Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2010
11/10/2010CN101399187B Method for forming film layer
11/10/2010CN101398629B Exposal correcting method
11/10/2010CN101364048B Photolithography illuminating apparatus and illuminating method
11/10/2010CN101349844B Array substrate for liquid crystal display device and method of fabricating the same
11/10/2010CN101334589B Exposure pattern data detecting device and method
11/10/2010CN101290395B Minisize multifunctional optical devices and method for making same
11/10/2010CN101251713B Method for deep-UV lithography making T type gate
11/10/2010CN101162363B Alternating phase shift mask inspection method and system
11/10/2010CN101137927B Apparatus for multiple beam deflection and intensity stabilization
11/10/2010CN101086614B Micrometer-class three-dimensional rolling die and its production method
11/10/2010CN101078890B Method for eliminating air bubble from photoresist and stud bump making method
11/10/2010CN101063741B High precision constant curved face focusing device and method thereof
11/10/2010CN101048705B Lower layer film-forming composition for lithography containing cyclodextrin compound
11/10/2010CN101034175B Color filter substrate and display components thereof
11/10/2010CN101025572B Supporting body of plate
11/10/2010CN101021682B Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
11/09/2010US7830497 System and method for using a two part cover and a box for protecting a reticle
11/09/2010US7829965 Touching microlens structure for a pixel sensor and method of fabrication
11/09/2010US7829650 Polymer for organic anti-reflective coating layer and composition including the same
11/09/2010US7829638 Antireflective hardmask composition and methods for using same
11/09/2010US7829270 comprising a support; and an emulsion layer containing a silver salt emulsion, the photosensitive material being capable of forming a conductive metal film by exposing and developing the emulsion layer, wherein the emulsion layer has a swelling rate of 150% or more
11/09/2010US7829269 patterning substrate by forming layer of radiation-sensitive material on substrate, layer comprising a first photo-acid generator and a second photo-acid generator, performing patterned exposure of layer of radiation-sensitive material to electromagnetic radiation
11/09/2010US7829268 forming a sacrificial layer on a substrate, then, selectively decomposing sacrificial layer at a temperature less than the temperature required to thermally decompose the sacrificial layer by selectively exposing the sacrificial layer to UV radiation
11/09/2010US7829266 Multiple exposure technique using OPC to correct distortion
11/09/2010US7829265 providing conductive circuit on surface of insulating layer, conductive surface having connection terminal, coating resist on insulating layer and conductive circuit, patterning resist into desired pattern, forming a projection portion; enhanced connection strength between connection terminals
11/09/2010US7829264 providing photoresist layer having surface, setting focus range corresponding to an angle to be formed in photoresist layer and corresponding to structure, exposing photoresist layer over focus range to form a photoresist mask having a trench therein; perpendicular magnetic recording pole
11/09/2010US7829263 Exposure method and apparatus, coating apparatus for applying resist to plural substrates, and device manufacturing method
11/09/2010US7829262 providing an insulating layer that is overlaid by multiple layers of masking material, creating a series of selectively definable lines in the masking material, where the lines have a pattern, performing pitch reduction on lines using a spacer material
11/09/2010US7829261 Method for making a lithographic plate
11/09/2010US7829260 treatment of laser imaged plate with a deactivating solution and overall irradiation can be used to cause certain chemical or physical change to plate without developing the plate; improves color contrast, resolution, durability, or imaging consistence
11/09/2010US7829259 Resin for photoresist composition, photoresist composition and method for forming resist pattern
11/09/2010US7829258 record material that is imageable with a laser beam, material comprising cellulosic substrate comprising white filler having on surface a coating containing a solvent-soluble or disperse-type dye suitable for coloring plastics or polymers; dye does not show visible dye specks
11/09/2010US7829257 Alkaline developable photoresists
11/09/2010US7829256 Photocuring composition and plasma display panel produced by using the same
11/09/2010US7827682 Apparatus for making circuitized substrates having photo-imageable dielectric layers in a continuous manner
11/04/2010WO2010126883A1 Durable skin marking compositions
11/04/2010WO2010126133A1 Photosensitive modified polyimide resin composition and use thereof
11/04/2010WO2010126006A1 Photosensitive resin composition, photosensitive element utilizing the composition, method for formation of resist pattern, and process for production of printed circuit board
11/04/2010WO2010125949A1 Photosensitive composition utilizing photopolymerizable polymer having fluorene skeleton
11/04/2010WO2010125825A1 Color filter, liquid crystal display device, and exposure mask
11/04/2010WO2010125721A1 Photo-curable and heat-curable resin composition
11/04/2010WO2010125720A1 Photo-curable and heat-curable resin composition
11/04/2010WO2010124910A1 Lithographic apparatus and detector apparatus
11/04/2010WO2010124903A1 Lithographic apparatus and method
11/04/2010WO2010124791A1 Method and calibration mask for calibrating a position measuring apparatus
