Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2010
10/13/2010CN101398630B Aligning and stacking marker, mask structure and using method thereof
10/13/2010CN101373335B Method for optimizing scan exposure
10/13/2010CN101216599B Projection optical system, exposure apparatus and exposure method
10/13/2010CN101101856B Substrate processing device
10/13/2010CN101093366B Conveyer
10/13/2010CN101009206B Apparatus for treating substrates and method of treating substrates
10/12/2010US7813257 Optical recording medium and master disc for manufacturing optical recording medium
10/12/2010US7813022 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
10/12/2010US7812972 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
10/12/2010US7812927 Scanning exposure technique
10/12/2010US7812925 Exposure apparatus, and device manufacturing method
10/12/2010US7812355 Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television
10/12/2010US7812194 Positive photosensitive composition
10/12/2010US7811937 Apparatus and method of fabricating thin film transistor array substrate
10/12/2010US7811748 preventing pattern falling by adjusting the contact angle on the resist pattern surface; rinsing with a solution of a water-soluble copolymer of vinyl pyrrolidone and vinyl imidazole, then contacting with a solution of a fluorine compound capable of forming a complex with the resin; semiconductors
10/12/2010US7811747 Method of patterning an anti-reflective coating by partial developing
10/12/2010US7811744 ease of use and good resolution; solventless low viscosity non-photosensitive liquid or paste precursor comprising a mixture of acrylate oligomers and monomers, infrared absorber, heat decomposable peroxide; forms a solid thermoplastic elastomeric; printing plate blank
10/12/2010US7811743 rubbing to remove the surface protective layer and exposing a photosensitive layer containing a sensitizing dye, a polymerization initiator, a polymerizable dipentaerythritol pentaacrylate compound and a hydrophobic methacrylic copolymer binder, and hardening; hydrophilic or highly water-permeable
10/12/2010US7811742 Lithographic printing plate precursor
10/12/2010US7811741 Reverse write erasable paper
10/12/2010US7811726 a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; color filter
10/12/2010US7811637 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film
10/12/2010US7811635 fabricating organic/inorganic composite nanostructures on a substrate by depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography
10/12/2010US7811412 Substrate processing apparatus and substrate processing method drying substrate
10/12/2010US7811409 Bare aluminum baffles for resist stripping chambers
10/12/2010CA2479026C Photoinitiator comprising a 1,3-diketone core and use in a photocurable composition
10/12/2010CA2300176C Latent reactive polymers with biologically active moieties
10/07/2010WO2010114176A1 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
10/07/2010WO2010114158A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
10/07/2010WO2010114107A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
10/07/2010WO2010114085A1 Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate
10/07/2010WO2010113989A1 Precursor for direct printing-type waterless lithographic printing plate and method for producing same
10/07/2010WO2010113813A1 Base-generating agent, photosensitive resin composition, patterning material comprising the photosensitive resin composition, patterning method and article using the photosensitive resin composition
10/07/2010WO2010113675A1 Substrate cleaning device
10/07/2010WO2010113644A1 Exposure method and exposure apparatus
10/07/2010WO2010113643A1 Exposure method and exposure apparatus
10/07/2010WO2010113513A1 Pattern-forming method using a laser
10/07/2010WO2010113478A1 Curable resin composition and printed wiring board
10/07/2010WO2010113370A1 Chemically amplified resist material and method for forming pattern using same
10/07/2010WO2010112940A1 Laser imaging
10/07/2010WO2010112328A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
10/07/2010WO2010112171A1 Extreme ultraviolet light source with a debris-mitigated and cooled collector optics
10/07/2010WO2010111973A1 Dual-stage exchange system for lithographic apparatus
10/07/2010WO2010111972A1 Dual wafer stage exchanging system for lithographic device
10/07/2010WO2010111969A1 Dual-stage exchange system for lithographic apparatus
10/07/2010WO2010079133A3 Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography
10/07/2010WO2010064135A3 A photosensitive composition
10/07/2010WO2010047837A3 Strain and kinetics control during separation phase of imprint process
10/07/2010US20100255679 Lithography method and apparatus for semiconductor device fabrication
10/07/2010US20100255430 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same
10/07/2010US20100255429 Fine pattern forming method and coat film forming material
10/07/2010US20100255428 Method to mitigate resist pattern critical dimension variation in a double-exposure process
