Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/10/2010US20100143849 Semiconductor device manufacturing method
06/10/2010US20100143848 Patterning methods for stretchable structures
06/10/2010US20100143847 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
06/10/2010US20100143846 Process for producing photosensitive resin plate and relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the process
06/10/2010US20100143845 Positive resist composition and method of forming resist pattern
06/10/2010US20100143844 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
06/10/2010US20100143843 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition
06/10/2010US20100143842 Method for producing a copolymer solution with a uniform concentration for semiconductor lithography
06/10/2010US20100143841 Enhanced relief printing plate
06/10/2010US20100143840 Flexographic element and method of imaging
06/10/2010US20100143832 Lithographic apparatus and device manufacturing method
06/10/2010US20100143830 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
06/10/2010US20100143828 Method of mask forming and method of three-dimensional microfabrication
06/10/2010US20100143673 Photosensitive adhesive composition, film-like adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and semiconductor device manufacturing method
06/10/2010US20100143657 High-temperature-durable optical film structure and fabrication method thereof
06/10/2010US20100143521 Method for Expelling Gas Positioned Between a Substrate and a Mold
06/10/2010US20100143467 Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets
06/10/2010US20100142900 Ssc chip, fiber array attached with ssc, plc module attached with ssc and method for manufacturing ssc
06/10/2010US20100142051 Optical system, exposure system, and exposure method
06/10/2010US20100142029 Flexible display and a method of producing a flexible display
06/10/2010US20100142015 Hologram recording film and method of manufacturing same, and image display apparatus
06/10/2010US20100141969 Method and Apparatus for Making Liquid Flexographic Printing Elements
06/10/2010US20100141926 Optical system,exposure system, and exposure method
06/10/2010US20100141921 Optical system, exposure system, and exposure method
06/10/2010US20100141918 Lithographic apparatus and device manufacturing method
06/10/2010US20100141912 Exposure apparatus and measuring device for a projection lens
06/10/2010US20100140841 Capillary Imprinting Technique
06/10/2010US20100140816 Method of forming a marker, substrate having a marker and device manufacturing method
06/10/2010US20100139838 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
06/10/2010US20100139421 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
06/10/2010DE102009019254A1 Justagevorrichtung und Verfahren zur Herstellung eines optischen Bauteils Adjusting device and method for producing an optical component
06/10/2010DE102005001671B4 Photolithographieanordnung Photolithography arrangement
06/10/2010CA2745075A1 Uv-curable inorganic-organic hybrid resin and method for preparation thereof
06/09/2010EP2194429A1 Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
06/09/2010EP2194428A1 Uniform pressing apparatus for use in a micro-nano imprint process
06/09/2010EP2194073A1 Positive-working photosensitive composition, method for pattern formation using the composition, and resin for use in the composition
06/09/2010EP2193404A1 Calibration of a position-measuring device of an optical device
06/09/2010EP2193403A1 Method for image lithography by continuous direct writing
06/09/2010EP2193391A1 Method of making a colour filter array
06/09/2010EP2193033A2 Bidirectional imaging with varying intensities
06/09/2010EP1806618B1 Positive photosensitive insulating resin composition and cured product thereof
06/09/2010EP1604246B1 Collectors in two hemispheres
06/09/2010EP1015878B1 Methods for fabricating enclosed microchannel structures
06/09/2010CN201503535U Multi-mask lithography machine silicon wafer stage system arranged in array
06/09/2010CN1980984B Polyamide
06/09/2010CN1954407B Exposure method and method for producing device
06/09/2010CN1945429B Photosensitive resin composition and photosensitive resin laminate using the same
06/09/2010CN1928714B Black photosensitive resin composition
06/09/2010CN1892435B Lithographic apparatus immersion damage control
06/09/2010CN1885166B Substrate processing system and control method thereof
