Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2010
09/21/2010US7799514 eliminating and/or mitigating formation of footing and/or T-tops in resist pattern; acid treatment prevents loss of photogenerated acid from resist by compensating for evaporation and/or neutralization of bases; semiconductor substrates with or without antireflective coatings
09/21/2010US7799513 Process for preventing development defect and composition for use in the same
09/21/2010US7799512 Multilayer wallss of ring pattern; forming dielectric on substrate; then patterned photoresist; etching; masking; removal
09/21/2010US7799511 Patterning photoresists; etching; dielectrics
09/21/2010US7799510 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device
09/21/2010US7799509 photoresists comprising light-blocking layer on substrate, color filter layer, insulating layer, common electrode layer; acrylic ester, norbornene containing monomoers; 1,2-quinonediazides
09/21/2010US7799508 thickeners contains polyvinyl alcohol, polyvinyl acetal, or polyvinyl acetate with 2-hydroxybenzyl alcohol; water solubility and alkali-solubility; utilize ArF excimer laser light, thickening the resist pattern and forming a fine space pattern; cost efficiency, industrial scale
09/21/2010US7799507 Positive resist composition for immersion lithography and method for forming resist pattern
09/21/2010US7799506 Positive resist composition and pattern forming method using the same
09/21/2010US7799505 Contains arylsulfonium salt; improved pattern collapse
09/21/2010US7799503 Composite structures to prevent pattern collapse
09/21/2010US7799490 Optical masks and methods for measuring aberration of a beam
09/21/2010US7799416 after ozonolysis and UV, void spaces/pores from removed oxidized polyisoprene exist; interfacial surface from oxidized poly(pentamethyldisilylstyrene) is depleted of C and enriched in Si and O2, indicating presence of an SiOx inorganic ceramic layer; heat and chemical resistant permselective membrane
09/21/2010US7799139 Utilizing cleaning mixture comprising solvent such as ethylene glycol monopropyl ether, inorganic or organic base, copper corrosion inhibitor and surfactant to clean polymer residue, organic sacrificial fill material and etched or un-etched photo resist from porous oxide dielectric; prevents undercutting
09/21/2010US7799136 Method of cleaning at least one surface of an optical device disposed in a vacuum chamber
09/21/2010CA2414243C Uv curing intaglio ink
09/21/2010CA2329412C Elastomeric mask and use in fabrication of devices, including pixelated electroluminescent displays
09/16/2010WO2010104560A1 Negative-working imageable elements with overcoat
09/16/2010WO2010104550A1 Reducing foam formation
09/16/2010WO2010104218A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
09/16/2010WO2010104178A1 Ammonium fluoroalkanesulfonates and a synthesis method therefor
09/16/2010WO2010104177A1 Fluoroalkanesulfonic acid ammonium salts and method for producing same
09/16/2010WO2010104163A1 Optical integrator
09/16/2010WO2010104162A1 Exposure apparatus, exposure method, and method of manufacturing device
09/16/2010WO2010104074A1 Composition for forming resist underlayer film which comprises polymer having acetal structure in side chain thereof, and method for forming resist pattern
09/16/2010WO2010103918A1 Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same
09/16/2010WO2010103903A1 Film for spacer formation, semiconductor wafer, and semiconductor device
09/16/2010WO2010103822A1 Exposure apparatus, exposure method and device manufacturing method
09/16/2010WO2010103506A1 Cd metrology system and method of classifying similar structural elements
09/16/2010WO2010103035A1 Process for the preparation of crystalline mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene dimers
09/16/2010WO2010102649A1 Microlithographic projection exposure apparatus
09/16/2010WO2010068340A3 Technique for marking product housing
09/16/2010WO2010068256A3 Counter sunk screen
09/16/2010WO2010063504A3 Imprint lithography apparatus and method
09/16/2010WO2010037453A8 Field facet mirror for use in an illumination optics of a projection exposure apparatus for euv microlithography
09/16/2010US20100234674 Microfluidic systems and methods
09/16/2010US20100233638 Substrate treatment apparatus, substrate treatment method, coating and developing apparatus, coating and developing method, and storage medium
09/16/2010US20100233637 Developing apparatus, developing method, and storage medium
09/16/2010US20100233636 Measurement apparatus, exposure apparatus, and method of manufacturing device
09/16/2010US20100233635 Method of forming pattern and composition for forming of organic thin-film for use therein
09/16/2010US20100233634 Processing Liquid for Resist Substrate and Method of Processing Resist Substrate Using the Same
09/16/2010US20100233633 Engineering boron-rich films for lithographic mask applications
09/16/2010US20100233632 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method
09/16/2010US20100233631 Recessed portion forming method, method for manufacturing pit-projection product, method for manufacturing light emitting element, and method for manufacturing optical element
09/16/2010US20100233630 Method for manufacturing liquid discharge head
09/16/2010US20100233629 Photosensitive compostion, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
