Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2010
08/19/2010US20100209832 Measurement apparatus, exposure apparatus, and device fabrication method
08/19/2010US20100209831 Method for correcting a position error of lithography apparatus
08/19/2010US20100209830 Multi-Pitch Scatterometry Targets
08/19/2010US20100209827 Novel sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
08/19/2010US20100209825 Exposure mask and method for forming semiconductor device by using the same
08/19/2010US20100209669 Photosensitive resin composition
08/19/2010US20100208935 Method and apparatus for determining the relative overlay shift of stacked layers
08/19/2010US20100208555 Escapement governor, mechanical watch, pallet fork (incomplete) manufacturing method, and roller manufacturing method
08/19/2010US20100208327 Pattern generator
08/19/2010US20100208186 Display device and manufacturing mehtod thereof
08/19/2010US20100207654 MEMS Interconnection Pins Fabrication on a Reusable Substrate for Probe Card Application
08/19/2010DE112006002626B4 Halbleitersubstrat und Verfahren zu dessen Herstellung Semiconductor substrate and process for its preparation
08/19/2010DE10310137B4 Satz von wenigstens zwei Masken zur Projektion von jeweils auf den Masken gebildeten und aufeinander abgestimmten Strukturmustern und Verfahren zur Herstellung der Masken Set of at least two masks for the projection of the respectively formed on the masks and concerted structure patterns and methods for making the masks
08/19/2010DE102009018937A1 Light guiding element for use in optical imaging device utilized in projection exposure system, has element covering channel-forming groove such that channels with channel cross section and channel length are formed
08/19/2010DE102009011328A1 Projection optics for use in projection exposure apparatus utilized for producing e.g. microchip, has beam path formed between object field and mirror and another beam path formed after another mirror, where paths intersect each other
08/19/2010DE102009009372A1 Monitoring von kippbaren Spiegeln Monitoring of tiltable mirrors
08/19/2010DE102009008209A1 Aktuator mit mindestens einem Magneten für eine Projektionsbelichtungsanlage sowie Projektionsbelichtungsanlage mit einem Magneten und Herstellungsverfahren hierfür Actuator with at least one magnet for a projection exposure apparatus and projection exposure apparatus with a magnet and manufacturing method thereof
08/19/2010DE102006037433B4 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper A process for producing a multilayer body as well as multi-layer body
08/19/2010CA2751911A1 Photo polymer compositions as printable formulations
08/18/2010EP2219214A1 Photosensitive adhesive, semiconductor device and method for manufacturing semiconductor device
08/18/2010EP2219206A1 Control device, exposure method, and exposure device
08/18/2010EP2219078A1 Inspection apparatus for lithography
08/18/2010EP2219077A1 Projection exposure method, projection exposure system and projection objective
08/18/2010EP2219075A1 New holographic media and photopolymers
08/18/2010EP2219074A1 Processing solution for developing lithographic printing plate precursor and method of preparing lithographic printing plate
08/18/2010EP2219073A1 New holographic media and photopolymers
08/18/2010EP2218745A1 Prepolymer-based polyurethane formulations for producing holographic films
08/18/2010EP2218744A1 Method of manufacturing holographic photopolymers on polymer films
08/18/2010EP2218743A1 Prepolymer-based polyurethane formulations for producing holographic films
08/18/2010EP2218742A1 Photopolymer compounds as compressible formulations
08/18/2010EP2218724A1 Epoxy group-containing organosiloxane compound, curable composition for transfer material, and fine pattern forming method using the composition
08/18/2010EP2218715A1 Photoacid generator and photoreactive composition
08/18/2010EP2218580A1 Method and apparatus for preparing a printing form using vibrational energy
08/18/2010EP2217970A1 Imageable elements with components having 1h-tetrazole groups
08/18/2010EP2217450A1 Processing of lithographic printing plates with hydrophilic polymer in finisher solution
08/18/2010EP2217429A1 Process and freeform fabrication system for producing a three-dimensional object
08/18/2010EP2111566B1 Fine pattern transfer material
08/18/2010EP1639393B1 Corrective device for compensating disturbances of polarization distribution, and microlithographic projection lens
08/18/2010CN201556029U Device for controlling consistency of developer of PS-plate developing machine
08/18/2010CN201556028U Developing equipment
08/18/2010CN201556027U Connecting mechanism for focusing and leveling
08/18/2010CN201556026U Glue spraying device
08/18/2010CN1963670B Coating device
08/18/2010CN1950749B Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
08/18/2010CN1935516B Method for producing liquid ejecting recording head
08/18/2010CN1918516B Lithographic apparatus, method of calibration
08/18/2010CN1898605B Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them
