Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2010
05/05/2010EP2182412A1 Radiation source and lithographic apparatus
05/05/2010EP2182411A1 Method for preparing a printing form from a photopolymerizable element
05/05/2010EP2182410A1 Photosensitive resin composition, cured photosensitive resin product, photosensitive resin film, cured photosensitive resin film product, and optical waveguide produced by using those products
05/05/2010EP2182396A1 Resin black matrix, light blocking photosensitive resin composition, tft element substrate and liquid crystal display device
05/05/2010EP2181824A1 Herstellungsverfahren eines Werkzeugs für Werkstücke aus nanostrukturierten Polymermaterialien
05/05/2010EP2181449A1 System managing gas flow between chambers of an extreme ultraviolet (euv) photolithography apparatus
05/05/2010EP2181360A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method
05/05/2010EP2181357A1 Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
05/05/2010EP2181166A2 Underlayer coating composition based on a crosslinkable polymer
05/05/2010EP1735820B1 Fabrication and use of superlattice
05/05/2010EP1632953B1 Supporting unit, and moving table device and linear-motion guiding device using the supporting unit
05/05/2010EP1481288B1 Reduced striae extreme ultraviolet lithographic elements and a method of manufacturing the same
05/05/2010CN201449984U Metal halogen exposure lamp
05/05/2010CN201449516U Mould for silicon slice dual-surface lithography
05/05/2010CN201449515U 同步升降系统 Synchronous lifting system
05/05/2010CN1997943B Vacuum system for immersion photolithography
05/05/2010CN1981237B Photocurable/thermosetting resin composition, dry film using same, and cured product thereof
05/05/2010CN1973244B Levenson type phase shift mask and production method therefor
05/05/2010CN1906542B Apparatus and method for thermally developing flexographic printing elements
05/05/2010CN1892420B Mask for continuously transverse solidifying technology and method for forming polycrystal silicon layer
05/05/2010CN1829945B Modulator circuit
05/05/2010CN1811599B System and method for forming patterns on basis material
05/05/2010CN1790170B Lithographic apparatus, analyser plate, subassembly, method of measuring parameters and patterning device
05/05/2010CN1782869B Thermal detector of contracted photolithographic mask
05/05/2010CN1782867B Reticle and method of fabricating semiconductor device
05/05/2010CN1773379B Lithographic apparatus and device manufacturing method
05/05/2010CN1769073B Laser direct writing anti-counterfeit label
05/05/2010CN1761549B System and method for cutting using a variable astigmatic focal beam spot
05/05/2010CN1755524B Phototonus thermosetting resin composition and printing plug board coating with resist and its manufacturing method
05/05/2010CN1743965B Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method
05/05/2010CN1737680B Advanced oriented assist features for integrated circuit hole patterns
05/05/2010CN1721998B Lithographic apparatus and device manufacturing method
05/05/2010CN1721989B Photoresist composition
05/05/2010CN1720484B Positive type photoresist composition for LCD production and method of forming resist pattern
05/05/2010CN1702562B Image recording apparatus and method for use therewith
05/05/2010CN1678961B Removing solution
05/05/2010CN1653388B Patterning semiconductor layers using phase shifting and assist features
05/05/2010CN1643452B Controlling of photolithography overlay incorporating feedforward overlay information
05/05/2010CN1577099B Method and apparatus of simultaneous optimization for NA-sigma exposure settings and scattering bars OPC using a device layout
05/05/2010CN1552589B Continuous microlens array amplifying displaying antifogery method
05/05/2010CN1525249B Polymerizable composition and lithographic printing plate precursor
05/05/2010CN1517795B 光敏性树脂组合物 The photosensitive resin composition of the
05/05/2010CN101702079A Method for accurately determining height of space image
05/05/2010CN101702078A Lithographic apparatus and method for calibrating the same
05/05/2010CN101702077A Method for improving filling and reducing defective gum by applying photoresist shaping in concave die hot coining
05/05/2010CN101702051A Lens tilt micro-adjusting mechanism in projection lithography objective lens
05/05/2010CN101701928A Gas-sensitive transducer with nano wall structure and preparation method thereof
05/05/2010CN101701776A Condensing recovery device and process device provided with same
05/05/2010CN101700992A Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
05/05/2010CN101700825A Pressure adjustment mechanism for conveying shaft
05/05/2010CN101095213B Exposure apparatus and device manufacturing method
05/05/2010CN101073038B Method for forming anti-reflective coating
05/05/2010CN101057182B Method for thermally processing photosensitive printing sleeves
