Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/17/2010WO2010068027A2 Positive photosensitive organic-inorganic hybrid insulator composition
06/17/2010WO2010067906A1 Composition for patterning on thermostable transparent insulator thin film and patterning method of thin film
06/17/2010WO2010067905A2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
06/17/2010WO2010067898A2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
06/17/2010WO2010067665A1 Photosensitive insulating resin composition and cured product thereof
06/17/2010WO2010067627A1 Precursor for acid-dissociable dissolution-inhibitive group and cyclic compound having acid-dissociable dissolution-inhibitive group
06/17/2010WO2010067622A1 Stereoisomeric cyclic compounds, manufacturing method therefor, compositions comprising the stereoisomeric cyclic compounds and manufacturing method therefor
06/17/2010WO2010067621A1 Cyclic compounds and photoresist compositions using same
06/17/2010WO2010067597A1 Light source apparatus, exposure apparatus and device manufacturing method
06/17/2010WO2010067484A1 Method for exposing semiconductor substrate and semiconductor device manufacturing system
06/17/2010WO2010066873A1 Gravitation compensation for optical elements in projection lighting systems
06/17/2010WO2010066820A1 Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
06/17/2010WO2010066515A1 Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
06/17/2010WO2010066056A1 System for transferring data and use thereof
06/17/2010WO2010047755A3 Gas environment for imprint lithography
06/17/2010WO2010043946A3 Bottom antireflective coating compositions
06/17/2010WO2010032878A3 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
06/17/2010WO2010025032A3 Method for optical proximity correction, design and manufacturing of a reticle using variable shaped beam lithography
06/17/2010US20100151610 Composition for photoresist stripper and method of fabricating thin film transistor array substrate
06/17/2010US20100151395 Protective film-removing solvent and method of photoresist patterning with it
06/17/2010US20100151394 System for Contactless Cleaning, Lithographic Apparatus and Device Manufacturing Method
06/17/2010US20100151393 Method of manufacturing nano-structure and method of manufacturing a pattern using the method
06/17/2010US20100151392 Antireflective coating compositions
06/17/2010US20100151391 Method and apparatus for high density storage of analog data in a durable medium
06/17/2010US20100151390 Method of making a photopolymer printing plate
06/17/2010US20100151389 Alkaline developable photosensitive materials
06/17/2010US20100151388 (Meth)acrylate compound, photosensitive polymer, and resist composition including the same
06/17/2010US20100151387 High resolution, solvent resistant, thin elastomeric printing plates
06/17/2010US20100151386 Photobase generator and photocurable resin composition
06/17/2010US20100151385 Stack of negative-working imageable elements
06/17/2010US20100151384 Composition for resist underlayer film and process for producing same
06/17/2010US20100151383 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
06/17/2010US20100151382 Bottom resist layer composition and patterning process using the same
06/17/2010US20100151381 Antireflective coating composition, antireflective coating , and patterning process
06/17/2010US20100151380 Resist composition
06/17/2010US20100151379 Compound and chemically amplified resist composition containing the same
06/17/2010US20100151365 Patterning Methods and Masks
06/17/2010US20100150506 Polymer optical waveguide forming material, polymer optical waveguide and manufacturing method of polymer optical waveguide
06/17/2010US20100149672 Optical filter and manufacturing method thereof
06/17/2010US20100149671 High positioning reproducible low torque mirror - actuator interface
06/17/2010US20100149517 Projection objective and method for its manufacture
06/17/2010US20100149511 Illumination optical system, exposure apparatus, and exposure method
06/17/2010US20100149504 Illumination device of a microlithographic projection exposure apparatus, and microlithographic projection exposure method
06/17/2010US20100149481 Manufacturing method of mold and method for forming liquid crystal display using the same
06/17/2010US20100149460 Liquid Crystal Display Device and Method for Manufacturing the Same
06/17/2010US20100147693 Device and method for manufacturing a particulate filter with regularly spaced micropores
06/17/2010DE102009054549A1 Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen Gravity compensation for optical elements in projection exposure apparatus
06/17/2010DE102008061998A1 Method for manufacturing embossing roller for planishing tool to form diffraction effect-images, involves corroding areas of sheet metal up to pre-determined corroding depth, so that sheet metal is optionally bent to form cylinder section