11/04/2010WO2010124704A1 Metrology apparatus, lithography apparatus and method of measuring a property of a substrate
11/04/2010WO2010100273A3 Variable overlap method and device for stitching together lithographic stripes
11/04/2010WO2010100268A3 Lithographic printing system with placement corrections
11/04/2010WO2010080789A3 Spin-on spacer materials for double- and triple-patterning lithography
11/04/2010WO2010080028A3 Method of selecting a set of illumination conditions of a lithographic apparatus for optimizing an integrated circuit physical layout
11/04/2010WO2010053558A3 Release agent partition control in imprint lithography
11/04/2010WO2010047788A3 Imprint lithography system and method
11/04/2010US20100280808 Method and system for measuring patterned structures
11/04/2010US20100280807 Method and system for measuring patterned structures
11/04/2010US20100280260 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
11/04/2010US20100279910 Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent
11/04/2010US20100279235 Composition for formation of top anti-reflective film, and pattern formation method using the composition
11/04/2010US20100279234 Double patterning method using metallic compound mask layer
11/04/2010US20100279233 Method for laser interference lithography using diffraction grating
11/04/2010US20100279232 Immersion lithographic apparatus and a device manufacturing method
11/04/2010US20100279231 Method and device for marking objects
11/04/2010US20100279230 Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method
11/04/2010US20100279229 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
11/04/2010US20100279228 Organo-metallic hybrid materials for micro- and nanofabrication
11/04/2010US20100279227 Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound
11/04/2010US20100279226 Resist processing method
11/04/2010US20100279213 Methods and systems for controlling variation in dimensions of patterned features across a wafer
11/04/2010US20100279212 Photomask
11/04/2010US20100279078 Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums
11/04/2010US20100279074 Process for preparing a polymeric relief structure
11/04/2010US20100278496 Optical waveguide and method for producing the same
11/04/2010US20100277706 Method of Measurement, an Inspection Apparatus and a Lithographic Apparatus
11/04/2010US20100276186 Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith
11/04/2010DE102009029132A1 Illumination system for micro lithographic projection system utilized for microlithography of e.g. electronic component, has optical element arranged in level directly in front of entry surface, and exhibiting refraction power
11/04/2010DE102008042462B4 Beleuchtungssystem für die EUV-Mikrolithographie Illumination system for EUV microlithography
11/04/2010DE102008042438B4 Mikrolithographie-Projektionsbelichtungsanlage mit mindestens zwei Arbeitszuständen Microlithography projection exposure apparatus having at least two working conditions
11/04/2010DE102008041179B4 Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage Illumination optics for microlithography projection exposure system
11/04/2010DE102005060337B4 Flüssigkristallanzeige-Paneel und Verfahren zur Herstellung von diesem A liquid crystal display panel and process for producing this
11/04/2010DE102005048380B4 Vorrichtung zum Belichten eines Substrats, Photomaske und modifiziertes Beleuchtungssystem der Vorrichtung und Verfahren zum Bilden eines Musters an einem Substrat unter Verwendung der Vorrichtung An apparatus for exposing a substrate, photomask and modified illumination system of the apparatus and method for forming a pattern on a substrate using the apparatus
11/04/2010DE102005017765B4 Verfahren zum Einstellen einer Einrichtung zur Bebilderung von Druckplatten A method for adjusting a device for imaging printing plates
11/04/2010CA2760148A1 Durable skin marking compositions
11/03/2010EP2247170A1 Method for electroconductive pattern formation
11/03/2010EP2246876A1 Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be exposed, and method of imparting water repellency with the same to substrate to be exposed
11/03/2010EP2246741A1 Image recording method
11/03/2010EP2246740A1 Method for structuring a silicone layer
11/03/2010EP2246739A1 Photosensitive color composition, color filter and method for producing the same
11/03/2010EP2246394A1 Fluoride-substituted perylenes for colour filters in LCD
11/03/2010EP2246385A1 Resin, pigment dispersion liquid, coloring curable composition, color filter produced by using the composition, and method for producing the color filter
11/03/2010EP2246371A1 Curable resin composition for nanoimprint
11/03/2010EP2246350A1 Fluoride-substituted perylenes for colour filters in LCD
11/03/2010EP2246170A1 Manufacturing method for seamless mold
11/03/2010EP2245723A1 Magnectic actuator
11/03/2010EP2245512A2 On-track process for patterning hardmask by multiple dark field exposures
11/03/2010EP2245511A1 Multiplexing of pulsed sources
11/03/2010EP2245487A1 Optical elements with gradient structure
11/03/2010EP2244987A1 Single-sided high throughput wet etching and wet processing apparatus and method
11/03/2010EP2233978A8 Composition for formation of anti-reflective film, and pattern formation method using the composition
11/03/2010EP2156247B1 Process for preparing a polymeric relief structure
11/03/2010EP2149072B1 A gum solution for developing and gumming a photopolymer printing plate
11/03/2010EP1802184B1 Method for manufacturing an electro-conductive pattern material
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