Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2010
10/28/2010US20100270060 Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method
10/28/2010DE10260235B4 Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht A method for patterning a resist layer and the negative resist layer
10/28/2010DE102009017095A1 Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, projection lens for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens
10/28/2010DE102007049923B4 Photomasken-Layoutmuster Photomask layout pattern
10/28/2010DE10049831B4 Photoresist-Strippermittel und Verfahren zum Strippen von Photoresistaufträgen unter Verwendung des Mittels Photoresist stripper means and methods for stripping photoresist orders using the agent
10/27/2010EP2244282A1 Illumination optical system, exposure device, device manufacturing method, correction filter, and exposure optical system
10/27/2010EP2244281A1 Curable composition for nanoimprint and pattern-forming method
10/27/2010EP2244127A1 Fine pattern mask, method for producing the same, and method for forming fine pattern using the mask
10/27/2010EP2244126A2 Patterning process
10/27/2010EP2244125A2 Resist composition
10/27/2010EP2244124A2 Patterning process
10/27/2010EP2243047A1 Facet mirror for use in a projection exposure apparatus for microlithography
10/27/2010EP1888455B1 A method for creating an article using a pin of a microarray spotter
10/27/2010EP0906589B1 Apertured nonplanar electrodes and forming methods
10/27/2010CN201615991U 一种采用超临界水去除光刻胶的系统 One kind of removing the photoresist using supercritical water system
10/27/2010CN201615990U 印刷连线式远红外线烤版机构造改进 Printing connection type far infrared baked version institutions made improvements
10/27/2010CN1910517B Adaptive real time control of a reticle/mask system
10/27/2010CN1904016B Composition for removal of residue comprising cationic salts and methods using same
10/27/2010CN1898604B 负性感光性组合物及负性感光性平版印刷版 Negative photosensitive composition and a negative photosensitive lithographic printing plate
10/27/2010CN1890605B Radiation-sensitive compositions and imageable elements based thereon
10/27/2010CN1821875B Salt suitable for an acid generator and a chemically amplified resist composition containing the same
10/27/2010CN1724626B Composition for removing photoresist and/or etching residue from a substrate and use thereof
10/27/2010CN1715389B Composition for stripping and cleaning and use thereof
10/27/2010CN1662852B Multi-tiered lithographic template
10/27/2010CN1612051B Lithographic apparatus and device manufacturing method
10/27/2010CN101872717A Coating and developing apparatus, coating and developing method
10/27/2010CN101872136A Developing solution for panel display
10/27/2010CN101872135A Exposure system and device producing method
10/27/2010CN101872134A Method for improving electron beam exposure efficiency
10/27/2010CN101872133A Illuminating device
10/27/2010CN101872132A Exposing device, exposing light beam illuminating method and method for manufacturing display panel substrate
10/27/2010CN101872131A Positioning device and alignment method for exposure alignment of PCB (Polychlorinated Biphenyl) board green oil
10/27/2010CN101872130A Lithographic projection apparatus
10/27/2010CN101872129A Lithographic apparatus and device manufacturing method
10/27/2010CN101872128A Nano-photoetching system and nano-photoetching method
10/27/2010CN101872127A Method for making relation curve of photoresist thickness and critical dimension
10/27/2010CN101872126A Wet soluble lithography
10/27/2010CN101872125A Novel electrolysis process of CTP base
10/27/2010CN101872124A Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method
10/27/2010CN101872123A Radioactive rays sensitive resin compound, distance piece or protection film for liquid crystal display and forming method thereof
10/27/2010CN101872122A Blue color composition containing dye, color filter and liquid crystal display device and organic el display provided with the color filter
10/27/2010CN101872121A Photosensitive compound, solidifying film and septum
10/27/2010CN101872120A Method for preparing patterned graphene
10/27/2010CN101872119A Preparation method of sacrificial layer structure with gentle slope
10/27/2010CN101872118A Method for performing micro patterning on barium strontium titanate thin film by direct photosensitization
10/27/2010CN101872117A Process for producing photoresist pattern
10/27/2010CN101872116A Method of generating photoresist patterns
10/27/2010CN101872115A Methods and processes for modifying polymer material surface interactions
10/27/2010CN101872081A Photo-deformable liquid crystal polymer three-dimensional tunable photonic crystal and preparation method thereof
10/27/2010CN101872033A Shading sheet array, manufacturing method thereof and lens module array
10/27/2010CN101870848A Positive thermo-sensitive CTP coating liquid and preparation method thereof
10/27/2010CN101870673A Dye compound
10/27/2010CN101870649A Method for preparing adamantyl unsaturated ester
10/27/2010CN101870146A Lens mould core fixing structure
10/27/2010CN101364052B Active vibration damping system and forecast control method thereof
10/27/2010CN101290363B Method for controlling growing multiple layer film for making multiple-level micro-reflector
