Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2010
05/12/2010CN1573543B Photosensitive metal nanoparticle and method of forming conductive pattern using the same
05/12/2010CN1550895B Negative type photosensitive resin composition containing a phenol-biphenylene resin
05/12/2010CN1532566B Radiation sensitive composition for color filter
05/12/2010CN101706639A Radiation curable resin composition and rapid prototyping process using the same
05/12/2010CN101706638A Ultraviolet nanoimprint resist and components thereof
05/12/2010CN101706592A Method for manufacturing Moire grating by directly copying metal mother set
05/12/2010CN101704410A Nano superhydrophobic surface used for airplane antifreezing and deicing and preparation method thereof
05/12/2010CN101210979B Photon crystal tunable filter and its manufacture method
05/12/2010CN101206992B Even glue developing process capable of economizing time and equipment improved structure
05/12/2010CN101192004B Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method
05/12/2010CN101169589B Method for manufacturing light guide plate cavity
05/12/2010CN101162313B Method for making cholesterin liquid crystal display device and products thereof
05/12/2010CN101130596B Colophony diacid ester aldehyde acetal polyalcohol, synthesis method and uses of the same
05/12/2010CN101126876B Thin-film transistor LCD pixel structure and its making method
05/12/2010CN101111392B Original film for lithographic printing plate and lithographic printing method
05/12/2010CN101109903B Method for on-line monitoring lens astigmatism
05/12/2010CN101086622B Method for using inverse scattering belt
05/12/2010CN101071217B Liquid crystal display fabrication method
05/12/2010CN101048372B Thiol compound, and photosensitive composition and black matrix resist composition using the compound
05/12/2010CN101044594B Substrate processing method, exposure apparatus, and method for producing device
05/11/2010US7716628 System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects
05/11/2010US7715641 Graphics engine for high precision lithography
05/11/2010US7714983 Illumination system for a microlithography projection exposure installation
05/11/2010US7714079 Ultra-large scale integrated (ULSI); film stack; hydrosilation
05/11/2010US7714033 Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same
05/11/2010US7713841 Methods for thinning semiconductor substrates that employ support structures formed on the substrates
05/11/2010US7713706 having a photoreactive compound bonded to a surface, evaporating the solution containing a low-molecular compound to dryness, in the state of being in contact with the solid-phase support, and irradiating the solid-phase support with light to form a covalent bond between the two compounds
05/11/2010US7713685 Exposure system and pattern formation method
05/11/2010US7713683 Apparatus and method for making a forming structure
05/11/2010US7713682 photolithography for exposing semiconductor substrates; double exposure for enhancing the image resolution; controlling the lithographic exposure apparatus and spin-coat device
05/11/2010US7713681 Method for preparation of lithographic printing plate
05/11/2010US7713680 Heat resistance, storage stability as composition; terpolymer containing acid or anhydride units, epoxy units, an unsaturated acid monomer, a polyfunctional unsaturated compound, and a photopolymerization initiator
05/11/2010US7713679 sulfonium compound containing sulfonate anions as an acid generator (tri(4-methylphenyl)sulfonium trifluoromethanesulfonate); exhibits changed solubility in an alkali developing solution under action of acid; a methacrylate resin containing an acid dissociable, dissolution inhibiting group
05/11/2010US7713677 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
05/11/2010US7713664 Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate
05/11/2010US7713663 provides mask blank capable of suppressing deformation of transfer mask when transfer mask is mounted on substrate holding member of an exposure device, suppressing lowering of the positional accuracy of transfer pattern to minimum, and suppressing the lowering of focus accuracy to minimum
05/11/2010US7712905 Imaging system with mirror group
05/06/2010WO2010051408A1 Method for preparing a printing form from a photopolymerizable element
05/06/2010WO2010051286A2 Photolithographic reticles with electrostatic discharge protection structures
05/06/2010WO2010051024A1 Facilitating adhesion between substrate and patterned layer
05/06/2010WO2010051023A1 Master template replication
05/06/2010WO2010051015A1 Optical system for use in stage control
05/06/2010WO2010050614A1 Composition for imprints, pattern and patterning method
05/06/2010WO2010050592A1 Phenol resin for photoresist, photoresist composition containing same, and method for producing same
05/06/2010WO2010050357A1 Photosensitive insulating resin composition and cured product thereof
05/06/2010WO2010050272A1 Photosensitive resin composition and method for producing photosensitive resin used therein
