Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2010
07/01/2010US20100167537 Partitioning features of a single ic layer onto multiple photolithographic masks
07/01/2010US20100167484 Gate line edge roughness reduction by using 2P/2E process together with high temperature bake
07/01/2010US20100167476 Photoresist composition and method of fabricating thin film transistor substrate
07/01/2010US20100167472 Implantation shadowing effect reduction using thermal bake process
07/01/2010US20100167217 Method of forming resist pattern
07/01/2010US20100167216 Exhaust apparatus, processing apparatus, and device manufacturing method
07/01/2010US20100167215 Composite substrate and method for forming metal pattern
07/01/2010US20100167214 Method of forming fine pattern using block copolymer
07/01/2010US20100167213 Semiconductor device manufacturing method
07/01/2010US20100167212 Resist underlayer composition and method of manufacturing integrated circuit device using the same
07/01/2010US20100167211 Method for forming fine patterns in a semiconductor device
07/01/2010US20100167210 Multi-layer embedded capacitance and resistance substrate core
07/01/2010US20100167209 Method of using mask film to form relief images
07/01/2010US20100167208 Water soluble photosensitive polymide polymer, its preparation and photoresist containing the same
07/01/2010US20100167207 Chemically amplified positive resist composition and resist patterning process
07/01/2010US20100167206 Photoresist composition and method for manufacturing a display substrate using the photoresist composition
07/01/2010US20100167205 Thermally curable solder resist composition
07/01/2010US20100167204 Radiation-sensitive insulation resin composition, cured article, and electronic device
07/01/2010US20100167203 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
07/01/2010US20100167202 Photosensitive flexographic printing original plate
07/01/2010US20100167201 A resist for negative tone development comprising a resin increasing polarity by the action of an acid to increase the solubility in a positive tone developer and decrease the solubility in a negative tone; acid generator with actinic radiation, and a solvent; undercutting smoothness
07/01/2010US20100167200 (Meth)acrylate compound, photosensitive polymer, and resist composition including the same
07/01/2010US20100167199 Chemically amplified positive resist composition
07/01/2010US20100167190 Pattern-correction supporting method, method of manufacturing semiconductor device and pattern-correction supporting program
07/01/2010US20100167189 Optically Compensated Unidirectional Reticle Bender
07/01/2010US20100167188 Pigment Dispersion Composition, Resist Composition for Color Filter Including the Same, and Color Filter Using the Same
07/01/2010US20100167183 Method and apparatus for performing model-based layout conversion for use with dipole illumination
07/01/2010US20100167178 Oxime sulfonates and the use thereof as latent acids
07/01/2010US20100167081 Resin composition containing catalyst precursor for electroless plating in forming electro-magnetic shielding layer, method of forming metallic pattern using the same, and metallic pattern formed by the same method
07/01/2010US20100167024 Negative-tone radiation-sensitive composition, cured pattern forming method, and cured pattern
07/01/2010US20100167021 Semiconductor structure and method of fabricating the same
07/01/2010US20100165340 Spectroscopic scatterometer system
07/01/2010US20100165251 Microlens assembly formed with curved incline and method for manufacturing the same, and light guiding plate, back light unit and display using the same
07/01/2010US20100164911 Photosensitive resist composition for color filters for use in electronic paper display devices
07/01/2010US20100163849 Double pass formation of a deep quantum well in enhancement mode iii-v devices
07/01/2010US20100163708 Mold core and method for fabricating mold core
07/01/2010DE102009055303A1 Verbundsubstrat und Verfahren zur Ausbildung eines Metallmusters Composite substrate and method for forming a metal pattern
07/01/2010DE102009049287A1 Verfahren zur Herstellung eines medizinischen Markers A method for producing a medical marker
07/01/2010DE102009028773A1 Extreme UV lithography system qualifying method for use in semiconductor industry, involves detecting electromagnetic radiation in viewing plane of lithographic system, where radiation is emitted by simulation illumination device
07/01/2010DE102008064504A1 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie The projection exposure method and projection exposure system for microlithography
06/2010
06/30/2010EP2202780A2 Light source device
06/30/2010EP2202779A2 Light source
06/30/2010EP2202778A2 Light source
06/30/2010EP2202742A1 Concave portion forming method, concave-convex product manufacturing method, light-emitting element manufacturing method, and optical element manufacturing method
06/30/2010EP2202581A1 Lithographic apparatus and positioning apparatus
06/30/2010EP2202580A1 Illumination system of a microlithographic projection exposure apparatus
06/30/2010EP2202579A2 Chemically amplified photoresist composition, photoresist laminated product, manufacturing method for photoresist composition, manufacturing method for photoresist pattern, and manufacturing method for connection element
06/30/2010EP2202578A1 Etching resist
06/30/2010EP2202577A1 Chemically amplified positive resist composition and resist patterning process
06/30/2010EP2202426A2 A method for damping an object, an active damping system, and a lithographic apparatus
