Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2010
09/01/2010CN101251718B Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
09/01/2010CN101206325B Liquid crystal display device with photosensor and method of fabricating the same
09/01/2010CN101149560B Micro structure mold core and its manufacture method
09/01/2010CN101021658B Liquid crystal display panel semiconductor structure and producing method thereof
09/01/2010CN101015039B Substrate for exposure, exposure method and device manufacturing method
09/01/2010CN101003355B Direct write nano etching method
08/2010
08/31/2010US7788626 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method
08/31/2010US7787706 Method for controlling an intensity of an infrared source used to detect objects adjacent to an interactive display surface
08/31/2010US7787174 Pattern generator
08/31/2010US7787102 Real-time configurable masking
08/31/2010US7786607 Overlay correction by reducing wafer slipping after alignment
08/31/2010US7786224 Liquid composition of alicyclic diepoxide, curing agent and/or curing accelerator
08/31/2010US7785863 Consists of a light source, a micromirror positioned to redirect light from light source toward substrate, a computer connected to and controlling micromirror and a reaction chamber is placed in the path of light redirected by mirrors
08/31/2010US7785768 Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
08/31/2010US7785767 photoresist films suitable for immersion exposure, comprising non-aromatic olefin polymers, acid generators, solvents and acrylic polymers or vinyl ether polymers, having good followability for water, improved profile and pattern collapse
08/31/2010US7785766 Polycarbosilane reaction product of a p-bis(dialkylsilyl)benzene and a bis(2-allylphenol) compound; photo-curable resin can be processed to form patterned films having a widely varying thickness from submicron to more than 20 mu m; good adhesion, heat and chemical resistance, and electrical insulation
08/31/2010US7785765 Photosensitive resin composition
08/31/2010US7785431 Compressible plate for flexographic printing, and process for obtaining
08/26/2010WO2010096615A2 Acid-sensitive, developer-soluble bottom anti-reflective coatings
08/26/2010WO2010096593A2 Beam pen lithography
08/26/2010WO2010096591A2 Gel polymer pen lithography
08/26/2010WO2010096147A1 On-press developable imageable elements
08/26/2010WO2010096043A1 Separation in an imprint lithogaphy process
08/26/2010WO2010095942A1 Method for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (euv) and the infrared (ir) wavelength range, and optical grating and optical device therefore
08/26/2010WO2010095763A1 Organic solvent development or multiple development pattern-forming method using electron beams or euv rays
08/26/2010WO2010095746A1 Compounds, fluorine-containing polymers, and radiation -sensitive resin compositions
08/26/2010WO2010095738A1 Starting liquid for forming protective film, protective film, and wired substrate having protective film
08/26/2010WO2010095719A1 Colored ceramic vacuum chuck and manufacturing method thereof
08/26/2010WO2010095698A1 Polymer, radiation-sensitive composition, and monomer
08/26/2010WO2010095390A1 Photosensitive resin composition
08/26/2010WO2010095385A1 Sulfonium salt, photo-acid generator, and photosensitive resin composition
08/26/2010WO2010094800A1 Substrate support structure, clamp preparation unit, and lithography system
08/26/2010WO2010094748A1 Method of clamping a substrate and clamp preparation unit
08/26/2010WO2010094684A1 Projection exposure apparatus comprising an actuator system
08/26/2010WO2010094661A1 Nanolithography process
08/26/2010WO2010094658A1 Monitoring of tiltable mirrors
08/26/2010WO2010094531A1 Ultra low post exposure bake photoresist materials
08/26/2010WO2010094399A1 Projection illumination method, projection illumination system, laser beam source and bandwidth narrowing module for a laser beam source
08/26/2010WO2010094102A1 Device for grasping and active release of micro and nano objects
08/26/2010WO2010064829A3 Anti-reflective underlayer composition
08/26/2010WO2010059580A3 Image mask assembly for photolithography
08/26/2010WO2010047790A3 Fluid dispense device calibration
08/26/2010WO2010047789A3 Double sidewall angle nano-imprint template
08/26/2010WO2010029138A3 Method of etching using a multilayer masking structure
08/26/2010US20100216077 Developing apparatus and developing method
08/26/2010US20100216076 Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
08/26/2010US20100216075 Method and apparatus for generating periodic patterns by step-and-align interference lithography
08/26/2010US20100216074 Method for on-press developable lithographic plate utilizing light-blocking material
08/26/2010US20100216073 Photosensitive resin composition
08/26/2010US20100216072 Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition
08/26/2010US20100216071 Ultra low post exposure bake photoresist materials
