| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/29/2010 | WO2010047340A1 Resist pattern coating agent and resist pattern forming method using same |
| 04/29/2010 | WO2010047271A1 Polyamide resin and composition thereof |
| 04/29/2010 | WO2010047264A1 Positive photosensitive resin composition for spray coating and method for producing through electrode using same |
| 04/29/2010 | WO2010047248A1 Positive photosensitive composition and permanent resist |
| 04/29/2010 | WO2010047196A1 Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate |
| 04/29/2010 | WO2010047138A1 Photosensitive resin composition, method for forming silica coating film, and apparatus and member each comprising silica coating film |
| 04/29/2010 | WO2010047018A1 Resist material and pattern forming method using the same |
| 04/29/2010 | WO2010046678A1 Method and apparatus for the formation of an electronic device |
| 04/29/2010 | WO2010046410A2 Method of compensation for bleaching of resist during three-dimensional exposure of resist |
| 04/29/2010 | WO2010046408A2 Method of iterative compensation for non-linear effects in three-dimensional exposure of resist |
| 04/29/2010 | WO2010046407A2 Multi-focus method of enhanced three-dimensional exposure of resist |
| 04/29/2010 | WO2010046384A1 A lithographic printing plate |
| 04/29/2010 | WO2010046240A1 Sulfonium derivatives and the use therof as latent acids |
| 04/29/2010 | WO2010046066A1 Composition for producing optical elements having gradient structure |
| 04/29/2010 | WO2010025060A3 Method for design and manufacture of a reticle using variable shaped beam lithography |
| 04/29/2010 | WO2010024988A3 Methods of forming a photoresist-comprising pattern on a substrate |
| 04/29/2010 | WO2010009323A3 Phase mask and method of fabrication |
| 04/29/2010 | US20100107285 Tunable bio-functionalized nanoelectromechanical systems having superhydrophobic surfaces for use in fluids |
| 04/29/2010 | US20100105594 such as 1,2,3,4,5,6-hexakis-O-[3-(hydroxyamino)-3-iminopropyl hexitol; low trace metal impurities; for semiconductors, integrated circuits, electronics |
| 04/29/2010 | US20100105213 Forming method of amorphous carbon film, amorphous carbon film, multilayer resist film, manufacturing method of semiconductor device, and computer-readable storage medium |
| 04/29/2010 | US20100105206 Method for manufacturing semiconductor device |
| 04/29/2010 | US20100104988 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
| 04/29/2010 | US20100104987 Composition for antireflection film formation and method for resist pattern formation using the composition |
| 04/29/2010 | US20100104986 Method for forming pattern |
| 04/29/2010 | US20100104985 Compound for photoresist, photoresist liquid, and etching method using the same |
| 04/29/2010 | US20100104984 Method of manufacturing semiconductor device |
| 04/29/2010 | US20100104983 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 04/29/2010 | US20100104982 Printing resist, method for preparing the same and patterning method using the same |
| 04/29/2010 | US20100104981 Colored dispersion, photoresist composition and black matrix |
| 04/29/2010 | US20100104980 Lithographic printing plate precursor |
| 04/29/2010 | US20100104979 Alpha-hydroxyketones |
| 04/29/2010 | US20100104978 Composition for antireflection film formation and method of forming resist pattern with the same |
| 04/29/2010 | US20100104977 Photoresist undercoat-forming material and patterning process |
| 04/29/2010 | US20100104976 Oxime derivative, photopolymerizable composition, color filter, and process for producing the same |
| 04/29/2010 | US20100104975 Use of Blended Solvents in Defectivity Prevention |
| 04/29/2010 | US20100104974 Positive resist composition and pattern forming method |
| 04/29/2010 | US20100104973 Compound, acid generator, resist composition, and method of forming resist pattern |
| 04/29/2010 | US20100104972 Resist composition and method of forming resist pattern |
| 04/29/2010 | US20100104962 Patterning method, exposure system, computer readable storage medium, and method of manufacturing device |
| 04/29/2010 | US20100104961 Particle Beam Writing Method, Particle Beam Writing Apparatus and Maintenance Method for Same |
| 04/29/2010 | US20100104960 Exposure apparatus |
| 04/29/2010 | US20100104959 Lithographic method, apparatus and controller |
| 04/29/2010 | US20100104958 Photosensitive Resin Composition for Color Filter and Color Filter Prepared Using the Same |
| 04/29/2010 | US20100104955 Mask blank substrate manufacturing method, reflective mask blank manufacturing method, and mask blank substrate |
| 04/29/2010 | US20100104952 Method of producing volume hologram laminate |
| 04/29/2010 | US20100104829 Process for thick film circuit patterning |
| 04/29/2010 | US20100104827 Photosensitive resin composition |
| 04/29/2010 | US20100104254 Composition for optical waveguide, preparation method for the composition, optical waveguide produced by using the composition, and optical waveguide manufacturing method |
| 04/29/2010 | US20100104173 Method And Apparatus For Inspecting A Pattern Formed On A Substrate |
| 04/29/2010 | US20100103433 Differential critical dimension and overlay metrology apparatus and measurement method |
| 04/29/2010 | US20100103401 Method and device for forming poly-silicon film |
| 04/29/2010 | US20100103396 Exposure apparatus and device fabrication method |
