| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/09/2010 | US20100227272 Highly Functional Multiphoton Curable Reactive Species |
| 09/09/2010 | US20100227271 Method for making a lithographic printing plate |
| 09/09/2010 | US20100227270 Reusable paper media with compatibility markings and printer with incompatible media sensor |
| 09/09/2010 | US20100227269 Imageable elements with colorants |
| 09/09/2010 | US20100227263 Position detector and exposure apparatus |
| 09/09/2010 | US20100227262 Method for manufacturing semiconductor device |
| 09/09/2010 | US20100227261 Flare-measuring mask, flare-measuring method, and exposure method |
| 09/09/2010 | US20100227260 Photomasks, Methods Of Forming Photomasks, And Methods Of Photolithographically-Patterning Substrates |
| 09/09/2010 | US20100227126 Positive-type photosensitive resin composition, method for producing patterns, and electronic parts |
| 09/09/2010 | US20100227051 Metal mold for use in imprinting processes |
| 09/09/2010 | US20100226655 Self-standing parallel plate beam splitter, method for manufacturing the same, and laser diode package structure using the same |
| 09/09/2010 | US20100225895 Illumination optical system, exposure apparatus, and exposure method |
| 09/09/2010 | US20100225890 Method for evaluating flare in exposure tool |
| 09/09/2010 | US20100225889 Projection optical system, exposure apparatus, and device manufacturing method |
| 09/09/2010 | US20100225864 Production method of liquid crystal display device and liquid crystal display device |
| 09/09/2010 | US20100225417 N-Way Divider/Combiner, With N Different From A Power Of Two, Obtained In Planar, Monolithic, And Single-Face Technology For Distribution Networks For Avionic Radars With Electronic Beam-Scanning Antenna |
| 09/09/2010 | DE102009011329A1 Catadioptric projection lens for use in wafer-scanner for immersion lithography, has refractive objective portion with immersion lens group that is made of optical high-index material with refractive index greater than specific value |
| 09/09/2010 | DE102009009562A1 Kombinierter Bewegungssensor zum Einsatz in Feedback-Regelsystemen zur Schwingungsisolation Combined motion sensor for use in feedback control systems for vibration isolation |
| 09/08/2010 | EP2226684A1 Process for producing regenerated porous sheet |
| 09/08/2010 | EP2226683A1 Illumination system for use in a stereolithography apparatus |
| 09/08/2010 | EP2226682A2 Exposure apparatus, exposure method, and method for producing device |
| 09/08/2010 | EP2226681A1 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 09/08/2010 | EP2226680A1 Positive lithographic printing plate precursor and method for producing the same |
| 09/08/2010 | EP2226679A1 Process for fabricating a mould for nanoimprint lithography |
| 09/08/2010 | EP2226678A1 Process for fabricating a mould for nanoimprint lithography |
| 09/08/2010 | EP2225770A1 Computer generated hologram, generation method, and exposure apparatus |
| 09/08/2010 | EP2225612A1 A method for preparing lithographic printing plate precursors |
| 09/08/2010 | EP2225106A1 Method of preparing printing forms for flexographic printing and a system used in the method |
| 09/08/2010 | EP2224874A1 Process and freeform fabrication system for producing a three-dimensional object |
| 09/08/2010 | EP1866371B1 Ultraviolet curing resin composition |
| 09/08/2010 | CN1949086B Substrate processing method and substrate processing apparatus |
| 09/08/2010 | CN1932645B Method for fabricating semiconductor device including resist flow process and film coating process |
| 09/08/2010 | CN1926471B Photosensitive structure for flexographic printing and process for producing the same |
| 09/08/2010 | CN1886442B Pellicle and novel fluoropolymer |
| 09/08/2010 | CN1847981B Negative photoresist composition |
| 09/08/2010 | CN1797201B Method for fabricating micro image |
| 09/08/2010 | CN101828228A Concave portion forming method, concave-convex product manufacturing method, light-emitting element manufacturing method, and optical element manufacturing method |
| 09/08/2010 | CN101828149A Displacement device with precision measurement |
| 09/08/2010 | CN101828148A Positive lithographic printing plate precursor and method for producing the same |
| 09/08/2010 | CN101827897A Diketopyrrolopyrrole pigment composition for use in color filters |
| 09/08/2010 | CN101827880A Precursor for heat-resistant resin and photosensitive resin composition containing the same |
| 09/08/2010 | CN101827813A Sulfone compound, sulfonic acid salt, and radiation-sensitive resin composition |
| 09/08/2010 | CN101827783A Methods of making hierarchical articles |
| 09/08/2010 | CN101827700A Peeling imaged media from a substrate |
| 09/08/2010 | CN101826330A Suspension board with circuit and production method thereof |
| 09/08/2010 | CN101825848A Developing solution of thermosensitive positive-type photosensitive plate for printing and preparation method thereof |
| 09/08/2010 | CN101825847A Cleanup method for optics in immersion lithography |
| 09/08/2010 | CN101825846A Method for detecting positive photoresistance exposure threshold energy |
| 09/08/2010 | CN101825845A Surface plasmon imaging lithography method for processing nano graphic with high aspect ratio |
| 09/08/2010 | CN101825844A Alkaline developable photosensitive material |
| 09/08/2010 | CN101825843A Photosensitive resin composition |
| 09/08/2010 | CN101825842A Method for manufacturing nano-imprinting seal |
| 09/08/2010 | CN101825810A Liquid crystal display panel and manufacturing method thereof |
| 09/08/2010 | CN101825730A Optical element, method for manufacturing master for manufacturing optical element, and photoelectric conversion device |
| 09/08/2010 | CN101825624A Miniaturized total analysis device formed by six-channel microfluidic chip and quartz crystal microbalance |