09/16/2010US20100233628 Compound and chemically amplified positive resist composition
09/16/2010US20100233627 Photosensitive resin composition, method for forming resist pattern, method for manufacturing printed wiring board, and method for producing substrate for plasma display panel
09/16/2010US20100233626 Positive resist composition and method of forming resist pattern
09/16/2010US20100233625 Positive resist composition, method of forming resist pattern, and polymeric compound
09/16/2010US20100233624 Positive resist composition and method of forming resist pattern
09/16/2010US20100233623 Positive resist composition and method of forming resist pattern
09/16/2010US20100233622 Method for forming fine pattern in semiconductor device
09/16/2010US20100233620 Copolymer and photoresist composition including the same
09/16/2010US20100233619 Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation
09/16/2010US20100233618 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
09/16/2010US20100233617 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
09/16/2010US20100233616 Method for producing plastic lens
09/16/2010US20100233600 Level sensor arrangement for lithographic apparatus and device manufacturing method
09/16/2010US20100233599 Lithographic Apparatus and Device Manufacturing Method
09/16/2010US20100233598 Pattern correcting apparatus, mask-pattern forming method, and method of manufacturing semiconductor device
09/16/2010US20100233596 Thiourethane compound and photosensitive resin composition
09/16/2010US20100233595 Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof
09/16/2010US20100233449 Method of forming resist pattern
09/16/2010US20100233445 Negative-working imageable elements with overcoat
09/16/2010US20100233437 Lithographic machine platform and applications thereof
09/16/2010US20100233436 Process for directing assemblies of particulate dispersions using surface roughness
09/16/2010US20100233434 Patterning of ionic polymers
09/16/2010US20100233309 Release surfaces, particularly for use in nanoimprint lithography
09/16/2010US20100232781 Coating and developing apparatus, coating and developing method, and storage medium
09/16/2010US20100231888 Optical system
09/16/2010US20100231886 Imaging optical system and projection exposure apparatus for microlithography including an imaging optical system
09/16/2010US20100231884 Imaging optical system and related installation and method
09/16/2010US20100231847 Methods of fabricating switchable liquid crystal polarization gratings on reflective substrates and related devices
09/16/2010US20100231490 Organic Electroluminescent Display Device and Production Method Thereof
09/16/2010US20100230839 Method for Producing Surface Convexes and Concaves
09/16/2010US20100230156 Packaging device for an electronic element and method for making the same
09/16/2010US20100230137 Method for manufacturing conductive pattern forming body
09/16/2010US20100230136 Method for producing resist pattern
09/16/2010DE102009009062A1 Verfahren zum Anordnen eines optischen Moduls in einer Messvorrichtung sowie Messvorrichtung A method of arranging an optical module in a measuring device and measurement device
09/16/2010DE102005052509B4 Verfahren zum Herstellen einer Druckplatte A method for making a printing plate
09/16/2010DE102005012739B4 Verfahren zur Herstellung räumlicher Feinstrukturen A process for producing spatial fine structures
09/16/2010DE102005004410B4 Verfahren zum Ausbilden einer Halbleiterstruktur mit Bemustern einer Schicht aus einem Material A method of forming a semiconductor structure comprising patterning a layer of a material
09/16/2010CA2754673A1 Process for the preparation of crystalline mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene dimers
09/15/2010EP2228684A2 Coating and developing apparatus, coating and developing method, and storage medium
09/15/2010EP2228409A2 Color composition for color filter, method for preparing it, and color filter
09/15/2010EP2227823A2 Methods and apparatus for forming memory lines and vias in three dimensional memory arrays using dual damascene process and imprint lithography
09/15/2010EP2227718A2 Cantilever with pivoting actuation
09/15/2010EP1117996B1 Method for producing biochemical reaction supporting materials
09/15/2010CN201583784U Vertical leveling focusing mechanism
09/15/2010CN201583783U Lithography machine wafer stage system with multiple masks
09/15/2010CN1758140B Lithographic apparatus and position measuring method
09/15/2010CN101836263A Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby
09/15/2010CN101836166A Exposure method and exposure device
09/15/2010CN101836165A Automated variable dimension mold and bottom block system
09/15/2010CN101836164A Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
09/15/2010CN101836163A Projection objective having mirror elements with reflective coatings
09/15/2010CN101836162A Film type transfer material
09/15/2010CN101836151A Imaging optical system, projection exposure installation for micro-lithography comprising an imaging optical system of this type, and method for producing a microstructured component with a projection exposure installation of this type
09/15/2010CN101835735A Bottom antireflective coating compositions
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