| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/25/2010 | CN1542551B Focus spot monitoring in a lithographic projection apparatus |
| 08/25/2010 | CN101815969A Projection objective for microlithography |
| 08/25/2010 | CN101815733A Polymers for use in photoresist compositions |
| 08/25/2010 | CN101813896A Developing solution of low-tension positive photoresist |
| 08/25/2010 | CN101813895A Exposure machine and exposure method using same |
| 08/25/2010 | CN101813894A On-line detection device of wave aberration of projection lens of lithography machine with precision calibration function |
| 08/25/2010 | CN101813893A Method for calibrating exposure energy demand distribution by adopting exposure mode |
| 08/25/2010 | CN101813892A Environmental system including a transport region for an immersion lithography apparatus |
| 08/25/2010 | CN101813891A Lithographic apparatus and device manufacturing method |
| 08/25/2010 | CN101813890A A lithographic apparatus provided with a swap bridge |
| 08/25/2010 | CN101813889A Spraying device of liquid material thin film and spraying method thereof |
| 08/25/2010 | CN101813888A Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists |
| 08/25/2010 | CN101813887A Method for enhancing thermal stability of diazo photosensitive emulsion |
| 08/25/2010 | CN101813886A Photoresist compound |
| 08/25/2010 | CN101813885A Mould making process for multilayer acid-free metal plate |
| 08/25/2010 | CN101813884A Method for preparing nano-structured matrix on surface of uneven substrate |
| 08/25/2010 | CN101812173A N-hydroxy maleopimaric acid imide ester acetal polymer and preparation method thereof |
| 08/25/2010 | CN101811963A Method for synthesizing photoresist-monomer carbon-rigid-skeleton acrylic ester compounds by transesterification |
| 08/25/2010 | CN101520543B Deep ultraviolet projection photoetching object lens |
| 08/25/2010 | CN101515118B Immersion self-adaptation rotary sealing device for photo-etching machine |
| 08/25/2010 | CN101452163B TFT-LCD array substrate structure and method for manufacturing same |
| 08/25/2010 | CN101424846B TFT-LCD array substrate, liquid crystal display panel and method for producing same |
| 08/25/2010 | CN101424837B Method for manufacturing LCD array substrate |
| 08/25/2010 | CN101403861B Immersion self-adapting seal control device used for photo-etching machine |
| 08/25/2010 | CN101393009B Large stroke laser interferometer vertical measuring set and method |
| 08/25/2010 | CN101387833B Projection objective magnification error and distortion detection device and method |
| 08/25/2010 | CN101369096B Plug-pull type vibration amplitude mask plate for producing arbitrary refractive index modulation optical fiber optical grating |
| 08/25/2010 | CN101327710B Method for decorating surface of metal |
| 08/25/2010 | CN101320218B Three scanning type silicon slice focusing and leveling measurement apparatus, system and method |
| 08/25/2010 | CN101303968B Substrate processing apparatus |
| 08/25/2010 | CN101241319B Machine vision aligning system possessing mask target hierarchy and its alignment method |
| 08/25/2010 | CN101233454B Polarization analyzer, polarization sensor and method for determining at least one polarization property and lithographic apparatus |
| 08/25/2010 | CN101226340B A scatterometer, a lithographic apparatus and a focus analysis method |
| 08/25/2010 | CN101226339B FIFO data storage system containing multiple capture channels and method thereof |
| 08/25/2010 | CN101221364B Technology, device and device |
| 08/25/2010 | CN101130577B Polymer, radiation sensitive resin composition and spacer for liquid crystal display element |
| 08/25/2010 | CN101118378B Preparation method of diamond surface graphics |
| 08/24/2010 | USRE41580 Lactone-containing compounds, polymers, resist compositions, and patterning method |
| 08/24/2010 | USRE41579 ARE CAPABLE OF DIRECTLY MAKING A PRINTING PLATE USING AN INFRARED LASER BASED ON DIGITAL SIGNALS OUTPUTTED FROM A COMPUTER; improve plate wear resistance and sensitivity, and generates heat upon absorbing light |
| 08/24/2010 | US7784020 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device |
| 08/24/2010 | US7784016 Method and system for context-specific mask writing |
| 08/24/2010 | US7783213 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 08/24/2010 | US7781763 Composition for forming passivation layer and organic thin film transistor comprising the passivation layer |
| 08/24/2010 | US7781750 Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources |
| 08/24/2010 | US7781495 Addition polymer having two or more (meth)acryloyl groups per molecule at the molecular ends, and an addition polymer having one (meth)acryloyl group per molecule at the molecular end, e.g., halogen-terminated butyl acrylate-ethyl acrylate-methoxyethyl acrylate terpolymer reacted with acryloyl chloride |
| 08/24/2010 | US7781342 between heat-processing and etching steps, supplying a fluorine-based liquid ( trifluoroethanol/2.2.2-/) to the heat processed resist pattern to form a protection film with a high fluorine density on a surface of the resist pattern; development, etching |
| 08/24/2010 | US7781157 coating a substrate with a film containing terpolymer of 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-6-methyl-hept-6-yl-methacrylate, 5-(3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl)bicyclo[2.2.1]heptanyl methacrylate and 4-oxa-tricyclo[4.2.1.03,7] non-5-one-2yl methacrylate, exposing, developing |
| 08/24/2010 | US7781156 forming a resist pattern on metal layer covering a substrate, wet etching exposed metal layer, removing resist pattern forming metal layer pattern, exposing a portion of substrate, wet etching, removing metal layer pattern to form a recessed pattern, depositing a compensation layer(SiO2); slim profile |
| 08/24/2010 | US7781153 Spin coating a substrate with a blocking layer containing a terpolymer prepared from benzyl methacrylate, methacrylic acid, and hydroxyethyl methacrylate; a cross-linking agent; a thermal acid generator such as toluenesulfonic acid, pyrimidine salt, exposing and developing to form blocking pattern |
