Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2010
10/21/2010US20100266969 Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising
10/21/2010US20100266968 Exposure apparatus, device manufacturing system, and method of manufacturing device
10/21/2010US20100266967 Polymer for forming organic anti-reflective coating layer
10/21/2010US20100266966 Methods of forming a pattern using photoresist compositions
10/21/2010US20100266965 Etch-Enhanced Technique for Lift-Off Patterning
10/21/2010US20100266964 Graphene oxide deoxygenation
10/21/2010US20100266963 Method for manufacturing mechanical shutter blades using beryllium-copper alloy substrate
10/21/2010US20100266962 Methods Of Forming A Plurality Of Capacitors
10/21/2010US20100266961 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
10/21/2010US20100266960 Method of manufacturing semiconductor device and exposure device
10/21/2010US20100266959 Pattern forming method
10/21/2010US20100266958 Resist material and method for forming pattern using the same
10/21/2010US20100266957 Resist composition and patterning process
10/21/2010US20100266956 Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery
10/21/2010US20100266955 Positive resist composition and method of forming resist pattern
10/21/2010US20100266954 Adamantane derivative, method for producing the same, and curing composition containing adamantane derivative
10/21/2010US20100266953 Copolymer and top coating composition
10/21/2010US20100266952 Cyclic compound, photoresist base, photoresist composition, microfabrication process, and semiconductor device
10/21/2010US20100266951 Resist underlayer film forming composition and method for forming resist pattern
10/21/2010US20100266936 Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram
10/21/2010US20100266935 Low-cost tough decorative printable film products having holographic-type images
10/21/2010US20100266258 Resin composition for optical material, resin film for optical material and optical waveguide using same
10/21/2010US20100265614 Servo pattern writing method of hard disk drive
10/21/2010US20100265571 Optical films and methods of making the same
10/21/2010US20100265512 Opto-mechanical optical path retardation multiplier for optical mems applications
10/21/2010US20100265481 Imaging optical system and projection exposure installation
10/21/2010US20100265479 Device manufacturing method and lithographic apparatus
10/21/2010US20100265477 Semiconductor manufacturing apparatus and pattern formation method
10/21/2010US20100265476 Lithographic apparatus and device manufacturing method
10/21/2010US20100265382 Ultra-wide angle mems scanner architecture
10/21/2010US20100264076 Manufacture of a microsieve and apparatus comprising a microsieve
10/21/2010DE102010011155A1 Schreibverfahren mit geladenem Partikelstrahl, Verfahren zum Erfassen der Position einer Referenzmarkierung für ein Beschreiben mit geladenem Partikelstrahl, und eine Schreibvorrichtung mit geladenem Partikelstrahl The writing method with a charged particle beam method for detecting the position of a reference mark for describing a charged particle beam, and a writing device with a charged particle beam
10/21/2010DE102009045763A1 Optical focal adjusting component for use in lighting system for projection exposure system of extreme UV microlithography, has reflector devices displaced with adjusting actuator for correcting use area within adjustment region
10/21/2010DE102009017096A1 Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, projection lens for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens
10/21/2010DE102009005954B4 Dämpfungsvorrichtung Damping device
10/21/2010CA2754701A1 Conducting lines, nanoparticles, inks, and patterning
10/20/2010EP2241448A1 Relief printing original plate for laser engraving and relief printing plate obtained therefrom
10/20/2010EP2240830A1 Illumination optics for microlithography
10/20/2010EP2240829A2 Ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions
10/20/2010EP2240828A1 Multiple exposure photolithography methods and photoresist compositions
10/20/2010EP2240827A2 Method to produce nanometer-sized features with directed assembly of block copolymers
10/20/2010EP2240826A1 Extrusion reduction in imprint lithography
10/20/2010EP2240322A1 Method of imaging and developing positive-working imageable elements
10/20/2010EP2178985B1 Fine-particle epsilon copper phthalocyanine pigment preparation
10/20/2010EP1853971B1 Mask blanks
10/20/2010EP1850972B1 Thermal control of deposition in dip pen nanolithography
10/20/2010CN1934496B Photosensitive insulative paste composition and photosensitive film using the same
10/20/2010CN1774675B Optical element for a lighting system
10/20/2010CN1696833B Lithographic apparatus and device manufacturing method
10/20/2010CN101868852A Photosensitive adhesive, semiconductor device and method for manufacturing semiconductor device
10/20/2010CN101868764A Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device
10/20/2010CN101868763A A lithographic apparatus, a projection system and a device manufacturing method
10/20/2010CN101868762A Photopatternable deposition inhibitor containing siloxane
