Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/03/2010US20100134892 Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus
06/03/2010US20100134886 Integrated planar polarizing device and methods of fabrication
06/03/2010US20100134777 Diaphragm changing device
06/03/2010US20100134772 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
06/03/2010US20100134771 Coupling apparatus, exposure apparatus, and device fabricating method
06/03/2010US20100134734 Substrate for a display apparatus
06/03/2010US20100133231 Processing method and processing system
06/03/2010CA2741673A1 Gluconic acid containing photoresist cleaning composition for multi-metal device processing
06/02/2010EP2192608A1 Substrate holding device
06/02/2010EP2192447A1 Method of applying a pattern to a substrate
06/02/2010EP2192446A1 Microlithography projection system with an accessible aperture stop
06/02/2010EP2192445A1 Exposure device and semiconductor device manufacturing method.
06/02/2010EP2192134A1 Photosensitive composition, pattern-forming method using the photosensitive composition, and compound used in the photosensitive composition
06/02/2010EP2191927A1 Method of and system for forming a microscopic structure on a substrate using a mask formed on this substrate
06/02/2010EP2191332A1 Projection objective having mirror elements with reflective coatings
06/02/2010EP2191331A1 Projection objective with obscurated pupil for microlithography
06/02/2010EP2191329A2 System and method for exposing a digital polymer plate
06/02/2010EP2190967A2 Composition and method for removing ion-implanted photoresist
06/02/2010EP1791164B1 Exposure equipment, exposure method and device manufacturing method
06/02/2010EP1646915B1 Purge gas humidifying method and lithographic projection apparatus
06/02/2010DE102006010337B4 Off-axis-Objektive mit drehbarem optischen Element Off-axis lenses with rotatable optical element
06/02/2010CN201497853U Pcb exposure machine
06/02/2010CN201497852U Direct writing device for thick circuit of conductive base plate with large breadth
06/02/2010CN1945484B Optical head or ink jet head action control device and method, and carrying table device
06/02/2010CN1898299B Polyamide acid resin having unsaturated group, photosensitive resin composition using same, and cured product thereof
06/02/2010CN1885167B Exposure device and graphic forming method
06/02/2010CN1802608B Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same
06/02/2010CN1784429B Novel trifunctional photoinitiators
06/02/2010CN1723541B Exposure apparatus and method for producing device
06/02/2010CN101720450A Modeling a sector-polarized-illumination source in an optical lithography system
06/02/2010CN101720449A Image sensor for lithography
06/02/2010CN101720448A Method and apparatus for determining the effect of process variations
06/02/2010CN101718959A Method and system for exchanging two silicon wafer stages of photoetching machine
06/02/2010CN101718958A System and method for controlling nonlinear aberration correction of green-laser trimmed focusing lens
06/02/2010CN101718957A Fixing device of photoelectric detector
06/02/2010CN101718956A Exposure method and alignment device thereof for substrate manufacturing
06/02/2010CN101718955A Substrate processing system and substrate processing method
06/02/2010CN101718954A Unit for providing chemical liquid, apparatus and method for treating substrate using the same
06/02/2010CN101718953A Ultraviolet light curing conductive silver slurry for manufacturing radio frequency identification (RFID) tag antenna
06/02/2010CN101718952A Method for preparing composite membrane layer with multilayer embossment structure based on mobile coding mask theory
06/02/2010CN101718951A Method for manufacturing scale in oscillographic tube by photoetching
06/02/2010CN101718950A Film composing method and method for manufacturing liquid crystal display device
06/02/2010CN101717361A Diazo naphthoquinone sulphonate sensitizer containing protecting groups capable of acid decomposition, and synthesis method thereof
06/02/2010CN101408285B Illuminating apparatus generating continuous variable pupil
06/02/2010CN101383196B Modularized 6 freedom degree active vibration isolation platform
06/02/2010CN101369053B Complete refraction type projection optical system
06/02/2010CN101354500B Liquid crystal display panel and method for producing the same
06/02/2010CN101339367B Projection exposure device and method and device for calibrating illumination light beam dynamic positional error
06/02/2010CN101320219B Field measurement method for optical aberration of imaging optical system
06/02/2010CN101303533B Aligning system, aligning method for photolithography equipment and enhancement type aligning mark
06/02/2010CN101299132B Aligning mark used for photolithography equipment aligning system and its use method