06/17/2010CA2744826A1 System for transferring data and use thereof
06/16/2010EP2197014A2 System for exposure of a substrate with several individually shaped charged particle beams for high resolution lithography of structured patterns
06/16/2010EP2196858A1 Coated-type silicon-containing film stripping process
06/16/2010EP2196857A2 Lithographic apparatus and device manufacturing method
06/16/2010EP2196856A1 System for transmitting data and its application
06/16/2010EP2196855A1 Exposure head and method for producing printing plates
06/16/2010EP2196854A1 Composition containing polymer having nitrogenous silyl group for forming resist underlayer film
06/16/2010EP2196853A1 Polymerizable compound and polymer compound obtained by using the same
06/16/2010EP2196852A1 Positive-type photosensitive resin composition, and method for formation of cured film using the same
06/16/2010EP2196851A1 Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
06/16/2010EP2196850A1 Positive photosensitive resin composition, cured film, protective film, insulating film and semiconductor device
06/16/2010EP2196838A1 Chromatically corrected catadioptric objective and projection exposure apparatus including the same
06/16/2010EP2196462A1 Polymerizable compound, lactone-containing compound, method for manufacturing lactone-containing compound and polymer compound obtained by polymerizing the polymerizable compound
06/16/2010EP2195710A1 Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
06/16/2010EP2195381A2 Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers
06/16/2010EP1384394B1 Method for the generation of far ultraviolet or soft x-ray radiation
06/16/2010EP1290497B1 Method for the production of a template and the template thus produced
06/16/2010CN201508461U Multifunctional transmission system of version punching machine
06/16/2010CN201508460U Liquid circulating pipeline
06/16/2010CN201508459U Transmission roll-shaft pressure adjusting mechanism
06/16/2010CN201506741U Ultrapure water filtering system
06/16/2010CN1961259B Fabrication and use of superlattice
06/16/2010CN1955842B Photoetching equipment
06/16/2010CN1924709B Heating apparatus, and coating and developing apparatus
06/16/2010CN1912743B Photosensitive resin composition for forming functional pattern and functional pattern forming method
06/16/2010CN1885163B Negative resist composition
06/16/2010CN1875323B Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition
06/16/2010CN1867695B Method of improving post-develop photoresist profile on a deposited dielectric film
06/16/2010CN1864099B Positively photosensitive insulating resin composition and cured object obtained therefrom
06/16/2010CN1863729B Method for patterning a substrate surface
06/16/2010CN1860412B Block copolymer composition for photosensitive flexographic plate
06/16/2010CN1849559B Positive photoresist composition and resist pattern formation method
06/16/2010CN1808272B Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same
06/16/2010CN1800985B Method for correcting mask pattern, photomask, semiconductor device, and method for fabricating the same
06/16/2010CN1705912B Pattern forming materials and pattern formation method using the materials
06/16/2010CN1690865B Photoresist stripper
06/16/2010CN1690855B Liquid radiation-curable composition, and method for producing cured articles or 3-D shaped product by using the same
06/16/2010CN1690853B Photosensitive resin composition and photosensitive dry film containing the same
06/16/2010CN1603114B Substrate for inkjet printing and method of manufacturing the same
06/16/2010CN101743515A Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
06/16/2010CN101743514A Color composition and color filter using the same
06/16/2010CN101743497A Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
06/16/2010CN101740359A Nickel stripping method in method for manufacturing low-temperature polysilicon
06/16/2010CN101740343A High-accuracy composite disk structure and application thereof
06/16/2010CN101740334A Photoetching pretreating method and photoetching method
06/16/2010CN101738882A Alignment mark detecting method and apparatus
06/16/2010CN101738881A Two-stage image precise contraposition method for upper plate and lower plate and device thereof
06/16/2010CN101738880A Thick film photoresist detergent
06/16/2010CN101738879A Cleaning agent for thick film photoresist
06/16/2010CN101738878A Photoresist cleaning fluid composition and application thereof
06/16/2010CN101738877A Method for removing photoresist and plasma processing equipment applying same
06/16/2010CN101738876A Developing method and developing apparatus
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