Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2010
07/07/2010EP2204695A1 Etendue adjuster for a pulsed beam
07/07/2010EP2204694A1 Compositions and processes for photolithography
07/07/2010EP2204677A1 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
07/07/2010EP2204399A2 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
07/07/2010EP2204392A1 Compositions and processes for photolithography
07/07/2010EP2203787A1 Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
07/07/2010EP2203786A1 Illumination system optical element with an electrically conductive region
07/07/2010EP2203785A1 Imaging optical system and projection exposure installation
07/07/2010EP2203784A2 Displacement device with precision position measurement
07/07/2010EP2203783A2 Thick film resists
07/07/2010EP2203778A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
07/07/2010EP2203529A1 Lithography of nanoparticle based inks
07/07/2010EP1902019B1 Sulphonium salt initiators
07/07/2010CN201522612U Direct writing lithography machine with OLED light source
07/07/2010CN1971428B Manufacturing method of semiconductor device using immersion lithography process
07/07/2010CN1920663B Method for manufacturing printing plate
07/07/2010CN1903449B Coating device and coating method
07/07/2010CN1885171B Lithographic apparatus and device manufacturing method
07/07/2010CN1885169B Lithographic apparatus and device manufacturing method
07/07/2010CN1873541B Exposure device of basal plate chuck with good flatness
07/07/2010CN1782873B Photosensitive resin composition and method for preparing the same and photosensitive film comprising the same
07/07/2010CN1782868B Photo mask and method for manufacturing patterns using the same
07/07/2010CN1746775B Lithographic apparatus and device manufacturing method
07/07/2010CN101772735A Radiation-sensitive resin composition
07/07/2010CN101772734A Positive photosensitive resin composition, cured film, protective film, insulating film and semiconductor device
07/07/2010CN101772720A Optical element holding apparatus, lens barrel, exposure apparatus and device manufacturing method
07/07/2010CN101771130A Method for photoetching piezoelectric film transducers on two sides of acoustic bulk wave
07/07/2010CN101770940A Laminated bottom antireflex structure and etching method
07/07/2010CN101770188A Method for removing cold-embossing residual adhesive layer
07/07/2010CN101770187A Plate surface treatment agent for lithographic princting plate and method for treating lithographic printing plate
07/07/2010CN101770186A Developer solution for positive lithoprinting plate
07/07/2010CN101770185A Developing method capable of reducing defects
07/07/2010CN101770184A Matting agent for PS plate and preparation method thereof
07/07/2010CN101770183A Circuit image transferring process
07/07/2010CN101770182A Three-degree of freedom flexible precision positioning workbench
07/07/2010CN101770181A Double-workpiece-table system of lithography machine
07/07/2010CN101770180A Cable stage for lithography wafer stages, adopting multi-joint manipulators
07/07/2010CN101770179A Device for regulating temperature of laser module in printing plate exposer
07/07/2010CN101770178A 光源装置 The light source device
07/07/2010CN101770177A Photomask-free type exposure system
07/07/2010CN101770176A Resist lower layer combination and method for manufacturing integrated circuit devices by using the same
07/07/2010CN101770175A Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
07/07/2010CN101770174A Flexible photosensitive resin plate and preparation method thereof
07/07/2010CN101770173A Chemically amplified positive resist composition
07/07/2010CN101770172A Organic layer photosensitive resin composition and organic layer fabricated using same
07/07/2010CN101770171A Photosensitive composition, sealing structure and manufacturing method of sealing structure
07/07/2010CN101770170A Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same
07/07/2010CN101770169A Positive lithograph plate photosensitive composition with high resolution and high sensitivity
07/07/2010CN101770168A Photosensitive resin composition
07/07/2010CN101770167A Positive type infrared light sensitive composition and positive heat-sensitive lithographic plate
07/07/2010CN101770166A Two-translational-motion precision positioning working table for nano-imprint photoetching system
07/07/2010CN101770165A Imprinting template
07/07/2010CN101770164A Impressing hard template in nanostructure
07/07/2010CN101770163A Manufacturing method of mold insert
07/07/2010CN101770108A Color film substrate, manufacture method thereof and liquid-crystal display panel
07/07/2010CN101770050A Manufacture method and device of color filter
07/07/2010CN101769856A Substrate for detecting samples, bio-chip employ the same, method of fabricating the substrate for detecting samples, and apparatus for detecting bio-material
07/07/2010CN101768232A Vinyl polymer, light-sensitive combination containing vinyl polymer and lithographic printing plate
07/07/2010CN101261331B Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method
07/07/2010CN101150048B Method for forming patterns using single mask
07/06/2010US7751129 Refractive projection objective for immersion lithography
07/06/2010US7751046 Methods and systems for determining a critical dimension and overlay of a specimen
07/06/2010US7751028 Exposure apparatus and method
07/06/2010US7751025 Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
07/06/2010US7750061 Ink for printing on a game ball
07/06/2010US7750059 Forming design on surface; applying polymer as liquid; crosslinking, curing
07/06/2010US7749823 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
07/06/2010US7749691 latent imaging; color filters; photomasks; semiconductors
07/06/2010US7749689 Generating meniscus on surface of substrate and applying light there through
07/06/2010US7749684 photocatalysts; colloids; waste treatment
07/06/2010US7749683 Photopolymerizable composition
07/06/2010US7749682 Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall
07/06/2010US7749681 naphthalene containing monomers; photoresists; integrated circuits; lithography
07/06/2010US7749680 Photoresist composition and method for forming pattern of a semiconductor device
07/06/2010US7749679 contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure
07/06/2010US7749678 Photosensitive composition and pattern forming method using the same
07/06/2010US7749677 Mixture of polysilsesquioxane and acid generator
07/06/2010US7749676 Positive type dry film photoresist and composition for preparing the same
07/06/2010US7749665 photoresists, photomasks; immersion lithography; latent images
07/06/2010US7749664 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance
07/06/2010CA2401111C Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a bragg grating, and dispersion compensating device using the optical fiber
07/01/2010WO2010075485A1 Photosensitive paste and process for production of pattern using the same
07/01/2010WO2010075158A1 Roll-to-roll digital photolithography
07/01/2010WO2010074659A1 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
07/01/2010WO2010074197A1 Photosensitive resin composition
07/01/2010WO2010074075A1 Additive for composition for forming resist underlayer film and composition for forming resist underlayer film comprising the same
07/01/2010WO2010073948A1 Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
07/01/2010WO2010073934A1 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same
07/01/2010WO2010073887A1 Photoresist remover composition, method for removing photoresist of multilayer metal circuit board, and method for producing multilayer metal circuit board
07/01/2010WO2010073801A1 Illumination optical system, exposure apparatus, and device manufacturing method
07/01/2010WO2010073795A1 Illumination optical system, exposure apparatus, and device manufacturing method
07/01/2010WO2010073794A1 Illumination optical system, exposure apparatus, and device manufacturing method
07/01/2010WO2010073390A1 Method for forming pattern, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern
07/01/2010WO2010072861A1 Procedure for manufacturing nanochannels
07/01/2010WO2010072429A1 A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method
07/01/2010WO2010072390A1 Method and composition for producing optical elements having a gradient structure
07/01/2010WO2010072157A1 Thermosensitive imaging composition and lithographic plate comprising the same
07/01/2010WO2010037453A9 Field facet mirror for use in an illumination optics of a projection exposure appratus for euv microlithography
07/01/2010WO2010036080A3 Photosensitive resin composition for black matrix
07/01/2010WO2009147014A9 Multilayer mirror and lithographic apparatus
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