| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/29/2010 | US7745101 Nanoparticle patterning process |
| 06/29/2010 | US7745100 Polymers, methods of use thereof, and methods of decomposition thereof |
| 06/29/2010 | US7745099 Photosensitive compound and photoresist composition including the same |
| 06/29/2010 | US7745098 Interpolymer of (meth)acrylic acid esters containing acid dissociable, dissolution inhibiting groups, such as 1-ethylcyclohexyl esters and cycloalkyl groups, especially adamantane rings; may also contain lactone rings; positive resists |
| 06/29/2010 | US7745097 Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern |
| 06/29/2010 | US7745096 Photosensitive polyimide composition, polyimide film and semiconductor device using the same |
| 06/29/2010 | US7745095 Lithographic method and device manufactured thereby |
| 06/29/2010 | US7745094 Photoacid generator, organonitrogen compound, and a silicone prepared by cohydrolysis of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively |
| 06/29/2010 | US7745093 Vinylimidazole-vinylpyrrolidone copolymer; amine sulfonate acid generator such asp-toluenesulfonic acid triethylamine salt; ethylene oxide adduct acetylenic glycol ether surfactant; and alkylated urea, oxazoline group-containing polymer, or polyamine curing agent;crosslinking, exposure to argon fluoride |
| 06/29/2010 | US7745092 Performing a first lithography step to print a first pattern on a substrate forming a first portion of an encoding pattern; performing a second lithography step to print a second pattern onthe substrate lateral offset from the first lithography step; bioassays |
| 06/29/2010 | US7745091 An encoded microparticle comprising a longest dimension < 50 microns;a plurality of segments, wherein the plurality of segments form a spatial code; and an outer surface encloses the spatial code where the spatial code is detectable through the outer surface; bioassays;accuracy; antiagglomerants |
| 06/29/2010 | US7745090 Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method |
| 06/29/2010 | US7745077 Composition for coating over a photoresist pattern |
| 06/29/2010 | US7745076 Dye-containing curable composition, color filter, and producing process thereof |
| 06/29/2010 | US7744963 Nanolithography methods and products therefor and produced thereby |
| 06/29/2010 | US7744768 Covering a surface of a resist pattern with a resin, a crosslinking agent, and an aromatic compound, an alicyclic compound, or a heterocyclic compound and pure water; heating to thicken; can be patterned by using ArF excimer laser, has a fine structure, and is excellent in etching resistance. |
| 06/29/2010 | US7743998 Stage device |
| 06/29/2010 | CA2247777C A process for manufacturing microstructure bodies |
| 06/24/2010 | WO2010071761A1 Cyclohexane oxidation process byproduct stream derivatives and methods for using the same |
| 06/24/2010 | WO2010071759A1 Cyclohexane oxidation process byproduct derivatives and methods for using the same |
| 06/24/2010 | WO2010071632A1 An imageable article |
| 06/24/2010 | WO2010071255A1 Hardmask composition with improved storage stability for forming resist underlayer film |
| 06/24/2010 | WO2010071240A1 Exposure apparatus and exposure method |
| 06/24/2010 | WO2010071239A1 Exposure apparatus, exposure method, and device manufacturing method |
| 06/24/2010 | WO2010071238A1 Movable body apparatus |
| 06/24/2010 | WO2010071234A1 Exposure apparatus, exposure method, and device manufacturing method |
| 06/24/2010 | WO2010071200A1 Photosensitive resin composition, photosensitive laminate, and flexographic printing plate |
| 06/24/2010 | WO2010071155A1 Silicon-containing resist underlayer film formation composition having anion group |
| 06/24/2010 | WO2010071103A1 Adamantane derivative, process for producing same, and cured object containing adamantane derivative |
| 06/24/2010 | WO2010071100A1 Positive-type photosensitive polyimide resin composition |
| 06/24/2010 | WO2010071081A1 Top coat composition |
| 06/24/2010 | WO2010071029A1 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation |
| 06/24/2010 | WO2010070988A1 Method for forming projected pattern, exposure apparatus and photomask |
| 06/24/2010 | WO2010070918A1 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure |
| 06/24/2010 | WO2010070785A1 Resist material and method for pattern formation using the resist material |
| 06/24/2010 | WO2010070162A1 System for processing a lithography sample by laser beam interference |
| 06/24/2010 | WO2010069758A1 Polymerizable photoinitiators and radiation curable compositions |
| 06/24/2010 | WO2010069757A1 Calibration method, inspection method and apparatus, lithographic apparatus, and lithographic processing cell |
| 06/24/2010 | WO2010069754A1 Cationic radiation curable compositions |
| 06/24/2010 | WO2010069497A1 Wafer chuck for euv lithography |
| 06/24/2010 | WO2010046410A3 Method of compensation for bleaching of resist during three-dimensional exposure of resist |
| 06/24/2010 | WO2010046408A3 Method of iterative compensation for non-linear effects in three-dimensional exposure of resist |
| 06/24/2010 | WO2010046407A3 Multi-focus method of enhanced three-dimensional exposure of resist |
| 06/24/2010 | US20100159691 Photosensitive resin composition and laminate |