| 09/08/2010 | CN101824370A Cleanser for slit coater, slit coater for manufacturing display device and manufacturing method for display device |
| 09/08/2010 | CN101824141A Process for making polyesters |
| 09/08/2010 | CN101823989A Polymer for resist, resist composition, pattern forming method and starting compound for resist polymer |
| 09/08/2010 | CN101546070B Transverse electric-field liquid crystal display panel and preparation method thereof |
| 09/08/2010 | CN101452212B Projection aligner |
| 09/08/2010 | CN101452210B Photolithography method for forming different pattern density |
| 09/08/2010 | CN101441417B Polarized light source apparatus based on liquid crystal in photolithography lens imaging system |
| 09/08/2010 | CN101413138B Method for improving accuracy of size of micro-electroforming cast layer |
| 09/08/2010 | CN101405836B Manufacturing method of semiconductor device |
| 09/08/2010 | CN101398859B Method for introducing light shield partial increment magnification coefficient into optical proximity effect model building |
| 09/08/2010 | CN101398558B Reflection-permeation array substrate and method for manufacturing same |
| 09/08/2010 | CN101382614B Optical filter copy process |
| 09/08/2010 | CN101308219B Method for constructing anti-reflection microstructure using single layer nanometer particle as etching blocking layer |
| 09/08/2010 | CN101135856B Laser directly writing device and laser directly writing method |
| 09/08/2010 | CN101118839B Coating and developing system, coating and developing method and storage medium |
| 09/08/2010 | CN101109879B Liquid display device and fabrication method thereof |
| 09/08/2010 | CN101101457B Method of removing photoresist |
| 09/08/2010 | CN101044435B Photosensitive composition removing liquid |
| 09/08/2010 | CN101034257B Photosensitive film used for holographic recording and manufacturing method |
| 09/07/2010 | US7793252 Mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 09/07/2010 | US7791740 Method and system for measuring patterned structures |
| 09/07/2010 | US7791718 Measurement method, exposure method, and device manufacturing method |
| 09/07/2010 | US7791711 Projection method including pupillary filtering and a projection lens therefor |
| 09/07/2010 | US7791021 method of evaluating each microstructured pattern of a semiconductor by calculating as a dislocation vector the relationship in position between the surface and bottom of the photoresist on the microstructured pattern; method of evaluating exposure accuracy |
| 09/07/2010 | US7790811 Pellicle and novel fluoropolymer |
| 09/07/2010 | US7790480 predetermined wavelength reflectance is measured and peak heights and valleys in vicinity of predetermined wavelength are tabulated; relative swing ratio is computed as average peak height of spectra at exposure wavelength; ratio is compared to other processes to determine best critical dimension control |
| 09/07/2010 | US7790389 Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays |
| 09/07/2010 | US7790369 Method for producing polymers |
| 09/07/2010 | US7790359 when the sealing rubber is pressed the thin negative resist layer bends because it is made from a flexible resin and capillary phenomenon occurs ao sealing rubber is elastically deformed when entering the plating pattern; thus plating solution does not leak; electrode on semiconductor wafer |
| 09/07/2010 | US7790357 forming a first photoresist pattern on a cell region of a semiconductor substrate including an underlying layer, depositing a polysiloxane layer over the first pattern and substrate, exposing and baking to form a crosslinking layer at the interface, developing, etching to expose photoresist pattern |
| 09/07/2010 | US7790356 ArF excimer laser beam (193 nm); lithography; photoresist; organic copolymer of pyrimidinetrione, imidazolidinedione, imidazolidinetrione or triazinetrione units and a diepoxide, and also a diacid to form a copolyester; solvent |
| 09/07/2010 | US7790355 Method of processing on-press developable lithographic printing plate |
| 09/07/2010 | US7790354 dry film resist; flexible; insulating protective coating; electroless gold plating resistance; isocyanatoalkyl acrylate, unsaturated co-monomer, thermosetting epoxy, photopolymerization catalyst, polylactone |
| 09/07/2010 | US7790353 method of enhancing peak power of light source (e.g., short pulse laser) used in photoreactive absorption (e.g., reacting) process, comprising splitting light from light source into plurality of parts and focusing parts at same volume element of a photoreactive composition from a plurality of directions |
| 09/07/2010 | US7790352 Lithographic printing plate precursor |
| 09/07/2010 | US7790351 Positive resist composition and pattern making method using the same |
| 09/07/2010 | US7790350 forming block copolymer film placed on random copolymer film substrate operatively associated with electronic component and block copolymer film wherein surface energy of random copolymer film is tailored by use of a photolithographic or chemical process prior to self assembly step |
| 09/07/2010 | US7790349 includes Si-based resin layer and an acrylate film formed on one surface of the Si-based resin layer, wherein the acrylate film prevents a volatile solvent from permeating into the blanket, to thereby prevent the blanket from being deformed |
| 09/07/2010 | US7790348 Decomposable resin composition and flexographic printing plate precursor using the same |
| 09/07/2010 | US7790347 Multi-photon reacted articles with inorganic particles and method for fabricating structures |
| 09/07/2010 | US7790346 Heat-sensitive transfer image-receiving sheet and image-forming method |
| 09/07/2010 | US7790345 Positive type dry film photoresist |
| 09/07/2010 | US7790335 Photomask and manufacturing method of semiconductor device |
| 09/07/2010 | US7790333 Microlithography method using a mask with curved surface |
| 09/07/2010 | US7790227 photoresists; semiconductors |