Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2010
10/19/2010US7816067 novolaks type substituted naphthalene-formaldehyde resin derivatives; masking, exposure, development and etching of above underlayer
10/19/2010US7816066 resin comprises (2-adamantyloxymethyl)methacrylate monomers which exhibit increased alkali solubility under action of acid, and acid generator such as diphenyliodonium trifluoromethanesulfonate; reduced line edge roughness, improved shape and depth of focus
10/19/2010US7816065 Imageable printing plate for on-press development
10/19/2010US7816064 Image-forming method using heat-sensitive transfer system
10/19/2010US7816060 photosensitive resin films with selective opening patterns; photoresists
10/19/2010US7815724 Ink composition
10/19/2010US7815425 Processing apparatus
10/19/2010CA2612712C Lithographic printing plate precursor
10/19/2010CA2502254C Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same
10/19/2010CA2452921C Microelectronic cleaning compositions containing ammonia-free fluoride salts
10/19/2010CA2335313C Automated opening and closing of ultra clean storage containers
10/14/2010WO2010118206A2 Process and apparatus for removal of contaminating material from substrates
10/14/2010WO2010117047A1 Optical material, optical element, and method for manufacturing same
10/14/2010WO2010116898A1 Method for processing target objects
10/14/2010WO2010116868A1 Photosensitive resin composite and laminate thereof
10/14/2010WO2010116808A1 Original plate for lithographic printing plate
10/14/2010WO2010116757A1 Solder resist composition, dry film using same, and printed wiring board
10/14/2010WO2010116743A1 Photosensitive resin composition for flexographic printing having excellent solvent resistance
10/14/2010WO2010116647A1 Method for forming resist pattern, and device
10/14/2010WO2010116646A1 Method for forming resist pattern, and device
10/14/2010WO2010116594A1 Photoresist material, photoresist film, etching method using same, and novel azo dye compound
10/14/2010WO2010116577A1 Chemically amplified resist material and pattern-forming method using same
10/14/2010WO2010115686A1 Method and apparatus for inspection in lithography
10/14/2010WO2010115657A1 Shared compliance in a rapid exchange device for reticles, and reticle stage
10/14/2010WO2010115526A1 Method for avoiding contamination and euv lithography system
10/14/2010WO2010115500A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
10/14/2010WO2010094696A3 Nano plasmonic parallel lithography
10/14/2010WO2010053536A3 Substrate alignment
10/14/2010WO2010049076A3 Optical module for guiding a radiation beam
10/14/2010US20100261123 Patterning process
10/14/2010US20100261122 Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method
10/14/2010US20100261121 Pattern forming method
10/14/2010US20100261120 Mirror for guiding a radiation bundle
10/14/2010US20100261119 Method of fabricating capacitive touch panel
10/14/2010US20100261118 Intensity Selective Exposure Method And Apparatus
10/14/2010US20100261117 Positive photosensitive composition and method of forming resist pattern
10/14/2010US20100261116 Developer for a photopolymer protective layer
10/14/2010US20100261107 photoresists; reticles; exposing to actinic radiation, forming flare spots; semiconductors, integrated circuits
10/14/2010US20100261106 Measurement apparatus, exposure apparatus, and device fabrication method
10/14/2010US20100261105 Method of Exposing Substrate, Apparatus for Performing the Same, and Method of Manufacturing Display Substrate Using the Same
10/14/2010US20100261098 High resolution photomask
10/14/2010US20100261097 Photo-imageable Hardmask with Positive Tone for Microphotolithography
10/14/2010US20100261095 Methods, Photomasks and Methods of Fabricating Photomasks for Improving Damascene Wire Uniformity Without Reducing Performance
10/14/2010US20100260983 Photosensitive resin composition and circuit formation substrate using the same
10/14/2010US20100260978 Composite Composition for Micropatterned Layers
10/14/2010US20100259950 Optical component, manufacturing method of the same and backlight module
10/14/2010US20100259742 Oblique mirror-type normal-incidence collector system for light sources, particularly euv plasma discharge sources
10/14/2010US20100259738 Lithographic systems and methods with extended depth of focus
10/14/2010US20100259737 Exposure apparatus preventing gas from moving from exposure region to measurement region
10/14/2010US20100258785 Superlattice nanopatterning of wires and complex patterns
10/14/2010US20100258758 Hdd pattern apparatus using laser, e-beam, or focused ion beam
10/14/2010US20100258336 Positive photosensitive resin composition, method for forming pattern, electronic component
10/14/2010DE19758561B4 Verfahren zur Herstellung eines feinen Musters und einer Halbleitervorrichtung A process for producing a fine pattern and a semiconductor device
