Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2010
05/18/2010US7718342 acrylic ester polymers; photomasks; high resolution and improved in line edge roughness and bias
05/18/2010US7718341 Laser induced thermal imaging apparatus and manufacturing method of organic light emitting diode using the same
05/18/2010US7718325 Photochromic material, inkless reimageable printing paper, and methods
05/18/2010US7718255 Cleaning sheets and method of cleaning with the same
05/18/2010US7718127 Microfluidic chip
05/18/2010US7718111 curing composition of a cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound, a cationic photoinitiator, and a free radical photoinitiator; epoxy-containing compounds are the cationically curable groups
05/18/2010US7717693 Modified metal mold for use in imprinting processes
05/14/2010WO2010054350A1 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
05/14/2010WO2010053635A1 Apparatus and method for thermally developing flexographic printing elements
05/14/2010WO2010053558A2 Release agent partition control in imprint lithography
05/14/2010WO2010053536A2 Substrate alignment
05/14/2010WO2010053519A2 Alignment for edge field nano-imprinting
05/14/2010WO2010053207A1 Photosensitive resin composition, photosensitive adhesive film, and light-receiving device
05/14/2010WO2010053125A1 Film-forming apparatus, film-forming method and semiconductor device
05/14/2010WO2010052882A1 Photosensitive resin composition and base
05/14/2010WO2010052811A1 Photocurable resin composition, dry film and cured product of the photocurable resin composition, and printed wiring board using the photocurable resin composition, the dry film, and the cured product
05/14/2010WO2010052098A1 Scatterometer and lithographic apparatus
05/14/2010WO2010051689A1 Rinse solution for removing thick film resist
05/14/2010WO2010025061A3 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
05/14/2010WO2010015296A3 Transmitting optical element consisting of magnesium-aluminium spinel
05/13/2010US20100121627 Method and system for measuring patterned structures
05/13/2010US20100120209 Etchant composition, and method of fabricating metal pattern and thin film transistor array panel using the same
05/13/2010US20100119982 Etching method and manufacturing method of semiconductor device
05/13/2010US20100119981 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
05/13/2010US20100119980 Antireflective Coating Composition Comprising Fused Aromatic Rings
05/13/2010US20100119979 Antireflective Coating Composition Comprising Fused Aromatic Rings
05/13/2010US20100119978 Apparatus and Method for Thermally Developing Flexographic Printing Elements
05/13/2010US20100119977 Photosensitive resin composition and laminate
05/13/2010US20100119976 Composition for radical polymerization and method of forming pattern using the composition
05/13/2010US20100119974 Resist composition, method of forming resist pattern, novel compound, and acid generator
05/13/2010US20100119973 Positive photosensitive resin composition and cured film forming method using the same
05/13/2010US20100119972 Coating composition
05/13/2010US20100119971 Resist ink and method of forming pattern using the same
05/13/2010US20100119970 Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
05/13/2010US20100119969 Positive photosensitive resin composition and dpolyhydroxyamide resin
05/13/2010US20100119961 Methods and system for lithography calibration
05/13/2010US20100119960 Dual Tone Development Processes
05/13/2010US20100119959 Pigment-dispersed composition, curable composition, and color filter and production method thereof
05/13/2010US20100119957 Volume holographic data recording media
05/13/2010US20100119835 Photocurable compositions for preparing abs-like articles
05/13/2010US20100119763 Production method for optical disc master, optical disc master, stamper, and optical disc
05/13/2010US20100119711 Polymeric micro-cantilevers for ultra-low volume fluid and living cell deposition
05/13/2010US20100118680 Optical recording material, optical recording medium, and recording and reproducing method of optical recording medium
05/13/2010US20100118404 Antireflection optical device and method of manufacturing master
05/13/2010US20100117227 Method of preparing detectors for oxide bonding to readout integrated chips
05/13/2010US20100117110 Photosensitive Quantum Dot, Composition Comprising the Same and Method of Forming Quantum Dot-Containing Pattern Using the Composition
05/13/2010US20100116670 Electroforming mold and method for manufacturing the same, and method for manufacturing electroformed component
05/13/2010US20100116631 Bistable nanoswitch
