Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2010
07/21/2010EP2208116A1 Computer generated hologram and exposure apparatus
07/21/2010EP2208113A1 Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
07/21/2010EP2208104A1 Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
07/21/2010EP2207872A1 Novel nitrile and amidoxime compounds and methods of preparation
07/21/2010EP2207837A2 Photoimageable branched polymer
07/21/2010EP2207820A1 Highly functional multiphoton curable reactive species
07/21/2010CN201532523U Full-automatic double-side exposure machine
07/21/2010CN201532522U Alignment target pattern for negative exposure
07/21/2010CN201532510U LCD panel and LCD panel combination
07/21/2010CN1954263B Formation of metal-insulator-metal capacitor using a hardmask
07/21/2010CN1828420B Coating compositions for use with an overcoated photoresist
07/21/2010CN1732407B Curable resin composition and flexographic printing plate material using the same
07/21/2010CN101784962A A method for developing a printing plate precursor
07/21/2010CN101784961A Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer
07/21/2010CN101784960A Plate supply and discharge device and printing plate forming device using same
07/21/2010CN101784959A A double exposure semiconductor process for improved process margin
07/21/2010CN101784958A Photosensitive composition, cured film formed therefrom, and device having cured film
07/21/2010CN101784957A Negative photosensitive material and circuit board
07/21/2010CN101784954A Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
07/21/2010CN101784583A Novel polyimide resin and photosensitive polyimide resin composition
07/21/2010CN101784578A Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same, and use of the same
07/21/2010CN101784577A Reactive carboxylate compound, curable resin composition using the same, and use of the same
07/21/2010CN101782725A Printed circuit board positioning exposure device and positioning exposure method
07/21/2010CN101782724A Contact exposure apparatus and contact exposure method
07/21/2010CN101782723A Pulse modifier with adjustable etendue
07/21/2010CN101782722A Method for preparing patterned conductive polyvinylidene fluoride by excimer laser
07/21/2010CN101782721A Photoetching device and method
07/21/2010CN101782720A Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine
07/21/2010CN101782719A Ink-jet resisting agent
07/21/2010CN101782718A Transfer printing method, photomask for transfer printing and manufacturing method thereof
07/21/2010CN101782665A Display panel and method for manufacturing flexible colored filter of same
07/21/2010CN101587198B Large area photon sieve
07/21/2010CN101546036B Shape memory alloy spring drive-based adjustable focal length silicon grating and preparation method thereof
07/21/2010CN101354537B Workpiece platform for photolithography apparatus
07/21/2010CN101256362B Method for establishing equivalent diffusion model of chemistry amplitude photoresist
07/21/2010CN101226345B Device for installing and leveling photo-etching machine projection objective
07/21/2010CN101187765B Film transistor array substrate for liquid crystal display and manufacture thereof
07/21/2010CN101114575B Apparatus for treating substrates
07/21/2010CN101084473B Cleaning liquid for lithography and method of cleaning therewith
07/21/2010CN101075095B Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrated circuit
07/21/2010CN101055426B Method of manufacturing integrated circuits
07/21/2010CN101038436B Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
07/21/2010CN101030039B Lampshade seat
07/21/2010CN101013262B Photo-sensitive monomer, liquid crystal material, liquid crystal panel and method of fabrication, photoelectric device and fabricating method thereof
07/20/2010US7761839 Performance in model-based OPC engine utilizing efficient polygon pinning method
07/20/2010US7760452 Driving apparatus, optical system, exposure apparatus and device fabrication method
07/20/2010US7760368 Method and system for measuring patterned structures
07/20/2010US7760366 System for measuring the image quality of an optical imaging system
07/20/2010US7760360 Monitoring a photolithographic process using a scatterometry target
07/20/2010US7760348 Particle inspection apparatus, exposure apparatus, and device manufacturing method
07/20/2010US7760330 Illumination optical system and exposure apparatus
07/20/2010US7760326 Exposure apparatus and aberration correction method
07/20/2010US7759660 Electron beam lithography system
07/20/2010US7759609 Method for manufacturing a patterned structure
07/20/2010US7759440 Fluorine-containing polymerisable monomer and polymer prepared by using same
