Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2010
09/15/2010CN101835721A Glass frit for photosensitive conductive paste
09/15/2010CN101834407A Method for preparing surface-emitting surface plasma laser by utilizing nanoimprint technology
09/15/2010CN101834121A Method for producing resist pattern
09/15/2010CN101833251A Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
09/15/2010CN101833250A Developing device and developing method
09/15/2010CN101833249A Utilities transfer system in a lithography system
09/15/2010CN101833248A Substrate table, immersion lithographic apparatus and device manufacturing method
09/15/2010CN101833247A Measuring system for the optical measurement of projecting object lens of micro-lithography projection exposure system
09/15/2010CN101833246A Optically compensated unidirectional reticle bender
09/15/2010CN101833245A Gluing device and gluing method
09/15/2010CN101833244A Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
09/15/2010CN101833243A Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
09/15/2010CN101833242A Resist solution and method of forming pattern using thereof
09/15/2010CN101833241A Photosensitive resin composition
09/15/2010CN101833240A Code brushing method of small-caliber steel pipe
09/15/2010CN101833239A Substrate processing method
09/15/2010CN101833238A Pressing mould
09/15/2010CN101833237A Pressing device
09/15/2010CN101833203A TFT-LCD (Thin Film Transistor-Liquid Crystal Display) array substrate and manufacturing method thereof
09/15/2010CN101833201A Method for marking sequence number of scanning lines and mask plate
09/15/2010CN101833193A Semi-transparent type crystal liquid display, transparent substrate and manufacturing method thereof
09/15/2010CN101833124A Micro lens based on digital maskless photetching technology and manufacture method thereof
09/15/2010CN101832995A Biological detection test piece and manufacturing method thereof
09/15/2010CN101832831A Piezoresistive sensor chip and manufacture method thereof
09/15/2010CN101831163A Sacrificial compositions, methods of use thereof, and methods of decomposition thereof
09/15/2010CN101829394A Method for preparing step micro-needle array
09/15/2010CN101482641B Lens fixing device and mounting method
09/15/2010CN101403864B Method for self-judgment of measurement data reliability of self-adapting focusing and leveling sensor system
09/15/2010CN101369104B Micro-adjusting device of optical element
09/15/2010CN101349871B Photo-etching illuminating apparatus
09/15/2010CN101334591B Levelling focusing mechanism possessing great range control function
09/15/2010CN101320217B Self-centering device
09/15/2010CN101320122B Projection optical system
09/15/2010CN101308332B Method for controlling photolithography exposure dosage
09/15/2010CN101288154B Transfer product fabricating method, and transfer product arrangement position identifying method
09/15/2010CN101276160B Focusing and leveling device for photo-etching machine as well as measuring method
09/15/2010CN101271282B Stage system and lithographic apparatus comprising such stage system
09/15/2010CN101260967B XYY precision positioning platform calibration method
09/15/2010CN101251725B Aligning system, mark, method for lithographic device and lithographic device thereof
09/15/2010CN101251724B Aligning system, method and lithographic device thereof
09/15/2010CN101241312B Photo-etching machine image-forming quality on-site measurement method
09/15/2010CN101169601B Focusing leveling measuring system
09/15/2010CN101164144B Exposure method, exposure device, and device manufacturing method
09/15/2010CN101089731B Fabrication apparatus and method of fabricating a soft mold using same
09/15/2010CN101071274B Method for manufacturing semiconductor device using immersion lithography process with filtered air
09/15/2010CN101042529B Photoresist regeneration method and system thereof
09/14/2010USRE41697 Method of forming planarized coatings on contact hole patterns of various duty ratios
09/14/2010USRE41681 Enhanced illuminator for use in photolithographic systems
09/14/2010USRE41667 Illumination system particularly for microlithography
09/14/2010US7797068 Defect probability calculating method and semiconductor device manufacturing method
09/14/2010US7796274 System for measuring the image quality of an optical imaging system
09/14/2010US7795833 Driving apparatus, exposure apparatus, and device manufacturing method
09/14/2010US7795603 Lithographic apparatus and device manufacturing method
09/14/2010US7794924 Developing method and developing unit
09/14/2010US7794923 Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
09/14/2010US7794922 forming a protective film, removing the residual substance by applying a first solvent, baking, performing immersion exposure selectively; for protecting the photoresist film from an immersion liquid on the photo resist film