10/14/2010DE102010003938A1 Optical arrangement i.e. projection illumination system, operating method for microlithography, involves illuminating lens with light, such that non-uniform temperature distribution is produced in lens to correct defect of system
10/14/2010DE102010003167A1 Method for operating microlithographic projection lighting apparatus, involves arranging mask in object plane of projection objective, where lighting setting, adjusted in lighting device, is changed dynamically
10/14/2010DE102009054869A1 Spiegel zur Führung eines Strahlungsbündels Mirror for guiding a radiation beam
10/14/2010DE102009016319A1 Verfahren zur Kontaminationsvermeidung und EUV-Lithographieanlage Procedures to avoid contamination and EUV lithography tool
10/14/2010DE102009015717A1 Verfahren und System zum Erkennen einer Teilchenkontamination in einer Immersionslithographieanlage Method and system for detecting a particle contamination in immersion lithography system
10/13/2010EP2239632A1 Method and apparatus for angular-resolved spectroscopic lithography characterization
10/13/2010EP2239631A1 Patterning process
10/13/2010EP2239630A2 Method for selective adsorption of noble metal catalyst onto surface of polymer
10/13/2010EP2239629A1 Optical recording material, optical recording method, photosensitive material, photolithography method, photopolymerization initiator and photosensitizing agent
10/13/2010EP2239628A1 Method for forming microscopic 3D structures
10/13/2010EP2239127A1 Imprinting device and imprinting method
10/13/2010EP2238622A1 Three-dimensional hexagonal matrix memory array and method of manufacturing the same
10/13/2010EP2238515A1 Microlithographic projection exposure apparatus
10/13/2010EP2238514A1 Exposure method, exposure apparatus, and method for producing device
10/13/2010EP2238513A1 Illumination system for illuminating a mask in a microlithographic exposure apparatus
10/13/2010EP2238178A2 Photolatent amidine bases for redox curing of radically curable formulations
10/13/2010CN201607610U 一种新型对位标记 A new alignment mark
10/13/2010CN201607609U 一种感光胶刮涂装置 One kind of sensitive adhesive coater apparatus
10/13/2010CN201606497U 主轴真空动密封系统 Spindle dynamic vacuum sealing system
10/13/2010CN1916760B Acid-producing agent, sulfonic acid, sulfonic acid derivative and radiation-sensitive resin composition
10/13/2010CN1890604B Device and method for large area lithography
10/13/2010CN1885161B Photoresist monomer polymer thereof and photoresist composition including the same
10/13/2010CN1877450B Coating compositions
10/13/2010CN1828412B Corrosion resistant composition and method for forming pattern on substrate
10/13/2010CN1821872B Etchant composition and manufacturing method for thin film transistor array panel
10/13/2010CN1726429B Chucking system and method for modulating shapes of substrates
10/13/2010CN1704848B Exposure device
10/13/2010CN1570762B Polymers and photoresists comprising same
10/13/2010CN101861548A Illumination system of a microlithographic projection exposure apparatus
10/13/2010CN101861547A Method of making a lithographic printing plate
10/13/2010CN101861245A Multi-layer imageable element with improved properties
10/13/2010CN101859074A Cleaning solution for dry plate developing tank and cleaning method thereof
10/13/2010CN101859073A Method of preventing developer residual by controling cutter ring
10/13/2010CN101859072A Fluid handling device, immersion lithographic apparatus and device manufacturing method
10/13/2010CN101859071A Light irradiation apparatus
10/13/2010CN101859070A Light irradiation apparatus with air cleaning device
10/13/2010CN101859069A Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
10/13/2010CN101859068A Color composition for color filter and color filter
10/13/2010CN101859067A Radiation-sensitive resin composition, interlayer insulating film and method for forming the same
10/13/2010CN101859066A Nano imprint template based on surface structure of biological material and preparation method thereof
10/13/2010CN101859065A Method to mitigate resist pattern critical dimension variation in double-exposure process
10/13/2010CN101859064A Method for forming resist pattern and method for manufacturing semiconductor device
10/13/2010CN101857825A Composition for stripping and cleaning and use thereof
10/13/2010CN101431008B Substrate treatment device, coating device and coating method
10/13/2010CN101424879B Resistance straining feedback type closed-loop two-dimension flexible hinge work bench
10/13/2010CN101424758B Negative refraction artificial material based on iron-clad
10/13/2010CN101414085B Liquid crystal display device and method of fabricating the same
1 ... 272 273 274 275 276 277 278 279 280 281 282 283 284 285 286 287 288 289 290 291 292 ... 1272