Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2010
08/17/2010US7776516 anti-reflective coating (ARC); Numerical aperture (NA); antireflective coating that reduces light reflectance from non-normal incidence angles for photolithography; ARC layers of silicon oxycarbide on amorphous carbon
08/17/2010US7776515 That includes a polyamic acid based on pyrolmellitic acid and phenylenediamine, and hexakis(methoxymethyl)melamine, with organic solvent; depositing a second hard mask film of silicon nitride SiON to form a double hard mask film having an excellent etching selectivity without use of expensive equipment
08/17/2010US7776514 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit
08/17/2010US7776513 Method of manufacturing semiconductor device
08/17/2010US7776512 Photoacid generator that is a sulfonium or iodonium salt of a fluoroalkylsulfonic acid; resin which contains a monocyclic or polycyclic alicyclic structure and which decomposes under the action of an acid to increase alkali solubility; short-wavelength exposure enabling super minute patterning
08/17/2010US7776511 Positive resist composition and method of forming resist pattern
08/17/2010US7776510 Comprising base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon irradiation
08/17/2010US7776509 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
08/17/2010US7776508 Antihalation compositions
08/17/2010US7776507 Photosensitive paste and manufacturing method of member for display panel
08/17/2010US7776505 Polymeric resist product of reacting an adamantyl compound, such as 2-(4-methoxybutyl)-2-adamantyl methacrylate, a cationic photoacid generator that is methacryloyloxyphenyldimethylsulfonium perfluoroalkyl sulfonate or dimethylphenylsulfonium p-vinylbenzenesulfonate and optionally hydroxystyrene
08/17/2010US7776504 Dye-containing resist composition and color filter using same
08/17/2010US7776495 Forming a slit in the middle of each mask pattern so as not to expose parts of wafer, the aperture of the wafer becomes nearly cocoon-shaped with a constriction in the middle; thus peripheral length of the aperture can be increased without changing the occupation rate of the mask patterns
08/17/2010CA2390451C Conductive electrical element and antenna with ink additive technology
08/12/2010WO2010091045A2 Non-fluoride containing composition for the removal of polymers and other organic material from a surface
08/12/2010WO2010090685A1 Means for attaching a printing plate to a printing cylinder
08/12/2010WO2010090406A2 Colored photosensitive resin composition, color filter, and liquid crystal display device comprising same
08/12/2010WO2010090345A1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate
08/12/2010WO2010090190A1 Laser exposure device
08/12/2010WO2010090146A1 Resist remover composition and method for removing resist using same
08/12/2010WO2010090018A1 Exposure method, color filter manufacturing method, and exposure device
08/12/2010WO2010089595A1 Co-crystals and their use
08/12/2010WO2010070893A3 Method for forming structure and method for manufacturing liquid ejecting head
08/12/2010US20100204422 Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern
08/12/2010US20100204415 Selfassembled grafted polymeric layer for use in biosensor technology
08/12/2010US20100203457 Patterning process
08/12/2010US20100203455 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
08/12/2010US20100203454 Enhanced transparent conductive oxides
08/12/2010US20100203453 Method for producing conductive film
08/12/2010US20100203452 Radiation-sensitive composition
08/12/2010US20100203451 Positive resist composition and pattern forming method using the same
08/12/2010US20100203450 Photoresist compositions and methods of use
08/12/2010US20100203449 Method of fabricating thin film transistor substrate and negative photoresist composition used therein
08/12/2010US20100203448 Method for manufacturing printing plate and printing plate-forming photocurable liquid for manufacturing
08/12/2010US20100203447 Radiation-sensitive resin composition
08/12/2010US20100203446 Chemically amplified photoresist composition and method for forming pattern
08/12/2010US20100203445 Negative resist composition and resist pattern forming method using the same
08/12/2010US20100203444 Photoresist composition and patterning method thereof
08/12/2010US20100203434 Substrate treatment method and substrate treatment system
08/12/2010US20100203433 Manufacturing method for a semiconductor device
08/12/2010US20100203432 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
08/12/2010US20100203429 Volume phase hologram recording material and optical information recording medium using the same
08/12/2010US20100203299 Hardmask Process for Forming a Reverse Tone Image Using Polysilazane
08/12/2010US20100203294 Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof
08/12/2010US20100202028 Method for producing counterfeit-proof confidential and valuable documents, master for use in this method and confidential and valuable documents produced therewith
08/12/2010US20100201925 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
08/12/2010US20100201381 Nano-Scale Biosensors
