Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2010
08/04/2010EP2212746A1 Method of making a lithographic printing plate
08/04/2010EP2212745A1 Method for replicating master molds
08/04/2010EP2212742A1 Porous template and imprinting stack for nano-imprint lithography
08/04/2010EP2212729A2 Optical system
08/04/2010EP2212273A2 Bottom antireflective coating compositions
08/04/2010EP2212113A1 A method for producing an optically variable image carrying shim
08/04/2010EP2057629B1 Drawing method and drawing device
08/04/2010EP1802693B1 Benzocyclobutene based polymer formulations and methods for processing such formulations in oxidative environments
08/04/2010EP1709490B1 Differential critical dimension and overlay metrology
08/04/2010EP1700164B1 Irradiation method
08/04/2010EP1639411B1 A nano impression lithographic process which involves the use of a die having a region able to generate heat
08/04/2010CN201540455U Device for taking synchroaccelerator as source in extreme ultraviolet lithography
08/04/2010CN201540454U Lightening homogeneity compensating device with a plurality of lightening conditions of quasi-molecule photoetching machine
08/04/2010CN1916764B Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
08/04/2010CN1816774B Positive type photosensitive resin composition
08/04/2010CN1737685B Compositions and processes for immersion lithography
08/04/2010CN1713075B Lithographic apparatus and device manufacturing method
08/04/2010CN101796614A Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method
08/04/2010CN101796460A Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
08/04/2010CN101796438A Thin resin film and production method thereof, and color filter for liquid crystal display and production method thereof
08/04/2010CN101796150A Underlayer coating composition based on a crosslinkable polymer
08/04/2010CN101796100A Method for producing polyamide and resin composition
08/04/2010CN101795527A Radiation source, lithographic apparatus and device manufacturing method
08/04/2010CN101794726A Workpiece stage and exposure apparatus using the same
08/04/2010CN101794089A Resist removing method of electron beam resist optical mask plate and device thereof
08/04/2010CN101794088A Composition for removing photoresist and/or etching residue from a substrate and use thereof
08/04/2010CN101794087A Stripper composition for photoresist and method for using the stripper composition to strip the photoresist
08/04/2010CN101794086A Device and method for separating waste developer from DI water
08/04/2010CN101794085A Method for focusing adjustment of wafer coated with photoresist prior to electron beam exposure
08/04/2010CN101794084A Lithographic apparatus and device manufacturing method
08/04/2010CN101794083A Lithographic apparatus and device manufacturing method
08/04/2010CN101794082A Lithographic apparatus and device manufacturing method
08/04/2010CN101794081A Vacuum system for immersion photolithography
08/04/2010CN101794080A Device for imagery photoetching by utilizing micro lens array
08/04/2010CN101794079A Lithographic apparatus and device manufacturing method
08/04/2010CN101794078A Ultraviolet ray lamp exposure system, using method and calibrating method
08/04/2010CN101794077A Operating platform and method of automatically installing shims
08/04/2010CN101794076A Automatic substrate transport system and method
08/04/2010CN101794075A Radiation sensitive resin composition, and spacer for liquid crystal display device and method for forming same
08/04/2010CN101794074A Photosensitive resin composition
08/04/2010CN101794073A A photosensitive resin composition and a method forming a pattern using the same
08/04/2010CN101794072A Method for preparing substrate with nano structure with line width below 20 nanometers
08/04/2010CN101794071A Method for making a semiconductor device
08/04/2010CN101794070A Device for reducing projection super-resolution imaging and photoetching method
08/04/2010CN101794046A Display device, touch sensor, and method for manufacturing display device
08/04/2010CN101793993A Optical elements, optical arrangement and system
08/04/2010CN101793989A Monolithic polarization controlled angle diffusers and associated methods
08/04/2010CN101793988A Method for accurately adjusting groove density in light path for making holographic grating
08/04/2010CN101441381B Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup
08/04/2010CN101419906B Method of forming micro pattern of semiconductor device
08/04/2010CN101315497B Liquid crystal display panel and method for producing the same
08/04/2010CN101261392B Touch control display panel, colourful filtering substrate and its manufacture method
08/03/2010US7768723 Replacement apparatus for an optical element
08/03/2010US7768653 Method and system for wavefront measurements of an optical system
08/03/2010US7768648 Method for aberration evaluation in a projection system
08/03/2010US7768156 Coil support unit, motor and exposure apparatus using the same, and device manufacturing method
08/03/2010US7767984 Resist collapse prevention using immersed hardening
08/03/2010US7767956 Methods and systems for lithography process control