05/13/2010US20100116332 Transparent substrate provided with an improved electrode layer
05/13/2010US20100116156 Multi-axis diffraction grating
05/12/2010EP2184768A1 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
05/12/2010EP2184643A2 Exposure device
05/12/2010EP2184642A2 Lithographic printing plate precursor and method of preparing lithographic printing plate
05/12/2010EP2183645A2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
05/12/2010EP2183292A2 Antireflective coating composition
05/12/2010EP1703548B1 Exposure apparatus, exposure method, and device producing method
05/12/2010EP1548804B1 Illuminating optical system, exposure system and exposure method
05/12/2010EP1410110B1 Real time analysis of periodic structures on semiconductors
05/12/2010EP1125167B1 Methods of reducing proximity effects in lithographic processes
05/12/2010DE102008054072A1 Selbstkorrigierendes Substrathaltesystem für die Fokussteuerung in Belichtungssystemen Self-Corrective substrate support system for focus control in imaging systems
05/12/2010CN201464802U Surface dusting device for precoating sensitive plate production line for printing
05/12/2010CN201464801U Composite structure of light resistor
05/12/2010CN201464690U Dispensing device
05/12/2010CN201456591U Plate base surface processing groove of precoating sensitive plate production line for printing
05/12/2010CN1991588B Method for fabricating printing plate with fine pattern using electric field
05/12/2010CN1991578B Printing device and printing method using the same
05/12/2010CN1983510B Method of manufacturing semiconductor device
05/12/2010CN1973358B Processing system and method for chemically treating a TERA layer
05/12/2010CN1963671B Coating apparatus and method of photoresist
05/12/2010CN1963666B Method and system for converting integrated circuit design into a plurality of masks
05/12/2010CN1963612B Display of initiative irradiance and passiveness reflection and manufacturing method thereof
05/12/2010CN1959530B Ultraviolet light solidified coating in use for post processing of imaging material
05/12/2010CN1957298B Method of forming a metal pattern on a substrate
05/12/2010CN1949087B Aligning system of photoetching apparatus and steping combined system of said aligning system thereof
05/12/2010CN1949080B Film transistor manufacturing apparatus and manufacturing method
05/12/2010CN1945434B Photohardenable and thermosetting resin compositions, their hardened product, and printing circuit boards using the same
05/12/2010CN1942825B Resist composition
05/12/2010CN1940646B Liquid crystal display device and method for fabricating of the same
05/12/2010CN1932644B Method for producing sensitized dye and photosensitive composition given by using the same
05/12/2010CN1928711B Mold, imprint method, and process for producing chip
05/12/2010CN1927944B Resin composition, cured composition and printed circuit board using same
05/12/2010CN1912742B Colorant dispersion liquid and photosensitive composition using the same
05/12/2010CN1892423B Substrate processing apparatus
05/12/2010CN1869775B Liquid crystal display and method of making the same
05/12/2010CN1858656B Lithographic apparatus and device manufacturing method
05/12/2010CN1851557B Two-dimensional scanning precision laser exposure system
05/12/2010CN1842742B Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing printed wiring board, and method for removing photocured product
05/12/2010CN1825210B Off-axis projection optics system and extreme ultraviolet lithography apparatus employing the same
05/12/2010CN1821869B Photoresist compositions
05/12/2010CN1818791B System and method for photolithography in semiconductor manufacturing and light shield for same
05/12/2010CN1814360B Process equipment and method for optical manufacture with substrate cleaning device
05/12/2010CN1812302B Efficient thermal tuning resonant cavity enhanced detector and producing method thereof
05/12/2010CN1808280B Method for removing static on substrate, apparatus and base thereof
05/12/2010CN1797221B Wet etching device and wet etching method
05/12/2010CN1790116B Transflective liquid crystal display and manufacturing method thereof
05/12/2010CN1720483B Local flare correction
05/12/2010CN1672097B Photosensitive bottom anti-reflective coatings
05/12/2010CN1668980B Highly heat-resistant, negative-type photosensitive resin composition
05/12/2010CN1645254B Chemical amplification type positive resist composition
05/12/2010CN1591112B Substrate for electro-optical device and manufacturing method thereof, electro-optical device and manufacturing method thereof
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