| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/28/2010 | US7804994 Overlay metrology and control method |
| 09/28/2010 | US7804648 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
| 09/28/2010 | US7804601 Methods for making holographic reticles for characterizing optical systems |
| 09/28/2010 | US7804584 Integrated circuit manufacturing methods with patterning device position determination |
| 09/28/2010 | US7804575 Lithographic apparatus and device manufacturing method having liquid evaporation control |
| 09/28/2010 | US7804574 Lithographic apparatus and device manufacturing method using acidic liquid |
| 09/28/2010 | US7803712 Multilevel imprint lithography |
| 09/28/2010 | US7803521 dispensing positive photoresist comprising casting solvent, adamantane-containing acrylic ester comonomers dissolved therein, and photoacid generator over substrate or fabrication layer, removing casting solvent by pre-exposure baking, exposing to actinic radiation, developing, baking; photolithography |
| 09/28/2010 | US7803519 coating photoresist of poly(t-butyl acrylate/2,2,3,4,4,4-hexafluorobutyl acrylate/maleic anhydride/N-hydroxy-5-norbonene-2,3-dicarboxylmide perfluoro-1-butanesulfonate/2-hydroxyethyl bicycle[2,2,1]hept-5-ene-2-carboxylate on semiconductor underlayer; reduced surface tension, stable ion-implanting |
| 09/28/2010 | US7803518 Method for manufacturing micro structure |
| 09/28/2010 | US7803516 liquid immersion; photosensitivity |
| 09/28/2010 | US7803513 Lithography; semiconductor microfabrication |
| 09/28/2010 | US7803512 resin comprises (2-adamantyloxymethyl)methacrylate monomers which exhibit increased alkali solubility under action of acid, and acid generator such as diphenyliodonium trifluoromethanesulfonate; reduced line edge roughness, improved shape and depth of focus |
| 09/28/2010 | US7803511 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits |
| 09/28/2010 | US7803510 heat resistance; relief imaging; plasticizer reduces sidewall angle of imaged and cured features in coated film on substrate to prevent stress failures in subsequent metallization of substrate due to steep angles of imaged features; microelectronics, microelectromechanical devices |
| 09/28/2010 | US7803503 Includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns |
| 09/28/2010 | US7803501 photoresists; liquid crystal display panels |
| 09/28/2010 | US7802891 Faceted mirror apparatus |
| 09/28/2010 | CA2492825C Nozzle assembly for applying a liquid to a substrate |
| 09/23/2010 | WO2010106827A1 Lithographic printing plate material and lithographic printing plate |
| 09/23/2010 | WO2010105640A1 Illumination system of a microlithographic projection exposure apparatus |
| 09/23/2010 | WO2010086068A3 Determining critical dimension and overlay variations of integrated circuit fields |
| 09/23/2010 | WO2010084372A8 A photoresist image-forming process using double patterning |
| 09/23/2010 | WO2010062328A3 Dispense system |
| 09/23/2010 | US20100239986 Substrate processing apparatus |
| 09/23/2010 | US20100239985 Method for Using Compositions Containing Fluorocarbinols in Lithographic Processes |
| 09/23/2010 | US20100239984 Pattern forming method |
| 09/23/2010 | US20100239983 Methods Of Forming Patterns On Substrates |
| 09/23/2010 | US20100239982 Photoresist composition with high etching resistance |
| 09/23/2010 | US20100239981 Polymer and positive-tone radiation-sensitive resin composition |
| 09/23/2010 | US20100239980 Negative-working resist composition and pattern forming method using the same |
| 09/23/2010 | US20100239979 Graded arc for high na and immersion lithography |
| 09/23/2010 | US20100239978 Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition |
| 09/23/2010 | US20100239977 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device |
| 09/23/2010 | US20100239976 Lithographic imaging with printing members having metal imaging bilayers |
| 09/23/2010 | US20100239965 Colored curable composition, color filter, and method for producing color filter |
| 09/23/2010 | US20100239964 Test Structures and Methods |
| 09/23/2010 | US20100239963 Exposure mask, exposure method, and method of manufacturing optical element |
| 09/23/2010 | US20100239833 Elastomeric mask and use in fabrication of devices |
| 09/23/2010 | US20100239319 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 09/23/2010 | US20100238388 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel |
| 09/23/2010 | US20100237256 Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus |
| 09/23/2010 | US20100236970 Composite substrate carrier |
| 09/23/2010 | US20100236819 Printed circuit board and method for making the same |
| 09/23/2010 | DE102009013720A1 Method for adjusting reference component e.g. mirror, of projection lens for semiconductor lithography, involves adjusting reference component of projection lens by auxiliary ring that is temporarily connected with projection lens |
| 09/23/2010 | DE102009012546A1 Mono anti-reflection silicon nitride layer for use on switching circuits with e.g. photodiodes, by single-step plasma enhanced chemical vapor deposition method, is designed as protective layer against data degradation of elements |