08/03/2010US7767636 useful with and having improved compatibility with nanoelectronic and microelectronic substrates characterized by silicon dioxide, sensitive low- kappa or high- kappa dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt, palladium, platinum, chromium, ruthenium, rhodium; photoresist strippers
08/03/2010US7767386 Forming a thin film to be patterned on a substrate, forming a developable organic planarization layer (OPL) on the thin film, forming a developable anti-reflective coating (ARC) layer on the OPL, and forming a mask layer on the ARC layer; patterning, imaging and development
08/03/2010US7767385 Method for lithography for optimizing process conditions
08/03/2010US7767384 Method for making a negative-working lithographic printing plate precursor
08/03/2010US7767383 Photosensitivity; flexography
08/03/2010US7767382 Making a lithographic printing plate where a negative-working photopolymer printing plate precursor is image-wise exposed and developed off-press in a gumming unit with a gum solution thereby developing and gumming the plate in a single step; photostability
08/03/2010US7767381 Vinyl acetal resin product of a vinyl alcohol polymer and a pyrdinium- or quinolinium-vinylphenyl- (or vinylphenoxy-)alkanaldehyde; an unsaturated monomer having anion dissociating capability for crosslinking the acetal through the ammonium salt; and a radical photoinitiator; may be developed with water
08/03/2010US7767380 negatives; laser drawing; high definition AM screen printing of screen line number of 200 or more or FM screen printing; excellent in uniformity of halftone dot in halftone area; reproducibility in shadow area, preservation stability and sensitivity; sensitizing dye; a hexaarylbiimidazole photoinitiator
08/03/2010US7767379 Polymer compound, positive resist composition, and method of forming resist pattern
08/03/2010US7767378 Method for producing resist composition and resist composition
08/03/2010US7767377 A terpolymer based three monomers of (alpha-lower alkyl) acrylic esters; one having acid-dissociable, dissolution-inhibiting groups, another having lactone-containing monocyclic or polycyclic groups, one having polycyclic and alicyclic hydrocarbon groups which contain polar groups; dry etching re
08/03/2010US7767364 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device
08/03/2010US7767361 silicon oxide matrix and photopolymerizable compound; high refractive index change, high sensitivity, low scattering, environment resistance, durability, low dimensional change and high multiplicity
07/2010
07/29/2010WO2010085770A1 Large area, homogeneous array fabrication including substrate temperature control
07/29/2010WO2010085769A1 Large area, homogeneous array fabrication including homogeneous substrates
07/29/2010WO2010085768A1 Large area, homogeneous array fabbrication including leveling with use of bright spots
07/29/2010WO2010085767A1 Large area, homogeneous array fabrication including controlled tip loading vapor deposition
07/29/2010WO2010085751A2 Apparatus and method for culturing stem cells
07/29/2010WO2010084372A1 A photoresist image-forming process using double patterning
07/29/2010WO2010083965A1 Damping device
07/29/2010WO2010051286A3 Photolithographic reticles with electrostatic discharge protection structures
07/29/2010WO2010011398A4 Scanning probe epitaxy
07/29/2010US20100190346 Method of processing resist, semiconductor device, and method of producing the same
07/29/2010US20100190116 Substrate processing apparatus and substrate processing method
07/29/2010US20100190115 Measurement apparatus, exposure apparatus having the same, and device manufacturing method
07/29/2010US20100190114 Topography based patterning
07/29/2010US20100190113 Optical element, exposure apparatus using this, and device manufacturing method
07/29/2010US20100190112 Photoresist stripping solution and a method of stripping photoresists using the same
07/29/2010US20100190111 Conductive film and method for producing the same
07/29/2010US20100190110 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer
07/29/2010US20100190109 Acid transfer composition, acid transfer film, and pattern forming method
07/29/2010US20100190108 Acrylic resin with increased solubility in an alkali developing under action of acid generator, acid generator, and organic solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME) and cyclohexanone; coatability to substrate
07/29/2010US20100190107 Cyclic compound, photoresist base material and photoresist composition
07/29/2010US20100190106 Resist composition for negative tone development and pattern forming method using the same
07/29/2010US20100190105 Lithographic printing plate precursor
07/29/2010US20100190104 Method for pattern formation and resin composition for use in the method
07/29/2010US20100189960 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
07/29/2010US20100189941 Photosensitive resin composition
07/29/2010US20100188791 Anti-static part and its manufacturing method
07/29/2010US20100188765 Oxime Ester Photoinitiators
07/29/2010US20100188183 Magnetic Induction Devices And Methods For Producing Them
07/29/2010US20100187658 Multi-material hard mask or prepatterned layer for use with multi-patterning photolithography
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