| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/29/2010 | US20100187596 Self-aligned double patterning for memory and other microelectronic devices |
| 07/29/2010 | US20100187576 Method of processing resist, semiconductor device, and method of producing the same |
| 07/29/2010 | DE102010000033A1 Verfahren zum Herstellen eines Halbleiterbauelements A method of manufacturing a semiconductor device |
| 07/29/2010 | DE102009058262A1 Geschichtete Strahlensensitive Materialien mit variierender Sensitivität Stratified radiation-sensitive materials with varying sensitivity |
| 07/29/2010 | DE102009005954A1 Dämpfungsvorrichtung Damping device |
| 07/29/2010 | DE102007010223B4 Verfahren zur Bestimmung geometrischer Parameter eines Wafers und Verwendung des Verfahren bei der optischen Inspektion von Wafern A method for determining geometric parameters of a wafer and use of the method for the optical inspection of wafers |
| 07/29/2010 | CA2750434A1 Large area, homogeneous array fabrication including substrate temperature control |
| 07/29/2010 | CA2750430A1 Large area, homogeneous array fabrication including homogeneous substrates |
| 07/29/2010 | CA2750425A1 Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
| 07/28/2010 | EP2211294A1 Process for correcting the recording skew when illuminating a printing master |
| 07/28/2010 | EP2211233A2 Lithographic projection apparatus and gas purging method |
| 07/28/2010 | EP2211232A1 Reduced striae extreme ultraviolet elements |
| 07/28/2010 | EP2211223A1 Method for generating a deflectable mirror structure and a micromirror device |
| 07/28/2010 | EP2210147A1 Aperiodic multilayer structures |
| 07/28/2010 | EP2210012A1 Lithographic apparatus |
| 07/28/2010 | EP2209839A1 Carbosilane polymer compositions for anti-reflective coatings |
| 07/28/2010 | EP1729174B1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 07/28/2010 | EP1668419B1 Projection objective for semiconductor lithography |
| 07/28/2010 | CN201535858U 一种采用紫激光感光制网的装置 A violet sensitive system network installations |
| 07/28/2010 | CN1950191B Method for producing a three-dimensional object with resolution enhancement by means of pixel shift |
| 07/28/2010 | CN1868005B Plasma source of directed beams and application thereof to microlithography |
| 07/28/2010 | CN1849386B Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate |
| 07/28/2010 | CN1808285B High-precision analog-to-digital converter based on PGA and control method thereof |
| 07/28/2010 | CN1794099B Solvent removal apparatus and method |
| 07/28/2010 | CN1695040B Assessment and optimization for metrology instrument |
| 07/28/2010 | CN101790704A Composition for resist lower layer film formation for lithography and process for producing semiconductor device |
| 07/28/2010 | CN101789367A A method for making a semiconductor device |
| 07/28/2010 | CN101788769A Method for forming semiconductor device layer by exposure |
| 07/28/2010 | CN101788768A Exposure method |
| 07/28/2010 | CN101788767A Radiation sensitive linear resin composition and layer insulation film and manufacture method thereof |
| 07/28/2010 | CN101788766A 光敏树脂组合物 The photosensitive resin composition |
| 07/28/2010 | CN101788765A Anti-corrosion water-based laser glue capable of being removed easily and ablated by laser |
| 07/28/2010 | CN101788764A Coating and developing apparatus |
| 07/28/2010 | CN101788763A compositions and processes for immersion lithography |
| 07/28/2010 | CN101788721A Polarization conversion device |
| 07/28/2010 | CN101786390A Fabrication method for painted wooden door |
| 07/28/2010 | CN101499406B Method for producing silicide nano-structure on insulated underlay |
| 07/28/2010 | CN101463106B Copolymer film forming resin containing benzoxazine structure and deep UV negativity chemical amplification type photo resist |
| 07/28/2010 | CN101329481B Liquid crystal display panel and method for making the same |
| 07/28/2010 | CN101010637B Display member exposing method and plasma display member manufacturing method |
| 07/27/2010 | USRE41457 Wavemeter for gas discharge laser |
| 07/27/2010 | US7764447 Optical element holding device, lens barrel, exposing device, and device producing method |
| 07/27/2010 | US7764376 Systems and methods for measurement of a specimen with vacuum ultraviolet light |
| 07/27/2010 | US7763948 Flexible and elastic dielectric integrated circuit |
| 07/27/2010 | US7763416 Fabrication method of active device array substrate |
| 07/27/2010 | US7763415 Method of fabricating semiconductor device |
| 07/27/2010 | US7763413 Methods for imaging and processing negative-working imageable elements |
| 07/27/2010 | US7763412 Polymer, positive resist composition and method for forming resist pattern |
| 07/27/2010 | US7763401 a colorant ( copper-phthalocyanine dye); a cross-linking agent( bisphenol-A-diglycidylether); and a photopolymerization initiator; a binder (methyl methacrylate-methacrylic acid copolymer); dipentaerythrytol hexa(meth)acrylate as photopolymerizable monomer; colored images |
