Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2010
08/11/2010CN101799628A Surface modifying agent, laminated structure using the same, method of manufacturing the structure, and transistor including the same
08/11/2010CN101799627A Positive photosensitive resin composition
08/11/2010CN101799626A Process and method for modifying polymer film surface interaction
08/11/2010CN101799625A Hyperbranched polyester micro-optical photoresist
08/11/2010CN101799624A Substrate processing apparatus
08/11/2010CN101799587A Optical system, projection system and manufacturing method of micro-structure semiconductor component
08/11/2010CN101799569A Method for producing convex double blazed grating
08/11/2010CN101798432A Curable resin composition and printed circuit board and reflection board using same
08/11/2010CN101477310B Immersion flow field stabilizing device used for photo-etching machine
08/11/2010CN101462426B Technology for printing sheet material with 3-D pattern
08/11/2010CN101452219B Submerge liquid supplying recovery controlling device for photoetching machine
08/11/2010CN101408732B Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system
08/11/2010CN101393840B Prime coating method and coating method of photoresist
08/11/2010CN101388327B Substrate processing device and processing method thereof
08/11/2010CN101252101B Method for making ultra-high power intelligent device using exposal field split joint technology
08/11/2010CN101246311B Photo resist air bubble eliminating system and method thereof
08/11/2010CN101246305B Graphic method
08/11/2010CN101211125B Photoresist removing method
08/11/2010CN101206406B Photolithography detection pattern and photolithography edition territory
08/11/2010CN101169591B Lens imaging system for overlay accuracy and its feeding and calibration method
08/11/2010CN101133365B Exposure method, method for forming irregular pattern, and method for manufacturing optical element
08/11/2010CN101122747B Slit coating apparatus
08/11/2010CN101082773B Photo- and thermo-setting solder resist composition and printed wire board using same
08/11/2010CN101056896B Less shear-thinning polyvinyl acetals
08/11/2010CN101034261B Method and device for preventing barrier processing from polluting optical element
08/11/2010CN101017329B Substrate treatment system, substrate treatment method
08/10/2010US7774738 Lithography method for forming a circuit pattern
08/10/2010US7774737 Performance in model-based OPC engine utilizing efficient polygon pinning method
08/10/2010US7774736 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
08/10/2010US7773296 Ultra-broadband UV microscope imaging system with wide range zoom capability
08/10/2010US7773209 Method and apparatus for parts manipulation, inspection, and replacement
08/10/2010US7773199 Methods and systems to compensate for a stitching disturbance of a printed pattern
08/10/2010US7771920 Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
08/10/2010US7771919 causing uv radiation to imagewise illuminate a target surface which a portion is disposed in a cycloalkoxy compound containing borate, phosphate or sufite groups; high transparency
08/10/2010US7771918 Forming resist film on substrate, irradiating selectively the resist film with exposure to light with a liquid on resist film, and forming resist pattern by developing film, wherein step of performing pattern exposure includes sub-step of removing a gas included in film; prevents diffraction abnormality
08/10/2010US7771917 Methods of making templates for use in imprint lithography
08/10/2010US7771916 Polymerizable composition and planographic printing plate precursor
08/10/2010US7771914 alkali-soluble fluoropolymer for use in photoresists, monomers having trifluoromethyl group and hydroxy group; good barrier property prevents water penetration during immersion lithography; copolymers; photolithography for making of semiconductor devices; high resolution, finer pattern
08/10/2010US7771913 micropatterning semiconductors; liquid immersion lithography; 193 nm ArF excimer laser is light source; water inserted in gap between projection lens and wafer; good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water; precision
08/10/2010US7771912 photoresist; resin of which solubility in an alkali developer increases under the action of an acid; acid generator; a fluoropolymethacrylate ester of a polycyclic norbornane-type ring unit or a lactone ring ester; solvent; immersion-type projection exposure; far UV 300 nm or less; semiconductors
08/10/2010US7771911 passing through a polyethylene or polypropylene membrane having negative zeta potential between -20 mV and 15 mV; reduces defects; photoresist is a polymethacrylate ester: methanoindene ester, adamantane ester, 1,4:5,8-dimethanonaphthalene ester (tetracyclododecane); storage stability
08/10/2010US7771904 Photomask, and method and apparatus for producing the same
08/10/2010US7771898 Extreme Ultraviolet; stress compensation layer between substrate and reflection layer; for fine semiconductor device photolithography; precision; molybdenum and silicon films; silicon wafers
08/10/2010US7771892 Double exposure method and photomask for same
08/10/2010US7771647 Comprises electroconductive stamp to provide high resolution; electrography; for data storage; xerography
08/10/2010US7771630 Precise fabrication of polymer microlens arrays
08/10/2010US7771435 Fragmentation and extraction basket