10/27/2010CN101290362B Silicon wet method corrosion for manufacturing multiple stage micro-reflector
10/27/2010CN101268420B Exposure apparatus
10/27/2010CN101261929B Process for wafer backside polymer removal by front side gas purge
10/27/2010CN101256363B Pneumatic vacuum control system for silicon slice bench
10/27/2010CN101251723B Negative colorful photoresist degumming agent and method for preparing the same
10/27/2010CN101201553B Illumination optical system, exposure apparatus, and exposure method
10/27/2010CN101191999B Central symmetry continuous diffraction element mask microstructure graph transfer method
10/27/2010CN101061433B Lithographic printing plate precursors with oligomeric or polymeric sensitizers
10/26/2010US7821714 Apparatus and method for measuring aerial image of EUV mask
10/26/2010US7821616 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
10/26/2010US7821614 Monitoring apparatus and method particularly useful in photolithographically processing substrates
10/26/2010US7820730 Perfluoropolyether copolymer composition for forming banks
10/26/2010US7820469 Stress-controlled dielectric integrated circuit
10/26/2010US7820369 Polymers with acetal or ketal linkage, soluble in aqueous base
10/26/2010US7820367 thickening material comprises a polyvinyl acetal resin, is capable of thickening the resist pattern by coating on the resist pattern; basic compound succinimide and cyclohexane carboxyamide; superior storage stability
10/26/2010US7820366 Method of writing identifying information on wafer
10/26/2010US7820365 using only two lithographic exposures and does not require mask repositioning between exposures; simple method to fabricate large-area, high-quality; semiconductors
10/26/2010US7820364 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates
10/26/2010US7820363 Process for forming a solder mask, apparatus thereof and process for forming electric-circuit patterned internal dielectric layer
10/26/2010US7820361 Lithographic printing plate precursor and method for preparation of lithographic printing plate
10/26/2010US7820360 Polymer compound, negative resist composition, and method of forming resist pattern
10/26/2010US7820359 Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
10/26/2010US7820358 Photo-resist material structure and method of producing the same
10/26/2010US7820357 diaryl iodonium salt radical polymerization initiator can generate radicals by the action of light or heat in a highly sensitive manner and can rapidly develop a curing reaction; as recording layers, responsive to an infrared laser, excellent image forming ability and printing durability
10/26/2010US7820356 Optical waveguides and methods thereof
10/26/2010US7820355 polyalkenamer containing an alicyclic olefin monomer having carboxyl group, obtained by ring-opening polymerization; crosslinked to form a transparent resin pattern film; excellent specific permittivity, transparency, dimensional stability under heating, solvent resistance and flatness; electronics
10/26/2010US7820344 Method for forming line pattern array, photomask having the same and semiconductor device fabricated thereby
10/26/2010US7820343 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate
10/26/2010US7820341 Method of two dimensional feature model calibration and optimization
10/26/2010US7820275 cationically curable component formed from epoxy compound(s), an acrylate component having no or a low amount of hydroxy groups preferably dipentaerythritol hexaacrylate, a polyol component, preferably a polyether polyol, a cationic photoinitiator; a free radical photoinitiator
10/26/2010US7820227 a reactive layer (e.g., a polysaccharide mass) having a surface region coated with a biologically compatible resist is provided, a portion of the resist is selectively removed to expose portion of reactive layer, molecules, such as biomolecules or cellular species are then conjugated to exposed portion
10/26/2010US7819594 Development processing device
10/26/2010US7819076 Substrate treatment method and substrate treatment apparatus
10/26/2010CA2628350C Method and apparatus for production of a cast component
10/21/2010WO2010120809A1 Conducting lines, nanoparticles, inks, and patterning
10/21/2010WO2010120131A2 Method for treating waste organic solvents
10/21/2010WO2010119924A1 Polymerizable composition for color filter, color filter, and solid imaging element
10/21/2010WO2010119910A1 Radiation-sensitive resin composition, polymer used therein, and compound used therein
10/21/2010WO2010119753A1 Photoresist remover composition and method for removing photoresist
10/21/2010WO2010119647A1 Photosensitive resin composition, adhesive film, and light receiving device
10/21/2010WO2010118916A1 Organic photoresist stripper composition
10/21/2010WO2010118902A1 Detector module with a cooling arrangement, and lithographic apparatus comprising said detector module
10/21/2010WO2010090406A3 Colored photosensitive resin composition, color filter, and liquid crystal display device comprising same
10/21/2010WO2010088141A3 Method and system for sizing polygons in an integrated circuit (ic) layout
1 ... 270 271 272 273 274 275 276 277 278 279 280 281 282 283 284 285 286 287 288 289 290 ... 1272