Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2010
05/25/2010US7723230 Method for manufacturing semiconductor device and method for designing photomask pattern
05/25/2010US7723016 Method for forming resist pattern and method for manufacturing a semiconductor device
05/25/2010US7723015 Method for manufacturing an array of interferometeric modulators
05/25/2010US7723014 photoresists, photomasks; semiconductors
05/25/2010US7723012 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
05/25/2010US7723010 Infrared transparent; chromophores; offset printing; lithography
05/25/2010US7723009 Topography based patterning
05/25/2010US7723007 Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
05/25/2010US7722928 Nanolithography methods and products therefor and produced thereby
05/25/2010CA2559913C Microfluidic chip
05/20/2010WO2010057031A1 Ultra thin alignment walls for di-block copolymer
05/20/2010WO2010056349A2 Large area patterning of nano-sized shapes
05/20/2010WO2010056278A1 Substrate patterning using polymerizable fluid
05/20/2010WO2010056119A1 A method for forming a multi-level surface on a substrate with areas of different wettability and a semiconductor device having the same
05/20/2010WO2010056116A1 Method and printer for printing of a product with a layer of photo sensitive material thereon
05/20/2010WO2010055852A1 Composition for forming resist underlayer film and patterning method using same
05/20/2010WO2010055739A1 Projection optical system, exposure apparatus, and device manufacturing method
05/20/2010WO2010055673A1 Moving body drive control method, exposure method, robot control method, drive control device, exposure device, and robot device
05/20/2010WO2010055406A2 Coating compositions
05/20/2010WO2010055374A1 An antireflective coating composition comprising fused aromatic rings
05/20/2010WO2010055373A1 An antireflective coating composition comprising fused aromatic rings
05/20/2010WO2010055050A1 Radiation curable coating materials
05/20/2010WO2010054979A1 Surface patterning with functional polymers
05/20/2010WO2009152885A8 Particle cleaning of optical elements for microlithography
05/20/2010US20100124724 Projection exposure apparatus, method for calibrating measurement criterion of displacement measurement unit, and method for manufacturing device
05/20/2010US20100124723 Method for the protection of extreme ultraviolet lithography optics
05/20/2010US20100124722 Constant current multi-beam patterning
05/20/2010US20100124721 Positive-working imageable elements and method of use
05/20/2010US20100124720 Material for protective film formation, and method for photoresist pattern formation using the same
05/20/2010US20100124719 Polymer and Resist Composition Comprising the Same
05/20/2010US20100124718 Polymeric compound, positive resist composition, and method of forming resits pattern
05/20/2010US20100124045 Reflector, display device, and method of manufacturing the same
05/20/2010US20100124044 Reflector, display device, and method of manufacturing the same
05/20/2010US20100123883 Projection optical system, exposure apparatus, and device manufacturing method
05/20/2010US20100123259 Photosensitive resin composition
05/20/2010DE102009044391A1 Verfahren zum Strukturieren von Strukturmerkmalen und Strukturen davon Method for structuring of structural features and structures thereof
05/20/2010DE102009025664A1 Facettenelement zum Aufbau eines Facettenspiegels Facet element to build a facet mirror
05/20/2010DE102009020320A1 Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen Method and apparatus for increasing the resolution and / or the speed of exposure systems
05/20/2010CA2742635A1 Surface patterning with functional polymers
05/19/2010EP2187434A1 Aerostatically guided table system for vacuum application
05/19/2010EP2187430A1 Position measuring system, exposure device, position measuring method, exposure method, device manufacturing method, tool, and measuring method
05/19/2010EP2187263A1 A method for forming a multi-level surface on a substrate with areas of different wettability and a semiconductor device having the same.