06/30/2010EP2200811A1 Peeling imaged media from a substrate
06/30/2010EP1953117B1 Scanning jet nanolithograph and the operation method thereof
06/30/2010EP1676173B1 Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
06/30/2010CN201516723U Novel net plate
06/30/2010CN1965265B Chemically amplified resist composition and method for forming resist pattern
06/30/2010CN101765908A Method for manufacturing semiconductor device, semiconductor device, and exposure apparatus
06/30/2010CN101765811A Lithographic apparatus and device manufacturing method
06/30/2010CN101765810A Positive photosensitive resin composition for spray coating, method for forming cured film using the same, cured film and semiconductor device
06/30/2010CN101765809A Imprint method and processing method of substrate using the imprint method
06/30/2010CN101765799A Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
06/30/2010CN101764080A Ashing treatment method in dual damascene process
06/30/2010CN101764053A Photoetching method
06/30/2010CN101763124A A method for damping an object, an active damping system, and a lithographic apparatus
06/30/2010CN101762993A Method for removing photoresist and method for manufacturing connecting hole
06/30/2010CN101762992A Positive thermosensitive CTP version developer solution
06/30/2010CN101762991A Heat-sensitive CTP (computer-to-plate) developing solution
06/30/2010CN101762990A Lithographic apparatus with sensor mount
06/30/2010CN101762989A Method for improving reliability of photosensitive materials of flat-panel display
06/30/2010CN101762988A Optimization method and a lithographic cell
06/30/2010CN101762987A Illumination system of a microlithographic projection exposure apparatus
06/30/2010CN101762986A Fluid extraction system, lithographic apparatus and device manufacturing method
06/30/2010CN101762985A Apparatus for processing a substrate
06/30/2010CN101762984A Photoresist instillation system, photoresist nozzle and application method thereof
06/30/2010CN101762983A Photoresist coating process using ordinary nozzle for reducing inhibitive gum consumption
06/30/2010CN101762982A Infrared positive thermal-sensitive offset plate
06/30/2010CN101762981A Chemically amplified positive resist composition and resist patterning process
06/30/2010CN101762980A Composition for simultaneously forming two isolated column spacer patterns
06/30/2010CN101762979A Coloring photosensitive resin composition and method for preparing color optical filter
06/30/2010CN101762978A Etching resist
06/30/2010CN101762977A Thermosensitive CTP thermolabile imaging liquid using luminol compound as additive
06/30/2010CN101762976A Application of active etherate containing pyrogallol acetonide resin as heat-sensitive CTP thermo-sensitive imaging liquid of dissolution inhibitor
06/30/2010CN101762975A Thermosensitive cytidine triphosphate (CTP) sensible-heat imaging solution of barbituric acid compound as additive
06/30/2010CN101762974A Heat-sensitive CTP heat-sensible image-forming liquid with carboxyl phenolic resin active ester and etherate as dissolving inhibitor
06/30/2010CN101762973A Radiation sensitive composition and manufacturing method thereof
06/30/2010CN101762972A Infrared positive thermal-sensitive imaging composition
06/30/2010CN101762971A Method for manufacturing fiber array V-shaped groove by photoetching technology
06/30/2010CN101762970A Manufacturing method of etched substrate and light-sensitive resin composition
06/30/2010CN101762969A Microlens mask of image sensor and method for forming microlens using the same
06/30/2010CN101759813A Method for preparing alkali soluble resin
06/30/2010CN101382611B Method for producing large area holographic grating based on second exposure of reference grating
06/30/2010CN101297223B Substrate with septum for use in ink jet color filter, method for manufacture of the substrate, color filter provided with the substrate, method for manufacture of the color filter, and liquid crystal
06/30/2010CN101266366B LCD alignment method
06/30/2010CN101261454B Method for accomplishing sub-wavelength interference photolithography utilizing multiple layer metal dielectric-coating structure
06/30/2010CN101216684B Spherical surface photolithography system with area differentiation
06/29/2010US7746575 Support mechanism, exposure apparatus having the same, and aberration reducing method
06/29/2010US7746445 Lithographic apparatus, device manufacturing method and a substrate
06/29/2010US7745506 A hydroxy-C4-12-alkyl acrylate, a di(meth)acrylate, and a photoinitiator; e.g., 4-hydroxybutyl methacrylate, bisphenol A bis(acryloyloxyethyl) ether, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone; high sensitivity; soft and highly fine patterns
06/29/2010US7745104 Bottom resist layer composition and patterning process using the same
06/29/2010US7745103 Exposure, cleaning, and drying z photosensitive resin film; radiating laser on the concave-convex pattern of the semi-finished decoration film; smooth concave-convex parts and/or provide difference in height of a convex part and depth of a concave part; automobile instrument panels; cost efficiency
06/29/2010US7745102 disposing a tri(1H,1H-perfluorooctyl-1-oxy)tridecafluoro-1,1,2,2-tetrahydrooctylsilane silane and Tri(1H,1H-heptafluoro-1-butoxy)methylgermane compounds such that radiation passes through at least a portion of the liquid before impinging on a surface to perform lithography at short wavelength
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