Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2010
05/27/2010US20100129753 Alkali-developable photosensitive resin composition and beta-diketone compound
05/27/2010US20100129752 Photosensitive resin composition, photosensitive element employing the same, method of forming resist pattern, and process for producing printed wiring board
05/27/2010US20100129742 Method for a lithographic apparatus
05/27/2010US20100129741 Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device
05/27/2010US20100129740 Method for Collecting Optical Proximity Correction Parameter
05/27/2010US20100129739 Surface Position Detection Apparatus, Exposure Apparatus, and Exposure Method
05/27/2010US20100129738 Positive resist composition and pattering process
05/27/2010US20100129737 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
05/27/2010US20100129736 Photomask Having A Reduced Field Size And Method Of Using The Same
05/27/2010US20100129735 Production of stamps, masks or templates for semiconductor device manufacturing
05/27/2010US20100129734 Polypropylene Providing Improved Surface Properties
05/27/2010US20100129617 Laser ablation tooling via sparse patterned masks
05/27/2010US20100129616 Negative-working on-press developable imageable elements
05/27/2010US20100129607 Photopolymer Stamp Manufacturing Process and Preparation System and Photopolymer Stamp Dies
05/27/2010US20100128589 Composition for holographic recording medium
05/27/2010US20100128347 Polarizing cube and method of fabricating the same
05/27/2010US20100128240 Chromatically corrected objective and projection exposure apparatus including the same
05/27/2010US20100128237 Driving apparatus, exposure apparatus, and device manufacturing method
05/27/2010US20100128235 Lithographic apparatus and device manufacturing method
05/27/2010US20100127255 Contact and method of fabrication
05/27/2010US20100126532 Substrate processing apparatus and substrate processing method
05/27/2010US20100126527 Apparatus for and method of processing substrate subjected to exposure process
05/27/2010US20100126367 Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same
05/27/2010DE10350685B4 Fotoresist geeignet zur Verwendung in der 157 nm-Fotolithografie, enthaltend ein Polymer auf Basis von fluorierten Norbornen-Derivaten Photoresist suitable for use in 157 nm photolithography, comprising a polymer based on fluorinated norbornene derivatives
05/27/2010DE102009036330A1 Spectral filter for use in illumination optics of illumination device of projection illumination system, has grid structure fastened at retaining body at structure end, where retaining body is arranged outside of free aperture of filter
05/27/2010DE102009029103A1 Beleuchtungseinrichtung für eine Mikrolithographische Projektionsbelichtungsanlage Lighting device for a Microlithographic projection exposure apparatus
05/26/2010EP2189849A2 A lithographic apparatus provided with a swap bridge
05/26/2010EP2189848A2 Catadioptric projection objective
05/26/2010EP2189847A2 Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
05/26/2010EP2189846A1 Compositions comprising block polymer and processes for photolithography
05/26/2010EP2189845A2 Compositions and processes for photolithography
05/26/2010EP2189844A2 Compositions comprising sulfonamide material and processes for photolithography
05/26/2010EP2189843A2 Imprinting machine and device manufacturing method
05/26/2010EP2189826A1 Method for manufacturing optical waveguide and optical waveguide manufactured by the method
05/26/2010EP2188831A1 Reduced residual formation in etched multi-layer stacks
05/26/2010EP2188674A1 Lithographic apparatus with rotation filter device
05/26/2010EP2188673A1 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
05/26/2010EP2188664A2 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
05/26/2010EP1583740B1 Fluoroarylsulfonium photoacid generators
05/26/2010CN201489273U Photoresist baking device
05/26/2010CN201489272U Full-automatic exposure machine
05/26/2010CN201489271U Multicolor light-pole laser holographic laser mother set
05/26/2010CN201489270U Mask plate for manufacturing liquid crystal display panel
05/26/2010CN1991581B Hardmask composition coated under photoresist and process of producing integrated circuit devices using thereof
05/26/2010CN1928718B Photoresist composition for forming light-proof pattern of plasma display device
05/26/2010CN1910522B Polarization-modulating optical element
05/26/2010CN1890607B Utilities transfer system in a lithography system
05/26/2010CN1808278B Lithographic apparatus, radiation system and filter system
05/26/2010CN1726435B Process for producing photoresist composition, filter, coater and photoresist composition