05/19/2010EP2187262A1 Microcontact printing stamp
05/19/2010EP2186838A1 Method for producing star polymer
05/19/2010EP2186799A1 Aromatic sulfonium salt compound
05/19/2010EP2186637A1 A lithographic printing plate
05/19/2010EP2185978A2 Illumination system of a microlithographic projection exposure apparatus
05/19/2010EP2185977A1 Two-photon stereolithography using photocurable compositions
05/19/2010EP2185976A1 Photosensitive compositions container polyvinyl alchool and their use in printing processes
05/19/2010EP2185975A1 Independently-addressable, self-correcting inking for cantilever arrays
05/19/2010EP2185974A2 Imprint method and processing method of substrate
05/19/2010EP2185360A1 Multi-layer imageable element with improved properties
05/19/2010EP2185344A1 Automatic geometric calibration using laser scanning reflectometry
05/19/2010EP1856578B1 Microlithography projection system with an accessible diaphragm or aperture stop
05/19/2010EP1654593B1 Immersion lithography system and monitoring method thereof
05/19/2010CN201477366U Pre-coating light-sensitive metal plate used for etching
05/19/2010CN201477365U Film for manufacturing inner figure of printed wiring board
05/19/2010CN1991592B Object stage device
05/19/2010CN1976961B Thermally curable resin composition with extended storage stability and good adhesive property
05/19/2010CN1970599B SU-8 epoxy resin separation method
05/19/2010CN101711376A multiplexing of pulsed sources
05/19/2010CN101711375A Mold film composition for forming pattern and mold film manufactured by using the same
05/19/2010CN101710579A Manufacturing method of thin film transistor array substrate
05/19/2010CN101710564A Substrate processing system
05/19/2010CN101710229A Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system
05/19/2010CN101710228A Imprint lithography processes and systems
05/19/2010CN101710204A Lens eccentricity fine adjustment mechanism in projection lithography objective
05/19/2010CN101710074A Micro optical fiber biosensor for detecting nitric oxide concentration in organism
05/19/2010CN101419407B Stacked photolithography alignment mark
05/19/2010CN101419406B Photolithography method for enhancing etching performance
05/19/2010CN101347054B Glass substrate having circuit pattern and process for producing the same
05/19/2010CN101206995B Method for monitoring crystal round pallet smoothness
05/19/2010CN101203802B 2-dimensional image display device, illumination light source, and exposure illumination device
05/19/2010CN101200149B Method for forming embossed hologram
05/19/2010CN101191996B Process for preparing light mask and optical proximity correction repairing method
05/19/2010CN101165595B Precision balance vibration-damping wafer stage movement system
05/19/2010CN101164142B Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method
05/19/2010CN101158816B Time sharing alignment apparatus and alignment method
05/19/2010CN101149564B Alignment mark and its imaging optical system and imaging method
05/19/2010CN101149559B Method for preparing ball-shaped bump biological microelectrode array
05/19/2010CN101135860B Light scribing device and Aligning system and aligning method used for light scribing device
05/19/2010CN101118377B Air pressure semi-suspending two freedom degree common basal surface movement workstation
05/19/2010CN101114134B Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine
05/19/2010CN101097370B Liquid crystal display and method for fabricating the same
05/19/2010CN101059654B Photolithagraphic diffractive image false-proof film and its preparation method
05/19/2010CN101042533B Organosilane hardmask compositions and methods of producing semiconductor devices using the same
05/19/2010CN101011882B Spraying head unit, product using the spraying head unit and manufacturing method thereof
05/18/2010US7719753 Method of operation for SLM-based optical lithography tool
05/18/2010US7719670 Parts manipulation, inspection, and replacement system and method
05/18/2010US7719659 Exposure apparatus and device manufacturing method
05/18/2010US7719658 Imaging system for a microlithographical projection light system
05/18/2010US7719556 Method and apparatus for imaging with multiple exposure heads
05/18/2010US7718714 Photosetting, thermosetting liquid ink
05/18/2010US7718591 contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in suitable solvent matrix; having improved compatibility with microelectronic substrates characterized by sensitive porous and low-high-kappa dielectrics and copper metallization
05/18/2010US7718541 Method of processing resist, semiconductor device, and method of producing the same
05/18/2010US7718349 using a shadow mask and applying charge and/or energy charge occurs through the openings of the shadow mask producing nano wires, electrodes, decrease sizes of integrated circuits and electronics
05/18/2010US7718348 integrated circuits; photoresists
05/18/2010US7718346 photoresists; screen printing; thin film transistors (TFT); heat treatment
05/18/2010US7718345 Composite photoresist structure
05/18/2010US7718344 microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate
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