Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2010
10/06/2010CN1669121B Transfer mask for exposure and pattern exchanging method of the same
10/06/2010CN1591192B Lithographic apparatus and device manufacturing method
10/06/2010CN1577108B Safety mechanism for a lithographic patterning device
10/06/2010CN1575525B Semiconductor device manufacturing method, thin film transistor array panel and method for manufacturing same
10/06/2010CN101855705A Drive control method, drive control apparatus, stage control method, stage control apparatus, exposure method, exposure apparatus and measuring apparatus
10/06/2010CN101855599A Electroformed stencils for solar cell front side metallization
10/06/2010CN101855598A Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
10/06/2010CN101855597A Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device
10/06/2010CN101855596A Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device
10/06/2010CN101855468A Lithographic apparatus
10/06/2010CN101855085A Method for making a lithographic printing plate
10/06/2010CN101853611A EL device, light-sensitive material for forming conductive film, and conductive film
10/06/2010CN101852994A Method for removing photoresist
10/06/2010CN101852993A Exposure method, and manufacturing method of device
10/06/2010CN101852992A Apparatus and method for optical position assessment
10/06/2010CN101852991A Photosensitive composition, photosensitive film, photosensitive laminated body, permanent pattern forming method and printed board
10/06/2010CN101852990A Photosensitive composition, photosensitive resin transfer film and resin pattern
10/06/2010CN101852989A Photosensitive coloring composition, color filter and method for making the same and liquid crystal display device
10/06/2010CN101852988A Photosensitive resin composition, and dry film and printed wiring board using the same
10/06/2010CN101852987A Continuous toning process of controllable gray scale of metal surface
10/06/2010CN101852986A Impressing mould
10/06/2010CN101852985A Manufacturing method of substrate alignment mark
10/06/2010CN101852795A Substrate for biochip and method of manufacturing the substrate
10/06/2010CN101851434A Dye composition
10/06/2010CN101851411A Curable resin composition
10/06/2010CN101851224A Method for producing sulfonamide compound
10/06/2010CN101323952B Preparing technological process of high vacuum vapor deposition dielectric membrane transfer material
10/06/2010CN101221359B Metallic material reflection type micro-optical element processing method based on hot press printing technology
10/06/2010CN101174092B Method for reducing image deformation caused by lens coma aberration and lens imaging system
10/06/2010CN101165591B Method for producing two-dimensional polymer photon crystal using flexible offset printing
10/06/2010CN101151579B Photosensitive resin composition and circuit substrate employing the same
10/06/2010CN101124653B Discharge lamp
10/06/2010CN101086627B Bump photolithographic machine exposal method
10/05/2010US7810066 Irradiation pattern data generation method, mask fabrication method, and plotting system
10/05/2010US7809460 Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored
10/05/2010US7809273 Transmission technique in system including chamber
10/05/2010US7809112 Method and device for generating EUV radiation and/or soft X-ray radiation
10/05/2010US7808611 Lithographic apparatus and device manufacturing method using acidic liquid
10/05/2010US7807613 Aqueous buffered fluoride-containing etch residue removers and cleaners
10/05/2010US7807343 Using alternating phase-shift implementation in lithography; electronic design automation (EDA); computer readable medium
10/05/2010US7807342 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings
10/05/2010US7807341 Method for forming organic mask and method for forming pattern using said organic mask
10/05/2010US7807340 Photoresists for visible light imaging
10/05/2010US7807339 depositing pattern target layer on surface of substrate, providing printing plate with concaves in side of transparent substrate and opaque layer on side except in concaves, filling photresists therein, positioning substrate, transferring resists onto pattern target layer exposing rear surface to harden
10/05/2010US7807337 Forming mold layer comprising hole arrays exposing seed layer;forming conductive patterns from seed layer to fill hole arrays; forming conductive line by growing; system-on-a-chip; electrolytic or electroless plating; adjusting height of conductive lines; helices; diffusion prevention layer
10/05/2010US7807336 sequentially forming underlying layer, hard mask layer, silicon-containing first anti-reflection film, and photoresist film over semiconductor substrate, forming photoresist pattern by exposing and developing film using exposure mask, and etching, performing O2 plasma treatment
10/05/2010US7807335 forming photoresist layer, forming contamination gettering topcoat layer including hexafluoroalcohol-subsituted cyclohexane based polymers, complexing agent (trans-1,2 diaminocyclohexane-N,N,N',N'-tetracetic acid monohydrate) and casting solvent, exposing to actinic radiation through photomask
10/05/2010US7807334 Substrate having fine line, electron source and image display apparatus