06/02/2010CN101290361B Method for manufacturing multiple stage micro-reflector by double film alternating corrosion
06/02/2010CN101286011B Photolithography equipment detecting device, method and preparation method
06/02/2010CN101276150B Stepping repeat exposure device
06/02/2010CN101261455B Device and method for photo-etching machine focusing system performance evaluation
06/02/2010CN101261450B Zero position automatically adjustable focusing and leveling measuring device and its usage method
06/02/2010CN101251717B Micro-electronics apparatus and manufacture method thereof
06/02/2010CN101246314B Silicon slice alignment signal processing method
06/02/2010CN101226344B Apparatus and method for measuring optical system parameter
06/02/2010CN101221373B Device for correcting illumination homogeneity
06/02/2010CN101221371B Device and method for detecting pattern positioning precision
06/02/2010CN101221370B Silicon slice edge exposure system and its light intensity control method
06/02/2010CN101216663B Backlight module accurate light guide thin film core production method
06/02/2010CN101211124B Coaxial aligning achromatic optical system
06/02/2010CN101192000B Central symmetry continuous microstructure diffraction element mask manufacture method
06/02/2010CN101183632B Image forming device and image forming method
06/02/2010CN101174100B Immersion lithography device and immersion exposure method
06/02/2010CN101146408B Wiring forming system and wiring forming method for forming wiring on wiring board
06/02/2010CN101105628B Light solidifying/heat solidifying one-part welding resistant agent composition
06/02/2010CN101063815B Method for manufacturing decorative glass
06/02/2010CN101030044B Method of processing a substrate
06/01/2010USRE41362 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
06/01/2010US7728968 Excimer laser inspection system
06/01/2010US7728914 Position encoded sensing device with amplified light reflection intensity and a method of manufacturing the same
06/01/2010US7728313 Maskless lithography system and method using optical signals
06/01/2010US7728308 Apparatus for blanking a charged particle beam
06/01/2010US7728089 Start with commercially available cyclic fluorocarbon alcohols, mix with casting solvents alpha , alpha , alpha -trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether, a mixture of a decane and octanol; prevents leaching of photoresist into process medium, lens contamination
06/01/2010US7727902 Composition for forming nitride coating film for hard mask
06/01/2010US7727853 Processing method, manufacturing method of semiconductor device, and processing apparatus
06/01/2010US7727709 Method of forming resist pattern and method of manufacturing semiconductor device
06/01/2010US7727708 Method for fabricating dual damascene structures
06/01/2010US7727707 Barrier film material and pattern formation method using the same
06/01/2010US7727705 High etch resistant underlayer compositions for multilayer lithographic processes
06/01/2010US7727704 Positive resist compositions and patterning process
06/01/2010US7727703 Methods of fabricating an electronic device and an sililation polyvinyl phenol for a dielectric layer of an electronic device
06/01/2010US7727702 Method of coloring a coating composition
06/01/2010US7727701 Positive resist composition and method of forming resist pattern
06/01/2010US7726964 Molding apparatus and molding method
06/01/2010CA2384186C System and method for programmable illumination pattern generation
05/2010
05/27/2010WO2010059580A2 Image mask assembly for photolithography
05/27/2010WO2010059050A1 Optical fiber, method of preparation thereof and device
05/27/2010WO2010058778A1 Method for producing substrate having patterned conductive polymer film and substrate having patterned conductive polymer film
05/27/2010WO2010057740A1 Method and device for imaging a radiation-sensitive substrate
05/27/2010WO2010015333A3 High aspect ratio template for lithography, method of making the same template and use of the template for perforating a substrate at nanoscale
05/27/2010WO2009053100A8 Process and freeform fabrication system for producing a three-dimensional object
05/27/2010US20100129758 Resist surface modifying liquid, and method for formation of resist pattern using the same
05/27/2010US20100129757 Synthesis of acylarylenes and hyperbranched poly(aclarylene)s by metal-free cyclotrimerization of alkynes
05/27/2010US20100129756 Gum solution for developing and gumming a photopolymer printing plate
05/27/2010US20100129755 Method for making a lithographic printer plate precursor
05/27/2010US20100129754 Hot melt compositions
1 ... 298 299 300 301 302 303 304 305 306 307 308 309 310 311 312 313 314 315 316 317 318 ... 1272