06/09/2010CN1854898B Coating and developing system
06/09/2010CN1800991B Scanning exposure method and scanning exposure apparatus manufacture method
06/09/2010CN1781826B Reticle-carrying container
06/09/2010CN1754696B Metal mesh fabric for screen process printing
06/09/2010CN1721990B Composition for forming sheet materials, production method thereof, and sheet-shape unsintered materials for producing display screen
06/09/2010CN101730866A Composition for forming micropattern and method for forming micropattern using the same
06/09/2010CN101730865A Vaccum suction frame for ultraviolet rays exposure apparatus
06/09/2010CN101730864A spacer lithography
06/09/2010CN101730412A Housing and method for making same
06/09/2010CN101728324A Method for formlng pattern of semiconductor device
06/09/2010CN101728295A Gas filling bearing piece, gas filling bearing piece set and gas filling equipment
06/09/2010CN101728224A Equipment and method for manufacturing semiconductor
06/09/2010CN101727025A Method for removing photoresist residues and etching reactant granules
06/09/2010CN101727024A High dose implantation strip (hdis) in h2 base chemistry
06/09/2010CN101727023A Method for controlling concentration of etching solution
06/09/2010CN101727022A Photoetching method of photosensitive dry film
06/09/2010CN101727021A Projection objective for a microlithographic projection exposure apparatus
06/09/2010CN101727020A Method for controlling X-ray exposing clearance
06/09/2010CN101727019A Double-platform exchange system for silicon chip platform of lithography machine and exchange method thereof
06/09/2010CN101727018A Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography
06/09/2010CN101727017A Lithographic apparatus and a method of removing contamination
06/09/2010CN101727016A Robot gripper for the reticle transfer of the exposure equipment
06/09/2010CN101727015A Middle mask wheel for mounting an exposure equipment
06/09/2010CN101727014A Photoetching method for controlling characteristic dimension and photoetching system thereof
06/09/2010CN101727013A Method for on-line monitoring of photoetching conditions
06/09/2010CN101727012A Method for detecting exposure stepping precision of current layer
06/09/2010CN101727011A Alignment method of lithography machine
06/09/2010CN101727010A Method for preparing biomimetic colour super-hydrophobic coating by multi-beam interference photoetching technology
06/09/2010CN101727009A Liquid processing apparatus and liquid processing method
06/09/2010CN101727008A Hierarchical control and cross-operation structure of working arm of gel coating developing unit
06/09/2010CN101727007A Reflective surface plasma imaging and photo-etching method for processing nano graph with high depth-to-width ratio
06/09/2010CN101727006A Positive type photosensitive resin composition
06/09/2010CN101727005A Photosensitive resin composition for plasma panel electrode
06/09/2010CN101727004A Photoacid generator containing aromatic ring
06/09/2010CN101727003A Photosensitive resin composition for color filter and color filter prepared using the same
06/09/2010CN101727002A Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for forming the same
06/09/2010CN101727001A Photosensitive resin composition
06/09/2010CN101727000A Photoresist composition
06/09/2010CN101726999A Coloring combination, color filter and color liquid crystal display element
06/09/2010CN101726998A Method for realizing improvement of surface plasma photoetching quality by utilizing metallic reflecting film structure
06/09/2010CN101726997A Six-freedom-degree precision positioning table for nano-imprint lithography system
06/09/2010CN101726996A Photolithography method on surface of metal copper
06/09/2010CN101726995A Colored filtering substrate and manufacturing method thereof
06/09/2010CN101726992A Exposure mask for forming a photodiode and method of manufacturing the image sensor using the exposure mask
06/09/2010CN101726988A Design and layout of phase shifting photolithographic masks
06/09/2010CN101726901A Method for manufacturing liquid crystal display panel
06/09/2010CN101726888A Fabricating method of touch circuit two-sided graph structure
06/09/2010CN101726863A Polarization-modulating optical element
06/09/2010CN101726782A Method for manufacturing colored filtering substrate
06/09/2010CN101726779A Method for producing holographic double balzed grating
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