| 09/23/2010 | DE102008054844B4 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Projektionsbelichtungsverfahren Illumination device of a microlithography projection exposure apparatus and microlithographic projection exposure method |
| 09/23/2010 | DE102007055443B4 Projektionsbelichtungsanlage für die Mikrolithographie Projection exposure system for microlithography |
| 09/23/2010 | DE102005048107B4 Verfahren zum Bestimmen einer optimalen Absorber-Schichtenstapelgeometrie für eine lithographische Reflexionsmaske A method for determining an optimum absorber layer stack geometry for a lithographic reflection mask |
| 09/22/2010 | EP2230552A2 Method for forming fine pattern in semiconductor device |
| 09/22/2010 | EP2230278A2 Color composition for color filter, method for preparing it, and color filter |
| 09/22/2010 | EP2229607A2 Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same |
| 09/22/2010 | EP1969426B1 Photopolymer composition suitable for lithographic printing plates |
| 09/22/2010 | EP1833080B1 Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 09/22/2010 | EP1780770B1 Exposure apparatus and exposure method |
| 09/22/2010 | CN1831651B Method for providing layout design and photomask |
| 09/22/2010 | CN1811597B Light-sensitive resin composite |
| 09/22/2010 | CN1780813B Acid generators, sulfonic acids, sulfonyl halides, and radiation-sensitive resin compositions |
| 09/22/2010 | CN1776531B Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
| 09/22/2010 | CN101842473A Novel nitrile and amidoxime compounds and methods of preparation |
| 09/22/2010 | CN101840882A Shallow slot isolation method |
| 09/22/2010 | CN101840879A Xy stage device, semiconductor checking device and semiconductor exposure device |
| 09/22/2010 | CN101840875A Image capturing device and image capturing control method for measuring aperture of contact hole |
| 09/22/2010 | CN101840859A Manufacturing method of semiconductor component |
| 09/22/2010 | CN101840858A Method for removing anti-reflective coating in top-level metallic dielectric layer groove etching process |
| 09/22/2010 | CN101840165A Device for reducing cost of developer solution and method thereof |
| 09/22/2010 | CN101840164A Photoetching machine projection objective wave aberration on-line detector and method |
| 09/22/2010 | CN101840163A Illumination source and photomask optimization |
| 09/22/2010 | CN101840162A Exposure unit and pattern forming method |
| 09/22/2010 | CN101840161A Lithographic apparatus and device manufacturing method |
| 09/22/2010 | CN101840160A Exposure apparatus |
| 09/22/2010 | CN101840159A Lithographic apparatus and device manufacturing method |
| 09/22/2010 | CN101840158A A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
| 09/22/2010 | CN101840157A Proximity exposure apparatus, method for determining a substrate position in the proximity exposure apparatus and method of manufacturing a display panel substrate |
| 09/22/2010 | CN101840156A Substrate processing device |
| 09/22/2010 | CN101840155A Colored photosensitive resin composition for short wavelength laser exposure apparatus, color filter and liquid crystal display device employing the same |
| 09/22/2010 | CN101840154A Colored photosensitive resin composition |
| 09/22/2010 | CN101840153A Metal artware relief color-painting method |
| 09/22/2010 | CN101840152A Method of forming resist pattern |
| 09/22/2010 | CN101840151A Coating and developing apparatus, coating and developing method and storage medium |
| 09/22/2010 | CN101840100A Liquid crystal display device and manufacture method of color film substrate thereof |
| 09/22/2010 | CN101840099A Liquid crystal display panel and manufacture method thereof |
| 09/22/2010 | CN101840012A Artificial compound eye lens with controllable curvature and preparation method thereof |
| 09/22/2010 | CN101587824B Registration mark and manufacturing method thereof |
| 09/22/2010 | CN101566721B Deep ultraviolet projection lithographic objective |
| 09/22/2010 | CN101551553B Liquid crystal display panel and method for manufacturing the same |
| 09/22/2010 | CN101515081B Colorized film substrate and method for manufacturing same |
| 09/22/2010 | CN101488450B Methods for forming a composite pattern including printed resolution assist features |
| 09/22/2010 | CN101388356B Stage apparatus |
| 09/22/2010 | CN101359184B Reactive force processing device |
| 09/22/2010 | CN101336047B Method for printing circuit board and combination thereof |
| 09/22/2010 | CN101301644B Liquid material supply device, bubble discharge device and liquid material supply method |
| 09/22/2010 | CN101017331B XYtheta moving stage |
| 09/21/2010 | US7800815 Pattern generator |
| 09/21/2010 | US7800638 Platemaking apparatus |
| 09/21/2010 | US7800079 Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method |
| 09/21/2010 | US7799885 suitable for use in replicating optical components; substantially free, <== 5% by weight, of urethane (meth)acrylates, halogenated (meth)acrylates, or monofunctional (meth)acrylates |
| 09/21/2010 | US7799883 copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate |
| 09/21/2010 | US7799516 Polymers, methods of use thereof, and methods of decomposition thereof |
| 09/21/2010 | US7799515 Method of fabricating semiconductor device, and developing apparatus using the method |