Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2010
07/15/2010US20100177546 Semiconductor device
07/15/2010US20100177488 Vinyl Addition Polycyclic Olefin Polymers Prepared With Non-Olefinic Chain Transfer Agents And Uses Thereof
07/15/2010US20100177295 Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below other stage
07/15/2010US20100177293 Polarization-modulating optical element
07/15/2010US20100177289 Immersion Fluid for Immersion Lithography, and Method of Performing Immersion Lithography
07/15/2010US20100176492 Method for Forming a Pattern on a Semiconductor Using an Organic Hard Mask
07/15/2010US20100176313 Extreme ultraviolet light source
07/15/2010US20100175767 Microfabricated Elastomeric Valve and Pump Systems
07/15/2010DE102008054844A1 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Projektionsbelichtungsverfahren Illumination device of a microlithography projection exposure apparatus and microlithographic projection exposure method
07/14/2010EP2207197A2 Photoresist residue removal composition
07/14/2010EP2207064A1 Method of selecting a set of illumination conditions of a lithographic apparatus for optimizing an integrated circuit physical layout
07/14/2010EP2207063A1 Wavefront-aberration-measuring device and exposure apparatus
07/14/2010EP2207062A2 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
07/14/2010EP2207061A2 A system to vary dimensions of a template
07/14/2010EP2207060A1 High quality and ultra large screen liquid crystal display device and production method thereof
07/14/2010EP2206019A2 Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method.
07/14/2010EP2206018A1 Optical unit, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method
07/14/2010EP2206017A1 Fabrication of silk fibroin photonic structures by nanocontact imprinting
07/14/2010EP2206016A1 Pad microprinting device and methods, and pad for this device
07/14/2010EP2206015A2 Polar polydimethylsiloxane molds, methods of making the molds, and methods of using the molds for pattern transfer
07/14/2010EP2205682A2 Diketopyrrolopyrrole pigment composition for use in color filters
07/14/2010EP2205521A1 Tool for making microstructured articles
07/14/2010CN201527542U Self-adjusting pinch device used in making PS edition
07/14/2010CN201527541U Multi-mask aligner silicon wafer platform system
07/14/2010CN201527540U Coating drying box used in making PS edition
07/14/2010CN1955841B Laser induced thermal imaging mask and fabrication method for organic electroluminescent device
07/14/2010CN1879046B Apparatus for manipulation of an optical element
07/14/2010CN1800917B Array substrate and display panel having the same
07/14/2010CN1749851B Mask plate supply system, method for producing mask plate and mask plate transparent substrate
07/14/2010CN101779166A Hydrocarbon getter for lithographic exposure tools
07/14/2010CN101779165A Photosensitive resin composition and laminate thereof
07/14/2010CN101779164A Production of stamps, masks or templates for semiconductor device manufacturing
07/14/2010CN101778876A Antireflective coating composition
07/14/2010CN101778818A Aromatic sulfonium salt compound
07/14/2010CN101776853A Composition for removing residue of photosensitive resistive etching film
07/14/2010CN101776852A Developing solution for e-beam resist PMMA and preparation method thereof
07/14/2010CN101776851A Three DOF micro-positioning workbench for nano-imprint lithography system
07/14/2010CN101776850A Exposure system and device production method
07/14/2010CN101776849A Light intensity distribution analogy method of heavy-rubber ultraviolet light oblique incidence back etching process
07/14/2010CN101776848A Liquid immersion lithography system
07/14/2010CN101776847A Water soluble light-sensitive polyimide polymer, method for preparing same and photoresistive composition containing same
07/14/2010CN101776846A Light-cured component for laser stereo lithography
07/14/2010CN101776845A Light-sensitive resin composition and manufacturing method of etched basal body
07/14/2010CN101776844A Photocuring component used for three-dimensional imaging
07/14/2010CN101776780A Two-dimensional fiber bragg grating and preparing method thereof
07/14/2010CN101775207A Optical direct writing patterned organic thin film transistor insulating layer material
07/14/2010CN101775197A Viscosity reducible radiation curable resin composition
07/14/2010CN101775171A Method for processing surface superfine texture of ultrahigh molecular weight polyethylene material for artificial joint
07/14/2010CN101487907B Transfer error compensation method for continuous relief structure micro-optical element dry etching figure
07/14/2010CN101464531B Production process of cam lens
07/14/2010CN101464527B Printing process of mobile phone lens sheet
07/14/2010CN101290420B Liquid crystal display panel and method for fabricating the same
07/13/2010US7756597 Method of operating a lithographic processing machine, control system, lithographic apparatus, lithographic processing cell, and computer program
07/13/2010US7755877 Conveying method, conveyance apparatus, exposure apparatus, and device manufacturing method
