Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2010
09/30/2010US20100248142 Lithographic printing plate precursor and plate making method thereof
09/30/2010US20100248141 Lithographic printing plate precursor and plate making method thereof
09/30/2010US20100248140 Lithographic printing plate precursor and plate making method thereof
09/30/2010US20100248139 Printing plate precursor for laser engraving, printing plate, and method for producing printing plate
09/30/2010US20100248138 Lithographic printing plate precursor
09/30/2010US20100248137 Antireflective Coating Compositons
09/30/2010US20100248136 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
09/30/2010US20100248135 Sulfonium compound
09/30/2010US20100248134 Methods of forming a pattern using negative-type photoresist compositions
09/30/2010US20100248133 Positive resist composition and method of forming resist pattern
09/30/2010US20100248099 Software-controlled maskless optical lithography using fluorescence feedback
09/30/2010US20100248097 Negative-working thermal imageable elements
09/30/2010US20100248096 Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device
09/30/2010US20100248095 Colored curable composition for color filter, color filter and method for producing the same, and solid state imaging device
09/30/2010US20100248092 Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
09/30/2010US20100247867 Relief printing plate precursor for laser engraving, resin composition for laser engraving, relief printing plate, and method for manufacturing relief printing plate
09/30/2010US20100247790 Interactive enamelled visual communication panel
09/30/2010US20100247752 Photocurable resin composition for forming overcoats rgb pixels black matrixes or spacers in color filter production, and color filters
09/30/2010US20100246617 Narrow surface corrugated grating
09/30/2010US20100246150 Interconnect Structure And A Method Of Fabricating The Same
09/30/2010US20100245847 Positioning unit and alignment device for an optical element
09/30/2010US20100245796 Optical Integrator, Illumination Optical Device, Aligner, and Method for Fabricating Device
09/30/2010US20100244997 Waveguide of multi-layer metal structure and manufacturing method thereof
09/30/2010US20100243923 Transparent electromagnetic wave-shielding filter and method of producing thereof, and conductive film
09/30/2010US20100243603 Silicon-metal composite micromechanical component and method of manufacturing the same
09/30/2010US20100242998 Compositions and methods for removing organic substances
09/30/2010US20100242766 Lithographic printing plate precursor and lithographic printing method
09/30/2010US20100242765 Methods and apparatus for ink delivery to nanolithographic probe systems
09/30/2010DE102009014701A1 Optische Baugruppe Optical assembly
09/30/2010DE102007028859B4 Vorrichtung zur Kontaktbelichtung einer Druckform Apparatus for contact printing a printing form
09/29/2010EP2234141A1 Illumination optical system, exposure apparatus, and device manufacturing method
09/29/2010EP2233978A1 Composition for formation of anti-reflective film, and pattern formation method using the composition
09/29/2010EP2233977A1 Composition for formation of top antireflective film, and pattern formation method using the composition
09/29/2010EP2233976A1 Photopolymerisable system for hologram formation
09/29/2010EP2233975A2 Photomask blank, processing method, and etching method
09/29/2010EP2233960A1 Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method
09/29/2010EP2233288A1 Radiation sensitive composition and method for preparing radiation sensitive composition
09/29/2010EP2232538A1 Spatial phase feature location
09/29/2010EP2232531A1 Method for making structures with improved edge definition
09/29/2010EP2232334A1 Illumination system for a microlithographic projection exposure apparatus
09/29/2010CN1987643B The photo mask and method of fabricating the array substrate for liquid crystal display device using the same
09/29/2010CN1985344B Apparatus for shielding a charged particle beam
09/29/2010CN1985216B Improved method for bump exposing relief image printing plates
09/29/2010CN1979290B Light-guide board and method for making same
09/29/2010CN1975570B Substrate for pattern forming, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device
09/29/2010CN1963667B Chemically amplified positive resist composition
09/29/2010CN1947069B Exposure apparatus
09/29/2010CN1928724B Photoresistance developer
09/29/2010CN1864104B Method and device for lithography by extreme ultraviolet radiation