| 04/29/2010 | US20100102413 Lithographic apparatus, device manufacturing method and position control method |
| 04/29/2010 | US20100102321 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film |
| 04/29/2010 | US20100101956 Nanoscale dna detection system using species-specific and/or disease- specific probes for rapid identification |
| 04/29/2010 | DE10331033B4 Herstellungsverfahren einer Halbleitervorrichtung und Reinigungszusammensetzung dafür Manufacturing method of a semiconductor device and cleaning composition therefor |
| 04/29/2010 | DE102009045008A1 EUV-Lithographievorrichtung und Verfahren zum Bearbeiten einer Maske EUV lithography apparatus and method for processing a mask |
| 04/29/2010 | DE102009009568A1 Optical assembly for use in microlithography projection exposure system of microchip, has supporting structure connected to mirror body via heat conducting section designed to discharge thermal power density of preset value to structure |
| 04/29/2010 | DE102008036573B3 Optical device, has support structures for supporting optical elements, and trapezoidal shaped housing substantially surrounding optical elements with sealing material, where support structures are fixed in penetration point |
| 04/29/2010 | DE102008031650B4 Anordnung zur Debrisunterdrückung in einer plasmabasierten Strahlungsquelle zur Erzeugung kurzwelliger Strahlung Arrangement for Debrisunterdrückung in a plasma-based radiation source for generating short-wave radiation |
| 04/28/2010 | EP2180309A2 Method and apparatus for synthesis of arrays of DNA probes |
| 04/28/2010 | EP2179416A1 Scanned writing of an exposure pattern on a substrate |
| 04/28/2010 | EP2179330A1 Illumination optical system, exposure apparatus, and device manufacturing method |
| 04/28/2010 | EP2179329A1 Illumination optical system, exposure apparatus, and device manufacturing method |
| 04/28/2010 | EP2179328A1 Method and apparatus for measuring scattered light on an optical system |
| 04/28/2010 | EP2179327A1 Lithography system, method of clamping and wafer table |
| 04/28/2010 | EP1802694B1 Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions |
| 04/28/2010 | EP1334330B1 Position measuring device and method for determining a position |
| 04/28/2010 | CN201444234U Hanging Diazo film developing device |
| 04/28/2010 | CN201444233U Vacuum developing mechanism |
| 04/28/2010 | CN1885159B Method for eliminating graphic defects of semiconductor wafer edge region |
| 04/28/2010 | CN1860585B Liquid immersion type lens system and projection exposure device |
| 04/28/2010 | CN1809788B Use of spin-on, photopatternable, interplayer dielectric materials and intermediate semiconductor device structure utilizing the same |
| 04/28/2010 | CN1761913B Method of manufacturing mask blank |
| 04/28/2010 | CN1716091B Transfer printing device and method for micro-nano structure pattern |
| 04/28/2010 | CN1690851B Chemical amplification positive photoresist compositions, (methyl) acrylate derivatives and method for preparing same |
| 04/28/2010 | CN1680863B Liquid crystal display and fabricating method thereof |
| 04/28/2010 | CN1645259B Photoresist residue remover composition and manufacture of semiconductor circuit components |
| 04/28/2010 | CN1641482B Lithographic apparatus and device manufacturing method |
| 04/28/2010 | CN1637540B Thin film layout method and method and equipment for producing flat display device |
| 04/28/2010 | CN1614513B Lithographic apparatus and device manufacturing method |
| 04/28/2010 | CN1614512B Lithographic apparatus and device manufacturing method |
| 04/28/2010 | CN1573471B Method and apparatus of manufacturing reflector |
| 04/28/2010 | CN1552000B Removable optical pellicle |
| 04/28/2010 | CN1550891B 着色光敏树脂组合物 The colored photosensitive resin composition |
| 04/28/2010 | CN1530746B Design change-over method and apparatus based on model by doublet illumination |
| 04/28/2010 | CN1508010B Printing plate and method for changing its moisture characteristic |
| 04/28/2010 | CN1479175B Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 04/28/2010 | CN1450394B Optical alignment method and liquid crystal display element |
| 04/28/2010 | CN101699352A Method for removing sulfate radicals from photomask |
| 04/28/2010 | CN101699351A Solder resist composition and printing circuit board formed thereby |
| 04/28/2010 | CN101699350A Gold foil composite paper hot pressing process |
| 04/28/2010 | CN101699336A Liquid crystal display device and manufacturing method thereof |
| 04/28/2010 | CN101699324A Device for producing triangular fiber grating |
| 04/28/2010 | CN101698368A Method capable of improving adhesive force of mask film of micropore-connected silk-screen printing plate |
| 04/27/2010 | US7706058 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 04/27/2010 | US7704684 Methods and devices for fabricating three-dimensional nanoscale structures |
| 04/27/2010 | US7704683 applying masking comprising resist layer on surface of substrate, depositing optical filter layer on surface and resist layer by vacuum deposition, and removing resist layer with portion of optical filter layer thereon from surface; simplification |
| 04/27/2010 | US7704682 Heating; diffusion impurities from core to cladding; adjust refractive index; applying ultraviolet raduiation; masking; diffraction, interference |
| 04/27/2010 | US7704680 Double exposure technology using high etching selectivity |