Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2010
09/07/2010US7790093 Process for the production of a three-dimensional object with resolution improvement by “pixel-shift”
09/07/2010US7789647 Processing apparatus and method
09/07/2010US7789577 Coating and developing system, coating and developing method and storage medium
09/02/2010WO2010099370A1 Solid-state array for lithography illumination
09/02/2010WO2010099017A2 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers
09/02/2010WO2010098899A1 Multipurpose acidic, organic solvent based microelectronic cleaning composition
09/02/2010WO2010098819A1 Polymer-containing solvent purifying process
09/02/2010WO2010098618A2 Polymer for coating photoresist pattern, and method for forming pattern for semiconductor device using same
09/02/2010WO2010098617A2 Polymer for coating a photoresist pattern, and method for forming a pattern of a semiconductor device using same
09/02/2010WO2010098493A1 Resist composition for negative-tone development and pattern forming method using the same
09/02/2010WO2010098474A1 Optical element holding device, optical system, exposure apapratus, device manufacturing method, and interchange method for optical element
09/02/2010WO2010098371A1 Exposure apparatus
09/02/2010WO2010098356A1 Block copolymer composition for flexographic printing plates
09/02/2010WO2010098352A1 Process for producing porous quartz glass object, and optical member for euv lithography
09/02/2010WO2010098327A1 Dispersion composition, polymerizable composition, opaque color filter, liquid crystal display element equipped with opaque color filter, solid state imaging element, wafer-level lens, and imaging unit equipped with wafer-level lens
09/02/2010WO2010098312A1 Photosensitive resin composition
09/02/2010WO2010098299A1 Optical element retaining device, optical system, and exposure device
09/02/2010WO2010098263A1 Substrate treatment device and treatment method
09/02/2010WO2010098183A1 Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same
09/02/2010WO2010098175A1 Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same
09/02/2010WO2010097857A1 Resist material and pattern-forming method using same
09/02/2010WO2010097856A1 Pattern forming method
09/02/2010WO2010097280A1 A spray nozzle
09/02/2010WO2010097039A1 Method of forming pattern on substrate
09/02/2010WO2010039226A3 Method of replication of an imprint lithography template
09/02/2010US20100221672 Pattern forming method
09/02/2010US20100221671 Printhead integrated circuit attachment film
09/02/2010US20100221670 Pattern formation method
09/02/2010US20100221669 Method, program product and apparatus for performing double exposure lithography
09/02/2010US20100221668 Resin composition for optical material, resin film for optical material, and optical waveguide
09/02/2010US20100221667 Catalyst For Microelectromechanical Systems Microreactors
09/02/2010US20100221666 Silsequioxane-titania hybrid polymers
09/02/2010US20100221665 Manufacturing method of semiconductor device
09/02/2010US20100221664 Radiation-sensitive composition
09/02/2010US20100221663 Light sensitive planographic printing plate material, and image formation method employing the same
09/02/2010US20100221662 Heat-sensitive imaging element
09/02/2010US20100221661 Methods for producing photosensitive microparticles
09/02/2010US20100221660 Lithographic apparatus, device manufacturing method and a substrate
09/02/2010US20100221659 Compound, salt, and radiation-sensitive resin composition
09/02/2010US20100221658 Lithographic printing plate precursor and method of preparing lithographic printing plate
09/02/2010US20100221657 Resist underlayer film forming composition and method of forming resist pattern using the same
09/02/2010US20100221656 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
09/02/2010US20100221653 Process for preparing stable photoresist compositions
09/02/2010US20100221646 Holographic recording medium
09/02/2010US20100221645 Film having hologram pattern and container having hologram pattern
09/02/2010US20100221581 Process for fabricating patterned magnetic recording media
09/02/2010US20100221508 Methods of flash reduction and patterning of graphite oxide and its polymer composites
09/02/2010US20100221463 Integrated Encapsulation for MEMS Devices
09/02/2010US20100220395 Fabrication process of a microfabricated blazed grating
09/02/2010US20100220305 Optical element and exposure apparatus
09/02/2010US20100220269 Display apparatus and fabrication method for display apparatus