| 08/24/2010 | US7781152 Magnetic read sensors that utilize the giant magnetoresistive (GMR) effect for their operation are patterned to produce a required trackwidt; forming a bilayer lift-off mask having sharply defined edge and corner regions, includes use of ozone to assist in the controlled dissolution of mask underlayer |
| 08/24/2010 | US7781151 depositing first polymer layer, first lithography, depositing chromium layer, depositing gold layer, removing first photo-resist layer, depositing second polymer layer, second lithography, plasma etching step, removing second photoresist layer; protective coatings for sensor; cost efficiency |
| 08/24/2010 | US7781150 Two layers of photoresist; second layer chemically amplified resist of photosensitive diazonaphtoquinone and novolac resin; second resist layer possesses a transmission which first increases then decreases as exposure dose increases |
| 08/24/2010 | US7781149 Reduced pitch multiple exposure process |
| 08/24/2010 | US7781148 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent |
| 08/24/2010 | US7781147 Imide-urethane resin, photosensitive resin composition including the same and cured product |
| 08/24/2010 | US7781145 Method for forming a photoresist pattern |
| 08/24/2010 | US7781144 Positive resist composition and resist pattern forming method |
| 08/24/2010 | US7781143 Imagable layer, polyvinyl alcohol protective overcoarting on hydrophilic substrate; including an infrared sensitive cyanine dyes ; antifogging by white light; high speed images |
| 08/24/2010 | US7781142 Copolymer and top coating composition |
| 08/24/2010 | US7781141 Compositions and processes for immersion lithography |
| 08/24/2010 | US7781140 presoaking, turbulently exposing, spraying, scouring and rinsing each take place automatically in the single tool and in more than one processing station of the tool for removing dry film resist (DFR) from a fine pitch solder bump array on a semiconductor wafer |
| 08/24/2010 | US7781131 alkali-soluble resin having a polybenzoxazole precursor structure, a sensitizer, and alcoholic compounds having cyclohexane, norbornane or adamantane rings; semiconductor device and a display element ; high reliability when cured at low temperature |
| 08/24/2010 | US7781129 Green pigment for color filter, green pigment dispersion, photosensitive color composition, color filter, and liquid crystal panel |
| 08/24/2010 | US7780366 Resist pattern forming method |
| 08/24/2010 | US7779890 Method and apparatus for production of a cast component |
| 08/24/2010 | US7779781 Lithographic apparatus and device manufacturing method |
| 08/19/2010 | WO2010094017A1 Process for thick film circuit patterning |
| 08/19/2010 | WO2010093415A1 Developer waste reuse |
| 08/19/2010 | WO2010093413A1 Negative-working imageable elements |
| 08/19/2010 | WO2010093210A2 Photoactive compound and photosensitive resin composition containing the same |
| 08/19/2010 | WO2010093004A1 Photosensitive lithographic printing plate material |
| 08/19/2010 | WO2010092824A1 Positive photosensitive resin composition, cured film using same, protective film, insulating film, semiconductor device, and display device |
| 08/19/2010 | WO2010092420A1 A hardmask process for forming a reverse tone image using polysilazane |
| 08/19/2010 | WO2010092128A1 Multi-table lithographic systems |
| 08/19/2010 | WO2010091977A1 Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet |
| 08/19/2010 | WO2010091927A1 Photoresist compositions and methods of use |
| 08/19/2010 | WO2010091907A1 Multilayer mirror and lithographic apparatus |
| 08/19/2010 | WO2010091840A1 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
| 08/19/2010 | WO2010091807A1 Photo polymer compositions as printable formulations |
| 08/19/2010 | WO2010091800A1 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
| 08/19/2010 | WO2010091795A1 Method for producing holographic photopolymers on polymer films |
| 08/19/2010 | US20100211207 Manufacturing apparatus for semiconductor device, controlling method for the manufacturing apparatus, and storage medium storing control program for the manufacturing apparatus |
| 08/19/2010 | US20100210475 Microarray having bright fiducial mark and method of obtaining optical data from the mircoarray |
| 08/19/2010 | US20100209857 Lithography Process for the Continuous Direct Writing of an Image |
| 08/19/2010 | US20100209856 Lithographic apparatus and device manufacturing method for writing a digital image |
| 08/19/2010 | US20100209855 Method and apparatus for manufacturing semiconductor device and resist material |
| 08/19/2010 | US20100209854 Method For Producing An Electro-Optical Printed Circuit Board With Optical Waveguide Structures |
| 08/19/2010 | US20100209853 Method for selectively adjusting local resist pattern dimension with chemical treatment |
| 08/19/2010 | US20100209852 Track nozzle system for semiconductor fabrication |
| 08/19/2010 | US20100209851 Method of making a lithographic printing plate |
| 08/19/2010 | US20100209850 Pattern forming method |
| 08/19/2010 | US20100209849 Pattern forming process and resist-modifying composition |
| 08/19/2010 | US20100209848 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 08/19/2010 | US20100209847 Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
| 08/19/2010 | US20100209846 Negative-working imageable elements |
| 08/19/2010 | US20100209845 Dispersion composition, photosensitive resin composition for light-shielding color filter, light-shielding color filter, method of producing the same, and solid-state image sensor having the color filter |
| 08/19/2010 | US20100209844 Method and apparatus for preparing a printing form using vibrational energy |
| 08/19/2010 | US20100209843 Process for thick film circuit patterning |
| 08/19/2010 | US20100209834 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure |
| 08/19/2010 | US20100209833 Charged particle beam writing method and charged particle beam writing apparatus |