09/14/2010US7794921 Expose photosensitive layer using a mask and hyper-numerical aperture optics providing a first exposure pattern; orthogonal second exposure using mask and optics different than the first exposure pattern; form two-dimensional array of features in the layer beneath the photosensitive layer
09/14/2010US7794920 Pattern decomposition method for double exposure
09/14/2010US7794919 Either a solvent solution of an epoxy group-containing addition polymer and a compound containing more than one carboxyl group and a molecular weight of less than 2000, or a phenolic poly with an OH, COOH or anhydride group(s) and a monomeric isocyanurate with more than one glycidyl group; dry etching
09/14/2010US7794918 Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
09/14/2010US7794917 Curable composition, color filter and manufacturing method thereof
09/14/2010US7794916 High sensitivity and improved pattern collapse; containing polymer having acid dissociatable structure introduced into main chain terminal; producing solubilizing hydrophilic functionality upon irradiation; synthesis
09/14/2010US7794915 Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
09/14/2010US7794914 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group
09/14/2010US7794913 a polymeric photoresist containing a chemically amplified addition copolymer comperising vinylphenol, methacrylic or acrylic ester having an alicyclic ring, a vinylstyrene with aromatic ester groups; and acid generator preferably diazomethane compound having sulfonyl groups; a sulfonium or iodonium comp.
09/14/2010US7794902 Radiation-absorptive layer contains a pigment that is attached to or coated with an alkylene oxide polymer, an alkyleneimine polymer, a maleic anhydride-styrene copolymer, an acrylic or styrenic polymer via an an arylene, heteroarylene, or alkylene group and a spacer group
09/14/2010US7794899 Photo mask, exposure method using the same, and method of generating data
09/14/2010US7794225 Fine mold and method for regenerating fine mold
09/14/2010US7794222 Mold, pattern forming method, and pattern forming apparatus
09/10/2010WO2010101691A2 Methods of forming patterns
09/10/2010WO2010101466A1 Illumination system for use in a stereolithography apparatus
09/10/2010WO2010101465A1 Illumination system for use in a stereolithography apparatus
09/10/2010WO2010101267A1 Movable body apparatus, exposure apparatus and device manufacturing method
09/10/2010WO2010101048A1 Flare-measuring mask, flare-measuring method, and exposure method
09/10/2010WO2010101010A1 Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition
09/10/2010WO2010100273A2 Variable overlap method and device for stitching together lithographic stripes
09/10/2010WO2010100272A1 Rotor imaging system and method with variable-rate pixel clock
09/10/2010WO2010100270A1 Method and apparatus for statistical illumination
09/10/2010WO2010100269A1 Rotor optics imaging method and system with variable dose during sweep
09/10/2010WO2010100268A2 Lithographic printing system with placement corrections
09/10/2010WO2010100078A1 Illumination system, lithographic apparatus and method of forming an illumination mode
09/10/2010WO2010100029A1 Optical lithography apparatus
09/10/2010WO2010099899A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
09/10/2010WO2010099807A1 Illumination optics unit and optical systems for microlithography
09/10/2010WO2010076232A3 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
09/10/2010WO2010068027A3 Positive photosensitive organic-inorganic hybrid insulator composition
09/10/2010CA2754337A1 Illumination system for use in a stereolithography apparatus
09/10/2010CA2754334A1 Illumination system for use in a stereolithography apparatus
09/09/2010US20100228379 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product
09/09/2010US20100227780 Methods for the synthesis of arrays of DNA probes
09/09/2010US20100227282 Methods Of Patterning Positive Photoresist
09/09/2010US20100227281 Methods Of Forming Patterns
09/09/2010US20100227280 Method of Measuring a Characteristic
09/09/2010US20100227279 Methods for producing codes for microparticles
09/09/2010US20100227278 Manufacturing process of semiconductor device
09/09/2010US20100227277 Movable body apparatus, exposure apparatus and device manufacturing method
09/09/2010US20100227276 Method of manufacturing semiconductor device
09/09/2010US20100227275 Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition
09/09/2010US20100227274 Positive resist composition and patterning process
09/09/2010US20100227273 Positive resist composition and patterning process
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