09/02/2010US20100219508 Semiconductor device
09/02/2010US20100219267 Spray nozzle
09/02/2010US20100219073 Biological test chip and a manufacturing method thereof
09/02/2010US20100218984 Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board
09/02/2010US20100218694 System and method for exposing a digital polymer plate
09/02/2010DE102010002298A1 Projektionsbelichtungsanlage für die Halbleiterlithographie mit einer Kühlvorrichtung Projection exposure apparatus for semiconductor lithography with a cooling device
09/02/2010DE102009015393B3 Messverfahren und Messsystem zur Messung der Doppelbrechung Measurement method and measuring system for measuring the birefringence
09/02/2010CA2753435A1 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers
09/02/2010CA2753399A1 Multipurpose acidic, organic solvent based microelectronic cleaning composition
09/01/2010EP2223804A2 Lithographic printing plate precursor and plate making method thereof
09/01/2010EP2223186A1 Diffraction based overlay metrology tool and method
09/01/2010EP2223174A1 Methods for forming sheeting with a composite image that floats and a master tooling
09/01/2010EP2222764A2 Controlling thickness of residual layer
09/01/2010EP1386376B1 Laser spectral engineering for lithographic process
09/01/2010CN201569851U Supercritical carbon dioxide gelatinizing system
09/01/2010CN201569850U Film sheet for corroding veins on working face of injection mould cavity
09/01/2010CN201565291U System for classified discharge or recovery of various chemicals
09/01/2010CN1991591B Lithographic apparatus and device manufacturing method
09/01/2010CN1952787B Method and system for manufacturing integrated circuit assembly
09/01/2010CN1904730B Gluing developing apparatus and chip transmission process
09/01/2010CN1869809B Halftone mask and method of fabricating the same, and method of fabricating display device using the same
09/01/2010CN1858655B Lithographic apparatus and device manufacturing method
09/01/2010CN1841208B Lithographic apparatus, wet dipping type projection device and device manufacturing method
09/01/2010CN1815371B Semiconductor element and method of manufacture the same
09/01/2010CN1707358B Photosensitive resin composition
09/01/2010CN1702559B Lithographic apparatus and device manufacturing method
09/01/2010CN1696828B Chemically amplified positive resist composition, a haloester derivative and a process for producing the same
09/01/2010CN101821678A Microlithographic projection exposure apparatus
09/01/2010CN101821677A Composition for forming resist underlayer film and method of forming resist pattern from the same
09/01/2010CN101821299A Photosensitive graft polymer, and photosensitive resin composition comprising the same
09/01/2010CN101821081A Automatic geometric calibration using laser scanning reflectometry
09/01/2010CN101819932A Graph transfer printing method
09/01/2010CN101819917A Manufacture method and system of semiconductor device
09/01/2010CN101819388A Lithographic apparatus and device manufacturing method
09/01/2010CN101819387A Exposure method, exposure device, and device manufacturing method
09/01/2010CN101819386A Exposure apparatus and device manufacturing method
09/01/2010CN101819385A Exposing method and device manufacturing method
09/01/2010CN101819384A Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
09/01/2010CN101819383A Lithographic apparatus and positioning apparatus
09/01/2010CN101819382A Method for reducing wafer defects in edge bead removal process and wafer structure
09/01/2010CN101819381A Photosensitive monomer, liquid crystal panel and manufacturing method thereof
09/01/2010CN101819380A Pulp for black optical imaging electrode of plasma display panel
09/01/2010CN101819379A Photosensitive polyurethane resin and composite containing same
09/01/2010CN101819349A Color film base plate and manufacturing method thereof as well as liquid crystal display panel
09/01/2010CN101819348A Horizontal electric field mode color film substrate and manufacturing method thereof
09/01/2010CN101819288A Optical element and method for making the same, master and method for making the same, and display apparatus
09/01/2010CN101817889A Iridoid as ultraviolet light initiator
09/01/2010CN101304076B Method for processing cathode insulated column of organic luminous display device
09/01/2010CN101251721B Developing spray nozzle structure and method for spraying developing solution
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