Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/16/2010CN101738875A Nozzle and apparatus and method for processing substrate using the nozzle
06/16/2010CN101738874A Method for simulating photoresist development
06/16/2010CN101738873A Exposure device
06/16/2010CN101738872A Methods and system for lithography calibration
06/16/2010CN101738871A Pattern selection for lithographic model calibration
06/16/2010CN101738870A Proximity exposure apparatus, method of delivering a mask of a proximity exposure apparatus and method of manufacturing a display panel substrate
06/16/2010CN101738869A Silicon wafer bearing table for photoetching machine and use method thereof
06/16/2010CN101738868A High-precision photoresist dispensing pump control device and control method thereof
06/16/2010CN101738867A Photoresist conveying device
06/16/2010CN101738866A Full automatic cleaning equipment for photoresist collecting cup
06/16/2010CN101738865A Dry-method film coating process
06/16/2010CN101738864A Resist ink and method of forming pattern using thereof
06/16/2010CN101738863A Photosensitive resin composition and display
06/16/2010CN101738862A Green photosensitive coloured composition and colour filter using same
06/16/2010CN101738861A Light-sensitive resin composite and method for manufacturing printed circuit board using same
06/16/2010CN101738860A Photosensitive resin composition for imprinting process and method for forming organic layer over substrate
06/16/2010CN101738859A Photosensitive resin composition and display
06/16/2010CN101738858A Flame retardant photocurable resin composition, dry film and cured product thereof, and printed wiring board using the same
06/16/2010CN101738857A Black photo resist and preparation method and picture composition method thereof
06/16/2010CN101738856A Sensible heat composition for positive thermosensitive CTP plate without preheating and plate-making method by using same
06/16/2010CN101738855A Flexible micro-positioning stage with two degrees of freedom
06/16/2010CN101738854A Preparation method of pattern
06/16/2010CN101738853A Method for forming a micro-lens of an image sensor, and manufacturing the image sensor
06/16/2010CN101738852A Method for making patterns on plain net for printing by photoresist process
06/16/2010CN101738799A TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacture method thereof
06/16/2010CN101738778A Semi-reflecting semitransparent liquid crystal display device and method for manufacturing upper base plate thereof
06/16/2010CN101738760A Pixel structure, optical element, liquid crystal display device and manufacturing method thereof
06/16/2010CN101738722A Method for manufacturing micro-opto-electro-mechanical system-based wave-adjustable harmonic filter
06/16/2010CN101738676A Manufacturing method of light guide plate
06/16/2010CN101738662A Method for preparing hundred nano grade narrow line width holographic grating photoresist pattern with various features
06/16/2010CN101738069A Soft baking device and soft baking process for vacuum drying
06/16/2010CN101735825A Liquid crystal aligning agent, polyorganosiloxane, liquid crystal aligning film, forming method thereof and liquid crystal display element
06/16/2010CN101735690A Ink composition and method of fabricating liquid crystal display device using the same
06/16/2010CN101735390A Polymer and resist composition comprising the same
06/16/2010CN101735344A Photo-iniciative polymerizer comprising oxime ester with unsaturated double bonds and photosensative resin composition having the same
06/16/2010CN101470224B Production method of plane continuous diffraction condensing lens
06/16/2010CN101359180B Method for detecting flatness of edges of electrostatic chuck
06/16/2010CN101339264B Fused silica transmission 1x3 polarization irrelevant beam-splitting grating for 785 nanometer waveband
06/16/2010CN101287767B Ic插座装置 Ic socket device
06/16/2010CN101278238B Immersion optical lithography system having protective optical coating
06/16/2010CN101178455B Thin film pattern layer and manufacturing method therefor
06/16/2010CN101174084B Solution for silver surface transplant of the hologram and method for silver surface transplant of the hologram
06/16/2010CN101164111B Device for directing radiation to a layer, apparatus with such device and method using such apparatus
06/16/2010CN101140421B Method for forming a photoresist pattern
06/16/2010CN101139712B Stripping method
06/16/2010CN101128544B Resin composition for recording material
06/16/2010CN101082771B Photosensitive resin composition for colorful color filter
06/16/2010CN101073037B Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
06/16/2010CN101040221B Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent
06/16/2010CN101016447B Antistatic agent, antistatic film and articles coated with antistatic film
06/16/2010CN101010635B Composition for forming antireflective film and wiring forming method using same
06/15/2010US7739649 Design and layout of phase shifting photolithographic masks
