04/22/2010 | DE102004047263B4 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 04/22/2010 | CA2740922A1 System and resin for rapid prototyping |
| 04/22/2010 | CA2740695A1 Composition, process of preparation and method of application and exposure for light imaging paper |
| 04/22/2010 | CA2740694A1 Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light |
| 04/22/2010 | CA2734969A1 Improvements for rapid prototyping apparatus |
| 04/21/2010 | EP2178352A2 Method and apparatus for accurately applying structures to a substrate |
| 04/21/2010 | EP2178107A1 Lighting optical apparatus, photolithography equipment and device manufacturing method |
| 04/21/2010 | EP2177952A1 Positive working resist composition and method for pattern formation using the positive working resist composition |
| 04/21/2010 | EP2177951A1 Method, system, holder and assembly for transferring templates during imprint lithography processes |
| 04/21/2010 | EP2177950A1 Replication and transfer of microstructures and nanostructures |
| 04/21/2010 | EP2177934A1 High transmission, high aperture catadioptric projection objective and projection exposure apparatus |
| 04/21/2010 | EP2177867A1 Measurement method, stage apparatus, and exposure apparatus |
| 04/21/2010 | EP2177506A1 Positive resist composition, pattern forming method using the composition, and compound used in the composition |
| 04/21/2010 | EP2177261A2 Apparatus for Fabricating and Optically Detecting Biochip |
| 04/21/2010 | EP2176710A1 A double exposure semiconductor process for improved process margin |
| 04/21/2010 | EP2176709A1 Imprint method and processing method of substrate using the imprint method |
| 04/21/2010 | EP2176073A1 Method of pre-exposing relief image printing plate |
| 04/21/2010 | EP1636654B1 Method for providing a confined liquid for immersion lithography |
| 04/21/2010 | EP1461826B1 Non-contact air cuhion support platform |
| 04/21/2010 | EP1256032B1 Liquid, radiation-curable composition, especially for stereolithography |
| 04/21/2010 | EP1066506B1 Method and apparatus for synthesis of arrays of dna probes |
| 04/21/2010 | CN201440065U Dual-frequency laser interference signal receiver |
| 04/21/2010 | CN1991582B Component of negative photosensitive gap control material and method for forming same |
| 04/21/2010 | CN1981236B Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing |
| 04/21/2010 | CN1957299B Radiation-sensitive composition, multilayer body and method for producing same, and electronic component |
| 04/21/2010 | CN1826216B Viscosity reducible radiation curable resin composition |
| 04/21/2010 | CN1734351B Photosensitive resin composition for isolator |
| 04/21/2010 | CN1732408B 辐射敏感性树脂组合物 The radiation-sensitive resin composition of the |
| 04/21/2010 | CN1672242B Light conducting device |
| 04/21/2010 | CN1664703B A polarizing pupil device and use in projection photo-etching system |
| 04/21/2010 | CN1650401B Exposure method, exposure apparatus, and method for manufacturing device |
| 04/21/2010 | CN1645253B Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board |
| 04/21/2010 | CN1601244B Focus detecting unit, and refractive index measuring apparatus and non-contact thermometer using the same |
| 04/21/2010 | CN1550938B Recording material for holograms, manufacturing method thereof, recording medium for holograms, hologram recording method and hologram reproduction method |
| 04/21/2010 | CN1501170B Lithographic apparatus and device manufacturing method |
| 04/21/2010 | CN1497345B Photosensitive thermosetting pastel composition and fired article pattern used by it |
| 04/21/2010 | CN101697337A Low-silver photosensitive silver paste for PDP site selection electrodes, and preparation method thereof |
| 04/21/2010 | CN101697065A Development device and developing method |