10/05/2010US7807333 comprises image-forming layer comprising an unsaturated double-bond containing substance, graft polymer having poly(alkyleneoxide) unit in side branch, and photothermal conversion substance, developing with neutral developer and ultrasonic waves; prevents staining of nonimage areas
10/05/2010US7807332 Namely, polyvinylthiophene; compatible with typical photoresists and have desired optical properties so that the underlayer can also be used as an antireflective coating; good mechanical properties and etch selectivity
10/05/2010US7807331 Hydrogenated ring-opening metathesis polymer, resist composition and patterning process
10/05/2010US7807330 Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
10/05/2010US7807329 Photosensitive composition and pattern-forming method using the same
10/05/2010US7807328 base resin comprises homo-/copolyenes having alkali soluble group, exhibits changed alkali solubility under action of acid, acid generator, and tertiary alkanolamines; for patterning semiconductor integrated circuit via lithography; improved resolution
10/05/2010US7807322 comprises mask substrate divided into first and second regions equally arranged to upper and lower sides on different sides, respectively, first mask pattern formed on first region of mask substrate,and second mask pattern formed on second region of mask substrate; minimizes yield reduction, cycle time
09/2010
09/30/2010WO2010110850A2 Negative-working thermal imageable elements
09/30/2010WO2010110848A1 Compositions and methods for removing organic substances
09/30/2010WO2010110847A2 Compositions and methods for removing organic substances
09/30/2010WO2010110491A1 Pigment dispersion, colored curable composition, color filter and method of manufacturing the same
09/30/2010WO2010110472A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method
09/30/2010WO2010110338A1 Photosensitive coloring composition and color filter
09/30/2010WO2010110335A1 Photosensitive resin composition and cured film
09/30/2010WO2010110236A1 Radiation-sensitive resin composition and polymer
09/30/2010WO2010110199A1 Curable coloring composition, color filter and method for producing same, and quinophthalone dye
09/30/2010WO2010110081A1 Method for manufacturing microlens array, and microlens array
09/30/2010WO2010109655A1 Electron beam lithography system and electron beam lithographing method
09/30/2010WO2010109647A1 Multicolumn electronic beam lithography mask retainer and multicolumn electronic beam lithography system
09/30/2010WO2010108835A1 Photoresist composition
09/30/2010WO2010108612A1 Optical assembly
09/30/2010WO2010108516A1 Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
09/30/2010WO2010072390A8 Method and composition for producing optical elements having a gradient structure
09/30/2010WO2010055406A3 Coating compositions
09/30/2010US20100248493 Photomask blank, processing method, and etching method
09/30/2010US20100248477 Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith
09/30/2010US20100248436 Methods of forming insulation layer patterns and methods of manufacturing semiconductor devices including insulation layer patterns
09/30/2010US20100248167 Pattern-forming method
09/30/2010US20100248166 Deflector Array, Exposure Apparatus, and Device Manufacturing Method
09/30/2010US20100248165 Information processing method, exposure processing system using same, device manufacturing method, and information processing apparatus
09/30/2010US20100248164 Cleaning liquid for lithography and method for forming a resist pattern using the same
09/30/2010US20100248163 Pattern formation method
09/30/2010US20100248162 Photosensitive Resin Composition, Photosensitive Element Using Same, Method for Forming Resist Pattern, and Method for Producing Printed Wiring Board
09/30/2010US20100248161 Method for making alignment mark on substrate
09/30/2010US20100248160 Patterning method
09/30/2010US20100248159 Patterning via optical-saturable transisions
09/30/2010US20100248158 High-volume manufacturing massive e-beam maskless lithography system
09/30/2010US20100248157 Method for manufacturing a reflection plate
09/30/2010US20100248156 Resin composition, resin cured product, and liquid discharge head
09/30/2010US20100248155 Illumination Control Module, and Diffraction Illumination System and Photolithography System Including the Same, and Methods of Fabricating Semiconductors Using the Same
09/30/2010US20100248154 Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition
09/30/2010US20100248153 Method for forming pattern of semiconductor device
09/30/2010US20100248152 Using Electric-Field Directed Post-Exposure Bake for Double-Patterning (D-P)
09/30/2010US20100248151 Method of making a printing plate
09/30/2010US20100248150 Method for preparing lithographic printing plate precursors
09/30/2010US20100248149 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
09/30/2010US20100248148 Polymer compound, positive resist composition, and method of forming resist pattern
09/30/2010US20100248147 Photoresist compositions and process for multiple exposures with multiple layer photoresist systems
09/30/2010US20100248146 Positive resist composition and pattern forming method using the same
09/30/2010US20100248145 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
09/30/2010US20100248144 Positive resist composition, method of forming resist pattern
09/30/2010US20100248143 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
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