07/13/2010US7755839 Microlithography projection objective with crystal lens
07/13/2010US7755833 Correcting device to compensate for polarization distribution perturbations
07/13/2010US7755748 Device and method for range-resolved determination of scattered light, and an illumination mask
07/13/2010US7755657 Method for high precision printing of patterns
07/13/2010US7755070 Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source
07/13/2010US7755063 Superresolution in microlithography and fluorescence microscopy
07/13/2010US7754820 photoresist; lithography; low refractive index; ethylene-maleic acid half ester of 3,3,4,4,5,5,6,6,6-nanofluoro-1-hexanol as antireflective layer
07/13/2010US7754780 Resist for forming pattern and method for forming pattern using the same
07/13/2010US7754417 Printed circuits and method for making same
07/13/2010US7754416 laminating support having upper surface on which copper exists, inorganic substance layer, and photoresist layer consisting of chemically amplified type positive photoresist composition to obtain photoresist laminate, selectively irradiating active light or radioactive rays to photoresist to form pattern
07/13/2010US7754415 forming photosensitive resin composition layer on cylindrical support or sheeted support and applying light to form a cured photosensitive resin layer, and then adjusting thickness of cured layer and shaping surface; high-performance printing substrate suitable for laser engraving; liquid crystal display
07/13/2010US7754413 radiation image-able coating, comprising first phase including a radiation curable polymer matrix and an activator disposed in matrix, second phase insolubly distributed in first phase including a color-former and sensitizing agent; thermochromic coating that exhibits enhanced image stability
07/13/2010US7754412 Process for preparing a flexographic printing plate from a photopolymerizable element
07/13/2010US7754411 protects planographic printing plate by having pulp fibers as a main constituent and a surface that contacts an image-forming surface of planographic printing plate and is physically separable from the planographic printing plate
07/13/2010US7754274 Forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; anddrilling through-holes in the substrate
07/13/2010US7754131 Device for transferring a pattern to an object
07/13/2010US7752966 Method of developing laser sensitive lithographic printing plate
07/08/2010WO2010077273A1 Stack of negative-working imageable elements
07/08/2010WO2010077269A1 Carrier solvent compositions, coatings compositions, and methods to produce thick polymer coatings
07/08/2010WO2010076894A1 Exposure apparatus, exposure method, and device manufacturing method
07/08/2010WO2010076254A1 Method of determining a characteristic
07/08/2010WO2010076232A2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
07/08/2010WO2009147031A3 Oxime ester photoinitiators
07/08/2010WO2009130010A9 Method and apparatus for measuring line end shortening, substrate and patterning device
07/08/2010US20100173251 Photoresist residue removal composition
07/08/2010US20100173250 Method for a multiple exposure, microlithography projection exposure installation and a projection system
07/08/2010US20100173249 Method for Manufacturing a Semiconductor Device
07/08/2010US20100173248 Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate
07/08/2010US20100173247 Substrate planarization with imprint materials and processes
07/08/2010US20100173246 Positive photosensitive resin composition and method for forming cured film using the same
07/08/2010US20100173245 Compositions comprising carboxy component and processes for photolithography
07/08/2010US20100173238 Gas contamination sensor, lithographic apparatus, method of determining a level of contaminant gas and device manufacturing method
07/08/2010US20100173237 Plate-making apparatus and printing plate manufacturing method
07/08/2010US20100173236 Exposure apparatus, and method of manufacturing device using same
07/08/2010US20100173235 Method and apparatus for writing
07/08/2010US20100173232 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
07/08/2010US20100173229 Shrinkable label having a hologram layer and container with the label
07/08/2010US20100173135 Method of Controlling Surface Roughness of a Flexographic Printing Plate
07/08/2010US20100173034 Conforming Template for Patterning Liquids Disposed on Substrates
07/08/2010US20100173033 Device for Holding a Template for Use in Imprint Lithography
07/08/2010US20100172000 Holographic security device
07/08/2010US20100171940 Projection exposure apparatus, projection exposure method, and method for producing device
07/08/2010US20100170710 Conductive film and manufacturing method thereof, and transparent electromagnetic shielding film
07/07/2010EP2204698A1 Plate surface treatment agent for lithographic princting plate and method for treating lithographic printing plate
07/07/2010EP2204697A2 Marker structure, lithographic projection apparatus, method for substrate alignment using such a structure, and substrate comprising such marker structure
07/07/2010EP2204696A2 Lithographic apparatus and method for calibrating the same