07/20/2010US7759053 forming an aluminum-comprising conductive metal line over a semiconductor substrate, exposing conductive line to a solution comprising an inorganic acid ( H3PO4 or H2SO4 ) hydrogen peroxide and a carboxylic acid buffering agent ( diammonium citrate, ammonium oxalate)
07/20/2010US7759052 Thioacetal product of acrolein-methyl methacrylate copolymer and ethanethiol; high refractive index; useful in a damascene process and in an immersion lithography process using ArF
07/20/2010US7759051 Laser mask and method of crystallization using the same
07/20/2010US7759050 providing a laminated body comprising a substrate to be ground, a curable silicone adhesive layer, a photothermal conversion layer comprising a light absorbing agent and a heat decomposable resin, and a light transmitting support
07/20/2010US7759049 laser engravable printing element which is a photocured resin formulation containing a solid state resin ( e.g butadiene-styrene copolymer), an organic compound containing a polymerizable unsaturated group e.g divinylbenzene, and inorganic porous particles (silica)
07/20/2010US7759048 Photosensitive resin composition and microlens formed with use thereof
07/20/2010US7759047 Resist protective film composition and patterning process
07/20/2010US7759046 Antireflective coating compositions
07/20/2010US7759045 Chemically amplified positive resist composition
07/20/2010US7759043 For resist applications; thermostability, storage stability; color filters
07/20/2010US7759042 Laser induced thermal imaging (LITI) donor films having substrate, light-to-heat conversion layer, and pattern-directing layer; when imaged, LITI donor film transfers portion of templated transfer layer to permanent receptor while maintaining pattern substantially intact in transferred portion; displays
07/20/2010US7759029 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation
07/20/2010US7759021 Multi-transmission phase mask and exposure method using the same
07/20/2010US7758930 Polymers with (alk)acrylic acid units reacted with glycidyl (meth)acrylate and/or hydroxyalkyl (alk)acrylate units reacted with an isocyanatoalkyl (meth)acrylate; tertiary amine photoinitiator; photocurable acid with 3 curable groups (pentaerythritol triacrylate monomaleate); high exposure sensitivity
07/20/2010US7758791 Find mold and method for regenerating fine mold
07/20/2010CA2482566C Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
07/15/2010WO2010080789A2 Spin-on spacer materials for double- and triple-patterning lithography
07/15/2010WO2010080758A1 Substrate planarization with imprint materials and processes
07/15/2010WO2010080378A1 Method and system for fabricating nanostructure mass replication tool
07/15/2010WO2010080200A1 Method of controlling surface roughness of a flexographic printing plate
07/15/2010WO2010080028A2 Method of selecting a set of illumination conditions of a lithographic apparatus for optimizing an integrated circuit physical layout
07/15/2010WO2010079133A2 Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography
07/15/2010WO2010079005A1 Method for reducing tip-to-tip spacing between lines
07/15/2010WO2010055374A8 An antireflective coating composition comprising fused aromatic rings
07/15/2010WO2010055373A8 An antireflective coating composition comprising fused aromatic rings
07/15/2010WO2010044756A3 Mold imprinting
07/15/2010WO2010038978A3 Photopolymer resin composition
07/15/2010US20100179727 Steering device for vehicles
07/15/2010US20100178621 Determination method, exposure method, device fabrication method, and storage medium
07/15/2010US20100178620 Inverted pattern forming method and resin composition
07/15/2010US20100178619 Method for enhancing lithographic imaging of isolated and semi-isolated features
07/15/2010US20100178618 Patterning process
07/15/2010US20100178617 Patterning process
07/15/2010US20100178616 Method of making a rough substrate
07/15/2010US20100178615 Method for reducing tip-to-tip spacing between lines
07/15/2010US20100178614 Method for manufacturing a lens
07/15/2010US20100178613 Display device uniforming light distribution throughout areas and method for manufacturing same
07/15/2010US20100178612 Lithographic apparatus and device manufacturing method
07/15/2010US20100178611 Lithography method of electron beam
07/15/2010US20100178610 Metallocenyl Phthalocyanine Compounds and Use Thereof
07/15/2010US20100178609 Resist composition, method of forming resist pattern, polymeric compound, and compound
07/15/2010US20100178608 Radiation-sensitive resin composition
07/15/2010US20100178602 Charged particle beam writing apparatus and device production method
07/15/2010US20100178600 Process for etching a metal layer suitable for use in photomask fabrication
07/15/2010US20100178472 Method of Preparing A Patterned Film With A Developing Solvent
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