Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/09/2010CN101726773A Cambered artificial compound eye and preparation method thereof
06/09/2010CN101726478A Apparatus for fabricating and opically detecting bio-chip
06/09/2010CN101726137A Heat regenerator and manufacturing method thereof
06/09/2010CN101724318A Method for manufacturing coloring composition
06/09/2010CN101452912B Device for forming alignment mark on back surface, and method for forming alignment mark
06/09/2010CN101435999B Device for automatically regulating illumination intensity of exposure machine
06/09/2010CN101398579B Method for making micro reflector layer and silicon based LCD
06/09/2010CN101393303B Method for making near infrared band three-dimensional photon crystal
06/09/2010CN101369077B LCD array substrates and manufacturing method thereof
06/09/2010CN101365594B Bragg diffracting security markers
06/09/2010CN101329515B Device and method for measuring and checking step photoetching machine aligning system
06/09/2010CN101320216B Reshaping structure of micro-photoetching illumination iris
06/09/2010CN101303532B Six-freedom degree precision positioning platform capable of switching station
06/09/2010CN101290477B Balancing damping station
06/09/2010CN101290476B Six freedom degree jiggle station
06/09/2010CN101241311B Superimposed motor based material transmission system possessing mask station function and its method
06/09/2010CN101226346B Demoundiing technique of photoresist as well as a first composition, a second composition and demoulding agent water solution used in said technique
06/09/2010CN101221374B Device for correcting illumination homogeneity
06/09/2010CN101221361B Pipeline pressure balancing system
06/09/2010CN101220224B UV solidified alkali resistant etching ink composition and uses thereof
06/09/2010CN101216668B Industrial synthesis method for N-methyl-p-formoxylstyrylpicolyl sulphate
06/09/2010CN101202244B Method for removing photoresist graph in forming process of dual embedded structure
06/09/2010CN101196695B Lithographic apparatus, device manufacturing method and computer program product
06/09/2010CN101190723B Vessel for containing protection thin film components
06/09/2010CN101175695B Modified silica particles, photosensitive composition containing same, and photosensitive lithography plate
06/09/2010CN101169594B Photo-etching machine imaging quality measuring method
06/09/2010CN101140426B Lithographic apparatus and device manufacturing method
06/09/2010CN101084472B Monolithic polarization controlled angle diffusers and associated methods
06/09/2010CN101075553B Substrate processing method and substrate processing apparatus
06/09/2010CN101055849B Cleaning method for removing the optical resistance residue and dual enchasing technology of the copper making process
06/09/2010CN101042526B Mask data correction method, photomask and optical image prediction method
06/09/2010CN101013272B Baking equipment
06/08/2010US7733625 Substrate holding system and exposure apparatus using the same
06/08/2010US7733459 Lithographic apparatus and device manufacturing method
06/08/2010US7732793 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
06/08/2010US7732789 Optical system having a cleaning arrangement
06/08/2010US7732633 Arylsulfinate salt as an electron donor; sensitizer that is a ketone, xanthene, acridine, thiazole, thiazine, oxazine, azine, aminoketone, aromatic polycyclic hydrocarbon, p-substituted aminostyryl ketone, aminotriaryl methane, cyanine, pyridinium, or triarylmethane dye
06/08/2010US7732533 Annealing a zwitterionic addition block copolymer having oppositely charged end groups: an amine and/or a protonated amine end group on one block and a carboxylic acid and/or a deprotonated carboxylic acid group on the other; undergos microphase separation upon annealing
06/08/2010US7732504 Functionalized photoinitiators
06/08/2010US7732123 Immersion photolithography with megasonic rinse
06/08/2010US7732121 Near-field exposure method
06/08/2010US7732120 Method for making soft pellicles
06/08/2010US7732119 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
06/08/2010US7732118 Negative-working imageable elements and methods of use
06/08/2010US7732117 high activity in short time; electron cyclotron resonance
06/08/2010US7732110 Method for exposing a substrate and lithographic projection apparatus
06/08/2010US7732106 Methods for etching devices used in lithography
06/08/2010US7732103 Photomask, focus measurement apparatus and focus measurement method
06/08/2010US7732003 Bank forming method, wiring pattern forming method, electro-optical device, and electronic apparatus
