Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2010
06/23/2010CN1751378B Detection method for optimum position detection formula, alignment method, exposure method, device production method, and device
06/23/2010CN1722366B Method for manufacturing semiconductor device
06/23/2010CN1689802B Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
06/23/2010CN1574163B Photocured resin composition and former substrate of plasm display board
06/23/2010CN1573566B Masking device
06/23/2010CN1573546B Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the displ
06/23/2010CN1444740B Improved method for developing process in wafer photolithography
06/23/2010CN101755369A Engraving with amplifier having multiple exit ports
06/23/2010CN101755239A Debris prevention system and lithographic apparatus
06/23/2010CN101755238A Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article
06/23/2010CN101755237A Method for patterning a surface
06/23/2010CN101755231A Projection objective
06/23/2010CN101755188A Measurement method, stage apparatus, and exposure apparatus
06/23/2010CN101754588A Method for flattening film layer
06/23/2010CN101753862A Solid-state imaging device, method of producing the same, and camera
06/23/2010CN101752643A Three-dimensional photoetching method for antenna manufacture
06/23/2010CN101752228A Photolithography
06/23/2010CN101752216A Method of manufacturing semiconductor device, exposure device, and recording medium
06/23/2010CN101752162A Photosensitive conductive paste, and electrode and plasma display panel formed using the same
06/23/2010CN101750917A Remover composition for photoresist and method for removing photoresist
06/23/2010CN101750916A Composition for photoresist stripper and method of fabricating thin film transistor array substrate
06/23/2010CN101750915A Semiconductor wafer metal protection liquid and use method thereof
06/23/2010CN101750914A Photoresist detergent composition
06/23/2010CN101750913A Cleaning solution for removing residues on photoresist layer
06/23/2010CN101750912A Photoresist detergent composition
06/23/2010CN101750911A Photoresist detergent composition
06/23/2010CN101750910A Developer solution component
06/23/2010CN101750909A Developer solution component
06/23/2010CN101750908A Developer solution component
06/23/2010CN101750907A Lithographic apparatus and method of irradiating at least two target portions
06/23/2010CN101750906A Method for a lithographic apparatus
06/23/2010CN101750905A Lithographic apparatus and device manufacturing method
06/23/2010CN101750904A Exposing apparatus for fabricating process of flat panel display device
06/23/2010CN101750903A Photolithography
06/23/2010CN101750902A Atomization effect compensation method of exposure conditions of diverse electron beams and exposure method thereof
06/23/2010CN101750901A Scanning exposure method
06/23/2010CN101750900A Method for determining photoetching procedure causing low yield rate in the unit of exposure area
06/23/2010CN101750899A Lithography layout and method for measuring lithography deformation thereof
06/23/2010CN101750898A Substrate coating method and substrate coating apparatus
06/23/2010CN101750897A Unit for providing chemical liquid, apparatus and method for treating substrate using the same
06/23/2010CN101750896A Fluorine-containing silicon low-surface-energy material for nano-imprinting and preparation method thereof
06/23/2010CN101750895A Silicon-containing (meth)acrylate light-cured stamping adhesive for ultraviolet nanometer-sized stamping and application thereof
06/23/2010CN101750894A Colored photosensitive resin composition
06/23/2010CN101750893A Radiation sensitive resin composition, spacer or protective film of liquid crystal display device, and method for forming the same
06/23/2010CN101750892A Photosensitive resin composite and color filter therefrom
06/23/2010CN101750891A Resist composition
06/23/2010CN101750890A Photosensitive black-colored resin composition, black matrix substrate, and manufacturing method of color filter
06/23/2010CN101750889A Photosensitive resin composite, preparation method thereof, and method for preparing SCE conductive film thereby
06/23/2010CN101750888A Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition
06/23/2010CN101750887A Photosensitive resin composite
06/23/2010CN101750886A Photosensitive resin composite and preparation method of color optical filter
06/23/2010CN101750885A Two-degree of freedom precise positioning work table
06/23/2010CN101750884A Layered radiation-sensitive materials with varying sensitivity
06/23/2010CN101750875A Method for monitoring photoetching quality
06/23/2010CN101750872A Mask cassette
06/23/2010CN101750664A Diffractive light guide film and preparation method thereof