08/18/2010CN1885129B Lighting apparatus and display apparatus
08/18/2010CN1862393B Downstream plasma processing apparatus and method
08/18/2010CN1811601B Lithographic apparatus and device manufacturing method
08/18/2010CN1797212B Lithographic apparatus and device manufacturing method
08/18/2010CN1791836B Process for fabricating semiconductor device and method for generating mask pattern data
08/18/2010CN1770011B Radiation curable compositions
08/18/2010CN1743955B Positive-type photosensitive composition
08/18/2010CN1702554B Light sensitive resin composition
08/18/2010CN101809504A Method for making lithographic printing plates
08/18/2010CN101809503A Positive-type photosensitive resin composition, and method for formation of cured film using the same
08/18/2010CN101809502A Thick film resists
08/18/2010CN101809501A Imprint method and processing method of substrate
08/18/2010CN101809500A stereolithography resin compositions and three-dimensional objects made therefrom
08/18/2010CN101809470A Method of making a colour filter array
08/18/2010CN101809064A Polyamide resin, photosensitive resin composition, method for forming cured relief pattern, and semiconductor device
08/18/2010CN101808469A Exposure method of printed wiring board
08/18/2010CN101807513A Manufacturing apparatus for semiconductor device, controlling method for manufacturing apparatus, and storage medium storing control program for manufacturing apparatus
08/18/2010CN101807014A Method for measuring alignment accuracy of machine vision system
08/18/2010CN101807013A System for monitoring minus one-level photoresist of holographic concave grating
08/18/2010CN101807012A Automatic focus light path structure of direct-write lithography machine
08/18/2010CN101807011A Lithographic apparatus and device manufacturing method
08/18/2010CN101807010A Nano-precision six-freedom-degree magnetic suspension jiggle station and application
08/18/2010CN101807009A Illumination uniformity compensating device and lithography machine provided therewith
08/18/2010CN101807008A Fluid supply system, lithographic apparatus, method of varying fluid flow rate and device manufacturing method
08/18/2010CN101807007A Liquid crystal exposure apparatus
08/18/2010CN101807006A Exposure apparatus, exposure method and method of manufacturing a display panel substrate
08/18/2010CN101807005A Processing liquid supply system and processing liquid supply method
08/18/2010CN101807004A Method for manufacturing working printing plate for production of color kinescope screen printing plate
08/18/2010CN101807003A New holographic media and photopolymers
08/18/2010CN101807002A Colored radiation-sensitive composition, color filter and color liquid crystal display device
08/18/2010CN101807001A Photosensitive resin composition and application thereof
08/18/2010CN101807000A Photosensitive resin composition and method for producing same
08/18/2010CN101806999A Colored photosensitive resin composition and color filter
08/18/2010CN101806998A Manufacture method of substrate below silica-based electrowetting microdisplay device
08/18/2010CN101806996A Preparation method of nanoimprint hard templates
08/18/2010CN101806974A Colorful film substrate, manufacture method thereof and liquid crystal display panel
08/18/2010CN101806973A Manufacturing method of segment liquid crystal display (LCD) with high contrast
08/18/2010CN101806931A Method for manufacturing optical element and optical element
08/18/2010CN101806930A Method for preparing antireflection grating
08/18/2010CN101805282A Oxime ester compound, photopolymerizable composition and color filter using the same
08/18/2010CN101805281A Oxime ester compound to used for photosensitive polymer composition
08/18/2010CN101805274A Method for producing particularly reactive and low viscosity allophanates with actinically hardenable groups and use of same to produce particularly scratch-proof coatings
08/18/2010CN101408731B Immerge control device for immersed photoetching machine
08/18/2010CN101378010B Coating and developing apparatus, coating and developing method, and storage medium
08/18/2010CN101373301B FFS type TFT-LCD array substrate structure and manufacturing method thereof
08/18/2010CN101373282B Method for manufacturing position phase array machine capable of adjusting two-dimensional photon microstructure
08/18/2010CN101174088B Polymethyl methacrylate-TiO2 hybrid material preparation and minute pattern production
08/18/2010CN101131541B Photographic emulsion supplying device
08/18/2010CN101067725B Preventing device and method for sensitive-liquid curing in slit-nozzle
08/18/2010CN101060769B A method for producing the 3D products suitable for foldable forming
08/17/2010US7777861 Methods, systems, and computer program products for printing patterns on photosensitive surfaces
08/17/2010US7776667 Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system
08/17/2010US7776517 Method of producing a touch panel
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