10/07/2010US20100255427 Conformal photo-sensitive layer and process
10/07/2010US20100255426 Mirror arrays for maskless photolithography and image display
10/07/2010US20100255425 Fabrication method of brightness enhancement film
10/07/2010US20100255424 Liquid discharge head manufacturing method
10/07/2010US20100255423 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
10/07/2010US20100255422 Manufacturing method of liquid discharge head
10/07/2010US20100255421 Method for forming resist pattern and method for manufacturing semiconductor device
10/07/2010US20100255419 Positive photosensitive composition
10/07/2010US20100255418 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
10/07/2010US20100255417 Radiation-curable silicone composition
10/07/2010US20100255416 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
10/07/2010US20100255412 Photo-imaging Hardmask with Negative Tone for Microphotolithography
10/07/2010US20100255410 Alkali-type nonionic surfactant composition
10/07/2010US20100255409 Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same
10/07/2010US20100253929 Photolithography systems and associated methods of selective die exposure
10/07/2010US20100253464 Electronic component and method of manufacturing same
10/07/2010DE112008003386T5 Wärmeempfindliche Lithographische Druckplatten The thermosensitive lithographic printing plates
10/07/2010DE102009045171A1 Thermally stressed elements tempering device for e.g. illumination system of extreme UV-projection exposure apparatus, has gas chamber provided between thermally stressed and tempering elements, where heat flow takes place between elements
10/07/2010DE102009045096A1 Lighting system for microlithographic-projection exposure system for illuminating object field in object level with illumination radiation, has two mirrors, where one mirror is flat mirror
10/07/2010DE102009034028A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure system for microlithography with such imaging optics
10/07/2010DE102009016585A1 Verfahren und Vorrichtung zum Kalibrieren einer Bestrahlungsvorrichtung Method and apparatus for calibrating a radiation apparatus
10/07/2010DE102009005972A1 Creating a periodic pattern on or in a processing substrate, comprises exposing the processing substrate to an interfering radiation field, which forms itself in a space area by interacting partial fields of different diffraction orders
10/07/2010CA2753841A1 Directly imageable waterless planographic printing plate precursor and method for producing same
10/06/2010EP2237110A1 Sulfur atom-containing composition for resist underlayer film formation and method for resist pattern formation
10/06/2010EP2237109A2 Method for inspecting and judging photomask blank or intermediate thereof
10/06/2010EP2237108A2 Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photmask blank
10/06/2010EP2237081A2 Optical sheets
10/06/2010EP2236543A1 Alkali-developable curable composition, insulating thin film using the same, and thin film transistor
10/06/2010EP2236526A2 Colored curable composition for color filter, color filter and method for producing the same, and solid state imaging device
10/06/2010EP2236497A1 Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device
10/06/2010EP2236488A1 Materials, methods and uses for photochemical generation of acids and/or radical species
10/06/2010EP2235594A1 Method of releasing a plate made of brittle material, assembly of a support and peeling arrangement, and peeling arrangement
10/06/2010EP2235593A1 Method of making lithographic printing plates
10/06/2010EP2235592A2 Lithography robustness monitor
10/06/2010EP2132599B1 Method and apparatus for creating overlapping patterns on a substrate
10/06/2010EP1802700B1 Low-viscosity, radiation-curable formulation for producing adaptive ear pieces
10/06/2010CN201600552U 一种印刷用预涂感光平版生产线的版位自动调整装置 A bit Pre-sensitized printing plate production line lithography automatic adjusting device
10/06/2010CN201600551U 一种印刷用预涂感光平版生产线的自动收版装置 A printed using precoated photosensitive lithographic printing plate production line of automatic closing devices
10/06/2010CN1976913B Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same
10/06/2010CN1934179B High performance water-based primer
10/06/2010CN1821876B Solder resist ink composition
10/06/2010CN1813223B Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
10/06/2010CN1811602B Developer solution composition
10/06/2010CN1808268B Metal hard mask method and structure for strained silicon MOS transistor
10/06/2010CN1808266B Optical mask and manufacturing method of thin film transistor array panel using the optical mask
10/06/2010CN1779568B Hardenable resin composition, hardened body thereof, and printed wiring board
10/06/2010CN1731278B EUV magnetic contrast lithography mask and manufacture thereof
10/06/2010CN1721993B System and method for moving an object employing piezo actuators
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