| 07/27/2010 | US7762638 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 07/27/2010 | CA2408717C Method of molecular-scale pattern imprinting at surfaces |
| 07/27/2010 | CA2330747C Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 07/22/2010 | WO2010083350A1 Nonpolymeric binders for semiconductor substrate coatings |
| 07/22/2010 | WO2010082686A1 Vacuum and pressure forming exposure apparatus and exposure method |
| 07/22/2010 | WO2010082554A1 Novel compound, polymerizable composition, color filter and process for produciton thereof, solid-state imaging element, and lithographic printing original plate |
| 07/22/2010 | WO2010082475A1 Stage equipment, exposure equipment, exposure method and device manufacturing method |
| 07/22/2010 | WO2010082232A1 Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method |
| 07/22/2010 | WO2010081721A1 Euv lithography system and cable for the same |
| 07/22/2010 | WO2010081624A1 Black matrix for colour filters |
| 07/22/2010 | US20100183988 Exposure system and pattern formation method |
| 07/22/2010 | US20100183987 Exposure apparatus |
| 07/22/2010 | US20100183986 Stamper production method and read-only optical disc production method |
| 07/22/2010 | US20100183985 Process for producing semiconductor device |
| 07/22/2010 | US20100183984 Multiplexing of pulsed sources |
| 07/22/2010 | US20100183983 Process for manufacturing electronic device |
| 07/22/2010 | US20100183982 Method of manufacturing a semiconductor device |
| 07/22/2010 | US20100183981 Positive resist composition and method of forming resist pattern |
| 07/22/2010 | US20100183980 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 07/22/2010 | US20100183979 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 07/22/2010 | US20100183978 Surface-treating agent for pattern formation and pattern forming method using the treating agent |
| 07/22/2010 | US20100183977 Compositions and processes for photolithography |
| 07/22/2010 | US20100183976 Compositions and processes for photolithography |
| 07/22/2010 | US20100183975 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin |
| 07/22/2010 | US20100183974 Compound, method for producing same, positive resist composition and method for forming resist pattern |
| 07/22/2010 | US20100183963 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography |
| 07/22/2010 | US20100183962 Method for examining a wafer with regard to a contamination limit and euv projection exposure system |
| 07/22/2010 | US20100183961 Integrated circuit layout design |
| 07/22/2010 | US20100183960 Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device |
| 07/22/2010 | US20100183958 Method of fabricating semiconductor device, and photomask |
| 07/22/2010 | US20100183956 Computer generated hologram, exposure apparatus and device fabrication method |
| 07/22/2010 | US20100183853 Stripping agent for resist film on/above conductive polymer, method for stripping resist film, and substrate having patterned conductive polymer |
| 07/22/2010 | US20100183851 Photoresist Image-forming Process Using Double Patterning |
| 07/22/2010 | US20100182692 Method for manufacturing optical element and optical element |
| 07/22/2010 | US20100182584 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 07/22/2010 | US20100182272 Touch screen panel and method of fabricating the same |
| 07/22/2010 | US20100181678 Structure with self aligned resist layer on an interconnect surface and method of making same |
| 07/22/2010 | US20100181677 Structure with self aligned resist layer on an insulating surface and method of making same |
| 07/22/2010 | US20100181656 Methods of eliminating pattern collapse on photoresist patterns |
| 07/22/2010 | US20100181289 Forming a Layer on a Substrate |
| 07/22/2010 | US20100181004 Hologram pattern forming method, method for manufacturing film having hologram pattern, laminate film and container |
| 07/22/2010 | US20100180937 Holographic energy-collecting medium and associated device |
| 07/22/2010 | DE102010004995A1 Verfahren zur Herstellung von Merkmalen elektronischer Schaltungen Process for the preparation of features of electronic circuits |
| 07/22/2010 | DE102009005340A1 EUV-Lithographieanlage und Kabel dafür EUV lithography tool and cable for |
| 07/22/2010 | DE102009000099A1 Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik Micromirror array with double beam arrangement and electronic actuators |
| 07/22/2010 | DE102008038591B3 Device for generating periodic illumination pattern with high optical performance on surface of substrate, has laser source that generates illumination beam, and diffractive beam splitter irradiated by illumination beam |
| 07/22/2010 | DE102004029077B4 Vorrichtung und Verfahren zur Entfernung eines Photoresists von einem Substrat Apparatus and method for removing a photoresist from a substrate |
| 07/21/2010 | EP2209135A1 Illumination optical device and exposure device |
| 07/21/2010 | EP2209046A1 Method and apparatus for registration correction of masks |
| 07/21/2010 | EP2209025A1 Pigment dispersing composition for color filters |
| 07/21/2010 | EP2208608A1 Transfer method and transfer device |