08/10/2010CA2411239C Eb pattern profile printing
08/05/2010WO2010088323A1 Radiation curable compositions useful in solid freeform fabrication systems
08/05/2010WO2010088274A2 Device, system, and method for multidirectional ultraviolet lithography
08/05/2010WO2010088141A2 Method and system for sizing polygons in an integrated circuit (ic) layout
08/05/2010WO2010088139A2 Compact abbe's kernel generation using principal component analysis
08/05/2010WO2010087516A1 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern
08/05/2010WO2010087504A1 Exposure apparatus and exposing method
08/05/2010WO2010087339A1 Alicyclic compound, method for manufacturing same, composition containing same and resist pattern formation method using same
08/05/2010WO2010087238A1 Resin composition and display device formed using same
08/05/2010WO2010087232A1 Negative-type photosensitive insulating resin composition, and method for forming pattern using same
08/05/2010WO2010087195A1 Positive-type photosensitive insulating resin composition, and method for forming pattern using same
08/05/2010WO2010086939A1 Method for evaluating superimposition of pattern
08/05/2010WO2010086773A1 Method for patterning nano-scale patterns of molecules on a surface of a material
08/05/2010WO2010086288A1 Developable bottom antireflective coating compositions especially suitable for ion implant applications and method of forming a pattern using it
08/05/2010WO2010086127A1 Illumination system for microlithography
08/05/2010WO2010086068A2 Determining critical dimension or overlay variation of integrated circuit fields
08/05/2010WO2010011397A4 Scanning probe epitaxy
08/05/2010US20100197140 Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
08/05/2010US20100197136 Composition for cleaning and rust prevention and process for producing semiconductor element or display element
08/05/2010US20100196832 Exposure apparatus, exposing method, liquid immersion member and device fabricating method
08/05/2010US20100196831 Exposure apparatus and device manufacturing method
08/05/2010US20100196830 Method for obtaining microfluidic polymer structures
08/05/2010US20100196829 Semiconductor device fabrication method and semiconductor device
08/05/2010US20100196828 Method of manufacturing semiconductor device
08/05/2010US20100196827 Method of making a flexographic printing sleeve forme
08/05/2010US20100196826 Photoinitiators for Energy Curing
08/05/2010US20100196825 Developable bottom antireflective coating compositions especially suitable for ion implant applications
08/05/2010US20100196823 Positive resist composition for immersion exposure and method of forming resist pattern
08/05/2010US20100196822 Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film
08/05/2010US20100196821 Positive resist composition, method of forming resist pattern using the same, and polymeric compound
08/05/2010US20100196820 Resist composition, method of forming resist pattern, novel compound and acid generator
08/05/2010US20100196809 Semiconductor device fabrication method and semiconductor device
08/05/2010US20100196808 Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device therewith
08/05/2010US20100196807 Prevention of photoresist scumming
08/05/2010US20100196661 Method for patterning nano-scale patterns of molecules on a surface of a material
08/05/2010US20100196660 Process for the Production of Micro-Structured Construction Units by Means of Optical Lithography
08/05/2010US20100196528 Stamper and method producing the same
08/05/2010US20100195175 Security Holograms
08/05/2010US20100195082 Device, System, And Method For Multidirectional Ultraviolet Lithography
08/05/2010US20100195077 Illumination system for a microlithography projection exposure installation
08/05/2010US20100195075 Projection objective having mirror elements with reflective coatings
08/05/2010US20100195069 Exposure method and exposure system
08/05/2010US20100195067 Exposure apparatus, exposure method, and method for producing device
08/05/2010US20100195030 Colored photosensitive resin composition, coating film of colored photosensitive resin composition, photosensitive resin transfer material, method of foaming photosensitive resin layer, color filter, method for producing color filter, and liquid crystal display device
08/05/2010US20100193971 Positive photosensitive resin composition for spray coating, method for forming cured film using the same, cured film, and semiconductor device
08/05/2010US20100193912 Methods and apparatus for the manufacture of microstructures
08/05/2010US20100193841 Method for forming resist pattern and method for manufacturing a semiconductor device
08/05/2010DE102009037646A1 System for illuminating reticle in microlithography-projection exposure system, during formation of structures in wafer in e.g. semi-conductor industry, has radiation formation unit to adjust form of surface to optical elements
08/05/2010DE102009006685A1 Beleuchtungssystem für die Mikro-Lithographie An illumination system for microlithography
08/05/2010CA2743117A1 Method for patterning nano-scale patterns of molecules on a surface of a material
08/04/2010EP2214056A2 Method of making a lithographic printing plate
08/04/2010EP2212748A1 Multicolored mask process for making display circuitry
08/04/2010EP2212747A1 Photopatternable deposition inhibitor containing siloxane
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