| 06/24/2010 | US20100159617 Semiconductor-device manufacturing method and exposure method |
| 06/24/2010 | US20100159405 Method of manufacturing structure and method of manufacturing ink jet head |
| 06/24/2010 | US20100159404 Patterning process |
| 06/24/2010 | US20100159403 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 06/24/2010 | US20100159402 Method, program and system for processing substrate |
| 06/24/2010 | US20100159401 Projection optical system, exposure system, and exposure method |
| 06/24/2010 | US20100159400 Composition for removing a photoresist pattern and method of forming a metal pattern using the composition |
| 06/24/2010 | US20100159399 Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless |
| 06/24/2010 | US20100159398 Layered radiation-sensitive materials with varying sensitivity |
| 06/24/2010 | US20100159397 Method and System for Forming a Data Recording Medium |
| 06/24/2010 | US20100159396 Method for production of a medical marker |
| 06/24/2010 | US20100159395 Method of differentiation of unexposed and exposed planographic printing plates |
| 06/24/2010 | US20100159394 Method of making a planographic printing plate |
| 06/24/2010 | US20100159393 Method of developing lithographic printing plate precursors |
| 06/24/2010 | US20100159392 Patterning process and resist composition |
| 06/24/2010 | US20100159391 Photosensitive paste and process for production of pattern using the same |
| 06/24/2010 | US20100159390 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
| 06/24/2010 | US20100159389 Resin, resist composition and method of forming resist pattern |
| 06/24/2010 | US20100159388 Lithographic printing plate precursor |
| 06/24/2010 | US20100159372 Substrate processing apparatus and substrate processing method |
| 06/24/2010 | US20100159371 Pigment dispersion solution, pigment photoresist and color filter |
| 06/24/2010 | US20100159369 Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit |
| 06/24/2010 | US20100159219 Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes |
| 06/24/2010 | US20100159217 Negative-type photosensitive resin composition, method for forming patterns, and electronic parts |
| 06/24/2010 | US20100159191 Processed substrate and method for manufacturing same |
| 06/24/2010 | US20100157475 Stepped main pole for perpendicular write heads in hard disk drives and method of making same |
| 06/24/2010 | US20100157270 Apparatus for manipulation of an optical element |
| 06/24/2010 | US20100157262 Exposure apparatus and device manufacturing method |
| 06/24/2010 | US20100157212 Method of producing liquid crystal cell substrate, liquid crystal cell substrate, and liquid crystal display device |
| 06/24/2010 | US20100156290 Paste composition for electrode, plasma display panel including the electrode, and associated methods |
| 06/24/2010 | US20100154993 Separation methods for imprint lithography |
| 06/24/2010 | US20100154833 Resist film removing apparatus, resist film removing method, organic matter removing apparatus and organic matter removing method |
| 06/24/2010 | DE102009052739A1 Messsystem zur Bestimmung der Position und/oder Lage einer reflektiven optischen Komponente Measuring system for determining the position and / or orientation of a reflective optical component |
| 06/23/2010 | EP2200070A1 Illuminating optical apparatus, and exposure method and apparatus |
| 06/23/2010 | EP2199861A1 Composition for forming silicon-containing fine pattern and method for forming fine pattern using the same |
| 06/23/2010 | EP2199860A1 Method and system for measuring a position of an object. |
| 06/23/2010 | EP2199859A2 Exposure apparatus, exposure method, and device producing method |
| 06/23/2010 | EP2199858A1 Lithographic apparatus and method of irradiating at least two target portions |
| 06/23/2010 | EP2199857A1 Radiation source, lithographic apparatus and device manufacturing method |
| 06/23/2010 | EP2199856A1 Cationic radiation curable compositions |
| 06/23/2010 | EP2199855A1 Methods and processes for modifying polymer material surface interactions |
| 06/23/2010 | EP2199854A1 Process and method for modifying polymer film surface interaction |
| 06/23/2010 | EP2199379A1 Wet clean compositions for CoWP and porous dielectrics |
| 06/23/2010 | EP2199273A1 Polymerizable photoinitiators and radiation curable compositions |
| 06/23/2010 | EP2199049A1 TiO2-CONTAINING QUARTZ GLASS SUBSTRATE |
| 06/23/2010 | EP2198344A1 Microlithographic projection exposure apparatus |
| 06/23/2010 | EP2197924A2 Polymers for use in photoresist compositions |
| 06/23/2010 | EP2197869A1 Sulphonium salt initiators |
| 06/23/2010 | EP2197840A1 Sulphonium salt initiators |
| 06/23/2010 | EP2197839A1 Sulphonium salt initiators |
| 06/23/2010 | CN201514541U High-temperature oven for rotary screen |
| 06/23/2010 | CN1976962B Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon |
| 06/23/2010 | CN1975583B Method and system to restore transverse magnetic wave contrast in lithographic processing |
| 06/23/2010 | CN1958301B A method of patterning molecules on a substrate using a micro-contact printing process |
| 06/23/2010 | CN1912744B Method of uniformly coating a substrate |
| 06/23/2010 | CN1773376B Substrate processing apparatus and substrate processing method |