09/29/2010CN1858648B Coating method and coating apparatus
09/29/2010CN1839354B Apparatus and method for treating imaging material
09/29/2010CN1831588B Apparatus for manufacturing panel display
09/29/2010CN1802722B Plasma ashing apparatus and endpoint detection process
09/29/2010CN1797206B Lithographic apparatus and device manufacturing method
09/29/2010CN1779569B Fluorocycloolefen polymer and its use for bark ultraviolet photoetching glue
09/29/2010CN1774673B Porous underlayer film and underlayer film forming composition used for forming the same
09/29/2010CN1770010B Lithographic apparatus
09/29/2010CN1653297B High efficiency solid-state light source and methods of use and manufacture
09/29/2010CN101849212A Radiation system and method, and a spectral purity filter
09/29/2010CN101849211A Method and system for determining a suppression factor of a suppression system and a lithographic apparatus
09/29/2010CN101849210A Lithographic projection apparatus and method of compensating perturbation factors
09/29/2010CN101849209A Composition for formation of top antireflective film, and pattern formation method using the composition
09/29/2010CN101849205A Chromatically corrected catadioptric objective and projection exposure apparatus including the same
09/29/2010CN101847576A Method for preparing ultra-narrow groove
09/29/2010CN101847348A El device, light-sensitive material for forming conductive film, and conductive film
09/29/2010CN101846891A Integrated post-exposure bake track
09/29/2010CN101846890A Parallel photoetching write-through system
09/29/2010CN101846889A Exposure apparatus
09/29/2010CN101846888A Exposure machine, array substrate, patterned film, photoresist layer and formation method
09/29/2010CN101846887A Lithographic apparatus and article support device for lithographic apparatus
09/29/2010CN101846886A Delta TCC (transmission cross coefficient) for high-speed sensibility model calculation
09/29/2010CN101846885A High-volume manufacturing massive e-beam maskless lithography system
09/29/2010CN101846884A Coating device
09/29/2010CN101846882A Photocuring thermocuring resin composition, dry membrane, cured product and printed circuit board
09/29/2010CN101846881A Curable resin composition, dry membrane and printed circuit board using same
09/29/2010CN101846880A Nanometer photolithography by excitating surface plasma
09/29/2010CN101846877A Method for manufacturing transparent substrate for mask blank, method for manufacturing mask blank, and method for manufacturing mask
09/29/2010CN101846876A Photomask blank, processing method, and etching method
09/29/2010CN101846758A Anti-dazzle processing method and methods of manufacturing anti-dazzle film and die
09/29/2010CN101846755A Methods of manufacturing anti-dazzle film and die for making anti-dazzle film
09/29/2010CN101845219A Curable resin composition, dry membrane and printed circuit board using same
09/29/2010CN101845190A Photopolymerisable system for hologram formation
09/29/2010CN101845137A Alkaline water-soluble resin, its producing method and photosensitive resin composition using same
09/29/2010CN101845008A 锍化合物 Sulfonium compounds
09/29/2010CN101844272A Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology
09/29/2010CN101625528B Mask clamp
09/29/2010CN101458454B Method for simultaneously monitoring photolithography exposure condition and registration photoetching precision
09/29/2010CN101452214B Exposure method, photolithography method and method for making through-hole
09/29/2010CN101364053B Exposure system of photo-etching machine and control method thereof
09/29/2010CN101344733B Photoresist coating and developing apparatus
09/29/2010CN101253451B A passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool
09/29/2010CN101226338B Method for detecting calibration degree of scanning exposure machine
09/29/2010CN101178547B Lithography apparatus and device manufacturing method
09/29/2010CN101071269B Photographic material of black matrix wall for ink-jet mode color filter and its manufacturing method
09/29/2010CN101059661B Lithographic apparatus and device manufacturing method
09/29/2010CN101046634B Method for etching quartz on photomask plasma
09/29/2010CN101031605B Photosensitive resin, photosensitive composition and photo-crosslinked structure
09/29/2010CN101021680B Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device
09/29/2010CN101017327B Precursor composition for positive photosensitive resin and display made with the same
09/28/2010US7805279 Remote maintenance system