08/12/2010US20100201249 Plasma display panel and method for fabricating the same
08/12/2010US20100200782 Microfabricated Elastomeric Valve And Pump Systems
08/12/2010US20100200772 Radiation system with contamination barrier
08/12/2010US20100200407 Enhanced transparent conductive coatings and methods for making them
08/12/2010DE102009054868A1 Control pressure adjusting method for pneumatically operatable bellow that is utilized for e.g. positioning lens for manipulator of projection system, involves transmitting working pressure for actuator elements in to control pressure
08/12/2010DE102009007770A1 Corrective action determining method for electron beam lithographic mask writer, involves evaluating aerial image by test mask with respect to observation of tolerances based on test structures, and determining corrective action
08/12/2010DE102005034669B4 Photolithographische Maske und Verfahren zum Bilden eines Musters auf der Maske Photolithographic mask and method for forming a pattern on the mask
08/11/2010EP2216685A2 Exposure apparatus and device manufacturing method
08/11/2010EP2216684A1 Coating compositions suitable for use with an overcoated photoresist
08/11/2010EP2216683A2 Coating compositions suitable for use with an overcoated photoresist
08/11/2010EP2216682A1 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
08/11/2010EP2216681A2 Production of a surface relief on a substrate
08/11/2010EP2216680A2 Fine particles and method for producing the same
08/11/2010EP2215527A2 Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device
08/11/2010EP2215525A1 Photocurable resin composition for producing three dimensional articles having high clarity
08/11/2010EP1887614B1 Patterning method
08/11/2010EP1768846B1 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
08/11/2010EP1222497B1 Uv-absorbing support layers and flexographic printing elements comprising same
08/11/2010CN201548806U Powder spraying device used for making pre-sensitized plate
08/11/2010CN1916772B Stripper
08/11/2010CN1882879B Photopolymerizable composition
08/11/2010CN1858657B Lithographic apparatus and device manufacturing method
08/11/2010CN1786832B Lithographic apparatus and device manufacturing method
08/11/2010CN1768305B Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
08/11/2010CN1755519B Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
08/11/2010CN1737692B Developing apparatus and method
08/11/2010CN1495540B Alignment system of photoetching system utilizing at least two wavelengths and its method
08/11/2010CN101802982A Liquid treatment apparatus and liquid treatment method
08/11/2010CN101802718A Composition for forming silicon-containing fine pattern and method for forming fine pattern using the same
08/11/2010CN101802717A Projection objective with obscurated pupil for microlithography
08/11/2010CN101802716A Lithographic apparatus and device manufacturing method
08/11/2010CN101802715A Illumination system of a microlithographic projection exposure apparatus
08/11/2010CN101802714A Lithographic apparatus with rotation filter device
08/11/2010CN101802713A Composition for forming resist underlayer film, process for producing semiconductor device with the same, and additive for composition for forming resist underlayer film
08/11/2010CN101802712A Composition containing polymer having nitrogenous silyl group for forming resist underlayer film
08/11/2010CN101802711A non-covalently crosslinkable materials for photolithography processes
08/11/2010CN101802710A Photosensitive resin composition and laminate thereof
08/11/2010CN101802709A Pigment dispersion composition, resist composition for color filter including the same, and color filter using the same
08/11/2010CN101802660A Pigment dispersing composition for color filters
08/11/2010CN101802033A 感光性树脂组合物 The photosensitive resin composition
08/11/2010CN101800166A Method for manufacturing liquid repellent retaining wall
08/11/2010CN101799640A Device and method for determining optimal focal plane position of lithography machine
08/11/2010CN101799639A Low temperature type aqueous stripper for positive photoresist
08/11/2010CN101799638A Developing device, developing processing method and storage medium
08/11/2010CN101799637A Lighting optical device, microlithography projection system and device manufacturing method
08/11/2010CN101799636A Exposure equipment, exposure method and device manufacturing method
08/11/2010CN101799635A Exposure method of maskless photoetching technology
08/11/2010CN101799634A Multichannel collecting and correcting device of alignment signal of photoetching machine
08/11/2010CN101799633A Method and device for off-line measurement of optimal object plane of imaging system
08/11/2010CN101799632A Light irradiation device
08/11/2010CN101799631A Worktable cleaner, describing device and substrate processing device
08/11/2010CN101799630A Simulation method for light intensity distribution of photolithographic process of obliquely incident ultraviolet light with medium compensation of thick rubber
08/11/2010CN101799629A Chemically amplified photoresist composition and method for forming pattern
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