06/23/2010CN101750649A Groove spacing accurately adjusting device in holographic grating manufacturing light path
06/23/2010CN101750038A Test wafer for edge detection and wafer edge detection method
06/23/2010CN101748621A Process method of blind embossing jacquard satin reactive print of towel
06/23/2010CN101748619A Process method of blind embossing jacquard satin print of towel
06/23/2010CN101747683A Nanometer pigment ink for computer to plate inkjet print and preparing method thereof
06/23/2010CN101747468A Copolymer and photosensitive resin composition
06/23/2010CN101747310A Compound and chemically amplified resist composition containing the same
06/23/2010CN101746957A Method of glass surface fine processing
06/23/2010CN101389476B Method for making a lithographic printing plate
06/23/2010CN101349869B System and method for aligning silicon chip by signal processing method
06/23/2010CN101349849B Display panel and manufacturing method thereof
06/23/2010CN101349825B Method for manufacturing transflective liquid crystal display panel
06/23/2010CN101249937B Method for processing micron/submicron sized block sample
06/23/2010CN101241314B 6 freedom degrees precision positioning station capable of compensating Z-direction position
06/23/2010CN101240996B Method for making high-temperature micrometre size speckle
06/23/2010CN101236362B Photo-etching machine projection objective wave aberration on-line detection method
06/23/2010CN101206365B Liquid crystal display element and method of manufacturing same
06/23/2010CN101197385B Image sensor and method for manufacturing the same
06/23/2010CN101197257B Method for forming micro-pattern in a semiconductor device
06/23/2010CN101158769B Liquid crystal display panel and method for producing same
06/23/2010CN101154047B Reworking processing method
06/23/2010CN101116037B Photosensitive composition removing liquid
06/22/2010US7741380 Polymerization initiator; and (meth)acrylic acid or monofunctional (meth)acrylic acid ester or amide each having a carboxy group in the molecule, e.g., mono(acryloyloxyethyl) succinate; cured with high sensitivity by ultrarviolet radiation; provides a high quality and sufficiently flexible image
06/22/2010US7741260 Rinsing fluid for lithography
06/22/2010US7741016 Method for fabricating semiconductor device and exposure mask
06/22/2010US7741015 Reducing pitch between patterns by half; applying positive resist comprising acid generator and 7-oxanorbornane ring bearing acrylic copolymer with acid labile groups; heat treating and exposing to high energy radiation, second heat treatment with developer then crosslinking
06/22/2010US7741014 e.g a glass surface, comprises a thiol molecule attached thereon, exposing the surface to electromagnetic radiation, and altering the layer of molecules to form a pattern comprising a first, second, and third region, differ from each other in physical and chemical properties
06/22/2010US7741013 photocurable photosensitive layer; image pattern using actinic radiation; adhesion promoter is oxalic acid catalyzed alkyl t-butyl/amyl phenolic resin; recovering thick film from a used sheet
06/22/2010US7741012 Method for removal of immersion lithography medium in immersion lithography processes
06/22/2010US7741011 Polymerizable composition and planographic printing plate precursor using the same, alkali-soluble polyurethane resin, and process for producing diol compound
06/22/2010US7741010 Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines
06/22/2010US7741009 Positive resist composition and method of forming resist pattern
06/22/2010US7741008 Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method
06/22/2010US7741007 Lithography; semiconductor microfabrication
06/22/2010US7741006 Laser patterning method for fabricating disc stamper
06/22/2010US7741004 Oxide of at least two of aluminum, tellurium, titanium and zirconium; reducing surface and line edge roughness; applying sol gel solution then thermochemical mode laser beam direct writing; compatibility, low cost
06/22/2010US7740996 Photosensitive resin composition and color filter
06/22/2010US7740992 detecting a distance between the exposure mask and the object to be exposed, before the exposure, and controlling the distance between the exposure mask and the object to be exposed, to control the amount of flexure of the exposure mask; lithographic exposure based on near-field light
06/22/2010US7740709 Apparatus for stripping photoresist and method thereof
06/22/2010US7740280 Substrate labeling system
06/17/2010WO2010068340A2 Techniques for marking product housings
06/17/2010WO2010068337A1 Wet-etchable antireflective coatings
06/17/2010WO2010068335A1 Method and apparatus for making liquid flexographic printing elements
06/17/2010WO2010068256A2 Counter sunk screen
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