05/06/2010WO2010050240A1 Exposure device, exposure method, and device manufacturing method
05/06/2010WO2010049348A2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
05/06/2010WO2010049076A2 Optical module for guiding a radiation beam
05/06/2010WO2010049020A1 Illuminating optic for euv microlithography
05/06/2010WO2010048988A1 Composite stamp for embossing
05/06/2010WO2010030018A3 Pattern forming method and device production method
05/06/2010WO2010017184A3 Dendrimer hydrogels
05/06/2010WO2010017160A3 Environmentally friendly polymer stripping compositions
05/06/2010WO2008115372A8 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
05/06/2010US20100112809 Multilevel imprint lithography
05/06/2010US20100112497 Image forming method
05/06/2010US20100112496 Patterning method
05/06/2010US20100112495 Photoresist stripping solution and a method of stripping photoresists using the same
05/06/2010US20100112494 Apparatus and method for measuring the outgassing and euv lithography apparatus
05/06/2010US20100112493 Method for Producing a Plurality of Regularly Arranged Nanoconnections on a Substrate
05/06/2010US20100112492 Fabrication of a high fill ratio silicon spatial light modulator
05/06/2010US20100112491 Method for manufacturing optical disc master and method for manufacturing optical disc
05/06/2010US20100112490 Optical Diffusers, Photomasks and their Methods of Fabrication
05/06/2010US20100112489 Efficient pitch multiplication process
05/06/2010US20100112488 Method for forming microlens of image sensor and method for manufacturing the image sensor
05/06/2010US20100112487 Manufacturing a narrow track read head
05/06/2010US20100112486 Method and system for providing a perpendicular magnetic recording head
05/06/2010US20100112485 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
05/06/2010US20100112484 Method for preparing a printing form from a photopolymerizable element
05/06/2010US20100112483 System and method for self-aligned dual patterning
05/06/2010US20100112482 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
05/06/2010US20100112481 Photosensitive element
05/06/2010US20100112480 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
05/06/2010US20100112479 Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same
05/06/2010US20100112478 Water-developable photosensitive lithographic printing plate material
05/06/2010US20100112477 Positive resist composition and pattern forming method
05/06/2010US20100112476 A lithographic printing plate precursor
05/06/2010US20100112475 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method
05/06/2010US20100112474 Photosensitive composition, photosensitive film, method for forming a permanent pattern, and printed board
05/06/2010US20100112469 Exposure apparatus and device manufacturing method
05/06/2010US20100112468 Self-correcting substrate support system for focus control in exposure systems
05/06/2010US20100112466 Optical masks and methods for measuring aberration of a beam
05/06/2010US20100112465 Optical arrangement for three-dimensionally patterning a material layer
05/06/2010US20100112464 Defect correction method for euv mask
05/06/2010US20100112463 Method for forming fine contact hole pattern of semiconductor device
05/06/2010US20100112458 Photopolymerisable composition
05/06/2010US20100112311 Structure for pattern formation, method for pattern formation, and application thereof
05/06/2010US20100112299 Process for producing photosensitive resin printing plate having concave-convex shape and relief printing plate, and plate surface treatment solution for use in the process
05/06/2010US20100110424 Nano structured sensing device for surface-enhanced raman scattering
05/06/2010US20100110406 Exposure apparatus, method of controlling the same, and device manufacturing method
05/06/2010US20100110242 Anthraquinone dye containing material, composition including the same, camera including the same, and associated methods
05/06/2010US20100109195 Release agent partition control in imprint lithography
05/06/2010US20100108866 Color filter arrays and image sensors using the same
05/06/2010US20100108865 Substrate for detecting samples, bio-chip employing the substrate, method of fabricating the substrate for detecting samples, and apparatus for detecting bio-material
05/06/2010US20100108652 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology
05/06/2010DE102009033223A1 Beleuchtungsoptik für die EUV-Mikrolithographie Illumination optics for EUV microlithography
05/06/2010DE102008053954A1 Fokuskorrektur in Lithographieanlagen mittels Linsenaberrationssteuerung Focus correction in lithography equipment using Linsenaberrationssteuerung
05/06/2010DE102008043324A1 Optische Anordnung zur dreidimensionalen Strukturierung einer Materialschicht Optical arrangement for three-dimensional structure of a material layer
05/06/2010DE10062660B4 Verfahren zur Herstellung einer Siliciumoxynitrid-ARC-Schicht über einer Halbleiterstruktur A method for producing a silicon oxynitride ARC layer over a semiconductor structure
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