06/15/2010US7739254 Labeling events in historic news
06/15/2010US7738232 Alignment apparatus
06/15/2010US7738193 Positioning unit and alignment device for an optical element
06/15/2010US7738172 Structures and methods for reducing aberration in optical systems
06/15/2010US7738078 Optimized mirror design for optical direct write
06/15/2010US7738076 Exposure apparatus and device manufacturing method
06/15/2010US7738074 Lithographic apparatus and device manufacturing method
06/15/2010US7737425 Contamination barrier with expandable lamellas
06/15/2010US7737419 Alignment apparatus, exposure apparatus, and device manufacturing method
06/15/2010US7737418 Debris mitigation system and lithographic apparatus
06/15/2010US7737088 Method and device for producing biochemical reaction supporting materials
06/15/2010US7737040 Method of reducing critical dimension bias during fabrication of a semiconductor device
06/15/2010US7736843 Method for manufacturing a semiconductor device
06/15/2010US7736842 photoresists; photoacid generators; lithography
06/15/2010US7736841 exposing a photoresist layer with regions of photosensitivity to an image in a lithography process using high numerical aperture imaging tools for improving contrast of the image of a feature projected onto the resist layer
06/15/2010US7736840 Production of two superposed elements within an integrated electronic circuit
06/15/2010US7736839 employing linearly polarized illumination to perform exposure along a mask pattern including mask patterns used to form the first and second wiring patterns, subsequently forming the first and second wiring patterns (different in geometry) having a geometry along the mask patterns
06/15/2010US7736837 Antireflective coating composition based on silicon polymer
06/15/2010US7736836 Slip film compositions containing layered silicates
06/15/2010US7736835 Unsaturated monomers containing a cyclic group, especially a norbornane ring, substituted by a 4-hydroxy-3-(trifluoromethyl)-4,4,4-trifluorobutyl group; maybe acrylates, vinyl ethers or allyl ethers; homo- and copolymers is these monomers; exposure of a resist to a high-energy ray or electron beam
06/15/2010US7736834 Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product
06/15/2010US7736833 Tuned underlayers functioning as antireflective coatings, planarizing layers, and etch resistant hard masks; high resolution, residue free lithography; do not interact with the resist limiting interfacial mixing and contamination of resist by an outgassing product
06/15/2010US7736825 provides a contrast enhancing layer that does not need to be removed and reapplied between exposures in a multi-exposure process; bleached areas caused by the first exposure beam become unbleached areas due to an intrinsic property of a material used to form contrast enhancing layer
06/15/2010US7736822 e.g.Brominated epoxy phenol novolk resins in propylene glycol, monomethyl ether solvent; curable; chemically-amplified type resist coating
06/15/2010US7736723 Holographic films employing cycloolefin copolymers
06/15/2010US7736570 Tool for generating microstructured surfaces
06/10/2010WO2010065247A2 Three-dimensional articles using nonlinear thermal polymerization
06/10/2010WO2010065094A2 Flexographic element and method of imaging
06/10/2010WO2010065065A1 Fabricating thermoset plates exhibiting uniform thickness
06/10/2010WO2010064829A2 Anti-reflective underlayer composition
06/10/2010WO2010064730A1 Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
06/10/2010WO2010064729A1 Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
06/10/2010WO2010064600A1 Method for forming resist pattern
06/10/2010WO2010064449A1 Lighting device, exposure device, and device manufacturing method
06/10/2010WO2010064240A1 Uv-curable inorganic-organic hybrid resin and method for preparation thereof
06/10/2010WO2010064135A2 A photosensitive composition
06/10/2010WO2010063830A1 Rotating arm for writing or reading an image on a workpiece
06/10/2010WO2010063827A1 Gradient assisted image resampling in micro-lithographic printing
06/10/2010WO2010063763A1 Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
06/10/2010WO2010063504A2 Imprint lithography apparatus and method
06/10/2010WO2010063418A1 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
06/10/2010WO2010042141A3 Energy sources for curing in an imprint lithography system
06/10/2010WO2010042140A3 Template having alignment marks formed of contrast material
06/10/2010WO2010037732A3 Projection exposure apparatus for microlithography for the production of semiconductor components
06/10/2010WO2010037476A3 Microlithographic projection exposure apparatus
06/10/2010WO2010007036A3 Optical device having a deformable optical element
06/10/2010US20100144074 Method of fabricating an array substrate for liquid crystal display device
06/10/2010US20100143850 Method of Manufacturing a Semiconductor Device
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