10/20/2010CN101868761A Process using colored mask combined with selective area deposition
10/20/2010CN101868743A Polarizer
10/20/2010CN101868358A Processing of lithographic printing plates with hydrophilic polymer in finisher solution
10/20/2010CN101868320A Laser beam machining
10/20/2010CN101866118A Organic photoresist remover composition
10/20/2010CN101866117A Part manufacturing method and lithographic apparatus
10/20/2010CN101866116A Lithographic apparatus, control system, multi-core processor, and a method to start tasks on a multi-core processor
10/20/2010CN101866115A Lithographic apparatus, positioning system, and positioning method
10/20/2010CN101866114A Lithographic apparatus and device manufacturing method
10/20/2010CN101866113A Method of processing substrate, exposure device and method of manufacturing device
10/20/2010CN101866112A Reticle support that reduces reticle slippage
10/20/2010CN101866111A Method for monitoring exposure machine focal plane change
10/20/2010CN101866110A Rotation test pattern of windmill-shaped scribing groove
10/20/2010CN101866109A Colored curable composition, method of forming colored pattern, color filter, and liquid crystal display device
10/20/2010CN101866108A Photosetting and thermosetting solder resist composition, and printed wiring board using the same
10/20/2010CN101866107A Four-gradation photomask, its manufacturing method and photomask blank
10/20/2010CN101866093A Preparation method of shutter baffle
10/20/2010CN101866058A Polarization conversion device
10/20/2010CN101866053A Integrator and light irradiation apparatus
10/20/2010CN101864196A Fluorine-substituted perylene for colour filters in lcds
10/20/2010CN101863166A Ink jet recording head, producing method therefor and composition for ink jet recording head
10/20/2010CN101510053B Optical lens for ultraviolet laser interference photolithography straight-writing system
10/20/2010CN101487992B Silicon slice mark capturing system and method
10/20/2010CN101477315B Measuring method and apparatus for mask bench scanning inclination
10/20/2010CN101452215B Control method for key dimension
10/20/2010CN101441421B Apparatus for implementing non-mask surface plasma interference photolithography by using Lloyd lens
10/20/2010CN101286010B Aligning system for photolithography equipment and its alignment method and photolithography equipment
10/20/2010CN101271280B Lithography method for forming a circuit pattern
10/20/2010CN101241313B Lithographic equipment aligning system based on machine vision and alignment method
10/20/2010CN101216681B Machine vision dynamic calibration method
10/20/2010CN101216676B Light optics system for microlithography
10/20/2010CN101183222B Measurement method of focusing levelling light spot horizontal position
10/20/2010CN101010641B Process for the production of a lithographic printing plate
10/19/2010US7818709 Circuit-pattern-data correction method and semiconductor-device manufacturing method
10/19/2010US7817249 Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration
10/19/2010US7817245 Lithographic apparatus and device manufacturing method
10/19/2010US7817244 Exposure apparatus and method for producing device
10/19/2010US7817242 Exposure method and device manufacturing method, exposure apparatus, and program
10/19/2010US7817175 Laser induced thermal imaging apparatus and fabricating method of organic light emitting diode using the same
10/19/2010US7816471 precipitation with a poor solvent (hydrocarbon with a nitrile, ketone, ester, or carbonate); lactone ring acrylates; hydroxyalicyclic acrylates; alkali soluble; dihydroxyadamantyl ester of methacrylic acid, or 1-hydroxy-3-methacryloyloxyadamantane, or 5-methacryloyloxy-2,6-norbornane carbolactone
10/19/2010US7816313 removes residue formed by ashing treatment after dry etching in step of forming, on substrate surface, wiring of aluminum, copper, tungsten, and alloy thereof, inorganic acid (sulfuric, nitric, hydrochloric, and/or phosphoric), hydrofluoric acid, ammonium fluoride and/or ammonium hydrogen fluoride
10/19/2010US7816276 Substrate treatment system, substrate treatment method, and computer readable storage medium
10/19/2010US7816072 for producing microelectromechanical systems using electron beams; resin component prepared by protecting hydroxyl groups within alkali-soluble novolak resin with acid-dissociable, dissolution-inhibiting groups, displays increased alkali solubility under acid; oxime sulfonate-based acid generator
10/19/2010US7816071 Process of imaging a photoresist with multiple antireflective coatings
10/19/2010US7816070 having photoresist film formed in periphery and rest regions, surface is oxidized, surface tension decreasing film comprising fluororesin and/or silicon resin formed on photoresist in periphery region; high precision and stability; minimal bubbling
10/19/2010US7816069 Graded spin-on organic antireflective coating for photolithography
10/19/2010US7816068 Namely, polyvinylthiophene; compatible with typical photoresists and have desired optical properties so that the underlayer can also be used as an antireflective coating; good mechanical properties and etch selectivity
1 ... 271 272 273 274 275 276 277 278 279 280 281 282 283 284 285 286 287 288 289 290 291 ... 1272