05/26/2010CN1723539B Exposure apparatus, exposure method, and method for producing device
05/26/2010CN1720245B Oxime ester photoinitiators with heteroaromatic groups
05/26/2010CN1711503B Use of negative photosensitive resin composition for producing partition wall
05/26/2010CN1688934B Method for fabricating semiconductor device
05/26/2010CN1682155B Photoresist remover composition
05/26/2010CN1680875B Chemically amplified posative opto-corrosionproof agent composition
05/26/2010CN1637620B Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
05/26/2010CN1637601B Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
05/26/2010CN1601384B Thermally isolating optical devices
05/26/2010CN1591189B Source and mask optimization
05/26/2010CN1580957B Multilayer reflective extreme ultraviolet lithography mask blanks
05/26/2010CN1577096B Calibration method for a lithographic apparatus and device manufacturing method
05/26/2010CN1573567B Lithographic apparatus and device manufacturing method
05/26/2010CN1573476B High quality and ultra large screen liquid crystal display device and production method thereof
05/26/2010CN1495861B Vapour as treating gas for removing hard shell, corrosion-resisting agent and residue produced by stripping corrosion-resisting agent after ion implantation
05/26/2010CN1495531B Photoetching projector and particle screen for said device
05/26/2010CN101715568A Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
05/26/2010CN101714371A Method for manufacturing master and method for manufacturing optical disc
05/26/2010CN101713932A Lithographic apparatus and device manufacturing method
05/26/2010CN101713931A An exposure device for display panel, exposure method and assembling or adjusting method of the display panel exposure device
05/26/2010CN101713930A Lithographic apparatus and lorentz actuator
05/26/2010CN101713929A Lithographic apparatus and device manufacturing method
05/26/2010CN101713928A Exposure apparatus
05/26/2010CN101713927A Adaptor of an aligner system
05/26/2010CN101713926A Peripheral exposure device and method thereof
05/26/2010CN101713925A Photoetching device
05/26/2010CN101713924A A device for treating substrate and a method of cardinal plate loading
05/26/2010CN101713923A Photopolymer formulations having a low crosslinking density
05/26/2010CN101713922A Photosensitive composition, photosensitive thin-film, photosensitive laminate material, method for forming permanent pattern and printed circuit board
05/26/2010CN101713921A Photosensitive resin composition and a sealant
05/26/2010CN101713919A A multilevel greyscale photo mask and method for producing the same
05/26/2010CN101713918A Techniques for reducing degradation and/or modifying feature size of photomasks
05/26/2010CN101713913A A photomask board and photomask
05/26/2010CN101713912A Alignment mark of mask
05/26/2010CN101713777A Preparation method of reusable micro-cantilever type immunosensor
05/26/2010CN101713732A Lithographic apparatus and humidity measurement system
05/26/2010CN101712746A Photopolymer compositions for optical elements and visual displays
05/26/2010CN101712737A Polymer for resist and resist composition manufactured by using the same
05/26/2010CN101712733A Polymer and resist composition comprising the same
05/26/2010CN101712202A A method for manufacturing mold and a method for manufacturing anti-dazzle membrane
05/26/2010CN101348048B Method for manufacturing lithographic printing plate base
05/26/2010CN101263431B Method for forming removable edge extension element of microelectronic substrate
05/26/2010CN101218108B Original plate for lithographic printing
05/26/2010CN101122752B Centering device and exposure device
05/26/2010CN101017332B Developing apparatus and developing method
05/26/2010CN101004551B Stamper, method of forming a concave/convex pattern, and method of manufacturing an information recording medium
05/26/2010CA2673805A1 Photopolymer stamp manufacturing process and preparation system and photopolymer stamp dies
05/25/2010USRE41350 Catadioptric objective comprising two intermediate images
05/25/2010US7725872 Orientation dependent shielding for use with dipole illumination techniques
05/25/2010US7723530 Used in electrooptical systems such as TV screens, liquid crystal displays, charge coupled devices, plasma displays or electroluminescent displays; do not tend to aggregate, show very good dispersibility; high transparence and pure hue
05/25/2010US7723397 ethylenically unsaturated aminoacrylates; overprinting; for production of scratch-resistant durable surface
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