08/26/2010US20100216070 Photosensitive Polyimides and Methods of Making the Same
08/26/2010US20100216067 Lithographic printing plate developing compositions
08/26/2010US20100216064 Semiconductor-device manufacturing method, computer program product, and exposure-parameter creating method
08/26/2010US20100216062 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
08/26/2010US20100216060 Method and system for producing multiple images in a single image plane using diffraction
08/26/2010US20100216059 Polymer composites with confined crystallization
08/26/2010US20100216058 Block terpolymer with confined crystallization
08/26/2010US20100215919 On-press developable imageable elements
08/26/2010US20100215543 Methods for fabricating high aspect ratio probes and deforming high aspect ratio nanopillars and micropillars
08/26/2010US20100213956 Probe for current test, probe assembly and production method thereof
08/26/2010US20100213580 Acid-sensitive, developer-soluble bottom anti-reflective coatings
08/26/2010US20100213069 Master plate and method of manufacturing the same
08/26/2010US20100212522 Processless development of printing plate
08/26/2010DE10308436C5 Druckplattenbelichter zur Aufzeichnung von Druckvorlagen Platesetter for recording printing templates
08/26/2010DE102009019122A1 Method for manufacturing optical surface of micro-lithography projection exposure apparatus, involves removing material in isotropic and anisotropic manner by local chemical and/or physical dry etching, and polishing removed material
08/26/2010DE102009012723A1 Method for cleaning joining area of optical element before joining operation, involves carrying out abrasion of impurities on joining area by cleaning medium, where cleaning medium is brought in contact with joining area
08/26/2010DE102009010560A1 Projektionsbelichtungsverfahren, Projektionsbelichtungsanlage, Laserstrahlungsquelle und Bandbreiten-Einengungsmodul für eine Laserstrahlungsquelle The projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source
08/26/2010DE102009009221A1 Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem Projection exposure apparatus for semiconductor lithography with an actuator system
08/26/2010DE102004052994C5 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate
08/26/2010CA2752907A1 Gel polymer pen lithography
08/26/2010CA2750918A1 Device for grasping and active release of micro and nano objects
08/25/2010EP2221860A2 Chip Attach Adhesive To Facilitate Embedded Chip Build Up And Related Systems And Methods
08/25/2010EP2221670A2 Automatic developing apparatus and processing method for lithographic printing plate precursor
08/25/2010EP2221669A2 A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
08/25/2010EP2221668A1 Lithographic apparatus and device manufacturing method
08/25/2010EP2221667A1 Combined motion sensor for use in feedback regulation systems for vibration isolation
08/25/2010EP2221666A1 Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device
08/25/2010EP2221665A2 Dispersion composition, photosensitive resin composition for light- shielding color filter, light-shielding color filter, method of producing the same, and solid-state image sensor having the color filter
08/25/2010EP2221664A1 Nanolithography process
08/25/2010EP2221348A2 Pigment dispersion composition, colored curable composition, color filter, liquid crystal display device and solid-state image sensor
08/25/2010EP2221326A1 Photosensitive resin composition
08/25/2010EP2221163A1 Machine head for production of a surface relief
08/25/2010EP2221162A1 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article
08/25/2010EP2220536A1 Illumination system of a microlithographic projection exposure apparatus
08/25/2010EP2220184A1 Novel siloxane polymer compositions
08/25/2010EP2220165A1 Siloxane polymer compositions and methods of using the same
08/25/2010EP2219815A1 Laser beam machining
08/25/2010EP1754108B1 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing
08/25/2010EP1502292B1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
08/25/2010CN201562123U Silk screen plate baking oven
08/25/2010CN201562122U Wafer delivery mechanism of photoetching machine
08/25/2010CN1996145B Method for reducing water pollution of optical elements in immersion type photoengraving technology
08/25/2010CN1983033B Mask pattern arrangement
08/25/2010CN1975584B Structure, system and method for analyzing dimensionally unstable layer for forming pattern
08/25/2010CN1853140B Positive photoresist composition and method of forming resist pattern
08/25/2010CN1816773B Methods of etching photoresist on substrates
08/25/2010CN1782886B Lithographic apparatus and device manufacturing method
08/25/2010CN1752844B Mask patterns for semiconductor device fabrication and related methods and structures
08/25/2010CN1690848B Image recording apparatus
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