Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2010
11/03/2010EP1741130B1 Device and method for treating a substrate in the field of semiconductor technology, in addition to a system comprising a device for treating a substrate
11/03/2010EP1614151B1 Method for forming an antireflective layer
11/03/2010EP1551020B1 Method of producing optical disk-use original and method of producing optical disk
11/03/2010EP1365288B1 Pattern forming method using a photo mask
11/03/2010EP1114355B1 Method and apparatus for developing photoresist patterns
11/03/2010CN1949079B Coating apparatus and coating method
11/03/2010CN1908818B Lens position control method, lens position control apparatus, cutting method, and cutting apparatus
11/03/2010CN1892432B Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device
11/03/2010CN1834788B Method of realizing continuous scanning to explore two patterns by using two mask plates
11/03/2010CN1830039B Method and system for drying a substrate
11/03/2010CN1813220B Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces
11/03/2010CN1809787B Aqueous developable photoimageable thick film compositions
11/03/2010CN1760758B Radioactivity sensitive resin composition
11/03/2010CN1609712B Method for etching smooth sidewalls in III-V based compounds for electro-optical devices
11/03/2010CN101878452A Remover liquid composition and method for removing resin layer by using the same
11/03/2010CN101878451A Blocked isocyanato bearing silicon containing composition for the formation of resist undercoat
11/03/2010CN101878438A Methods for forming sheeting with a composite image that floats and a master tooling
11/03/2010CN101876793A Method of forming a pattern of an array of shapes including a blocked region
11/03/2010CN101876792A Normal-temperature hole sealing technology of CTP base
11/03/2010CN101876791A Positive photo-resist resin composition and solidification film forming method using the composition
11/03/2010CN101876790A Photocurable resin composition for transparent electrode formation and method for producing transparent electrode
11/03/2010CN101876789A Positive photo-sensitive resin composition and solidification film forming method using the same
11/03/2010CN101876788A Photosensitive colored composition and color filter
11/03/2010CN101876787A Preparation of flexographic printing masters using an additive process
11/03/2010CN101875631A Dye composition
11/03/2010CN101875532A Manufacturing method of lens mould
11/03/2010CN101582373B Gas charging equipment and gas inlet port device
11/03/2010CN101515080B Colored filter and manufacturing method
11/03/2010CN101356454B Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus
11/03/2010CN101261444B Manufacture method for display panel possessing different substrate thickness difference
11/03/2010CN101246310B Negative fluorine-contained photoresist composition and its application in polymer optical waveguide device
11/03/2010CN101221890B Method for forming semiconductor structure
11/03/2010CN101178545B Position detecting method and device, patterning device
11/03/2010CN101078880B Composition for forming pattern and in-plane printing method using the same
11/03/2010CN101051185B Light etching positioning self assembling filling method
11/03/2010CN101048692B Imaging or exposure device, particularly for the creation of an electronic micro-circuit
11/02/2010USRE41906 Two dimensional beam deflector
11/02/2010US7826071 Parametric profiling using optical spectroscopic systems
11/02/2010US7826035 Lithographic apparatus and device manufacturing method
11/02/2010US7826033 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/02/2010US7826031 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
11/02/2010US7826012 Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate
11/02/2010US7825651 Resistor structures to electrically measure unidirectional misalignment of stitched masks
11/02/2010US7825443 Semiconductor constructions
11/02/2010US7825078 Non-aqueous microelectronic cleaning compositions containing fructose
11/02/2010US7824846 forming a tapered photoresist edge on semiconductor substrate by exposing to the actinic radiation gradually decreasing in intensity from the first outer perimeter to the first inner perimeter; photolithography
11/02/2010US7824845 Functionalized carbosilane polymers and photoresist compositions containing the same
11/02/2010US7824844 Solvent mixtures for antireflective coating compositions for photoresists
11/02/2010US7824843 forming a randomly arranged plurality of holes pattern using the first and second positive photoresists as a mask; photolithography
11/02/2010US7824841 Method for forming a fine pattern of a semiconductor device
11/02/2010US7824840 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates
11/02/2010US7824839 cationic lactone containing perfluorinated sulfonate or sulfonimides with iodonium or sulfonium anions as photoacid generator, a polyhydroxystyrene homo or copolymer and a solvent (propylene glycol/1,2-/, monoalkyl ether, ethyl lactone ); semiconductor, heat exposure, pattern forming; development
11/02/2010US7824838 Method of manufacturing printed circuit board
11/02/2010US7824837 copolymer containing monomers selected from acrylic acid, methacrylic acid, vinyl alcohol, hydroxystyrenes, acrylic ester of chromophore group or 1,1,1,3,3,3-hexafluoro-2-propanol group; vinyl ether terminated crosslinking agent; solvent resistant, impervious to interdiffusion of photoresist
11/02/2010US7824836 Mixture of acid generator, mixture of basic compounds and surfactant; pattern forming method
11/02/2010US7824826 Method and apparatus for performing dark field double dipole lithography (DDL)
11/02/2010US7824825 stencil mask in which various surface patterns can be formed, and in which deformation is suppressed when charged particles are introduced; mask for limiting an irradiation area of charged particles on a surface of a substrate to a predetermined shape; for semiconductor
11/02/2010US7824823 Mask, method of fabricating the same, and method of fabricating organic electro-luminescence device using the same
11/02/2010US7824822 Photosensitive compositions for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram
11/02/2010US7824494 Method and apparatus for production of a cast component
11/02/2010US7823534 Development device and development method
10/2010
10/28/2010WO2010123157A1 Liquid immersion member
10/28/2010WO2010123123A1 Developing apparatus, method for processing developer liquid, method for producing printing plate, and filtration device
10/28/2010WO2010123101A1 Radiation-sensitive resin composition
10/28/2010WO2010123066A1 Process for production of polyhydroxyimide
10/28/2010WO2010123032A1 Composition for forming film for pattern reversal and method of forming reversed pattern
10/28/2010WO2010123009A1 Radiation-sensitive resin composition, polymer, and method for forming resist pattern
10/28/2010WO2010123005A1 Photosensitive resin laminate
10/28/2010WO2010123000A1 Top coating composition
10/28/2010WO2010122948A1 Composition for forming resist underlayer film for euv lithography
10/28/2010WO2010122788A1 Moving-object apparatus, exposure apparatus, exposure method, and device manufacturing method
10/28/2010WO2010122777A1 Colored composition, color filter, and color liquid crystal display element
10/28/2010WO2010099017A3 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers
10/28/2010WO2010088139A3 Compact abbe's kernel generation using principal component analysis
10/28/2010WO2010062370A3 Dispense system set-up and characterization
10/28/2010WO2010029328A3 Textile colouration with diacetylene compounds
10/28/2010WO2010029138A9 Method of etching using a multilayer masking structure
10/28/2010US20100273115 Particle inspection apparatus, exposure apparatus, and device manufacturing method
10/28/2010US20100273114 Device manufacturing apparatus and method of manufacturing device
10/28/2010US20100273113 Process for producing photoresist pattern
10/28/2010US20100273112 Process for producing photoresist pattern
10/28/2010US20100273111 Dual tone development with plural photo-acid generators in lithographic applications
10/28/2010US20100273110 Patterning process
10/28/2010US20100273109 Method for producing optical part
10/28/2010US20100273108 Method for producing regenerated porous sheet
10/28/2010US20100273107 Dual tone development with a photo-activated acid enhancement component in lithographic applications
10/28/2010US20100273106 Positive resist composition, method of forming resist pattern, polymeric compound, and compound
10/28/2010US20100273105 Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator
10/28/2010US20100273104 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
10/28/2010US20100273099 Flood exposure process for dual tone development in lithographic applications
10/28/2010US20100273096 Photopolymer media with enhanced dynamic range
10/28/2010US20100272967 Method of forming a pattern of an array of shapes including a blocked region
10/28/2010US20100272909 Method of forming fine patterns
10/28/2010US20100271716 Replacement apparatus for an optical element
10/28/2010US20100271621 Methods and systems for determining a critical dimension and overlay of a specimen
10/28/2010US20100271608 System and method for imaging apparatus calibration
10/28/2010US20100271602 Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
10/28/2010US20100271428 Polyfunctional epoxy compound, epoxy resin, cationic photopolymerizable epoxy resin composition, micro structured member, producing method therefor and liquid discharge head
10/28/2010US20100270709 Lithographic apparatus and device manufacturing method
10/28/2010US20100270264 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device
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