05/05/2010CN101044593B Exposure apparatus, exposure method, and component producing method
05/05/2010CN101002299B Exposing device and component manufacturing method
05/04/2010USRE41307 Mask for clamping apparatus, e.g. for a lithographic apparatus
05/04/2010US7712071 Printing a mask with maximum possible process window through adjustment of the source distribution
05/04/2010US7710634 Pattern generator
05/04/2010US7710544 Optimized polarization illumination
05/04/2010US7710542 Imaging device in a projection exposure machine
05/04/2010US7710541 Lithographic apparatus and device manufacturing method
05/04/2010US7709768 System and method for cutting using a variable astigmatic focal beam spot
05/04/2010US7709766 System and method for manufacturing embedded conformal electronics
05/04/2010US7709548 Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product
05/04/2010US7709383 Film forming method, and substrate-processing apparatus
05/04/2010US7709187 High resolution imaging process using an in-situ image modifying layer
05/04/2010US7709186 Exposing photoresist film of semiconductor wherein wafer is sequentially shifted by predetermined distance so that exposed regions before and after shifts have overlapping region having an area larger than or equal to that of die pattern to prevent defects on exposure mask from being transcribed to film
05/04/2010US7709185 Method for imaging a lithographic printing form
05/04/2010US7709184 Printing plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution; deactivation of texposed plate allows handling of plate under regular office light or any other light without causing the hardening of the non-exposed areas of photosensitive layer
05/04/2010US7709183 using a liquid-state photosensitive resin in manufacturing of a printing form plate for forming a relief image for flexo printing by laser carving, forming a pattern for surface working such as embossing, selectively applying an infrared laser beam to an original form plate suited to form a relief image
05/04/2010US7709182 excellent in the items including the resolution, developability, pattern profile, and coatability of the resist; copolymer of e.g. acrylamido-2-methylpropanesulfonic acid, 2,2,3,3,3-pentafluoropropyl acrylate, and methyl methacrylate
05/04/2010US7709180 A pellicle for use in semiconductor lithography, comprising a radiation transparent, cross-linked polytetrefluoroethylene film; cost efficient
05/04/2010US7709179 Forming a resist pattern from which a desirable pattern shape can be obtained in spite of thickness of the film; using ansulfonium thiazole or thiophene ring with a perfluorosulfonate anion as acid generator; copolymerizing monomer of fluorinated acrylic ester of a norbornane
05/04/2010US7709178 Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance
05/04/2010US7709177 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
05/04/2010US7709166 Measuring the effect of flare on line width
05/04/2010US7709165 Image enhancement for multiple exposure beams
05/04/2010US7709164 Solvent-less process for producing transient documents
05/04/2010US7709162 Photosensitive composition, color filter, and its production method
05/04/2010US7709159 Mask, mask forming method, pattern forming method, and wiring pattern forming method
05/04/2010US7708926 Capillary imprinting technique
05/04/2010US7708914 Method of and apparatus for producing micro lens and micro lens
05/04/2010US7708880 Chemical liquid supply apparatus and a chemical liquid supply method
05/04/2010US7708542 Device for holding a template for use in imprint lithography
05/04/2010CA2472615C Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
05/04/2010CA2384889C Temporary bridge for micro machined structures
04/2010
04/29/2010WO2010048312A1 Methods for performing photolithography using barcs having graded optical properties
04/29/2010WO2010047837A2 Strain and kinetics control during separation phase of imprint process
04/29/2010WO2010047833A2 Fluid transport and dispensing
04/29/2010WO2010047821A1 Fabrication of high-throughput nano-imprint lithography templates
04/29/2010WO2010047790A2 Fluid dispense device calibration
04/29/2010WO2010047789A2 Double sidewall angle nano-imprint template
04/29/2010WO2010047770A1 Nano-imprint lithogaphy stack with enhanced adhesion between layers
04/29/2010WO2010047769A1 Reduction of stress during template separation
04/29/2010WO2010047766A1 Drop pattern generation with edge weighting
04/29/2010WO2010047759A1 Drop deposition device for imprint lithography
04/29/2010WO2010047758A1 Robust optimization to generate drop patterns in imprint lithography
04/29/2010WO2010047755A2 Gas environment for imprint lithography
04/29/2010WO2010047362A1 Exposure apparatus and photomask
04/29/2010WO2010047346A1 Underlayer film for image formation
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