06/08/2010US7731799 Substrate processing method, substrate processing apparatus and computer-readable memory medium
06/08/2010US7730834 Printing apparatus and device manufacturing method
06/03/2010WO2010062508A1 Gluconic acid containing photoresist cleaning composition for multi-metal device processing
06/03/2010WO2010062444A1 Photopolymer stamp manufacturing process and preparation system and photopolymer stamp dies
06/03/2010WO2010062424A1 Method and system for performing lithography verification for a double-patterning process
06/03/2010WO2010062370A2 Dispense system set-up and characterization
06/03/2010WO2010062328A2 Dispense system
06/03/2010WO2010062319A1 Imprint lithography template
06/03/2010WO2010061977A2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
06/03/2010WO2010061875A1 Radiation-sensitive resin composition
06/03/2010WO2010061869A1 Method for manufacturing lithographic printing plate, developer for original lithographic printing plate, and replenisher for developing original lithographic printing plate
06/03/2010WO2010061833A1 Resist pattern coating agent and method for forming resist pattern
06/03/2010WO2010061774A1 Composition for forming resist underlayer film with reduced outgassing
06/03/2010WO2010061701A1 Anti-corrosive photoresist-removing agent composition
06/03/2010WO2010061674A1 Correction unit, illumination optical system, exposure device, and device manufacturing method
06/03/2010WO2010060929A1 Image reading and writing using a complex two-dimensional interlace scheme
06/03/2010WO2010060741A1 A method and installation for writing large gratings
06/03/2010WO2010060702A1 Photoinitiator mixtures
06/03/2010WO2010060274A1 Detergent for removing photo resist
06/03/2010WO2010060273A1 Rinse solution composition for removing resist
06/03/2010WO2010060272A1 A protection liquid for metal substrate of semiconductor wafer and application method thereof
06/03/2010WO2010037472A3 Method and system for determining a lithographic process parameter
06/03/2010WO2010029341A3 Improvements in or relating to printing
06/03/2010WO2010022839A3 Spectral purity filter and lithographic apparatus
06/03/2010WO2010011398A3 Scanning probe epitaxy
06/03/2010WO2010011397A3 Scanning probe epitaxy
06/03/2010WO2010004006A9 Device and method for impressing structures in a substrate, in particular in optical data storage media, semiconductor structures and microstructures
06/03/2010WO2010002679A3 Method of forming a microstructure
06/03/2010US20100137181 Removing a photoresist from the substrate having a copper metal layer by using a stripper solution of a copper salt, the chloride or nitate, dimethyl sulfoxide; tetramethylammonium hydroxide and ethanolaminesolubilizer for the copper salt; protection of copper layer; rinsing; compatibility
06/03/2010US20100136792 Self-aligned multi-patterning for advanced critical dimension contacts
06/03/2010US20100136492 Substrate processing apparatus and substrate processing method
06/03/2010US20100136491 Oxime ester photoinitiators
06/03/2010US20100136490 Multi-scale cantilever structures having nano sized holes and method of preparing the same
06/03/2010US20100136489 Manufacturing device and manufacturing method for polymer waveguide device
06/03/2010US20100136488 Pattern creation method, semiconductor device manufacturing method, and computer-readable storage medium
06/03/2010US20100136487 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
06/03/2010US20100136486 Resist protective coating compositon and patterning process
06/03/2010US20100136485 Acetal compounds and their preparation, polymers, resist compositions and patterning process
06/03/2010US20100136484 Photosensitive paste and sintered layer
06/03/2010US20100136483 Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element
06/03/2010US20100136482 Resist composition and patterning process
06/03/2010US20100136481 Resist composition
06/03/2010US20100136480 Resist composition and method of forming resist pattern
06/03/2010US20100136479 Positive photosensitive composition
06/03/2010US20100136478 Resist composition, method of forming resist pattern, novel compound, and acid generator
06/03/2010US20100136477 Photosensitive Composition
06/03/2010US20100136468 Diffraction order measurement
06/03/2010US20100136467 Oxime ester photoinitiators
06/03/2010US20100136466 Exposure mask and method for manufacturing semiconductor device using the same
06/03/2010US20100135609 Apparatus comprising a cylindrical substrate and an integrated optical circuit
06/03/2010US20100134948 Humidity sensor having anodic aluminum oxide layer, and fabricating method thereof
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